CN101844440A - 液体喷射头、液体喷射装置以及致动器 - Google Patents
液体喷射头、液体喷射装置以及致动器 Download PDFInfo
- Publication number
- CN101844440A CN101844440A CN201010143229A CN201010143229A CN101844440A CN 101844440 A CN101844440 A CN 101844440A CN 201010143229 A CN201010143229 A CN 201010143229A CN 201010143229 A CN201010143229 A CN 201010143229A CN 101844440 A CN101844440 A CN 101844440A
- Authority
- CN
- China
- Prior art keywords
- piezoelectric
- layer
- piezoelectric body
- electrode
- body layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000007788 liquid Substances 0.000 title claims abstract description 44
- 239000010936 titanium Substances 0.000 claims abstract description 74
- 239000013078 crystal Substances 0.000 claims abstract description 60
- 239000000758 substrate Substances 0.000 claims abstract description 35
- 229910052719 titanium Inorganic materials 0.000 claims abstract description 19
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims abstract description 16
- 229910052726 zirconium Inorganic materials 0.000 claims abstract description 9
- VSZWPYCFIRKVQL-UHFFFAOYSA-N selanylidenegallium;selenium Chemical compound [Se].[Se]=[Ga].[Se]=[Ga] VSZWPYCFIRKVQL-UHFFFAOYSA-N 0.000 claims abstract description 8
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 claims abstract description 5
- 239000000463 material Substances 0.000 claims description 22
- 229910052451 lead zirconate titanate Inorganic materials 0.000 claims description 12
- HFGPZNIAWCZYJU-UHFFFAOYSA-N lead zirconate titanate Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ti+4].[Zr+4].[Pb+2] HFGPZNIAWCZYJU-UHFFFAOYSA-N 0.000 claims description 5
- 238000002347 injection Methods 0.000 claims description 3
- 239000007924 injection Substances 0.000 claims description 3
- 230000015572 biosynthetic process Effects 0.000 claims description 2
- 230000009466 transformation Effects 0.000 claims description 2
- 239000000203 mixture Substances 0.000 abstract description 36
- 238000006073 displacement reaction Methods 0.000 abstract description 15
- 230000035882 stress Effects 0.000 description 17
- 239000012212 insulator Substances 0.000 description 16
- 239000002243 precursor Substances 0.000 description 14
- 238000004519 manufacturing process Methods 0.000 description 13
- RKTYLMNFRDHKIL-UHFFFAOYSA-N copper;5,10,15,20-tetraphenylporphyrin-22,24-diide Chemical group [Cu+2].C1=CC(C(=C2C=CC([N-]2)=C(C=2C=CC=CC=2)C=2C=CC(N=2)=C(C=2C=CC=CC=2)C2=CC=C3[N-]2)C=2C=CC=CC=2)=NC1=C3C1=CC=CC=C1 RKTYLMNFRDHKIL-UHFFFAOYSA-N 0.000 description 9
- 238000000034 method Methods 0.000 description 9
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 8
- 230000001681 protective effect Effects 0.000 description 8
- 238000003860 storage Methods 0.000 description 8
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 7
- 229910052721 tungsten Inorganic materials 0.000 description 7
- 239000010937 tungsten Substances 0.000 description 7
- 238000007789 sealing Methods 0.000 description 6
- 229910052751 metal Inorganic materials 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- 238000005245 sintering Methods 0.000 description 5
- 238000004544 sputter deposition Methods 0.000 description 5
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 4
- 238000005238 degreasing Methods 0.000 description 4
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 3
- 238000004891 communication Methods 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 229910052741 iridium Inorganic materials 0.000 description 3
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 description 3
- 229910044991 metal oxide Inorganic materials 0.000 description 3
- 150000004706 metal oxides Chemical class 0.000 description 3
- 229910021421 monocrystalline silicon Inorganic materials 0.000 description 3
- 230000010287 polarization Effects 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 238000000354 decomposition reaction Methods 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 230000001747 exhibiting effect Effects 0.000 description 2
- 239000010931 gold Substances 0.000 description 2
- 238000010884 ion-beam technique Methods 0.000 description 2
- 238000010030 laminating Methods 0.000 description 2
- 229910052746 lanthanum Inorganic materials 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 230000007246 mechanism Effects 0.000 description 2
