CN101795961B - 用于制备微结构化制品的工具 - Google Patents

用于制备微结构化制品的工具 Download PDF

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Publication number
CN101795961B
CN101795961B CN2008801060642A CN200880106064A CN101795961B CN 101795961 B CN101795961 B CN 101795961B CN 2008801060642 A CN2008801060642 A CN 2008801060642A CN 200880106064 A CN200880106064 A CN 200880106064A CN 101795961 B CN101795961 B CN 101795961B
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CN
China
Prior art keywords
micro
structural
instrument
preparation
pressing mold
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Expired - Fee Related
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CN2008801060642A
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English (en)
Chinese (zh)
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CN101795961A (zh
Inventor
莫塞斯·M·大卫
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3M Innovative Properties Co
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3M Innovative Properties Co
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Publication of CN101795961A publication Critical patent/CN101795961A/zh
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
    • G03F7/2053—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a laser
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0015—Production of aperture devices, microporous systems or stamps
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0017—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor for the production of embossing, cutting or similar devices; for the production of casting means

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Nanotechnology (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Micromachines (AREA)
  • Moulds For Moulding Plastics Or The Like (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
CN2008801060642A 2007-09-06 2008-09-02 用于制备微结构化制品的工具 Expired - Fee Related CN101795961B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US96762207P 2007-09-06 2007-09-06
US60/967,622 2007-09-06
PCT/US2008/075021 WO2009032815A1 (en) 2007-09-06 2008-09-02 Tool for making microstructured articles

Publications (2)

Publication Number Publication Date
CN101795961A CN101795961A (zh) 2010-08-04
CN101795961B true CN101795961B (zh) 2013-05-01

Family

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CN2008801060642A Expired - Fee Related CN101795961B (zh) 2007-09-06 2008-09-02 用于制备微结构化制品的工具

Country Status (5)

Country Link
US (1) US20100308497A1 (enExample)
EP (1) EP2205521A4 (enExample)
JP (1) JP2010537843A (enExample)
CN (1) CN101795961B (enExample)
WO (1) WO2009032815A1 (enExample)

