JP2010537843A - 微細構造物品を作製するための工具 - Google Patents
微細構造物品を作製するための工具 Download PDFInfo
- Publication number
- JP2010537843A JP2010537843A JP2010524112A JP2010524112A JP2010537843A JP 2010537843 A JP2010537843 A JP 2010537843A JP 2010524112 A JP2010524112 A JP 2010524112A JP 2010524112 A JP2010524112 A JP 2010524112A JP 2010537843 A JP2010537843 A JP 2010537843A
- Authority
- JP
- Japan
- Prior art keywords
- pattern
- tool
- carrier
- microstructured
- microstructure pattern
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000463 material Substances 0.000 claims abstract description 68
- 239000000758 substrate Substances 0.000 claims abstract description 18
- 229920000642 polymer Polymers 0.000 claims abstract description 13
- 230000003362 replicative effect Effects 0.000 claims abstract description 11
- 238000000034 method Methods 0.000 claims description 110
- 239000010408 film Substances 0.000 claims description 17
- 239000007789 gas Substances 0.000 claims description 16
- 239000002184 metal Substances 0.000 claims description 14
- 229910052751 metal Inorganic materials 0.000 claims description 14
- 239000010409 thin film Substances 0.000 claims description 14
- 230000005855 radiation Effects 0.000 claims description 13
- 230000010076 replication Effects 0.000 claims description 12
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 11
- 238000004519 manufacturing process Methods 0.000 claims description 11
- 229910052710 silicon Inorganic materials 0.000 claims description 11
- 239000010703 silicon Substances 0.000 claims description 11
- 239000002243 precursor Substances 0.000 claims description 10
- 229920002313 fluoropolymer Polymers 0.000 claims description 9
- 239000004811 fluoropolymer Substances 0.000 claims description 9
- 229920001296 polysiloxane Polymers 0.000 claims description 8
- 238000009832 plasma treatment Methods 0.000 claims description 7
- 239000010702 perfluoropolyether Substances 0.000 claims description 6
- CZDYPVPMEAXLPK-UHFFFAOYSA-N tetramethylsilane Chemical compound C[Si](C)(C)C CZDYPVPMEAXLPK-UHFFFAOYSA-N 0.000 claims description 6
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims description 5
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 5
- 238000000151 deposition Methods 0.000 claims description 5
- 229910052731 fluorine Inorganic materials 0.000 claims description 5
- 239000011737 fluorine Substances 0.000 claims description 5
- 239000001301 oxygen Substances 0.000 claims description 5
- 229910052760 oxygen Inorganic materials 0.000 claims description 5
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 claims description 4
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 4
- NBVXSUQYWXRMNV-UHFFFAOYSA-N fluoromethane Chemical compound FC NBVXSUQYWXRMNV-UHFFFAOYSA-N 0.000 claims description 4
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 claims description 3
- 239000011521 glass Substances 0.000 claims description 3
- QLOAVXSYZAJECW-UHFFFAOYSA-N methane;molecular fluorine Chemical compound C.FF QLOAVXSYZAJECW-UHFFFAOYSA-N 0.000 claims description 3
- 239000010453 quartz Substances 0.000 claims description 3
- 150000003376 silicon Chemical class 0.000 claims description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 3
- 229910021529 ammonia Inorganic materials 0.000 claims description 2
- 238000009713 electroplating Methods 0.000 claims description 2
- QYSGYZVSCZSLHT-UHFFFAOYSA-N octafluoropropane Chemical compound FC(F)(F)C(F)(F)C(F)(F)F QYSGYZVSCZSLHT-UHFFFAOYSA-N 0.000 claims description 2
- 229960004065 perflutren Drugs 0.000 claims description 2
- 229920006254 polymer film Polymers 0.000 claims description 2
- 238000012545 processing Methods 0.000 claims description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 2
- 229910001868 water Inorganic materials 0.000 claims description 2
- 238000012986 modification Methods 0.000 claims 1
- 230000004048 modification Effects 0.000 claims 1
- 229910052757 nitrogen Inorganic materials 0.000 claims 1
- 239000000203 mixture Substances 0.000 description 17
- 239000011347 resin Substances 0.000 description 8
- 229920005989 resin Polymers 0.000 description 8
- 238000012876 topography Methods 0.000 description 6
- 238000003491 array Methods 0.000 description 5
