201013319 六、發明說明： 【發明所屬之技術領域】 本發明涉及感光液塗敷裝置，特別涉及一種用於調整 具有狹縫喷頭的喷頭支承件之水平狀態的感光液塗敷裝 置’該裝置可在不導致機器疲勞的情況下簡便地進行精密 調整。 【先前技術】 一般來說，通過照相平版印刷（Ph〇t〇 lith〇graphy)作業 在平板顯示器用的基板上形成電路圖案。所述照相平版印 刷作業是通過一系列工序，即在基板上塗敷一定厚度的光 刻膠後經過對所述感光層的曝光、顯影及蝕刻等製程，在 基板上形成電路圖案的過程。 在上述照相平版印刷作業中尤其重要的是在感光液的 塗敷製程中在基板的薄膜上均勻塗敷一定厚度的感光層這 一操作。如果感光層的厚度大於或小於標準厚度，就無法 獲得均勻的蝕刻。 如此在基板上塗敷感光液的作業中已被公開的方式有 採用旋塗機（spin coater)的旋轉塗覆方式和採用狹縫式塗敷 裝置（Slit coater)的非旋轉塗覆方式。 這兩種塗敷方式中，旋轉塗敷方式根據其工作條件（基 板的旋轉速度和溶劑蒸發等），會形成不規則的表面。因此 目前主要應用的是採用狹縫式感光液塗敷裝置的非旋轉塗 覆方式。非旋轉塗覆方式則採用感光液塗敷裝置的狹縫喷 201013319 頭，一邊塗敷感光液，一邊於基板薄膜上塗敷一定厚度的 照相平版印刷用的感光層（光刻膠層）。 在非旋轉塗覆方式中所採用的感光液塗敷裝置包括： 工作台；設置在所述工作台上方兩侧的多個線性驅動單 元；結合到所述多個線性驅動單元，在垂直方向上延伸的 多個柱髅；同所述多個柱體結合的多個垂直驅動單元；同 所述多個垂直驅動單元水平結合，供狹縫喷頭結合的架台 (Gantry)即喷頭支承件。 這種感光液塗敷裝置中：所述喷頭支承件在所述多個 垂直驅動單元的驅動作用下可上下移動，並使狹縫喷頭向 基板靠近。而狹縫喷頭則在多個線性驅動單元的驅動作用 下水平移動的同時，在基板上塗敷藥液。 這種感光液塗敷裝置通過精密調整喷頭支承件的水平 狀態’來調整狹缝喷頭的水平狀態。 仁是’隨著需要塗敷藥液的基板面積增大，感光液塗 敷裝置的尺寸也變大，而結合有狹縫喷頭的喷頭支承件的 尺寸及重量也會隨之增大。這種大型化喷頭支承件無法讓 操作者容易且精密地調整其水平狀態。尤其是這種喷頭支 承件的水平調整工作需要分兩步進行。即操作者初步地把 噴頭支承件水平配置後將其左右兩端結合到多個垂直驅動 〇g 一 單7C。 然後’操作者一邊通過水平測試工具檢測喷頭支承件 的水平狀態’ 一邊調整喷頭支承件的左右兩側的結合位 置以進行第二次調整。在此過程中，噴頭支承件在進行 201013319 初步安裝後其水平狀態並不精確，大部分會傾斜配置。此 時，和噴頭支承件相連的部分會産生不必要的負荷，導致 感光液塗敷裝置的精度下降。 【發明内容】 鑒於上述問題，本發明的目的是提供一種不僅可易於 調整設有狹縫喷頭的喷頭支承件的水平狀態，還可以在不 導致機器疲勞的情況下提高安裝精度的感光液塗敷裝置。 爲達到上述目的，本發明採用以下技術方案。本發明 的感光液塗敷裝置包括：工作台；多個柱體，結合在所述 工作台上，所述多個柱體之間相互隔開預定距離；多個垂 直驅動單元，分別結合到所述多個柱體；噴頭支承件，在 所述多個垂直驅動單元的驅動作用下上下移動；狹縫噴 頭，結合到所述噴頭支承件，將藥液喷到基板上；位移調 整單元，結合到所述多個垂直驅動單元，用於調整所述噴 > 頭支承件的左右高度差所産生的位移量。 優選地，所述工作台上設置有用於把所述多個柱體在 水平方向上線性移動的多個線性驅動單元。 優選地，所述位移調整單元包括：位移補償移動單元， 結合在所述垂直驅動單元中的一個，用於把所述喷頭支承 件水平移動；第一位移補償旋轉單元，結合在所述位移補 償移動單元，並可旋轉地與和所述喷頭支承件相結合；第 二位移補償旋轉單元，結合到所述多個垂直驅動單元中剩 下的另一個’並可旋轉地與所述喷頭支承件相結合。 5 201013319 優選地，所述第-位移補償旋轉單元和第二位移補償 旋轉單元由可旋轉地結合於所述多個垂直驅動單元，並供 所述噴頭支承件結合的轉軸構成。 優選地’所述位移補償移動單元包括：同所述垂直驅 單元水平結合的多個導軌；沿所述多個導軌移動的多個 座架（m〇unt);同所述多個座架結合的移動件。 優選地，所述轉轴的外周面上結合有轴承。 優選地，所述垂直驅動單元包括：多個主驅動單元， -又置在所述多個柱體上，通過馬達驅動；多個輔助驅動單 元叹置在所述多個柱鱧上，和所述主骚動單元並聯配置， 通過空壓致動器驅動。 優選地，所述主驅動單元包括〔所述馬達；旋轉螺桿， 在所述馬達的驅動作用下旋轉；傳送機構，結合到所述旋 轉螺#的外周上並隨之移動；升降件，同所述傳送機構結 合，在線性導軌組件的導向作用下上下移動。 優選地，所述升降件結合到線性導執組件，且被上下 導向移動。 具有如上結構的本發明在水平調整噴頭支承件的過程 中’即使喷頭支承件傾斜設置，&而喷頭支承件的兩側發 生位移差，也會通過位移調整單元旋轉及水平移動喷頭支 承件，因此機器所受負荷不會過大，從而可以保障精度。 而且，本發明可讓操作者易於調整喷頭支承件的水平 狀態，因此其操作簡便、調整精度高。 201013319 【實施方式】 下面參照附圖詳細說明本發明的優選實施例。 圖1是本發明的感光液塗敷裝置一個實施例的整體結 構示意圖。 感光液塗敷裝置包括：工作台1;設置在工作台丨兩側 的一對線性驅動單元即第一線性驅動單元3及第二線性驅 動單元5;和第一線性驅動單元3及第二線性驅動單元5相 結合的第一柱體7及第二柱體9;和第一柱體7及第二柱體 9相結合的第一垂直驅動單元u及第二垂直驅動單元13; 和第一垂直驅動單元U及第二垂直驅動單元13相結合的 第一位移調整單元15及第二位移調整單元17;和第一位移 調整單7C 15及第二位移調整單& 17才目結合的喷頭支承件 19 ;以及和喷頭支承件19相結合的狹縫喷頭21。 工作台1上面設置有定盤3卜而且在所述定盤31上可 ❿ 設置有基板G。即，爲了在基板G上塗敷光刻膠等藥液，工 作台1具有工作面。 所述第-線性驅動單元3及第二線性驅動單元5最好 在工作台1上方的邊緣部分成對地並排設置。 —在本實施例中’第一線性驅動單元3及第二線性驅動 單元5具有相同的結構，因此在此僅舉第—線性驅 說明其結構。 .在本實施例中，第一線性驅動單元3最好是線性馬達 (War 。這種第—線性㈣單元+㈣ 第-柱體7及第二柱體9。在移動第一柱體7及第二柱體9 7 201013319 時’只要是能夠最大限度地減少震動，並以勻速移動的結 構均可作爲本實施例中的線性驅動單元來使用。 第一柱體7及第二柱體9最好結合到第一線性驅動單 元3及第二線性驅動單元5的上部並向上延伸而且成對 配置。這些第一柱體7及第二柱體9上分別結合有第一垂 直驅動單元U及第二垂直驅動單元13。 和第一柱體7相結合的第一垂直驅動單元u可如圖3 所不，由第一主驅動單元41和第一輔助驅動單元43構成。 第一主驅動單元41包括：在控制器（未圖示）的控制下 驅動的第—馬達45;在所述第—馬達“的驅動作用下旋轉 的第-旋轉螺桿47;和第一旋轉螺桿47的外周相結合而被 傳送的第-傳送機構49。而且，所述第―傳送機構49與第 一升降件5 1相結合。 所述第一馬達45結合到第一知栌7 埋47 h 〇 ^柱想7上部。第一旋轉螺 桿47連接於第一馬達45 -旋轉螺;#軸上I向下配置。通過第 踨轉螺# 47的旋轉，所述第一 ， 傳送機構49可上下移動。 备第一傳送機構49移動_ @ ^ 之移動。 移動時，第-升降件51也會隨 性導軌組件由在垂直方^ ^組什相結合。