CN101730725B - 硅烷化的研磨热解法二氧化硅 - Google Patents

硅烷化的研磨热解法二氧化硅 Download PDF

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Publication number
CN101730725B
CN101730725B CN200880016826XA CN200880016826A CN101730725B CN 101730725 B CN101730725 B CN 101730725B CN 200880016826X A CN200880016826X A CN 200880016826XA CN 200880016826 A CN200880016826 A CN 200880016826A CN 101730725 B CN101730725 B CN 101730725B
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silicon
pyrogenic silica
dioxide
coating formulation
weight
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Chinese (zh)
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CN101730725A (zh
Inventor
J·迈尔
K·施皮茨纳格尔
G·米夏埃多
T·格罗斯
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Evonik Operations GmbH
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Evonik Degussa GmbH
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    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09CTREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS, TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES ; PREPARATION OF CARBON BLACK  ; PREPARATION OF INORGANIC MATERIALS WHICH ARE NO SINGLE CHEMICAL COMPOUNDS AND WHICH ARE MAINLY USED AS PIGMENTS OR FILLERS
    • C09C1/00Treatment of specific inorganic materials other than fibrous fillers; Preparation of carbon black
    • C09C1/28Compounds of silicon
    • C09C1/30Silicic acid
    • C09C1/309Combinations of treatments provided for in groups C09C1/3009 - C09C1/3081
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00Nanotechnology for materials or surface science, e.g. nanocomposites
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09CTREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS, TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES ; PREPARATION OF CARBON BLACK  ; PREPARATION OF INORGANIC MATERIALS WHICH ARE NO SINGLE CHEMICAL COMPOUNDS AND WHICH ARE MAINLY USED AS PIGMENTS OR FILLERS
    • C09C1/00Treatment of specific inorganic materials other than fibrous fillers; Preparation of carbon black
    • C09C1/28Compounds of silicon
    • C09C1/30Silicic acid
    • C09C1/3009Physical treatment, e.g. grinding; treatment with ultrasonic vibrations
    • C09C1/3018Grinding
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09CTREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS, TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES ; PREPARATION OF CARBON BLACK  ; PREPARATION OF INORGANIC MATERIALS WHICH ARE NO SINGLE CHEMICAL COMPOUNDS AND WHICH ARE MAINLY USED AS PIGMENTS OR FILLERS
    • C09C1/00Treatment of specific inorganic materials other than fibrous fillers; Preparation of carbon black
    • C09C1/28Compounds of silicon
    • C09C1/30Silicic acid
    • C09C1/3081Treatment with organo-silicon compounds
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D7/00Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
    • C09D7/40Additives
    • C09D7/43Thickening agents
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00Particle morphology
    • C01P2004/60Particles characterised by their size
    • C01P2004/64Nanometer sized, i.e. from 1-100 nanometer
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00Physical properties of inorganic compounds
    • C01P2006/11Powder tap density
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00Physical properties of inorganic compounds
    • C01P2006/12Surface area
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00Use of inorganic substances as compounding ingredients
    • C08K3/34Silicon-containing compounds
    • C08K3/36Silica
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K9/00Use of pretreated ingredients
    • C08K9/04Ingredients treated with organic substances
    • C08K9/06Ingredients treated with organic substances with silicon-containing compounds
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/29Coated or structually defined flake, particle, cell, strand, strand portion, rod, filament, macroscopic fiber or mass thereof
    • Y10T428/2982Particulate matter [e.g., sphere, flake, etc.]

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Nanotechnology (AREA)
  • Materials Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Wood Science & Technology (AREA)
  • Composite Materials (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Paints Or Removers (AREA)
  • Silicon Compounds (AREA)
  • Pigments, Carbon Blacks, Or Wood Stains (AREA)
CN200880016826XA 2007-05-22 2008-05-06 硅烷化的研磨热解法二氧化硅 Active CN101730725B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE102007024365A DE102007024365A1 (de) 2007-05-22 2007-05-22 Pyrogen hergestellte silanisierte und vermahlene Kieselsäure
DE102007024365.2 2007-05-22
PCT/EP2008/055556 WO2008141923A1 (en) 2007-05-22 2008-05-06 Fumed silanized and ground silica

Publications (2)

Publication Number Publication Date
CN101730725A CN101730725A (zh) 2010-06-09
CN101730725B true CN101730725B (zh) 2013-12-04

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CN200880016826XA Active CN101730725B (zh) 2007-05-22 2008-05-06 硅烷化的研磨热解法二氧化硅

Country Status (7)

Country Link
US (2) US8163080B2 (enExample)
EP (1) EP2147058B1 (enExample)
JP (1) JP2010528132A (enExample)
CN (1) CN101730725B (enExample)
DE (1) DE102007024365A1 (enExample)
PL (1) PL2147058T3 (enExample)
WO (1) WO2008141923A1 (enExample)