Families Citing this family (29)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2197646B1 (en) 2007-09-06 2011-11-23 3M Innovative Properties Company Methods of forming molds and methods of forming articles using said molds
JP5951928B2 (ja) 2007-09-06 2016-07-13 スリーエム イノベイティブ プロパティズ カンパニー 光出力の領域制御を提供する光抽出構造体を有する光ガイド
CN101821659B (zh) 2007-10-11 2014-09-24 3M创新有限公司 色差共聚焦传感器
WO2009075970A1 (en) 2007-12-12 2009-06-18 3M Innovative Properties Company Method for making structures with improved edge definition
JP5801558B2 (ja) * 2008-02-26 2015-10-28 スリーエム イノベイティブ プロパティズ カンパニー 多光子露光システム
CN101885577A (zh) * 2009-05-14 2010-11-17 鸿富锦精密工业（深圳）有限公司 压印成型微小凹透镜阵列的模仁、模压装置及方法
CN102491257A (zh) * 2011-12-28 2012-06-13 大连理工大学 一种热塑性聚合物纳米通道的制作方法
TW201325884A (zh) * 2011-12-29 2013-07-01 Hon Hai Prec Ind Co Ltd 光學薄膜壓印滾輪及該滾輪之製作方法
JP2015532323A (ja) * 2012-09-28 2015-11-09 イー・アイ・デュポン・ドウ・ヌムール・アンド・カンパニーＥ．Ｉ．Ｄｕ Ｐｏｎｔ Ｄｅ Ｎｅｍｏｕｒｓ Ａｎｄ Ｃｏｍｐａｎｙ イメージャブルな架橋性フルオロポリマーフィルムを配置された基材を含むイメージャブル物品、並びにそれらから作製されたイメージ化物品
US9711744B2 (en) 2012-12-21 2017-07-18 3M Innovative Properties Company Patterned structured transfer tape
JP6317247B2 (ja) * 2014-12-22 2018-04-25 富士フイルム株式会社 インプリント用モールド
JP2019510540A (ja) 2016-02-05 2019-04-18 ハヴィ グローバル ソリューションズ、エルエルシー 改善された断熱および結露耐性を有する微細構造の表面
US10687642B2 (en) 2016-02-05 2020-06-23 Havi Global Solutions, Llc Microstructured packaging surfaces for enhanced grip
CN109475465A (zh) 2016-04-07 2019-03-15 哈维全球解决方案有限责任公司 具有内部微结构的流体囊
JP7004680B2 (ja) * 2016-06-27 2022-01-21 ハヴィ グローバル ソリューションズ、エルエルシー 強化されたグリップのための微細構造化されたパッケージング表面
WO2019026021A1 (en) 2017-08-04 2019-02-07 3M Innovative Properties Company MICRO-REPLICATED POLISHING SURFACE WITH IMPROVED COPLANARITY
EP3775086B1 (en) 2018-04-05 2022-09-14 3M Innovative Properties Company Gel adhesive comprising crosslinked blend of polydiorganosiloxane and acrylic polymer
KR20210073604A (ko) 2018-11-09 2021-06-18 쓰리엠 이노베이티브 프로퍼티즈 컴파니 나노구조화된 광학 필름 및 중간체
US12434427B2 (en) 2019-08-20 2025-10-07 Solventum Intellectual Properties Company Microstructured surface with increased microorganism removal when cleaned, articles and methods
CN114650887A (zh) 2019-08-20 2022-06-21 3M创新有限公司 具有在清洁时微生物去除增加的微结构化表面、制品及方法
US11766822B2 (en) 2019-08-20 2023-09-26 3M Innovative Properties Company Microstructured surface with increased microorganism removal when cleaned, articles and methods
JP2023526631A (ja) 2020-05-20 2023-06-22 スリーエム イノベイティブ プロパティズ カンパニー 微細構造化表面を有する医療用物品
DE102020125484A1 (de) * 2020-09-30 2022-03-31 Lts Lohmann Therapie-Systeme Ag Verfahren zur Herstellung eines Formelements für die Herstellung von Mikroarrays sowie Formelement
US20230390991A1 (en) 2020-12-11 2023-12-07 3M Innovative Properties Company Method of thermoforming film with structured surface and articles
WO2022137063A1 (en) 2020-12-21 2022-06-30 3M Innovative Properties Company Superhydrophobic films
EP4284570A1 (en) 2021-01-28 2023-12-06 3M Innovative Properties Company Microstructured surface with increased microorganism removal when cleaned, articles and methods
EP4401946A1 (en) 2021-09-14 2024-07-24 Solventum Intellectual Properties Company Articles including a microstructured curved surface and methods of making same
WO2024141815A1 (en) 2022-12-28 2024-07-04 3M Innovative Properties Company Multilayered articles including a uv barrier layer
WO2024213958A1 (en) 2023-04-14 2024-10-17 Solventum Intellectual Properties Company Multilayer polymer film, method, and articles suitable for thermoforming

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20020088146A (ko) * 2001-05-17 2002-11-27 한국과학기술연구원 초소형 렌즈 어레이 제조방법
CN1296191C (zh) * 2002-07-01 2007-01-24 埃西勒国际通用光学公司 制造具有带实用微结构的主曲面的模制件的方法