所述系 …η 配置的第-導軌53(如圖” =同所述第-導軌”結合 '並沿所述第—導軌圖53 動的座架（未圖示）组成 導軌53毛 的上述線㈣軌組件成對配/施财，兩個相隔預定距离 即，第-升降…助第：，而且其可以是常規組件。 借助第-傳送機構49上下移動，但由於 201013319 受線性導軌組件的導向， 不會扭曲。 其在垂直方向上可順利移動，而 第—輔助驅動單元43包衽釦笛 ^ 設置的匕括和第一主驅動單元4i並排 器：的第：(如圖3所示）。第-空壓致動 關第-活塞桿61a結合到第一位移調整單元15。 準時整單元，通過圖2及圖3說明關1爲基 平呀位於左側的第—位 巧土201013319 6. Technical Field of the Invention The present invention relates to a photosensitive liquid coating apparatus, and more particularly to a photosensitive liquid coating apparatus for adjusting a horizontal state of a head support having a slit head. It can be easily adjusted precisely without causing machine fatigue. [Prior Art] Generally, a circuit pattern is formed on a substrate for a flat panel display by photolithography (Ph〇t〇 lith〇graphy). The photolithographic printing operation is a process of forming a circuit pattern on a substrate by a series of processes, that is, applying a certain thickness of photoresist on a substrate and then exposing, developing, and etching the photosensitive layer. Of particular importance in the above photolithography operations is the uniform application of a photosensitive layer of a certain thickness on the film of the substrate in the coating process of the photosensitive liquid. If the thickness of the photosensitive layer is larger or smaller than the standard thickness, uniform etching cannot be obtained. The manner in which the photosensitive liquid is applied to the substrate in this manner is disclosed by a spin coating method using a spin coater and a non-rotation coating method using a slit coater. Among the two coating methods, the spin coating method forms an irregular surface depending on the working conditions (rotation speed of the substrate, evaporation of the solvent, etc.). Therefore, the main application at present is a non-rotation coating method using a slit type photosensitive liquid coating device. In the non-rotation coating method, a photosensitive liquid layer (photoresist layer) for photolithography of a certain thickness is applied onto a substrate film by applying a photosensitive liquid to a slit of a liquid-jet coating device. The photosensitive liquid application device used in the non-rotation coating method includes: a table; a plurality of linear driving units disposed on both sides above the table; coupled to the plurality of linear driving units in a vertical direction a plurality of extended columns; a plurality of vertical driving units combined with the plurality of columns; and a Gantry which is horizontally combined with the plurality of vertical driving units for combining the slit nozzles. In the photosensitive liquid application device, the head support member is movable up and down by the driving of the plurality of vertical driving units, and the slit head is brought closer to the substrate. The slit nozzle is coated with a chemical solution on the substrate while being horizontally moved by the driving of a plurality of linear driving units. This photosensitive liquid application device adjusts the horizontal state of the slit nozzle by precisely adjusting the horizontal state of the head support. The size of the photosensitive liquid coating device is also increased as the area of the substrate to which the chemical solution is applied is increased, and