- 238000010924 continuous production Methods 0.000 description 4
- 238000005520 cutting process Methods 0.000 description 4
- 238000003754 machining Methods 0.000 description 4
- -1 polydimethylsiloxane Polymers 0.000 description 4
- 150000002009 diols Chemical class 0.000 description 3
- UHESRSKEBRADOO-UHFFFAOYSA-N ethyl carbamate;prop-2-enoic acid Chemical compound OC(=O)C=C.CCOC(N)=O UHESRSKEBRADOO-UHFFFAOYSA-N 0.000 description 3
- 230000001788 irregular Effects 0.000 description 3
- 230000003287 optical effect Effects 0.000 description 3
- 229920000058 polyacrylate Polymers 0.000 description 3
- 239000004417 polycarbonate Substances 0.000 description 3
- 229920000515 polycarbonate Polymers 0.000 description 3
- 239000004793 Polystyrene Substances 0.000 description 2
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 2
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 238000005266 casting Methods 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 239000003085 diluting agent Substances 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 238000001125 extrusion Methods 0.000 description 2
- 238000011049 filling Methods 0.000 description 2
- UQEAIHBTYFGYIE-UHFFFAOYSA-N hexamethyldisiloxane Chemical compound C[Si](C)(C)O[Si](C)(C)C UQEAIHBTYFGYIE-UHFFFAOYSA-N 0.000 description 2
- 238000007373 indentation Methods 0.000 description 2
- 238000001746 injection moulding Methods 0.000 description 2
- 238000000608 laser ablation Methods 0.000 description 2
- RBQRWNWVPQDTJJ-UHFFFAOYSA-N methacryloyloxyethyl isocyanate Chemical compound CC(=C)C(=O)OCCN=C=O RBQRWNWVPQDTJJ-UHFFFAOYSA-N 0.000 description 2
- 238000005459 micromachining Methods 0.000 description 2
- 239000000178 monomer Substances 0.000 description 2
- 238000000206 photolithography Methods 0.000 description 2
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 2
- 229920000139 polyethylene terephthalate Polymers 0.000 description 2
- 239000005020 polyethylene terephthalate Substances 0.000 description 2
- 239000004926 polymethyl methacrylate Substances 0.000 description 2
- 229920002223 polystyrene Polymers 0.000 description 2
- 229910000077 silane Inorganic materials 0.000 description 2
- 230000004304 visual acuity Effects 0.000 description 2
- 235000012431 wafers Nutrition 0.000 description 2
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000000969 carrier Substances 0.000 description 1
- 238000003486 chemical etching Methods 0.000 description 1
- 238000007906 compression Methods 0.000 description 1
- 230000006835 compression Effects 0.000 description 1
- 238000000748 compression moulding Methods 0.000 description 1
- 238000011960 computer-aided design Methods 0.000 description 1
- 239000002872 contrast media Substances 0.000 description 1
- 230000001934 delay Effects 0.000 description 1
- 238000005137 deposition process Methods 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000007516 diamond turning Methods 0.000 description 1
- 239000004205 dimethyl polysiloxane Substances 0.000 description 1
- 229910001882 dioxygen Inorganic materials 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000012377 drug delivery Methods 0.000 description 1
- 229920001971 elastomer Polymers 0.000 description 1
- 229920005570 flexible polymer Polymers 0.000 description 1
- 210000003128 head Anatomy 0.000 description 1
- 230000001939 inductive effect Effects 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 238000007726 management method Methods 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000009828 non-uniform distribution Methods 0.000 description 1
- 150000001282 organosilanes Chemical class 0.000 description 1
- 238000012856 packing Methods 0.000 description 1
- 229920000435 poly(dimethylsiloxane) Polymers 0.000 description 1
- 229920003223 poly(pyromellitimide-1,4-diphenyl ether) Polymers 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 239000002861 polymer material Substances 0.000 description 1
- 229920000098 polyolefin Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000010107 reaction injection moulding Methods 0.000 description 1
- 229920013730 reactive polymer Polymers 0.000 description 1
- 238000002310 reflectometry Methods 0.000 description 1
