CN101713071B - 制备整体金属结构的方法以及由该方法制备的结构 - Google Patents

制备整体金属结构的方法以及由该方法制备的结构 Download PDF

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CN101713071B
CN101713071B CN200910204996.7A CN200910204996A CN101713071B CN 101713071 B CN101713071 B CN 101713071B CN 200910204996 A CN200910204996 A CN 200910204996A CN 101713071 B CN101713071 B CN 101713071B
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S·A·米勒
P·库玛
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Abstract

制备整体金属结构的方法以及由该方法制备的结构。通过一种方法生产由亚微米级晶粒尺寸构成的三维大金属结构，该方法包括将超声粉末喷射流导向基材，使得粉末粘附在基材和其自身上，形成致密的粘着沉积物。粉末喷射流可由难熔金属粉末组成。可通过超声喷射流沉积粉末，并通过等径角挤压法挤压。

Description

制备整体金属结构的方法以及由该方法制备的结构
待解决的问题
具有亚微米或纳米晶体结构的金属和金属合金在商业和军事领域都有重要意义。它们具有新颖的性质，能够开发完全新的产品。但是至今为止，制备感兴趣的金属的整体纳米晶体材料仍然有困难。大部分成功的例子是薄膜和喷射涂层。使用高能研磨、高形变速率加工碎片、等角挤压和简便的玻璃形成剂已经取得了一些成功。但是这些成功的例子都具有严重的缺陷。仍然需要简单且节省成本的方法来制备三维的具有亚微米级晶粒尺寸的大晶体结构。
发明背景
具有亚微米或纳米晶粒结构的金属材料由于其独特的性质而备受关注，这些性质包括扩大的延展性和极高的屈服强度。对于制备纳米晶体结构的薄膜、涂层和粉末已经进行了许多工作，但是制备三维大结构的方法仍然是难以捉摸的。
高能研磨可能是最常用的制备具有亚微米级晶粒结构的金属粉末的方法之一。该方法的一个问题是粉末常常被工艺中使用的研磨机、磨碎机或研磨介质磨损产生的微观颗粒重度污染。
珀德尤大学(Purdue University)倡导另一种技术，该技术目前已被纳米动态学公司(Nanodynamics Inc.)商业化，其中涉及压实在高形变速率下产生的加工碎片。加工过程中引入的冷作导致碎片中产生纳米晶粒尺寸。如同高能研磨工艺，该技术也遇到被加工过程污染的问题，同样需要采用昂贵的二次操作(热等静压压制、挤压、爆破压实等)来将疏松的粉末或碎片整实为大块固体。如果不小心控制，该二次操作常常会在整实的过程中破坏初始的微观结构。
等径角挤压(ECAE)是高剪切工艺，其中金属或合金被强制通过改变流
等径角挤压(ECAE)是高剪切工艺，其中金属或合金被强制通过改变流动方向的模具。由此产生极高的应变，造成晶粒尺寸精细化。但是，为了产生亚微米级晶粒尺寸，金属可能必须多次(3-4)通过模具，结果造成工艺复杂、成本提高。
其它方法如A.C.Hall，L.N.Brewer和T.J.Roemer，“使用冷喷涂方法制备含均一的纳米晶体微观结构的铝涂层(Preparation of Aluminum coatingsContaining Homogeneous Nanocrystalline Microstructures Using the coldSpray Process)”，JTTEES 17：352-359已经表明由亚微米级晶粒尺寸的粉末制备的薄涂层在通过冷喷涂制备涂层时仍然保持其亚微米级晶粒尺寸。在某些含铝的情况中，它们甚至具有减小的亚微米级晶粒尺寸。
发明内容
我们已经发现，某些常规晶粒尺寸(主要为5-10微米，甚至更大)的金属粉末在较低温度下以超音速喷射并沉积在基材上时，形成具有亚微米级晶粒结构的致密固体。所制备的沉积物在所有三个维度上的尺寸都可以很大，基材很容易取出，只留下该纳米晶体沉积物。该沉积物与涂层的区别在于：难熔金属涂层的厚度通常小于0.5毫米，甚至常常小于0.1毫米，并且依赖附着在基材上的残余物来保持其物理完整性。在此情况中，厚度尺寸可以非常大，最高达1-2厘米，甚至超出该范围。厚度较大使得沉积物可以从基材上取下，用于直立式用品中。
我们已经论证了Ta、Nb和Mo金属的该项行为(所有都是BCC结构，并具有高熔点温度)，相信这是一种对速率敏感的普遍现象。
附图说明
图1显示了通过冷喷涂制备的管状钽预制件；
图2是从通过冷喷涂制备的溅射靶获取的TaNb复合物的SEM显微照片；
图3是MoTi溅射靶的宏观照片；和
图4是冷喷涂的MoTi样本的SEM放大显微照片。
具体实施方式
我们已经发现的是一种制备具有亚微米晶粒结构的三维大结构的方法。该亚微米晶粒结构还具有在升高温度下加工时的耐生长性，该高温加工可用于提高颗粒间粘结强度，消除加工硬化，提高延展性。另外，这些沉积物可用作ECAE加工的原料，将形成完全致密化的精细的均匀结构所需的通过次数减少到1次。
通常，生产由亚微米范围粒度构成的三维大金属结构的方法包括将超声粉末喷射流导向基材，使得粉末粘附在基材和其自身上，形成致密的粘着沉积物。因此，可由这种沉积物制备的产品包括但不限于爆破成型弹丸(explosively formed projectiles)、动能穿孔器(kinetic energy penetrators)和氢气膜(hydrogen membranes)。在该过程中，粉末化的喷射流可由难熔金属粉末组成。因此，由具有亚微米微观结构的金属粉末制备的致密的金属结构可用作难熔金属结构。本发明可以通过以下方式实施：通过超声喷射流沉积粉末，并通过等径角挤压法(Equi channel angular extrusion)进行挤压。沉积物可以保持粘附在基材上，或者可以将沉积物从基材上取下。
可使用已知的冷喷涂体系实施本发明，其中使用例如受热的气体(例如氮气)来加快粉末的速度，制得随后将导向基材的超声粉末喷射流。当将超声粉末喷射流导向基材并使得粉末粘附在基材和其自身上时，所得致密的粘着沉积物产生由亚微米级晶粒尺寸构成的三维大金属结构。
实施例
以下所示的结果都是使用Kinetics 4000冷喷涂体系得到的。该体系是一种可商购的标准体系。通常，冷喷涂工艺包括将气流导向靶，其中气流与粉末形成气流-粉末混合物。使气流具有超音速。将超音速喷射流导向基材表面，从而冷喷涂基材。PCT申请U.S.2008/062434揭示了冷喷涂技术。该申请的所有具体内容都通过参考结合于此。在本发明的实施中，使用在500-800℃和约30巴的受热氮气来加快粉末的速度，从而制得超声粉末喷射流。该喷射流通常对着铜或钢基材喷去。基材通常是圆柱形的，类似圆柱形的，或者平面形的。可以制成管状、碗状、平盘状和矩形的。从成形体上切下金相学样品，进行机械抛光。使用FIB SEM以二次散射模式和反散射模式检测微观结构。H.C.施塔克公司(HC Starck)制备的用于冷喷涂应用的特定高纯度钽、铌和钼粉末用于这些实验中。
图1显示了通过冷喷涂制备的管状钽预制件。该预制件的长度约为150毫米，外径为85毫米，壁厚为14毫米，重量为8.8千克。该预制件是三维大结构的一个例子。
图2是从通过冷喷涂制备的溅射靶获取的TaNb复合物(50/50w/o)的SEM显微照片。Ta看上去作为亮相，而Nb作为暗相。左边的一幅图的亮度和对比度经过调节显示出Ta微观结构的具体情况，而右边的一幅图经过调节显示出Nb的微观结构。在接近Ta粉末颗粒的表面处，显然微观结构是高度精细化的，包含的晶粒通常小于400-500纳米。向内部移动，结构变得更分散。我们相信这是因为从颗粒外部到颗粒内部产生的应变梯度造成的，因为内部所承受的变形更小。可以简单地通过使用更细小的粉末和可能甚至更高的颗粒速率来消除这种梯度。右边的一幅显微照片显示围绕Nb的微观结构。虽然许多晶粒仍然是亚微米尺寸的，但是显然精细化的程度明显小于Ta。图2在左侧和右侧的图底部都包括一根横线，用来作为1微米的标度尺。
图3是直径125毫米的MoTi(67/33w/o)溅射靶的宏观照片。如同图1，该图仅仅论证了冷喷涂法制备自立式大物体的可能性。
图4是冷喷涂的MoTi样本的高倍放大显微照片。该样本已经在700C的真空中退火1.5小时。亮相是Mo，暗相是Ti。在Mo中，晶粒尺寸约为500纳米，而在Ti中，晶粒生长到约微米级的尺寸。图4在图底部中央位置有一横线，作为1微米的标度尺。