the size and weight of the head support member incorporating the slit nozzle are also increased. This large-sized nozzle support does not allow the operator to easily and precisely adjust its horizontal state. In particular, the leveling work of such a nozzle support member needs to be carried out in two steps. That is, the operator initially arranges the head support horizontally and then combines the left and right ends thereof into a plurality of vertical drives 一g a single 7C. Then, the operator adjusts the joint position of the left and right sides of the head support while adjusting the horizontal state of the head support by the horizontal test tool to perform the second adjustment. During this process, the head support is not accurate after the initial installation of 201013319, and most of it will be tilted. At this time, the portion connected to the head support member causes an unnecessary load, resulting in a decrease in the accuracy of the photosensitive liquid application device. SUMMARY OF THE INVENTION In view of the above problems, an object of the present invention is to provide a photosensitive liquid which can not only easily adjust the horizontal state of a head support provided with a slit nozzle but also improve the mounting accuracy without causing machine fatigue. Coating device. In order to achieve the above object, the present invention adopts the following technical solutions. The photosensitive liquid coating apparatus of the present invention comprises: a table; a plurality of cylinders coupled to the table, the plurality of cylinders being spaced apart from each other by a predetermined distance; and a plurality of vertical driving units respectively coupled to the a plurality of cylinders; a nozzle support member moving up and down under the driving action of the plurality of vertical driving units; a slit nozzle coupled to the nozzle support member to spray the chemical liquid onto the substrate; and a displacement adjusting unit And a plurality of vertical driving units for adjusting a displacement amount generated by a left and right height difference of the spray head support. Preferably, the table is provided with a plurality of linear drive units for linearly moving the plurality of cylinders in the horizontal direction. Preferably, the displacement adjusting unit comprises: a displacement compensating moving unit, which is coupled to one of the vertical driving units for horizontally moving the head support; the first displacement compensating rotating unit is coupled to the displacement Compensating the mobile unit and rotatably engaging with the showerhead support; the second displacement compensating rotary unit coupled to the remaining one of the plurality of vertical drive units rotatably coupled to the spray The head supports are combined. 