Family Cites Families (107)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3018262A (en) * 1957-05-01 1962-01-23 Shell Oil Co Curing polyepoxides with certain metal salts of inorganic acids
US3729313A (en) * 1971-12-06 1973-04-24 Minnesota Mining & Mfg Novel photosensitive systems comprising diaryliodonium compounds and their use
US3808006A (en) * 1971-12-06 1974-04-30 Minnesota Mining & Mfg Photosensitive material containing a diaryliodium compound, a sensitizer and a color former
US3741769A (en) * 1972-10-24 1973-06-26 Minnesota Mining & Mfg Novel photosensitive polymerizable systems and their use
AU497960B2 (en) * 1974-04-11 1979-01-25 Minnesota Mining And Manufacturing Company Photopolymerizable compositions
US4250053A (en) * 1979-05-21 1981-02-10 Minnesota Mining And Manufacturing Company Sensitized aromatic iodonium or aromatic sulfonium salt photoinitiator systems
US4262072A (en) * 1979-06-25 1981-04-14 Minnesota Mining And Manufacturing Company Poly(ethylenically unsaturated alkoxy) heterocyclic protective coatings
US4249011A (en) * 1979-06-25 1981-02-03 Minnesota Mining And Manufacturing Company Poly(ethylenically unsaturated alkoxy) heterocyclic compounds
US4279717A (en) * 1979-08-03 1981-07-21 General Electric Company Ultraviolet curable epoxy silicone coating compositions
US4491628A (en) * 1982-08-23 1985-01-01 International Business Machines Corporation Positive- and negative-working resist compositions with acid generating photoinitiator and polymer with acid labile groups pendant from polymer backbone
US4668601A (en) * 1985-01-18 1987-05-26 Minnesota Mining And Manufacturing Company Protective coating for phototools
US4642126A (en) * 1985-02-11 1987-02-10 Norton Company Coated abrasives with rapidly curable adhesives and controllable curvature
US4652274A (en) * 1985-08-07 1987-03-24 Minnesota Mining And Manufacturing Company Coated abrasive product having radiation curable binder
CA1323949C (en) * 1987-04-02 1993-11-02 Michael C. Palazzotto Ternary photoinitiator system for addition polymerization
US4859572A (en) * 1988-05-02 1989-08-22 Eastman Kodak Company Dye sensitized photographic imaging system
CA2065368A1 (en) * 1989-08-21 1991-02-22 Carl R. Amos Methods of and apparatus for manipulating electromagnetic phenomenon
JP2724232B2 (ja) * 1990-05-02 1998-03-09 株式会社日立製作所 自動焦点手段およびその自動焦点手段を用いた光ディスク装置
US5235015A (en) * 1991-02-21 1993-08-10 Minnesota Mining And Manufacturing Company High speed aqueous solvent developable photopolymer compositions
GB9121789D0 (en) * 1991-10-14 1991-11-27 Minnesota Mining & Mfg Positive-acting photothermographic materials
EP0544332B1 (en) * 1991-11-28 1997-01-29 Enplas Corporation Surface light source device
TW268969B (enExample) * 1992-10-02 1996-01-21 Minnesota Mining & Mfg
US5298741A (en) * 1993-01-13 1994-03-29 Trustees Of Tufts College Thin film fiber optic sensor array and apparatus for concurrent viewing and chemical sensing of a sample
US5512219A (en) * 1994-06-03 1996-04-30 Reflexite Corporation Method of casting a microstructure sheet having an array of prism elements using a reusable polycarbonate mold
US5856373A (en) * 1994-10-31 1999-01-05 Minnesota Mining And Manufacturing Company Dental visible light curable epoxy system with enhanced depth of cure
US5858624A (en) * 1996-09-20 1999-01-12 Minnesota Mining And Manufacturing Company Method for assembling planarization and indium-tin-oxide layer on a liquid crystal display color filter with a transfer process