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JP6443041B2 (ja) * 2014-12-26 2018-12-26 三菱マテリアル株式会社 シリカゾル分散液及びシリカ多孔質膜形成用組成物
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US10429125B2 (en) 2015-12-08 2019-10-01 Whirlpool Corporation Insulation structure for an appliance having a uniformly mixed multi-component insulation material, and a method for even distribution of material combinations therein
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US10222116B2 (en) 2015-12-08 2019-03-05 Whirlpool Corporation Method and apparatus for forming a vacuum insulated structure for an appliance having a pressing mechanism incorporated within an insulation delivery system
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US10422573B2 (en) 2015-12-08 2019-09-24 Whirlpool Corporation Insulation structure for an appliance having a uniformly mixed multi-component insulation material, and a method for even distribution of material combinations therein
US10422569B2 (en) 2015-12-21 2019-09-24 Whirlpool Corporation Vacuum insulated door construction
US9840042B2 (en) 2015-12-22 2017-12-12 Whirlpool Corporation Adhesively secured vacuum insulated panels for refrigerators
US9752818B2 (en) 2015-12-22 2017-09-05 Whirlpool Corporation Umbilical for pass through in vacuum insulated refrigerator structures
US10018406B2 (en) 2015-12-28 2018-07-10 Whirlpool Corporation Multi-layer gas barrier materials for vacuum insulated structure
US10610985B2 (en) 2015-12-28 2020-04-07 Whirlpool Corporation Multilayer barrier materials with PVD or plasma coating for vacuum insulated structure
US10030905B2 (en) 2015-12-29 2018-07-24 Whirlpool Corporation Method of fabricating a vacuum insulated appliance structure
US10807298B2 (en) 2015-12-29 2020-10-20 Whirlpool Corporation Molded gas barrier parts for vacuum insulated structure
US11247369B2 (en) 2015-12-30 2022-02-15 Whirlpool Corporation Method of fabricating 3D vacuum insulated refrigerator structure having core material
EP3443285B1 (en) 2016-04-15 2021-03-10 Whirlpool Corporation Vacuum insulated refrigerator cabinet
EP3443284B1 (en) 2016-04-15 2020-11-18 Whirlpool Corporation Vacuum insulated refrigerator structure with three dimensional characteristics
CN107502003B (zh) * 2016-06-14 2020-06-02 中国科学院理化技术研究所 一种疏水无机粉体材料的制备方法
EP3491308B1 (en) 2016-07-26 2021-03-10 Whirlpool Corporation Vacuum insulated structure trim breaker
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CN111918849A (zh) * 2018-04-04 2020-11-10 积水化学工业株式会社 夹层玻璃用中间膜和夹层玻璃
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EP0076377A2 (de) * 1981-10-01 1983-04-13 Degussa Aktiengesellschaft Verfahren zur Verringerung des Grindometerwertes von hochdispersen Kieselsäuren
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EP1236773A2 (de) * 2001-02-28 2002-09-04 Degussa AG Oberflächenmodifizierte, dotierte, pyrogen hergestellte Oxide
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EP0076377A2 (de) * 1981-10-01 1983-04-13 Degussa Aktiengesellschaft Verfahren zur Verringerung des Grindometerwertes von hochdispersen Kieselsäuren
US5959005A (en) * 1996-04-26 1999-09-28 Degussa-Huls Aktiengesellschaft Silanized silica
CN1190644A (zh) * 1996-12-21 1998-08-19 希尔斯硅股份有限公司 使硅酸解聚集的方法
EP1236773A2 (de) * 2001-02-28 2002-09-04 Degussa AG Oberflächenmodifizierte, dotierte, pyrogen hergestellte Oxide
CN1678695A (zh) * 2002-08-28 2005-10-05 德古萨股份公司 二氧化硅
EP1406129A2 (en) * 2002-10-02 2004-04-07 Canon Kabushiki Kaisha Silicia fine particle, toner, two-component developer and image forming method
CN1930249A (zh) * 2004-03-05 2007-03-14 德古萨股份公司 硅烷化的硅石

Also Published As

Publication number Publication date
WO2008141923A1 (en) 2008-11-27
JP2010528132A (ja) 2010-08-19
CN101730725A (zh) 2010-06-09
US8163080B2 (en) 2012-04-24
US20100126387A1 (en) 2010-05-27
EP2147058B1 (en) 2017-01-18
PL2147058T3 (pl) 2017-07-31
DE102007024365A1 (de) 2008-11-27
US20120152151A1 (en) 2012-06-21
EP2147058A1 (en) 2010-01-27

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Address after: Essen, Germany

Patentee after: Evonik Operations Limited

Address before: Essen, Germany

Patentee before: EVONIK DEGUSSA GmbH