5 201013319 Preferably, the first displacement compensation rotation unit and the second displacement compensation rotation unit are constituted by a rotating shaft rotatably coupled to the plurality of vertical driving units and coupled to the head support. Preferably, the displacement compensation moving unit comprises: a plurality of guide rails horizontally combined with the vertical drive unit; a plurality of mounts (m〇unt) moving along the plurality of guide rails; combined with the plurality of mounts Mobile parts. Preferably, a bearing is coupled to an outer peripheral surface of the rotating shaft. Preferably, the vertical driving unit comprises: a plurality of main driving units, which are further disposed on the plurality of cylinders and driven by a motor; a plurality of auxiliary driving units are slanted on the plurality of columns, and The main turbulence units are arranged in parallel and driven by a pneumatic actuator. Preferably, the main drive unit includes [the motor; a rotating screw that rotates under the driving action of the motor; and a conveying mechanism that is coupled to the outer circumference of the rotating screw # and moves therewith; the lifting member, the same The transport mechanism is combined to move up and down under the guidance of the linear guide assembly. Preferably, the lifter is coupled to the linear guide assembly and is moved up and down. The present invention having the above structure, in the process of horizontally adjusting the head support member, 'even if the head support member is inclined, & and the displacement of the both sides of the head support member is poor, the nozzle is rotated by the displacement adjusting unit and the head is moved horizontally. The support is so that the load on the machine is not too large, thus ensuring accuracy. Moreover, the present invention allows the operator to easily adjust the horizontal state of the head support, so that the operation is simple and the adjustment accuracy is high. 201013319 [Embodiment] Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the accompanying drawings. BRIEF DESCRIPTION OF THE DRAWINGS Figure 1 is a schematic view showing the entire configuration of an embodiment of a photosensitive liquid application apparatus of the present invention. The photosensitive liquid coating device includes: a table 1; a pair of linear driving units disposed on both sides of the table, that is, a first linear driving unit 3 and a second linear driving unit 5; and a first linear driving unit 3 and a first cylindrical body 7 and a second cylindrical body 9 combined with the second linear driving unit 5; and a first vertical driving unit u and a second vertical driving unit 13 combined with the first cylindrical body 7 and the second cylindrical body 9; The first displacement adjusting unit 15 and the second displacement adjusting unit 17 combined with the first vertical driving unit U and the second vertical driving unit 13; and the first displacement adjusting sheet 7C 15 and the second displacement adjusting sheet & a nozzle support member 19; and a slit nozzle 21 combined with the head support member 19. A table 3 is disposed on the table 1 and a substrate G is disposed on the platen 31. That is, in order to apply a chemical liquid such as a photoresist on the substrate G, the stage 1 has a working surface. Preferably, the first linear drive unit 3 and the second linear drive unit 5 are arranged side by side in pairs at an edge portion above the table 1. - In the present embodiment, the first linear driving unit 3 and the second linear driving unit 5 have the same structure, and