Claims (14)

1.一种生产具有亚微米级晶粒尺寸的三维大金属结构的方法，该方法包括： 
将超声金属粉末喷射流导向基材，并且使粉末粘附在基材上和其自身上，以形成致密的粘着沉积物，该沉积物具有亚微米晶粒结构，并且在所有三个维度上都具有大尺寸；所述金属粉末的晶粒尺寸为5微米或更大；所述沉积物的厚度为1cm或更大。 
2.权利要求1所述的方法，其特征在于，所述粉末喷射流包含至少一种难熔金属粉末。 
3.权利要求2所述的方法，其特征在于，所生产的三维大金属结构是难熔金属结构。 
4.权利要求1所述的方法，所述方法还包括通过等径角挤压法挤压沉积物。 
5.权利要求1所述的方法，其特征在于，在形成所述沉积物之后，所述沉积物保持粘附至基材。 
6.权利要求1所述的方法，所述方法还包括将基材与沉积物相互分离。 
7.权利要求1所述的方法，其特征在于，所生产的三维大金属结构是选自下组的产品：爆破成型弹丸、动能穿孔器和氢气膜。 
8.权利要求1所述的方法，所述方法包括将所述沉积物退火以实现下述中的至少一种：增加颗粒间粘结、增加延展性或降低加工硬化。 
9.权利要求1所述的方法，其特征在于，所述粉末选自钽、铌和钼。 
10.权利要求1所述的方法，其特征在于，所述沉积物为TaNb复合物，其具有小于500纳米的晶粒尺寸。 
11.权利要求1所述的方法，其特征在于，所述沉积物为TaNb复合物，其具有小于400纳米的晶粒尺寸。 
12.权利要求1所述的方法，其特征在于，受热的气体包括温度为500-800℃的氮。 
13.权利要求1所述的方法，其特征在于，所述沉积物的厚度为1-2cm。 
14.一种通过如权利要求1所述的方法生产的具有亚微米级晶粒尺寸的三维大金属结构。 
CN200910204996.7A 2008-10-06 2009-09-29 制备整体金属结构的方法以及由该方法制备的结构 Expired - Fee Related CN101713071B (zh)

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