CN101641752B - 驻极体及具备该驻极体的静电感应型变换元件 - Google Patents
驻极体及具备该驻极体的静电感应型变换元件 Download PDFInfo
- Publication number
- CN101641752B CN101641752B CN2008800087934A CN200880008793A CN101641752B CN 101641752 B CN101641752 B CN 101641752B CN 2008800087934 A CN2008800087934 A CN 2008800087934A CN 200880008793 A CN200880008793 A CN 200880008793A CN 101641752 B CN101641752 B CN 101641752B
- Authority
- CN
- China
- Prior art keywords
- electret
- fluorine
- ring structure
- main chain
- fluoropolymer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000006243 chemical reaction Methods 0.000 title claims abstract description 14
- 230000006698 induction Effects 0.000 title claims abstract description 11
- 239000002904 solvent Substances 0.000 claims abstract description 35
- 229910052731 fluorine Inorganic materials 0.000 claims abstract description 33
- 229920000642 polymer Polymers 0.000 claims abstract description 30
- 239000011737 fluorine Substances 0.000 claims abstract description 27
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims abstract description 26
- 239000000203 mixture Substances 0.000 claims abstract description 19
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims abstract description 8
- 239000011248 coating agent Substances 0.000 claims abstract description 6
- 238000000576 coating method Methods 0.000 claims abstract description 6
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 claims description 33
- 229920002313 fluoropolymer Polymers 0.000 claims description 32
- 239000004811 fluoropolymer Substances 0.000 claims description 32
- 229910000077 silane Inorganic materials 0.000 claims description 26
- -1 silane compound Chemical class 0.000 claims description 23
- 125000001153 fluoro group Chemical group F* 0.000 claims description 12
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims description 9
- 229920001577 copolymer Polymers 0.000 claims description 9
- FZHAPNGMFPVSLP-UHFFFAOYSA-N silanamine Chemical compound [SiH3]N FZHAPNGMFPVSLP-UHFFFAOYSA-N 0.000 claims description 7
- 125000001931 aliphatic group Chemical group 0.000 claims description 6
- 125000004430 oxygen atom Chemical group O* 0.000 claims description 3
- 239000010949 copper Substances 0.000 abstract description 11
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 abstract description 10
- 229910052802 copper Inorganic materials 0.000 abstract description 10
- 238000004528 spin coating Methods 0.000 abstract description 7
- 239000000758 substrate Substances 0.000 abstract description 6
- 239000006087 Silane Coupling Agent Substances 0.000 abstract 1
- 238000010304 firing Methods 0.000 abstract 1
- 239000000243 solution Substances 0.000 description 19
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 11
- 229910052799 carbon Inorganic materials 0.000 description 10
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 9
- 125000000217 alkyl group Chemical group 0.000 description 9
- GAURFLBIDLSLQU-UHFFFAOYSA-N diethoxy(methyl)silicon Chemical compound CCO[Si](C)OCC GAURFLBIDLSLQU-UHFFFAOYSA-N 0.000 description 8
- 229910052760 oxygen Inorganic materials 0.000 description 8
- 239000001301 oxygen Substances 0.000 description 8
- PKTOVQRKCNPVKY-UHFFFAOYSA-N dimethoxy(methyl)silicon Chemical compound CO[Si](C)OC PKTOVQRKCNPVKY-UHFFFAOYSA-N 0.000 description 7
- 125000004435 hydrogen atom Chemical class [H]* 0.000 description 7
- 238000000034 method Methods 0.000 description 7
- 230000006641 stabilisation Effects 0.000 description 6
- 238000011105 stabilization Methods 0.000 description 6