therefore only the first linear driving will be described here. In the present embodiment, the first linear drive unit 3 is preferably a linear motor (War. This first-linear (four) unit + (four) first-column 7 and second cylinder 9. Moving the first cylinder 7 And the second cylinder 9 7 201013319 'as long as the structure can minimize the vibration and move at a constant speed can be used as the linear driving unit in the embodiment. The first cylinder 7 and the second cylinder 9 Preferably, it is coupled to the upper portions of the first linear drive unit 3 and the second linear drive unit 5 and extends upwardly and in pairs. The first vertical body 7 and the second cylindrical body 9 are respectively coupled with a first vertical drive unit U. And the second vertical driving unit 13. The first vertical driving unit u combined with the first cylinder 7 may be constituted by the first main driving unit 41 and the first auxiliary driving unit 43 as shown in Fig. 3. The first main driving The unit 41 includes: a first motor 45 driven under the control of a controller (not shown); a first rotating screw 47 that rotates under the driving action of the first motor; and a peripheral phase of the first rotating screw 47 a first conveying mechanism 49 that is conveyed in combination. Moreover, the first conveyor 49 is combined with the first lifting member 51. The first motor 45 is coupled to the first knowledge base 7 to bury the upper portion of the column 7. The first rotating screw 47 is coupled to the first motor 45 - rotating screw; The on-axis I is disposed downward. By the rotation of the second turn screw 47, the first transfer mechanism 49 can be moved up and down. The first transfer mechanism 49 moves _@^. When moving, the first lifter 51 Also, the random rail assembly is combined by the vertical group. The first rail 53 of the system η is arranged as shown in the figure, and is coupled with the first rail. The movable frame (not shown) constituting the above-mentioned wire (four) rail assembly of the guide rail 53 is paired/financed, and the two are spaced apart by a predetermined distance, that is, the first-lower-up, and can be a conventional component. The first conveying mechanism 49 moves up and down, but since the 201013319 is guided by the linear guide rail assembly, it does not twist. It can move smoothly in the vertical direction, and the first auxiliary driving unit 43 includes the buckle and the first set and the first Main drive unit 4i side by side: the first: (as shown in Figure 3). The first - air pressure actuated off - Stopper rod 61a coupled to the first displacement unit 15. The time adjusting the entire unit, and FIG. 2 through FIG. 3 illustrates a closed die base level of the left side - Soil bit clever