- 210000001525 retina Anatomy 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 229920005573 silicon-containing polymer Polymers 0.000 description 1
- 229920002050 silicone resin Polymers 0.000 description 1
- 229920002379 silicone rubber Polymers 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 229920002803 thermoplastic polyurethane Polymers 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 238000001721 transfer moulding Methods 0.000 description 1
- 238000011282 treatment Methods 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
- G03F7/2053—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a laser
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0015—Production of aperture devices, microporous systems or stamps
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0017—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor for the production of embossing, cutting or similar devices; for the production of casting means
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Nanotechnology (AREA)
- Crystallography & Structural Chemistry (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Optics & Photonics (AREA)
- Mathematical Physics (AREA)
- Theoretical Computer Science (AREA)
- Micromachines (AREA)
- Moulds For Moulding Plastics Or The Like (AREA)
- Shaping Of Tube Ends By Bending Or Straightening (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US96762207P | 2007-09-06 | 2007-09-06 | |
| PCT/US2008/075021 WO2009032815A1 (en) | 2007-09-06 | 2008-09-02 | Tool for making microstructured articles |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2010537843A true JP2010537843A (ja) | 2010-12-09 |
| JP2010537843A5 JP2010537843A5 (enExample) | 2011-10-06 |
Family
ID=40429318
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2010524112A Pending JP2010537843A (ja) | 2007-09-06 | 2008-09-02 | 微細構造物品を作製するための工具 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US20100308497A1 (enExample) |
| EP (1) | EP2205521A4 (enExample) |
| JP (1) | JP2010537843A (enExample) |
| CN (1) | CN101795961B (enExample) |
| WO (1) | WO2009032815A1 (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2016103653A1 (ja) * | 2014-12-22 | 2016-06-30 | 富士フイルム株式会社 | インプリント用モールド |
Families Citing this family (28)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8322874B2 (en) | 2007-09-06 | 2012-12-04 | 3M Innovative Properties Company | Lightguides having light extraction structures providing regional control of light output |
| CN101795838B (zh) | 2007-09-06 | 2014-02-12 | 3M创新有限公司 | 形成模具的方法以及使用所述模具形成制品的方法 |
| WO2009048808A1 (en) | 2007-10-11 | 2009-04-16 | 3M Innovative Properties Company | Chromatic confocal sensor |
| JP5524856B2 (ja) | 2007-12-12 | 2014-06-18 | スリーエム イノベイティブ プロパティズ カンパニー | エッジ明瞭性が向上した構造の製造方法 |
| JP5801558B2 (ja) | 2008-02-26 | 2015-10-28 | スリーエム イノベイティブ プロパティズ カンパニー | 多光子露光システム |
| CN101885577A (zh) * | 2009-05-14 | 2010-11-17 | 鸿富锦精密工业（深圳）有限公司 | 压印成型微小凹透镜阵列的模仁、模压装置及方法 |
| CN102491257A (zh) * | 2011-12-28 | 2012-06-13 | 大连理工大学 | 一种热塑性聚合物纳米通道的制作方法 |
| TW201325884A (zh) * | 2011-12-29 | 2013-07-01 | Hon Hai Prec Ind Co Ltd | 光學薄膜壓印滾輪及該滾輪之製作方法 |
| EP2901213A1 (en) * | 2012-09-28 | 2015-08-05 | E. I. du Pont de Nemours and Company | Imageable article comprising a substrate having an imageable crosslinkable fluoropolymer film disposed thereupon, and the imaged article prepared therefrom |
| US9711744B2 (en) * | 2012-12-21 | 2017-07-18 | 3M Innovative Properties Company | Patterned structured transfer tape |
| US10687642B2 (en) | 2016-02-05 | 2020-06-23 | Havi Global Solutions, Llc | Microstructured packaging surfaces for enhanced grip |
| EP3411214A4 (en) | 2016-02-05 | 2019-11-20 | Havi Global Solutions, LLC | Micro-structured surface with improved insulation and resistance to condensation |
| CN109475465A (zh) | 2016-04-07 | 2019-03-15 | 哈维全球解决方案有限责任公司 | 具有内部微结构的流体囊 |
| WO2018005294A1 (en) * | 2016-06-27 | 2018-01-04 | Havi Global Solutions, Llc | Microstructured packaging surfaces for enhanced grip |
| KR102608124B1 (ko) * | 2017-08-04 | 2023-11-29 | 쓰리엠 이노베이티브 프로퍼티즈 컴파니 | 향상된 동일 평면성을 갖는 미세복제된 폴리싱 표면 |
| US11965120B2 (en) | 2018-04-05 | 2024-04-23 | 3M Innovative Properties Company | Gel adhesive comprising crosslinked blend of polydiorganosiloxane and acrylic polymer |
| WO2020097319A1 (en) | 2018-11-09 | 2020-05-14 | 3M Innovative Properties Company | Nanostructured optical films and intermediates |