- 150000001875 compounds Chemical class 0.000 description 5
- 230000008569 process Effects 0.000 description 5
- 150000004982 aromatic amines Chemical class 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 4
- 238000010438 heat treatment Methods 0.000 description 4
- 238000000059 patterning Methods 0.000 description 4
- GBOMEIMCQWMHGB-UHFFFAOYSA-N 2-butyltetrahydrofuran Chemical class CCCCC1CCCO1 GBOMEIMCQWMHGB-UHFFFAOYSA-N 0.000 description 3
- GRJRKPMIRMSBNK-UHFFFAOYSA-N 3,3,4,4,5,5,6,6,7,7,8,8,8-tridecafluorooctan-1-ol Chemical compound OCCC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F GRJRKPMIRMSBNK-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- 239000004593 Epoxy Substances 0.000 description 3
- QYKIQEUNHZKYBP-UHFFFAOYSA-N Vinyl ether Chemical class C=COC=C QYKIQEUNHZKYBP-UHFFFAOYSA-N 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 238000001879 gelation Methods 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 229960004624 perflexane Drugs 0.000 description 3
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 3
- 150000003254 radicals Chemical class 0.000 description 3
- 150000004756 silanes Chemical class 0.000 description 3
- IMFACGCPASFAPR-UHFFFAOYSA-N tributylamine Chemical compound CCCCN(CCCC)CCCC IMFACGCPASFAPR-UHFFFAOYSA-N 0.000 description 3
- ZWISTDCFZLBCEQ-UHFFFAOYSA-N (methoxy-methyl-phenylsilyl)oxymethanamine Chemical compound NCO[Si](OC)(C)C1=CC=CC=C1 ZWISTDCFZLBCEQ-UHFFFAOYSA-N 0.000 description 2
- GETTZEONDQJALK-UHFFFAOYSA-N (trifluoromethyl)benzene Chemical compound FC(F)(F)C1=CC=CC=C1 GETTZEONDQJALK-UHFFFAOYSA-N 0.000 description 2
- YHSPIJAYKLRNBS-UHFFFAOYSA-N 1-(ethoxy-methyl-phenylsilyl)oxyethanamine Chemical compound NC(C)O[Si](OCC)(C)C1=CC=CC=C1 YHSPIJAYKLRNBS-UHFFFAOYSA-N 0.000 description 2
- KEVMYFLMMDUPJE-UHFFFAOYSA-N 2,7-dimethyloctane Chemical compound CC(C)CCCCC(C)C KEVMYFLMMDUPJE-UHFFFAOYSA-N 0.000 description 2
- GSVMCEUQHZAFKG-UHFFFAOYSA-N 2-triethoxysilylaniline Chemical compound CCO[Si](OCC)(OCC)C1=CC=CC=C1N GSVMCEUQHZAFKG-UHFFFAOYSA-N 0.000 description 2
- CNODSORTHKVDEM-UHFFFAOYSA-N 4-trimethoxysilylaniline Chemical compound CO[Si](OC)(OC)C1=CC=C(N)C=C1 CNODSORTHKVDEM-UHFFFAOYSA-N 0.000 description 2
- RZVAJINKPMORJF-UHFFFAOYSA-N Acetaminophen Chemical compound CC(=O)NC1=CC=C(O)C=C1 RZVAJINKPMORJF-UHFFFAOYSA-N 0.000 description 2
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 2
- DTQVDTLACAAQTR-UHFFFAOYSA-N Trifluoroacetic acid Chemical compound OC(=O)C(F)(F)F DTQVDTLACAAQTR-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 230000032683 aging Effects 0.000 description 2
- 150000001335 aliphatic alkanes Chemical class 0.000 description 2
- 125000003545 alkoxy group Chemical group 0.000 description 2
- 125000003118 aryl group Chemical group 0.000 description 2
- NNBZCPXTIHJBJL-UHFFFAOYSA-N decalin Chemical compound C1CCCC2CCCCC21 NNBZCPXTIHJBJL-UHFFFAOYSA-N 0.000 description 2
- SNRUBQQJIBEYMU-UHFFFAOYSA-N dodecane Chemical compound CCCCCCCCCCCC SNRUBQQJIBEYMU-UHFFFAOYSA-N 0.000 description 2
- 125000005843 halogen group Chemical group 0.000 description 2
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 2
- 238000002347 injection Methods 0.000 description 2
- 239000007924 injection Substances 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000000178 monomer Substances 0.000 description 2
- ZWRUINPWMLAQRD-UHFFFAOYSA-N nonan-1-ol Chemical compound CCCCCCCCCO ZWRUINPWMLAQRD-UHFFFAOYSA-N 0.000 description 2
- 125000005010 perfluoroalkyl group Chemical group 0.000 description 2