G 準時位於右侧的第二位移調整m對於以圖1爲基 細說明。 整皁疋P，則通過圖4進行詳 如圖3所示，第一 移動單元及楚7 單70 15包括第-位移補償 单及第一位移補償旋轉單元73。 第一位移補償移動單 結合的另-”軌即多㈣包括和第-升降件51水平 軌移動的m 導轨75、沿所述多個第二導 件79。 ^ 77、和所述多個座架77結合的移動 而且，第一位移補償旋轉 所述第-位移補償移動單元71 了=結合到 81。所述第-轉轴81的外 動件79㈣-轉轴 從而使得所述第-轉軸81 =置有第—軸承82’ 元Μ的移動件79進行順利的旋轉斤述第一位移補償移動單 如圖4所示，同第_ 元13可由第-主— 相結合的第二垂直驅動單 成。 驅動單元141和第二辅助驅動單元⑷組 第二主驅動單元141 、有在控制器（未圖示）的控制下 9 201013319 驅動的第二馬達145、在所述第二馬達145的驅動下旋轉的 第二旋轉螺桿147、同所述第二旋轉螺桿147外周面相結合 而被傳送的第二傳送機構149。所述第二傳送機構149和第 二升降件1 5 1相結合。 另外，第二升降件151結合到由上下配置的導軌（未圖 示）和同所述導轨相結合、並沿所述導軌移動的座架（未圖示 組成的線性導軌組彳卜在本㈣例巾，兩個相隔預定距離 的上述線性導軌組件㈣配置，而且其可以是常規組件。The second displacement adjustment m, on the right side of G, is described in detail with reference to Fig. 1. The whole saponin P is detailed as shown in Fig. 4. As shown in Fig. 3, the first moving unit and the singular unit 70 15 include a first displacement compensation unit and a first displacement compensation rotation unit 73. The other displacement of the first displacement compensation moving single unit, that is, the multiple (four) includes the m-rail 75 moving with the horizontal rail of the first lifting member 51, along the plurality of second guiding members 79, ^ 77, and the plurality of The movement of the mount 77 is combined, and the first displacement compensation rotates the first displacement compensation moving unit 71 = is coupled to 81. The outer mover 79 (four) of the first-rotor shaft 81 is rotated to thereby make the first-axis 81 = the moving member 79 provided with the first bearing 82' is smoothly rotated. The first displacement compensation moving single is as shown in FIG. 4, and the same vertical element 13 can be combined by the first main driving. The drive unit 141 and the second auxiliary drive unit (4) are provided with a second main drive unit 141, a second motor 145 driven by a controller (not shown) 9 201013319, and a second motor 145 at the second motor 145. a second rotating screw 147 that is driven to rotate, and a second conveying mechanism 149 that is coupled to the outer peripheral surface of the second rotating screw 147. The second conveying mechanism 149 and the second lifting member 155 are combined. The second lifting member 151 is coupled to the guide rail (not shown) arranged from above and below And a frame that is combined with the guide rail and moves along the guide rail (a linear guide group not shown in the drawing is arranged in the fourth (four) example towel, two linear guide assemblies (four) spaced apart by a predetermined distance, and Can be a regular component.
即，第二升降件151借助第二傳送機構149上下移動，但由 於受線性導軌組件的導向，其在 丁〜守同丹在垂直方向上可順利移動， 而不會扭曲。That is, the second lifting member 151 is moved up and down by the second conveying mechanism 149, but due to the guidance of the linear guide member, it can smoothly move in the vertical direction without being twisted.
第二辅助驅動單元143包括和第二主驅動單元141道 排設置的第二空壓致動請（如圖4所示）。第二咖 動器16:的第二活塞桿161a結合到第二位移調整單元… 第-位移調整單元17由第二位移補償旋轉單元^(如 構成，所述第二位移補償旋轉單元85同上述垂 :單-中剩餘的一個，即第二垂直驅動單元。相結合。 第-位移補償旋轉單元85最好包括同第二垂直驅動單 :父：：二升降件151(其結構和上述第-垂直驅動單 了族Λ 降件51㈣）相結合的連接部件84、以及 =3:合於所述連接部件84的第二轉軸83。所述第二 m上最好設置有第二轴承87,㈣使得所述 =於同所述第二垂直_元13相結合的 運接。卩件84進行順利的旋轉。 10 201013319 相較於驅動單幻3相結合的第二位移調整單元η 、』述的和第一垂直驅動單 …，少-個水平移動的位移補償二單的元第:位移調整 移調=二9通::栓等連接部件結合到所述第-位 二轉:：。即’喷頭支承件19和第—轉軸以及第二轉 ❹ 動而7’並隨著第二轉軸83的旋轉，可-道旋轉及移 所述喷頭支承件19旋轉移動時，第—位移補 兀產生位移’因此喷頭支承件19可以順利地 移動。 下面參照圖5和圖6’詳細說明通過如上實施例調整喷 頭支承件19水平狀態的一例。 操作者採㈣栓等連㈣件將料噴以承件Η連接 到第-轉軸81及第二轉軸83。此時，噴頭支承件19難以 在水平方向上精密配置，而具有若干傾斜冑a (如圖5所 不），並以傾斜的狀態固定在所述轉軸上。 例如在圈5中’當所述喷頭支承件i 9的左側部分相較 於右側部分下垂些許距離時，爲了調整喷頭支承件Η的水 平狀態，有必要把喷頭支承件19朝2方向移動其在Z轴上 偏移的距離b。此時，喷頭支承件19自然會在水平方向即 在X轴上移動距離c。 操作者可通過另外的調整工具調整所述下垂的喷頭支 承件19側，以使其朝著z方向移動。此時，由於喷頭支 承件19結合到第一轉軸81及第二轉軸83，其可將第二轉 11 201013319 軸83的旋轉中心。作爲基準，朝z方向移動。 