US5922238A (en) * 1997-02-14 1999-07-13 Physical Optics Corporation Method of making replicas and compositions for use therewith
DE19713362A1 (de) * 1997-03-29 1998-10-01 Zeiss Carl Jena Gmbh Konfokale mikroskopische Anordnung
US6025406A (en) * 1997-04-11 2000-02-15 3M Innovative Properties Company Ternary photoinitiator system for curing of epoxy resins
US6001297A (en) * 1997-04-28 1999-12-14 3D Systems, Inc. Method for controlling exposure of a solidfiable medium using a pulsed radiation source in building a three-dimensional object using stereolithography
US5859251A (en) * 1997-09-18 1999-01-12 The United States Of America As Represented By The Secretary Of The Air Force Symmetrical dyes with large two-photon absorption cross-sections
US5770737A (en) * 1997-09-18 1998-06-23 The United States Of America As Represented By The Secretary Of The Air Force Asymmetrical dyes with large two-photon absorption cross-sections
JP4564655B2 (ja) * 1998-04-21 2010-10-20 ユニバーシティ オブ コネチカット 多光子励起を用いたフリーフォームナノ製作
US6100405A (en) * 1999-06-15 2000-08-08 The United States Of America As Represented By The Secretary Of The Air Force Benzothiazole-containing two-photon chromophores exhibiting strong frequency upconversion
US7046905B1 (en) * 1999-10-08 2006-05-16 3M Innovative Properties Company Blacklight with structured surfaces
US6288842B1 (en) * 2000-02-22 2001-09-11 3M Innovative Properties Sheeting with composite image that floats
US6696157B1 (en) * 2000-03-05 2004-02-24 3M Innovative Properties Company Diamond-like glass thin films
US6560248B1 (en) * 2000-06-08 2003-05-06 Mania Barco Nv System, method and article of manufacture for improved laser direct imaging a printed circuit board utilizing a mode locked laser and scophony operation
US7381516B2 (en) * 2002-10-02 2008-06-03 3M Innovative Properties Company Multiphoton photosensitization system
AU2001270320A1 (en) * 2000-06-15 2001-12-24 3M Innovative Properties Company Multicolor imaging using multiphoton photochemical processes
US6852766B1 (en) * 2000-06-15 2005-02-08 3M Innovative Properties Company Multiphoton photosensitization system
KR100811017B1 (ko) * 2000-06-15 2008-03-11 쓰리엠 이노베이티브 프로퍼티즈 캄파니 다중방향성 광반응성 흡수 방법
EP1292852B1 (en) * 2000-06-15 2005-11-09 3M Innovative Properties Company Microfabrication of organic optical elements
DE10034737C2 (de) * 2000-07-17 2002-07-11 Fraunhofer Ges Forschung Verfahren zur Herstellung einer permanenten Entformungsschicht durch Plasmapolymerisation auf der Oberfläche eines Formteilwerkzeugs, ein nach dem Verfahren herstellbares Formteilwerkzeug und dessen Verwendung
JP4192414B2 (ja) * 2000-09-14 2008-12-10 凸版印刷株式会社 レンズシートの製造方法
JP2002355830A (ja) * 2001-03-26 2002-12-10 Novartis Ag 眼科用レンズの製造のための型及び方法
JP2002307398A (ja) * 2001-04-18 2002-10-23 Mitsui Chemicals Inc マイクロ構造物の製造方法
US20030006535A1 (en) * 2001-06-26 2003-01-09 Michael Hennessey Method and apparatus for forming microstructures on polymeric substrates
DE10131156A1 (de) * 2001-06-29 2003-01-16 Fraunhofer Ges Forschung Arikel mit plasmapolymerer Beschichtung und Verfahren zu dessen Herstellung
US6804062B2 (en) * 2001-10-09 2004-10-12 California Institute Of Technology Nonimaging concentrator lens arrays and microfabrication of the same
US6948448B2 (en) * 2001-11-27 2005-09-27 General Electric Company Apparatus and method for depositing large area coatings on planar surfaces
US7887889B2 (en) * 2001-12-14 2011-02-15 3M Innovative Properties Company Plasma fluorination treatment of porous materials