| US12434427B2 (en) | 2019-08-20 | 2025-10-07 | Solventum Intellectual Properties Company | Microstructured surface with increased microorganism removal when cleaned, articles and methods |
| WO2021033162A1 (en) | 2019-08-20 | 2021-02-25 | 3M Innovative Properties Company | Microstructured surface with increased microorganism removal when cleaned, articles and methods |
| US11766822B2 (en) | 2019-08-20 | 2023-09-26 | 3M Innovative Properties Company | Microstructured surface with increased microorganism removal when cleaned, articles and methods |
| EP4153060A1 (en) | 2020-05-20 | 2023-03-29 | 3M Innovative Properties Company | Medical articles with microstructured surface |
| DE102020125484A1 (de) * | 2020-09-30 | 2022-03-31 | Lts Lohmann Therapie-Systeme Ag | Verfahren zur Herstellung eines Formelements für die Herstellung von Mikroarrays sowie Formelement |
| US20230390991A1 (en) | 2020-12-11 | 2023-12-07 | 3M Innovative Properties Company | Method of thermoforming film with structured surface and articles |
| WO2022137063A1 (en) | 2020-12-21 | 2022-06-30 | 3M Innovative Properties Company | Superhydrophobic films |
| EP4284570A1 (en) | 2021-01-28 | 2023-12-06 | 3M Innovative Properties Company | Microstructured surface with increased microorganism removal when cleaned, articles and methods |
| US20240343550A1 (en) | 2021-09-14 | 2024-10-17 | 3M Innovative Properties Company | Articles including a microstructured curved surface and methods of making same |
| WO2024141815A1 (en) | 2022-12-28 | 2024-07-04 | 3M Innovative Properties Company | Multilayered articles including a uv barrier layer |
| CN120936479A (zh) | 2023-04-14 | 2025-11-11 | 舒万诺知识产权公司 | 适于热成形的多层聚合物膜、方法和制品 |
Citations (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002307398A (ja) * | 2001-04-18 | 2002-10-23 | Mitsui Chemicals Inc | マイクロ構造物の製造方法 |
| WO2005113422A1 (en) * | 2004-05-24 | 2005-12-01 | Agency For Science, Technology And Research | Imprinting of supported and free-standing 3-d micro-or nano-structures |
| WO2005119360A1 (en) * | 2004-05-28 | 2005-12-15 | Obducat Ab | Modified metal mold for use in imprinting processes |
| JP2005349619A (ja) * | 2004-06-09 | 2005-12-22 | Ricoh Opt Ind Co Ltd | 形状転写用金型、それを用いた製品の製造方法及び得られる微細形状をもつ製品 |
| JP2006032423A (ja) * | 2004-07-12 | 2006-02-02 | Toshiba Corp | インプリント加工用スタンパーおよびその製造方法 |
| JP2006513811A (ja) * | 2003-11-10 | 2006-04-27 | エイジェンシー フォー サイエンス， テクノロジー アンド リサーチ | マイクロニードルおよびマイクロニードルの製造 |
| WO2006098958A1 (en) * | 2005-03-09 | 2006-09-21 | 3M Innovative Properties Company | Microreplicated article with defect-reducing surface |
| JP2007522433A (ja) * | 2003-09-23 | 2007-08-09 | ザ ユニバーシティ オブ ノース カロライナ アット チャペル ヒル | マイクロ流体装置の新規な材料として使用するための光硬化性ペルフルオロポリエーテル |
| JP2009155710A (ja) * | 2007-12-27 | 2009-07-16 | Tokai Rika Co Ltd | 微細構造体の製造方法 |
Family Cites Families (100)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3018262A (en) * | 1957-05-01 | 1962-01-23 | Shell Oil Co | Curing polyepoxides with certain metal salts of inorganic acids |
| US3808006A (en) * | 1971-12-06 | 1974-04-30 | Minnesota Mining & Mfg | Photosensitive material containing a diaryliodium compound, a sensitizer and a color former |
| US3729313A (en) * | 1971-12-06 | 1973-04-24 | Minnesota Mining & Mfg | Novel photosensitive systems comprising diaryliodonium compounds and their use |
| US3741769A (en) * | 1972-10-24 | 1973-06-26 | Minnesota Mining & Mfg | Novel photosensitive polymerizable systems and their use |
| AU497960B2 (en) * | 1974-04-11 | 1979-01-25 | Minnesota Mining And Manufacturing Company | Photopolymerizable compositions |
| US4250053A (en) * | 1979-05-21 | 1981-02-10 | Minnesota Mining And Manufacturing Company | Sensitized aromatic iodonium or aromatic sulfonium salt photoinitiator systems |
| US4262072A (en) * | 1979-06-25 | 1981-04-14 | Minnesota Mining And Manufacturing Company | Poly(ethylenically unsaturated alkoxy) heterocyclic protective coatings |
| US4249011A (en) * | 1979-06-25 | 1981-02-03 | Minnesota Mining And Manufacturing Company | Poly(ethylenically unsaturated alkoxy) heterocyclic compounds |
| US4279717A (en) * | 1979-08-03 | 1981-07-21 | General Electric Company | Ultraviolet curable epoxy silicone coating compositions |