在喷頭支承件19朝2方向移動距離b時所述 第-轉軸81在第一位移補償移動單元7ι的作用下 方向上移動距離。(在圖5和圖6中用虛線表示卜 Χ 即，第一位移補償移動單元中的座架77沿 軌75移動’而固定在所述座架77上的移動件79也料在 …上移動。因此’結合在移動件79上的噴頭支承心 可同時在Ζ方向和X方向上移動，從而完成水平調整。 因此在調整喷頭支承件19的水平狀態時，由於喷頭支 承件19移動’不會導致機器疲勞，可以保持機器精度。 尤其是操作者無需使用過分的力氣而很容易地調節喷 頭支承件的水平狀態。 【圖式簡單說明】 圖1是本發明的感光液塗敷裝置一個實施例的整體結 構示意圖。 圖2是圖1中主要部分的結構圖。 ❹ 囷3是圖2中m_]n向剖面圖。 圖4是和圖3相對的相反侧結構示意圖。 圖5是用來說明本發明操作原理的示意圓。 圖6是用來說明本發明操作原理的示意圖。 【主要元件符號說明】 工作台 12 201013319The second auxiliary driving unit 143 includes a second air pressure actuation (as shown in Fig. 4) arranged in a row with the second main driving unit 141. The second piston rod 161a of the second coffee machine 16 is coupled to the second displacement adjustment unit. The first displacement adjustment unit 17 is compensated by the second displacement rotation unit (as configured, the second displacement compensation rotation unit 85 is the same as described above).垂: The remaining one of the single-, ie, the second vertical driving unit. The first-displacement-compensating rotating unit 85 preferably includes the same second vertical driving unit: the parent:: two lifting members 151 (the structure and the above-mentioned - The vertical drive unit Λ 件 51 (4)) is connected to the connecting member 84, and = 3: the second rotating shaft 83 is coupled to the connecting member 84. The second m is preferably provided with a second bearing 87, (4) The operation is performed in conjunction with the second vertical element 13. The element 84 is smoothly rotated. 10 201013319 Compared with the second displacement adjustment unit η, which is combined with the driving single magic 3 phase And the first vertical drive single..., less - one horizontal movement displacement compensation two single element: displacement adjustment transposition = two 9-way:: the connection member such as a bolt is coupled to the first-position two-turn:: The head support member 19 and the first and second rotating shafts and the second rotating shaft 7' are along with the second rotating shaft 83 When the rotation, the rotation of the nozzle and the movement of the nozzle support member 19 are rotationally moved, the displacement of the first displacement is generated, so that the nozzle support member 19 can be smoothly moved. The following is explained in detail with reference to FIGS. 5 and 6'. The embodiment adjusts an example of the horizontal state of the head support member 19. The operator picks up (4) a bolt or the like (four) pieces to spray the material to the first-axis 81 and the second shaft 83 with the carrier Η. At this time, the head support member 19 is difficult to Precisely arranged in the horizontal direction, with a plurality of tilts 胄a (as shown in Fig. 5), and fixed on the rotating shaft in an inclined state. For example, in the ring 5 'When the left side portion of the head support i 9 In order to adjust the horizontal state of the head support member 较, it is necessary to move the head support member 19 in the two directions by a distance b which is offset on the Z axis in comparison with the right side portion. In this case, the head support The member 19 naturally moves the distance c in the horizontal direction, that is, on the X-axis. The operator can adjust the side of the drooping head support 19 by another