US6750266B2 (en) * 2001-12-28 2004-06-15 3M Innovative Properties Company Multiphoton photosensitization system
US20030155667A1 (en) * 2002-12-12 2003-08-21 Devoe Robert J Method for making or adding structures to an article
US7478942B2 (en) * 2003-01-23 2009-01-20 Samsung Electronics Co., Ltd. Light guide plate with light reflection pattern
TWI352228B (en) * 2003-02-28 2011-11-11 Sharp Kk Surface dadiation conversion element, liquid cryst
JP4269745B2 (ja) * 2003-03-31 2009-05-27 株式会社日立製作所 スタンパ及び転写装置
US20040202865A1 (en) * 2003-04-08 2004-10-14 Andrew Homola Release coating for stamper
US7070406B2 (en) * 2003-04-29 2006-07-04 Hewlett-Packard Development Company, L.P. Apparatus for embossing a flexible substrate with a pattern carried by an optically transparent compliant media
JP4586021B2 (ja) * 2003-09-23 2010-11-24 ザ ユニバーシティ オブ ノース カロライナ アット チャペル ヒル マイクロ流体装置の新規な材料として使用するための光硬化性ペルフルオロポリエーテル
WO2005044364A1 (en) * 2003-11-10 2005-05-19 Agency For Science, Technology And Research Microneedles and microneedle fabrication
EP1538482B1 (en) * 2003-12-05 2016-02-17 Obducat AB Device and method for large area lithography
US7632087B2 (en) * 2003-12-19 2009-12-15 Wd Media, Inc. Composite stamper for imprint lithography
US9040090B2 (en) * 2003-12-19 2015-05-26 The University Of North Carolina At Chapel Hill Isolated and fixed micro and nano structures and methods thereof
US20050273146A1 (en) * 2003-12-24 2005-12-08 Synecor, Llc Liquid perfluoropolymers and medical applications incorporating same
US7282324B2 (en) * 2004-01-05 2007-10-16 Microchem Corp. Photoresist compositions, hardened forms thereof, hardened patterns thereof and metal patterns formed using them
US9039401B2 (en) * 2006-02-27 2015-05-26 Microcontinuum, Inc. Formation of pattern replicating tools
JP4879159B2 (ja) * 2004-03-05 2012-02-22 アプライド マテリアルズ インコーポレイテッド アモルファス炭素膜堆積のためのｃｖｄプロセス
US20050254035A1 (en) * 2004-05-11 2005-11-17 Chromaplex, Inc. Multi-photon lithography
US8025831B2 (en) * 2004-05-24 2011-09-27 Agency For Science, Technology And Research Imprinting of supported and free-standing 3-D micro- or nano-structures
US7717693B2 (en) * 2004-05-28 2010-05-18 Obducat Ab Modified metal mold for use in imprinting processes
US20050272599A1 (en) * 2004-06-04 2005-12-08 Kenneth Kramer Mold release layer
JP4420746B2 (ja) * 2004-06-09 2010-02-24 リコー光学株式会社 形状転写用金型、及びその製造方法、並びにそれを用いた製品の製造方法
JP2006032423A (ja) * 2004-07-12 2006-02-02 Toshiba Corp インプリント加工用スタンパーおよびその製造方法
JP4389791B2 (ja) * 2004-08-25 2009-12-24 セイコーエプソン株式会社 微細構造体の製造方法および露光装置
JP2006165371A (ja) * 2004-12-09 2006-06-22 Canon Inc 転写装置およびデバイス製造方法
US9370881B2 (en) * 2005-03-02 2016-06-21 The Trustees Of Boston College Structures and methods of replicating the same
BRPI0608856A2 (pt) * 2005-03-09 2010-02-02 3M Innovative Properties Co artigo microrreplicado, método de produzir um artigo microrreplicado e monitor óptico
KR100688866B1 (ko) * 2005-04-07 2007-03-02 삼성전기주식회사 임프린트 장치, 시스템 및 방법
US7478791B2 (en) * 2005-04-15 2009-01-20 3M Innovative Properties Company Flexible mold comprising cured polymerizable resin composition
KR100692742B1 (ko) * 2005-05-13 2007-03-09 삼성전자주식회사 도광층을 갖는 키 패드 및 키 패드 어셈블리
ES2315797T3 (es) * 2005-06-10 2009-04-01 Obducat Ab Metodo de replicacion de modelo.
DE602005012068D1 (de) * 2005-06-10 2009-02-12 Obducat Ab Kopieren eines Musters mit Hilfe eines Zwischenstempels