- 229910052697 platinum Inorganic materials 0.000 description 2
- 238000003980 solgel method Methods 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 238000000018 DNA microarray Methods 0.000 description 1
- 208000016169 Fish-eye disease Diseases 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 238000002441 X-ray diffraction Methods 0.000 description 1
- FYOZFGWYYZDOQH-UHFFFAOYSA-N [Mg].[Nb] Chemical compound [Mg].[Nb] FYOZFGWYYZDOQH-UHFFFAOYSA-N 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 229910021523 barium zirconate Inorganic materials 0.000 description 1
- DQBAOWPVHRWLJC-UHFFFAOYSA-N barium(2+);dioxido(oxo)zirconium Chemical compound [Ba+2].[O-][Zr]([O-])=O DQBAOWPVHRWLJC-UHFFFAOYSA-N 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000007772 electrode material Substances 0.000 description 1
- 230000006355 external stress Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000002241 glass-ceramic Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- FZLIPJUXYLNCLC-UHFFFAOYSA-N lanthanum atom Chemical compound [La] FZLIPJUXYLNCLC-UHFFFAOYSA-N 0.000 description 1
- 229910052745 lead Inorganic materials 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- 239000000395 magnesium oxide Substances 0.000 description 1
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 1
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229910000480 nickel oxide Inorganic materials 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- 239000010955 niobium Substances 0.000 description 1
- 229910000484 niobium oxide Inorganic materials 0.000 description 1
- URLJKFSTXLNXLG-UHFFFAOYSA-N niobium(5+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Nb+5].[Nb+5] URLJKFSTXLNXLG-UHFFFAOYSA-N 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- GNRSAWUEBMWBQH-UHFFFAOYSA-N oxonickel Chemical compound [Ni]=O GNRSAWUEBMWBQH-UHFFFAOYSA-N 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 238000004151 rapid thermal annealing Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/14—Structure thereof only for on-demand ink jet heads
- B41J2/14201—Structure of print heads with piezoelectric elements
- B41J2/14233—Structure of print heads with piezoelectric elements of film type, deformed by bending and disposed on a diaphragm
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1607—Production of print heads with piezoelectric elements
- B41J2/161—Production of print heads with piezoelectric elements of film type, deformed by bending and disposed on a diaphragm
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/164—Manufacturing processes thin film formation
- B41J2/1646—Manufacturing processes thin film formation thin film formation by sputtering
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N30/00—Piezoelectric or electrostrictive devices
- H10N30/20—Piezoelectric or electrostrictive devices with electrical input and mechanical output, e.g. functioning as actuators or vibrators
- H10N30/204—Piezoelectric or electrostrictive devices with electrical input and mechanical output, e.g. functioning as actuators or vibrators using bending displacement, e.g. unimorph, bimorph or multimorph cantilever or membrane benders
- H10N30/2047—Membrane type
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N30/00—Piezoelectric or electrostrictive devices
- H10N30/80—Constructional details
- H10N30/85—Piezoelectric or electrostrictive active materials
- H10N30/853—Ceramic compositions
- H10N30/8548—Lead-based oxides
- H10N30/8554—Lead-zirconium titanate [PZT] based
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Chemical & Material Sciences (AREA)
- Ceramic Engineering (AREA)
- Particle Formation And Scattering Control In Inkjet Printers (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP077841/2009 | 2009-03-26 | ||
| JP2009077841A JP2010228266A (ja) | 2009-03-26 | 2009-03-26 | 液体噴射ヘッド及び液体噴射装置並びにアクチュエーター |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN101844440A true CN101844440A (zh) | 2010-09-29 |
Family
ID=42769332
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201010143229A Pending CN101844440A (zh) | 2009-03-26 | 2010-03-26 | 液体喷射头、液体喷射装置以及致动器 |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | US8317304B2 (enExample) |
| JP (1) | JP2010228266A (enExample) |