adjustment tool to move it in the z direction. Head support 19 is coupled to the first shaft 81 and a second rotating shaft 83, which is movable in the z direction with reference to the center of rotation of the second shaft 11 201013319 shaft 83. The first rotating shaft 81 is at the time when the head support 19 moves the distance b in the two directions. A displacement compensating movement unit 7i moves downward by the distance. (In FIG. 5 and FIG. 6, the broken line indicates that the carriage 77 in the first displacement compensation moving unit moves along the rail 75 and is fixed to the seat. The moving member 79 on the frame 77 is also moved on. Therefore, the head support core combined with the moving member 79 can be simultaneously moved in the x direction and the X direction to complete the horizontal adjustment. Therefore, the head support 19 is adjusted. In the horizontal state, since the movement of the head support 19 does not cause machine fatigue, the machine accuracy can be maintained. In particular, the operator can easily adjust the horizontal state of the nozzle support without using excessive force. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a schematic view showing the entire configuration of an embodiment of a photosensitive liquid application apparatus of the present invention. Fig. 2 is a structural view of the main part of Fig. 1. ❹ 囷 3 is a cross-sectional view of m_]n in Fig. 2. Figure 4 is a schematic view showing the structure of the opposite side opposite to Figure 3. Figure 5 is a schematic circle for explaining the principle of operation of the present invention. Figure 6 is a schematic view for explaining the principle of operation of the present invention. [Main component symbol description] Workbench 12 201013319
3 第一線性驅動單元 5 第二線性驅動單元 7 第一柱體 9 第二柱體 11 第一垂直驅動單元 13 第二垂直驅動單元 15 第一位移調整單元 17 第二位移調整單元 19 喷頭支承件 21 狹縫喷頭 31 定盤 41 第一主驅動單元 43 第一輔助驅動單元 45 第一馬達 47 第一旋轉螺桿 49 第一傳送機構 51 第一升降件 53 第一導執 61 第一空壓致動器 71 第一位移補償移動單元 73 第一位移補償旋轉單元 75 第二導軌 77 座架 79 移動件 13 201013319 81 第一轉軸 82 第一軸承 83 第二轉軸 84 連接部件 85 第二位移補償旋轉單元 87 第二軸承 141 第二主驅動單元 143 第二輔助驅動單元3 first linear drive unit 5 second linear drive unit 7 first cylinder 9 second cylinder 11 first vertical drive unit 13 second vertical drive unit 15 first displacement adjustment unit 17 second displacement adjustment unit 19 Support member 21 slit head 31 fixed plate 41 first main drive unit 43 first auxiliary drive unit 45 first motor 47 first rotary screw 49 first transfer mechanism 51 first lift member 53 first guide 61 first empty Pressure actuator 71 First displacement compensation moving unit 73 First displacement compensation rotation unit 75 Second rail 77 Seat 79 Moving member 13 201013319 81 First shaft 82 First bearing 83 Second shaft 84 Connecting member 85 Second displacement compensation Rotating unit 87 second bearing 141 second main driving unit 143 second auxiliary driving unit
145 第二馬達 147 第二旋轉螺桿 149 第二傳送機構 151 第二升降件 161 第二空壓致動器 161a 第二活塞桿 61a 第一活塞桿 G 基板145 second motor 147 second rotating screw 149 second conveying mechanism 151 second lifting member 161 second air pressure actuator 161a second piston rod 61a first piston rod G substrate
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