| US4491628A (en) * | 1982-08-23 | 1985-01-01 | International Business Machines Corporation | Positive- and negative-working resist compositions with acid generating photoinitiator and polymer with acid labile groups pendant from polymer backbone |
| US4668601A (en) * | 1985-01-18 | 1987-05-26 | Minnesota Mining And Manufacturing Company | Protective coating for phototools |
| US4642126A (en) * | 1985-02-11 | 1987-02-10 | Norton Company | Coated abrasives with rapidly curable adhesives and controllable curvature |
| US4652274A (en) * | 1985-08-07 | 1987-03-24 | Minnesota Mining And Manufacturing Company | Coated abrasive product having radiation curable binder |
| CA1323949C (en) * | 1987-04-02 | 1993-11-02 | Michael C. Palazzotto | Ternary photoinitiator system for addition polymerization |
| US4859572A (en) * | 1988-05-02 | 1989-08-22 | Eastman Kodak Company | Dye sensitized photographic imaging system |
| US5369511A (en) * | 1989-08-21 | 1994-11-29 | Amos; Carl R. | Methods of and apparatus for manipulating electromagnetic phenomenon |
| JP2724232B2 (ja) * | 1990-05-02 | 1998-03-09 | 株式会社日立製作所 | 自動焦点手段およびその自動焦点手段を用いた光ディスク装置 |
| US5235015A (en) * | 1991-02-21 | 1993-08-10 | Minnesota Mining And Manufacturing Company | High speed aqueous solvent developable photopolymer compositions |
| GB9121789D0 (en) * | 1991-10-14 | 1991-11-27 | Minnesota Mining & Mfg | Positive-acting photothermographic materials |
| DE69217177T2 (de) * | 1991-11-28 | 1997-05-15 | Enplas Corp | Flächenartige Lichtquelle |
| TW268969B (enExample) * | 1992-10-02 | 1996-01-21 | Minnesota Mining & Mfg | |
| US5298741A (en) * | 1993-01-13 | 1994-03-29 | Trustees Of Tufts College | Thin film fiber optic sensor array and apparatus for concurrent viewing and chemical sensing of a sample |
| US5512219A (en) * | 1994-06-03 | 1996-04-30 | Reflexite Corporation | Method of casting a microstructure sheet having an array of prism elements using a reusable polycarbonate mold |
| US5856373A (en) * | 1994-10-31 | 1999-01-05 | Minnesota Mining And Manufacturing Company | Dental visible light curable epoxy system with enhanced depth of cure |
| US5858624A (en) * | 1996-09-20 | 1999-01-12 | Minnesota Mining And Manufacturing Company | Method for assembling planarization and indium-tin-oxide layer on a liquid crystal display color filter with a transfer process |
| US5922238A (en) * | 1997-02-14 | 1999-07-13 | Physical Optics Corporation | Method of making replicas and compositions for use therewith |
| DE19713362A1 (de) * | 1997-03-29 | 1998-10-01 | Zeiss Carl Jena Gmbh | Konfokale mikroskopische Anordnung |
| US6025406A (en) * | 1997-04-11 | 2000-02-15 | 3M Innovative Properties Company | Ternary photoinitiator system for curing of epoxy resins |
| US6001297A (en) * | 1997-04-28 | 1999-12-14 | 3D Systems, Inc. | Method for controlling exposure of a solidfiable medium using a pulsed radiation source in building a three-dimensional object using stereolithography |
| US5859251A (en) * | 1997-09-18 | 1999-01-12 | The United States Of America As Represented By The Secretary Of The Air Force | Symmetrical dyes with large two-photon absorption cross-sections |
| US5770737A (en) * | 1997-09-18 | 1998-06-23 | The United States Of America As Represented By The Secretary Of The Air Force | Asymmetrical dyes with large two-photon absorption cross-sections |
| WO1999054784A1 (en) * | 1998-04-21 | 1999-10-28 | University Of Connecticut | Free-form nanofabrication using multi-photon excitation |
| US6100405A (en) * | 1999-06-15 | 2000-08-08 | The United States Of America As Represented By The Secretary Of The Air Force | Benzothiazole-containing two-photon chromophores exhibiting strong frequency upconversion |
| US7046905B1 (en) * | 1999-10-08 | 2006-05-16 | 3M Innovative Properties Company | Blacklight with structured surfaces |
| US6288842B1 (en) * | 2000-02-22 | 2001-09-11 | 3M Innovative Properties | Sheeting with composite image that floats |
| US6696157B1 (en) * | 2000-03-05 | 2004-02-24 | 3M Innovative Properties Company | Diamond-like glass thin films |
| US6560248B1 (en) * | 2000-06-08 | 2003-05-06 | Mania Barco Nv | System, method and article of manufacture for improved laser direct imaging a printed circuit board utilizing a mode locked laser and scophony operation |
