CN101676802B - 感光液涂敷装置 - Google Patents
感光液涂敷装置 Download PDFInfo
- Publication number
- CN101676802B CN101676802B CN2009101429297A CN200910142929A CN101676802B CN 101676802 B CN101676802 B CN 101676802B CN 2009101429297 A CN2009101429297 A CN 2009101429297A CN 200910142929 A CN200910142929 A CN 200910142929A CN 101676802 B CN101676802 B CN 101676802B
- Authority
- CN
- China
- Prior art keywords
- shower nozzle
- drive units
- supporting member
- vertical drive
- coating apparatus
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Images
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
- G03F7/162—Coating on a rotating support, e.g. using a whirler or a spinner
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C5/00—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
- B05C5/02—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work
- B05C5/0254—Coating heads with slot-shaped outlet
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/3021—Imagewise removal using liquid means from a wafer supported on a rotating chuck
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/6715—Apparatus for applying a liquid, a resin, an ink or the like
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Coating Apparatus (AREA)
Abstract
Description
Claims (7)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020080092152A KR101000549B1 (ko) | 2008-09-19 | 2008-09-19 | 감광액 도포장치 |
KR10-2008-0092152 | 2008-09-19 | ||
KR1020080092152 | 2008-09-19 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN101676802A CN101676802A (zh) | 2010-03-24 |
CN101676802B true CN101676802B (zh) | 2012-05-16 |
Family
ID=42029408
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN2009101429297A Active CN101676802B (zh) | 2008-09-19 | 2009-05-14 | 感光液涂敷装置 |
Country Status (3)
Country | Link |
---|---|
KR (1) | KR101000549B1 (zh) |
CN (1) | CN101676802B (zh) |
TW (1) | TWI395067B (zh) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101227611B1 (ko) * | 2012-08-22 | 2013-01-29 | 주식회사로케트전기 | 디스펜서 타입의 압축기용 피스톤 코팅장치 |
CN105772340B (zh) * | 2016-05-16 | 2019-07-05 | 京东方科技集团股份有限公司 | 液态光固化胶涂覆装置和方法 |
CN106694319B (zh) | 2017-03-22 | 2019-06-18 | 京东方科技集团股份有限公司 | 曲面涂布装置及涂胶设备 |
CN108889546B (zh) * | 2018-07-11 | 2020-10-23 | 深圳市中欣科技有限公司 | 一种光学液态胶涂布设备 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1193292A (zh) * | 1996-05-13 | 1998-09-16 | 松下电器产业株式会社 | 粘接剂涂敷装置 |
JP2005296907A (ja) * | 2004-04-16 | 2005-10-27 | Tokyo Electron Ltd | 塗布膜形成装置 |
JP4027508B2 (ja) * | 1998-08-24 | 2007-12-26 | 株式会社リコー | 画像データ処理装置 |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4270344B2 (ja) * | 2003-12-01 | 2009-05-27 | 東京応化工業株式会社 | 平行度調整機構を備えた塗布装置および平行度調整方法 |
WO2006003876A1 (ja) * | 2004-06-30 | 2006-01-12 | Hirata Corporation | 基板塗布装置 |
JP4419764B2 (ja) * | 2004-09-13 | 2010-02-24 | 株式会社日立プラントテクノロジー | 塗布装置と塗布方法 |
TW200638083A (en) * | 2005-04-18 | 2006-11-01 | Shibaura Mechatronics Corp | The coating apparatus and method thereof |
JP2007144240A (ja) * | 2005-11-24 | 2007-06-14 | Dainippon Screen Mfg Co Ltd | 塗布装置および塗布方法 |
-
2008
- 2008-09-19 KR KR1020080092152A patent/KR101000549B1/ko active IP Right Grant
-
2009
- 2009-05-14 CN CN2009101429297A patent/CN101676802B/zh active Active
- 2009-06-04 TW TW098118526A patent/TWI395067B/zh not_active IP Right Cessation
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1193292A (zh) * | 1996-05-13 | 1998-09-16 | 松下电器产业株式会社 | 粘接剂涂敷装置 |
JP4027508B2 (ja) * | 1998-08-24 | 2007-12-26 | 株式会社リコー | 画像データ処理装置 |
JP2005296907A (ja) * | 2004-04-16 | 2005-10-27 | Tokyo Electron Ltd | 塗布膜形成装置 |
Also Published As
Publication number | Publication date |
---|---|
TW201013319A (en) | 2010-04-01 |
TWI395067B (zh) | 2013-05-01 |
KR20100033139A (ko) | 2010-03-29 |
CN101676802A (zh) | 2010-03-24 |
KR101000549B1 (ko) | 2010-12-14 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
ASS | Succession or assignment of patent right |
Owner name: WEIHAI DIANMEISHI OPTO-MECHATRONICS CO., LTD. Effective date: 20140226 |
|
TR01 | Transfer of patent right | ||
TR01 | Transfer of patent right |
Effective date of registration: 20140226 Address after: Gyeonggi Do, South Korea Patentee after: Display Production Service Co., Ltd. Patentee after: Weihai dianmei Shiguang electromechanical Co Ltd Address before: Gyeonggi Do, South Korea Patentee before: Display Production Service Co., Ltd. |
|
CP03 | Change of name, title or address | ||
CP03 | Change of name, title or address |
Address after: 264205 No. 88-1, Bekaert Road, Weihai Economic and Technological Development Zone, Weihai City, Shandong Province Patentee after: WEIHAI DMS OPTICAL ELECTROMECHANICAL Co.,Ltd. Patentee after: DMS Co.,Ltd. Address before: Gyeonggi Do, South Korea Patentee before: DMS Co.,Ltd. Patentee before: WEIHAI DMS OPTICAL ELECTROMECHANICAL Co.,Ltd. |