EP1731965B1 (en) * 2005-06-10 2012-08-08 Obducat AB Imprint stamp comprising cyclic olefin copolymer
US7326948B2 (en) * 2005-08-15 2008-02-05 Asml Netherlands B.V. Beam modifying device, lithographic projection apparatus, method of treating a beam, and device manufacturing method
KR100610336B1 (ko) * 2005-09-12 2006-08-09 김형준 키패드 백라이트용 도광판 및 그 제조 방법
US7878791B2 (en) * 2005-11-04 2011-02-01 Asml Netherlands B.V. Imprint lithography
US7583444B1 (en) * 2005-12-21 2009-09-01 3M Innovative Properties Company Process for making microlens arrays and masterforms
WO2007073482A2 (en) * 2005-12-21 2007-06-28 3M Innovative Properties Company Method and apparatus for processing multiphoton curable photoreactive compositions
US7545569B2 (en) * 2006-01-13 2009-06-09 Avery Dennison Corporation Optical apparatus with flipped compound prism structures
TWM298289U (en) * 2006-03-17 2006-09-21 Hon Hai Prec Ind Co Ltd Light guide plates and electronic products using the same
US20070216049A1 (en) * 2006-03-20 2007-09-20 Heptagon Oy Method and tool for manufacturing optical elements
WO2007112309A2 (en) * 2006-03-24 2007-10-04 3M Innovative Properties Company Process for making microneedles, microneedle arrays, masters, and replication tools
EP2018263B1 (en) * 2006-05-18 2017-03-01 3M Innovative Properties Company Process for making light guides with extraction structures
TWI322927B (en) * 2006-05-24 2010-04-01 Ind Tech Res Inst Roller module for microstructure thin film imprint
TW200745490A (en) * 2006-06-07 2007-12-16 Jeng Shiang Prec Ind Co Ltd Light guide plate
US20080007964A1 (en) * 2006-07-05 2008-01-10 Tai-Yen Lin Light guiding structure
US7551359B2 (en) * 2006-09-14 2009-06-23 3M Innovative Properties Company Beam splitter apparatus and system
US20080083886A1 (en) * 2006-09-14 2008-04-10 3M Innovative Properties Company Optical system suitable for processing multiphoton curable photoreactive compositions
US8241713B2 (en) * 2007-02-21 2012-08-14 3M Innovative Properties Company Moisture barrier coatings for organic light emitting diode devices
US7891636B2 (en) * 2007-08-27 2011-02-22 3M Innovative Properties Company Silicone mold and use thereof
EP2197646B1 (en) * 2007-09-06 2011-11-23 3M Innovative Properties Company Methods of forming molds and methods of forming articles using said molds
CN101821302A (zh) * 2007-10-11 2010-09-01 3M创新有限公司 高功能性多光子可固化反应性物质
US8080073B2 (en) * 2007-12-20 2011-12-20 3M Innovative Properties Company Abrasive article having a plurality of precisely-shaped abrasive composites
JP2009155710A (ja) * 2007-12-27 2009-07-16 Tokai Rika Co Ltd 微細構造体の製造方法
JP5801558B2 (ja) * 2008-02-26 2015-10-28 スリーエム イノベイティブ プロパティズ カンパニー 多光子露光システム
US8570270B2 (en) * 2009-10-19 2013-10-29 Apple Inc. Backlight unit color compensation techniques
TWM385715U (en) * 2009-12-14 2010-08-01 Chunghwa Picture Tubes Ltd Backlight module

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20020088146A (ko) * 2001-05-17 2002-11-27 한국과학기술연구원 초소형 렌즈 어레이 제조방법
CN1296191C (zh) * 2002-07-01 2007-01-24 埃西勒国际通用光学公司 制造具有带实用微结构的主曲面的模制件的方法

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
C.Y.Chang,et al..A roller embossing process for rapid fabrication of microlens arrays on glass substrates.《Microsyst Technol.》.2006, *
Can Peng,Xiaogan Liang,et al..High fidelity fabrication of microlens arrays by nanoimprint using conformal mold duplication and low-pressure liquid material curing.《J.Vac.Sci.Technol.B》.2007, *

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