| EP1303791B1 (en) * | 2000-06-15 | 2009-08-19 | 3M Innovative Properties Company | Multicolor imaging using multiphoton photochemical processes |
| US7381516B2 (en) * | 2002-10-02 | 2008-06-03 | 3M Innovative Properties Company | Multiphoton photosensitization system |
| US6852766B1 (en) * | 2000-06-15 | 2005-02-08 | 3M Innovative Properties Company | Multiphoton photosensitization system |
| KR100810546B1 (ko) * | 2000-06-15 | 2008-03-18 | 쓰리엠 이노베이티브 프로퍼티즈 캄파니 | 삼차원 광학 소자의 가공 방법 |
| EP1292861B1 (en) * | 2000-06-15 | 2014-11-19 | 3M Innovative Properties Company | Multidirectional photoreactive absorption method |
| DE10034737C2 (de) * | 2000-07-17 | 2002-07-11 | Fraunhofer Ges Forschung | Verfahren zur Herstellung einer permanenten Entformungsschicht durch Plasmapolymerisation auf der Oberfläche eines Formteilwerkzeugs, ein nach dem Verfahren herstellbares Formteilwerkzeug und dessen Verwendung |
| JP4192414B2 (ja) * | 2000-09-14 | 2008-12-10 | 凸版印刷株式会社 | レンズシートの製造方法 |
| EP1245372B1 (en) * | 2001-03-26 | 2011-09-28 | Novartis AG | Mould and method for the production of ophthalmic lenses |
| KR100490873B1 (ko) * | 2001-05-17 | 2005-05-23 | 한국과학기술연구원 | 초소형 렌즈 어레이 제조방법 |
| US20030006535A1 (en) * | 2001-06-26 | 2003-01-09 | Michael Hennessey | Method and apparatus for forming microstructures on polymeric substrates |
| DE10131156A1 (de) * | 2001-06-29 | 2003-01-16 | Fraunhofer Ges Forschung | Arikel mit plasmapolymerer Beschichtung und Verfahren zu dessen Herstellung |
| US6804062B2 (en) * | 2001-10-09 | 2004-10-12 | California Institute Of Technology | Nonimaging concentrator lens arrays and microfabrication of the same |
| US6948448B2 (en) * | 2001-11-27 | 2005-09-27 | General Electric Company | Apparatus and method for depositing large area coatings on planar surfaces |
| US7887889B2 (en) * | 2001-12-14 | 2011-02-15 | 3M Innovative Properties Company | Plasma fluorination treatment of porous materials |
| US6750266B2 (en) * | 2001-12-28 | 2004-06-15 | 3M Innovative Properties Company | Multiphoton photosensitization system |
| GB2390327B (en) * | 2002-07-01 | 2005-11-16 | Essilor Int | Process for making a mold piece having a main curved surface bearing a utilitary microstructure |
| US20030155667A1 (en) * | 2002-12-12 | 2003-08-21 | Devoe Robert J | Method for making or adding structures to an article |
| US7478942B2 (en) * | 2003-01-23 | 2009-01-20 | Samsung Electronics Co., Ltd. | Light guide plate with light reflection pattern |
| TWI352228B (en) * | 2003-02-28 | 2011-11-11 | Sharp Kk | Surface dadiation conversion element, liquid cryst |
| JP4269745B2 (ja) * | 2003-03-31 | 2009-05-27 | 株式会社日立製作所 | スタンパ及び転写装置 |
| US20040202865A1 (en) * | 2003-04-08 | 2004-10-14 | Andrew Homola | Release coating for stamper |
| US7070406B2 (en) * | 2003-04-29 | 2006-07-04 | Hewlett-Packard Development Company, L.P. | Apparatus for embossing a flexible substrate with a pattern carried by an optically transparent compliant media |
| EP1538482B1 (en) * | 2003-12-05 | 2016-02-17 | Obducat AB | Device and method for large area lithography |
| US7632087B2 (en) * | 2003-12-19 | 2009-12-15 | Wd Media, Inc. | Composite stamper for imprint lithography |
| US9040090B2 (en) * | 2003-12-19 | 2015-05-26 | The University Of North Carolina At Chapel Hill | Isolated and fixed micro and nano structures and methods thereof |
| US20050273146A1 (en) * | 2003-12-24 | 2005-12-08 | Synecor, Llc | Liquid perfluoropolymers and medical applications incorporating same |
| US7282324B2 (en) * | 2004-01-05 | 2007-10-16 | Microchem Corp. | Photoresist compositions, hardened forms thereof, hardened patterns thereof and metal patterns formed using them |
| JP4879159B2 (ja) * | 2004-03-05 | 2012-02-22 | アプライド マテリアルズ インコーポレイテッド | アモルファス炭素膜堆積のためのｃｖｄプロセス |
| US20050254035A1 (en) * | 2004-05-11 | 2005-11-17 | Chromaplex, Inc. | Multi-photon lithography |
| US20050272599A1 (en) * | 2004-06-04 | 2005-12-08 | Kenneth Kramer | Mold release layer |
| JP4389791B2 (ja) * | 2004-08-25 | 2009-12-24 | セイコーエプソン株式会社 | 微細構造体の製造方法および露光装置 |
| JP2006165371A (ja) * | 2004-12-09 | 2006-06-22 | Canon Inc | 転写装置およびデバイス製造方法 |
| US9370881B2 (en) * | 2005-03-02 | 2016-06-21 | The Trustees Of Boston College | Structures and methods of replicating the same |