| CN (1) | CN101844440A (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111823714A (zh) * | 2019-04-19 | 2020-10-27 | 精工爱普生株式会社 | 液体喷出头以及打印机 |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP2833423B1 (en) * | 2012-03-30 | 2020-11-04 | Kyocera Corporation | Piezoelectric actuator, inkjet head, and method for manufacturing piezoelectric actuator |
| US9450171B2 (en) * | 2012-04-19 | 2016-09-20 | Sae Magnetics (H.K.) Ltd. | Thin film piezoelectric element and manufacturing method thereof, micro-actuator, head gimbal assembly and disk drive unit with the same |
| US20130279044A1 (en) * | 2012-04-19 | 2013-10-24 | Sae Magnetics (H.K.) Ltd. | Thin film piezoelectric element and manufacturing method thereof, micro-actuator, head gimbal assembly and disk drive unit with the same |
| JP6613596B2 (ja) * | 2015-04-06 | 2019-12-04 | セイコーエプソン株式会社 | 圧電素子、これを備えた液体吐出ヘッド、及び、液体吐出装置 |
| CN107342357B (zh) * | 2016-04-28 | 2022-08-16 | 新科实业有限公司 | 薄膜压电元件及其制造方法 |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005119166A (ja) * | 2003-10-17 | 2005-05-12 | Matsushita Electric Ind Co Ltd | 圧電素子、インクジェットヘッド、及びこれらの製造方法、並びにインクジェット式記録装置 |
| CN1676330A (zh) * | 2004-04-02 | 2005-10-05 | 松下电器产业株式会社 | 压电元件、喷墨头、角速度传感器及喷墨式记录装置 |
| JP2007088446A (ja) * | 2005-08-23 | 2007-04-05 | Canon Inc | 圧電体、圧電素子、圧電素子を用いた液体吐出ヘッドおよび液体吐出装置 |
| CN1953947A (zh) * | 2004-01-20 | 2007-04-25 | 株式会社Iai | 压电陶瓷组合物 |
| US20080018716A1 (en) * | 2006-07-19 | 2008-01-24 | Seiko Epson Corporation | Piezoelectric device and liquid jet head |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4327942B2 (ja) * | 1999-05-20 | 2009-09-09 | Tdk株式会社 | 薄膜圧電素子 |
| US7998362B2 (en) | 2005-08-23 | 2011-08-16 | Canon Kabushiki Kaisha | Piezoelectric substance, piezoelectric element, liquid discharge head using piezoelectric element, liquid discharge apparatus, and production method of piezoelectric element |
| US7521845B2 (en) | 2005-08-23 | 2009-04-21 | Canon Kabushiki Kaisha | Piezoelectric substance, piezoelectric element, liquid discharge head using piezoelectric element, and liquid discharge apparatus |
| JP5241087B2 (ja) | 2005-08-23 | 2013-07-17 | キヤノン株式会社 | 圧電体、圧電素子、圧電素子を用いた液体吐出ヘッド、液体吐出装置及び圧電素子の製造方法 |
| JP2007250626A (ja) * | 2006-03-14 | 2007-09-27 | Seiko Epson Corp | 圧電素子の製造方法、アクチュエータ装置の製造方法、液体噴射ヘッドの製造方法、液体噴射装置の製造方法および圧電素子 |
| US8020974B2 (en) | 2007-01-31 | 2011-09-20 | Panasonic Corporation | Piezoelectric thin film device and piezoelectric thin film device manufacturing method, and inkjet head and inkjet recording apparatus |
| JP2008218620A (ja) | 2007-03-02 | 2008-09-18 | Matsushita Electric Ind Co Ltd | 圧電体薄膜素子、圧電体薄膜素子の製造方法、インクジェットヘッド、およびインクジェット式記録装置 |
| JP2008305821A (ja) | 2007-06-05 | 2008-12-18 | Panasonic Corp | 圧電体薄膜素子、圧電体薄膜素子の製造方法、インクジェットヘッド、およびインクジェット式記録装置 |
| JP2009049220A (ja) | 2007-08-21 | 2009-03-05 | Panasonic Corp | 圧電体薄膜素子、圧電体薄膜素子の製造方法、インクジェットヘッド、及びインクジェット式記録装置 |
| US8518290B2 (en) * | 2008-07-30 | 2013-08-27 | Canon Kabushiki Kaisha | Piezoelectric material |
-
2009
- 2009-03-26 JP JP2009077841A patent/JP2010228266A/ja not_active Withdrawn
-
2010
- 2010-03-11 US US12/722,387 patent/US8317304B2/en active Active
- 2010-03-26 CN CN201010143229A patent/CN101844440A/zh active Pending
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005119166A (ja) * | 2003-10-17 | 2005-05-12 | Matsushita Electric Ind Co Ltd | 圧電素子、インクジェットヘッド、及びこれらの製造方法、並びにインクジェット式記録装置 |
| CN1953947A (zh) * | 2004-01-20 | 2007-04-25 | 株式会社Iai | 压电陶瓷组合物 |
| CN1676330A (zh) * | 2004-04-02 | 2005-10-05 | 松下电器产业株式会社 | 压电元件、喷墨头、角速度传感器及喷墨式记录装置 |
| JP2007088446A (ja) * | 2005-08-23 | 2007-04-05 | Canon Inc | 圧電体、圧電素子、圧電素子を用いた液体吐出ヘッドおよび液体吐出装置 |
| US20080018716A1 (en) * | 2006-07-19 | 2008-01-24 | Seiko Epson Corporation | Piezoelectric device and liquid jet head |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111823714A (zh) * | 2019-04-19 | 2020-10-27 | 精工爱普生株式会社 | 液体喷出头以及打印机 |
Also Published As
| Publication number | Publication date |
|---|---|
| US8317304B2 (en) | 2012-11-27 |
| JP2010228266A (ja) | 2010-10-14 |
| US20100245487A1 (en) | 2010-09-30 |
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| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C02 | Deemed withdrawal of patent application after publication (patent law 2001) | ||
| WD01 | Invention patent application deemed withdrawn after publication |
Application publication date: 20100929 |