| KR100688866B1 (ko) * | 2005-04-07 | 2007-03-02 | 삼성전기주식회사 | 임프린트 장치, 시스템 및 방법 |
| US7478791B2 (en) * | 2005-04-15 | 2009-01-20 | 3M Innovative Properties Company | Flexible mold comprising cured polymerizable resin composition |
| KR100692742B1 (ko) * | 2005-05-13 | 2007-03-09 | 삼성전자주식회사 | 도광층을 갖는 키 패드 및 키 패드 어셈블리 |
| EP1731965B1 (en) * | 2005-06-10 | 2012-08-08 | Obducat AB | Imprint stamp comprising cyclic olefin copolymer |
| EP1731961B1 (en) * | 2005-06-10 | 2008-11-05 | Obducat AB | Template replication method |
| KR101229100B1 (ko) * | 2005-06-10 | 2013-02-15 | 오브듀캇 아베 | 중간 스탬프를 갖는 패턴 복제 |
| US7326948B2 (en) * | 2005-08-15 | 2008-02-05 | Asml Netherlands B.V. | Beam modifying device, lithographic projection apparatus, method of treating a beam, and device manufacturing method |
| KR100610336B1 (ko) * | 2005-09-12 | 2006-08-09 | 김형준 | 키패드 백라이트용 도광판 및 그 제조 방법 |
| US7878791B2 (en) * | 2005-11-04 | 2011-02-01 | Asml Netherlands B.V. | Imprint lithography |
| US7583444B1 (en) * | 2005-12-21 | 2009-09-01 | 3M Innovative Properties Company | Process for making microlens arrays and masterforms |
| WO2007073482A2 (en) * | 2005-12-21 | 2007-06-28 | 3M Innovative Properties Company | Method and apparatus for processing multiphoton curable photoreactive compositions |
| US7545569B2 (en) * | 2006-01-13 | 2009-06-09 | Avery Dennison Corporation | Optical apparatus with flipped compound prism structures |
| WO2007100849A2 (en) * | 2006-02-27 | 2007-09-07 | Microcontinuum, Inc. | Formation of pattern replicating tools |
| TWM298289U (en) * | 2006-03-17 | 2006-09-21 | Hon Hai Prec Ind Co Ltd | Light guide plates and electronic products using the same |
| US20070216049A1 (en) * | 2006-03-20 | 2007-09-20 | Heptagon Oy | Method and tool for manufacturing optical elements |
| EP1998844A4 (en) * | 2006-03-24 | 2017-03-01 | 3M Innovative Properties Company | Process for making microneedles, microneedle arrays, masters, and replication tools |
| EP2468487B1 (en) * | 2006-05-18 | 2017-07-12 | 3M Innovative Properties Company | Light extraction structures and light guides incorporating same |
| TWI322927B (en) * | 2006-05-24 | 2010-04-01 | Ind Tech Res Inst | Roller module for microstructure thin film imprint |
| TW200745490A (en) * | 2006-06-07 | 2007-12-16 | Jeng Shiang Prec Ind Co Ltd | Light guide plate |
| US20080007964A1 (en) * | 2006-07-05 | 2008-01-10 | Tai-Yen Lin | Light guiding structure |
| US20080083886A1 (en) * | 2006-09-14 | 2008-04-10 | 3M Innovative Properties Company | Optical system suitable for processing multiphoton curable photoreactive compositions |
| US7551359B2 (en) * | 2006-09-14 | 2009-06-23 | 3M Innovative Properties Company | Beam splitter apparatus and system |
| US8241713B2 (en) * | 2007-02-21 | 2012-08-14 | 3M Innovative Properties Company | Moisture barrier coatings for organic light emitting diode devices |
| US7891636B2 (en) * | 2007-08-27 | 2011-02-22 | 3M Innovative Properties Company | Silicone mold and use thereof |
| CN101795838B (zh) * | 2007-09-06 | 2014-02-12 | 3M创新有限公司 | 形成模具的方法以及使用所述模具形成制品的方法 |
| EP2207820A4 (en) * | 2007-10-11 | 2011-10-26 | 3M Innovative Properties Co | HIGHLY FUNCTIONAL REACTIVE SPECIES WITH MULTIPHOTONIC HARDENING |
| US8080073B2 (en) * | 2007-12-20 | 2011-12-20 | 3M Innovative Properties Company | Abrasive article having a plurality of precisely-shaped abrasive composites |
| JP5801558B2 (ja) * | 2008-02-26 | 2015-10-28 | スリーエム イノベイティブ プロパティズ カンパニー | 多光子露光システム |
| US8570270B2 (en) * | 2009-10-19 | 2013-10-29 | Apple Inc. | Backlight unit color compensation techniques |
| TWM385715U (en) * | 2009-12-14 | 2010-08-01 | Chunghwa Picture Tubes Ltd | Backlight module |
-
2008
- 2008-09-02 CN CN2008801060642A patent/CN101795961B/zh not_active Expired - Fee Related
- 2008-09-02 EP EP08829637.1A patent/EP2205521A4/en not_active Withdrawn
- 2008-09-02 US US12/675,806 patent/US20100308497A1/en not_active Abandoned
- 2008-09-02 JP JP2010524112A patent/JP2010537843A/ja active Pending
- 2008-09-02 WO PCT/US2008/075021 patent/WO2009032815A1/en not_active Ceased
Patent Citations (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002307398A (ja) * | 2001-04-18 | 2002-10-23 | Mitsui Chemicals Inc | マイクロ構造物の製造方法 |
| JP2007522433A (ja) * | 2003-09-23 | 2007-08-09 | ザ ユニバーシティ オブ ノース カロライナ アット チャペル ヒル | マイクロ流体装置の新規な材料として使用するための光硬化性ペルフルオロポリエーテル |
| JP2006513811A (ja) * | 2003-11-10 | 2006-04-27 | エイジェンシー フォー サイエンス， テクノロジー アンド リサーチ | マイクロニードルおよびマイクロニードルの製造 |
| WO2005113422A1 (en) * | 2004-05-24 | 2005-12-01 | Agency For Science, Technology And Research | Imprinting of supported and free-standing 3-d micro-or nano-structures |
| WO2005119360A1 (en) * | 2004-05-28 | 2005-12-15 | Obducat Ab | Modified metal mold for use in imprinting processes |
| JP2005349619A (ja) * | 2004-06-09 | 2005-12-22 | Ricoh Opt Ind Co Ltd | 形状転写用金型、それを用いた製品の製造方法及び得られる微細形状をもつ製品 |
| JP2006032423A (ja) * | 2004-07-12 | 2006-02-02 | Toshiba Corp | インプリント加工用スタンパーおよびその製造方法 |
| WO2006098958A1 (en) * | 2005-03-09 | 2006-09-21 | 3M Innovative Properties Company | Microreplicated article with defect-reducing surface |
| JP2008532807A (ja) * | 2005-03-09 | 2008-08-21 | スリーエム イノベイティブ プロパティズ カンパニー | 欠陥低減表面を有する微細複製物品 |
| JP2009155710A (ja) * | 2007-12-27 | 2009-07-16 | Tokai Rika Co Ltd | 微細構造体の製造方法 |
Non-Patent Citations (1)
| Title |
|---|
| CAN PENG 外３名: "High fidelity fabrication of microlens arrays by nanoimprint using conformal mold duplication and lo", J. VAC. SCI. TECHNOL. B 25(2), MAR/APR 2007, JPN7013001185, 13 March 2007 (2007-03-13), US, pages 410 - 414, XP012102859, ISSN: 0002497061, DOI: 10.1116/1.2713405 * |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2016103653A1 (ja) * | 2014-12-22 | 2016-06-30 | 富士フイルム株式会社 | インプリント用モールド |
| JP2016119391A (ja) * | 2014-12-22 | 2016-06-30 | 富士フイルム株式会社 | インプリント用モールド |
Also Published As
| Publication number | Publication date |
|---|---|
| CN101795961B (zh) | 2013-05-01 |
| WO2009032815A1 (en) | 2009-03-12 |
| US20100308497A1 (en) | 2010-12-09 |
| CN101795961A (zh) | 2010-08-04 |
| EP2205521A4 (en) | 2013-09-11 |
| EP2205521A1 (en) | 2010-07-14 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP2010537843A (ja) | 微細構造物品を作製するための工具 | |
| Lan et al. | UV-nanoimprint lithography: structure, materials and fabrication of flexible molds | |
| Li et al. | Hybrid nanoimprint− soft lithography with sub-15 nm resolution | |
| CN101910873B (zh) | 具有凹面或凸面的制品及其制造方法 | |
| US9102083B2 (en) | Methods of forming molds and methods of forming articles using said molds | |
| JP6032196B2 (ja) | スタンパの製造方法、および成形体の製造方法 | |
| KR20170032382A (ko) | 다층 광학 접착제 및 그의 제조 방법 | |
| WO2011111741A1 (ja) | 樹脂モールド | |
| JP2000071290A (ja) | 反射防止物品の製造方法 | |
| Yi et al. | Roll-to-roll UV imprinting lithography for micro/nanostructures | |
| CN101573659A (zh) | 排除位于基板和模具之间的气体的方法 | |
| JP2018513401A (ja) | 部分的再帰反射体ツール及びシートを形成する方法並びにその装置 | |
| Peng et al. | Continuous roller nanoimprinting: next generation lithography | |
| JP4307040B2 (ja) | 微細表面構造をもつ物品の製造方法 | |
| KR100717851B1 (ko) | 미세가공 기술을 이용한 마이크로렌즈 배열 시트 및 그제조방법 | |
| JP2012013748A (ja) | マイクロレンズを備えた光学フィルムとその製造方法 | |
| JP2007245702A (ja) | テンプレートおよび転写微細パターンを有する処理基材の製造方法 | |
| US20110068494A1 (en) | Fabrication of microscale tooling | |
| JP2011093123A (ja) | 櫛型構造を有する構造体の製造方法、樹脂構造体成形用金型の製造方法および樹脂成形体 | |
| US20240004282A1 (en) | Structured Film and Method of Using Same to Form a Pattern on a Substrate | |
| JP2024502733A (ja) | 構造化フィルム及び構造化フィルムを含む光学物品 | |
| TW202206253A (zh) | 製造微結構及/或奈米結構之方法及裝置 | |
| KR20050003629A (ko) | 경사 노광기 및 경사 노광방법 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20110818 |
|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20110818 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20130402 |
|
| A601 | Written request for extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A601 Effective date: 20130701 |
|
| A602 | Written permission of extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A602 Effective date: 20130708 |
|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20130726 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20131203 |
|
| A601 | Written request for extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A601 Effective date: 20140228 |
|
| A602 | Written permission of extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A602 Effective date: 20140307 |
|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20140327 |
|
| A02 | Decision of refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A02 Effective date: 20140624 |