- 229960004065 perflutren Drugs 0.000 description 2
- 238000001259 photo etching Methods 0.000 description 2
- 229920001748 polybutylene Polymers 0.000 description 2
- 229920001296 polysiloxane Polymers 0.000 description 2
- 238000010248 power generation Methods 0.000 description 2
- 239000005297 pyrex Substances 0.000 description 2
- NQPDZGIKBAWPEJ-UHFFFAOYSA-N valeric acid Chemical compound CCCCC(O)=O NQPDZGIKBAWPEJ-UHFFFAOYSA-N 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- DSNMEFYRPYNWJJ-UHFFFAOYSA-N 1,1,1,2,2,3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10-henicosafluorodecane Chemical compound FC(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F DSNMEFYRPYNWJJ-UHFFFAOYSA-N 0.000 description 1
- LVJGGVLUKSDQJP-UHFFFAOYSA-N 1-(methyl-phenyl-propoxysilyl)oxypropan-1-amine Chemical compound NC(CC)O[Si](OCCC)(C)C1=CC=CC=C1 LVJGGVLUKSDQJP-UHFFFAOYSA-N 0.000 description 1
- UHMWWIKRVZTBBR-UHFFFAOYSA-N 1-chloro-1,1,2,2,3-pentafluoropropane Chemical compound FCC(F)(F)C(F)(F)Cl UHMWWIKRVZTBBR-UHFFFAOYSA-N 0.000 description 1
- PCIUEQPBYFRTEM-UHFFFAOYSA-M 2,2,3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,10-nonadecafluorodecanoate Chemical compound [O-]C(=O)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F PCIUEQPBYFRTEM-UHFFFAOYSA-M 0.000 description 1
- VGFKXVSMDOKOJZ-UHFFFAOYSA-N 2,2,3,3,4,4,5,5-octafluoropentanoic acid Chemical compound OC(=O)C(F)(F)C(F)(F)C(F)(F)C(F)F VGFKXVSMDOKOJZ-UHFFFAOYSA-N 0.000 description 1
- MZQGWXGEUGHKJA-UHFFFAOYSA-N 2,2,3,3,4,4-hexafluorononanoic acid Chemical class CCCCCC(F)(F)C(F)(F)C(F)(F)C(O)=O MZQGWXGEUGHKJA-UHFFFAOYSA-N 0.000 description 1
- GVIVQCNNFDHBAG-UHFFFAOYSA-N 2,2-dimethyl-1,3-dioxole Chemical compound CC1(C)OC=CO1 GVIVQCNNFDHBAG-UHFFFAOYSA-N 0.000 description 1
- HIXDQWDOVZUNNA-UHFFFAOYSA-N 2-(3,4-dimethoxyphenyl)-5-hydroxy-7-methoxychromen-4-one Chemical compound C=1C(OC)=CC(O)=C(C(C=2)=O)C=1OC=2C1=CC=C(OC)C(OC)=C1 HIXDQWDOVZUNNA-UHFFFAOYSA-N 0.000 description 1
- IXADAFKVJBHNQJ-UHFFFAOYSA-N 2-(methyl-phenyl-propan-2-yloxysilyl)oxypropan-2-amine Chemical compound NC(C)(C)O[Si](OC(C)C)(C)C1=CC=CC=C1 IXADAFKVJBHNQJ-UHFFFAOYSA-N 0.000 description 1
- ZAOOBQWPNVQNOH-UHFFFAOYSA-N 2-[diphenyl(propan-2-yloxy)silyl]oxypropan-2-amine Chemical compound C=1C=CC=CC=1[Si](OC(C)(C)N)(OC(C)C)C1=CC=CC=C1 ZAOOBQWPNVQNOH-UHFFFAOYSA-N 0.000 description 1
- JCMNMOBHVPONLD-UHFFFAOYSA-N 3,3,4,4,5,5,6,6,6-nonafluorohexan-1-ol Chemical compound OCCC(F)(F)C(F)(F)C(F)(F)C(F)(F)F JCMNMOBHVPONLD-UHFFFAOYSA-N 0.000 description 1
- FLXYIZWPNQYPIT-UHFFFAOYSA-N 3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,11,11,12,12,12-henicosafluorododecan-1-ol Chemical compound OCCC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F FLXYIZWPNQYPIT-UHFFFAOYSA-N 0.000 description 1
- CEUQRWZHUUPZGD-UHFFFAOYSA-N 3,3,4,4,5,6,6,6-octafluoro-5-(trifluoromethyl)hexan-1-ol Chemical compound OCCC(F)(F)C(F)(F)C(F)(C(F)(F)F)C(F)(F)F CEUQRWZHUUPZGD-UHFFFAOYSA-N 0.000 description 1
- LZMNXXQIQIHFGC-UHFFFAOYSA-N 3-[dimethoxy(methyl)silyl]propyl 2-methylprop-2-enoate Chemical compound CO[Si](C)(OC)CCCOC(=O)C(C)=C LZMNXXQIQIHFGC-UHFFFAOYSA-N 0.000 description 1
- HUIMQNVGDFZFPP-UHFFFAOYSA-N 3-[diphenyl(propoxy)silyl]oxypropan-1-amine Chemical compound C=1C=CC=CC=1[Si](OCCCN)(OCCC)C1=CC=CC=C1 HUIMQNVGDFZFPP-UHFFFAOYSA-N 0.000 description 1
- MPFYAEVXYNRMRM-UHFFFAOYSA-N 3-[phenyl(dipropoxy)silyl]oxypropan-1-amine Chemical compound NCCCO[Si](OCCC)(OCCC)C1=CC=CC=C1 MPFYAEVXYNRMRM-UHFFFAOYSA-N 0.000 description 1
- KEZMLECYELSZDC-UHFFFAOYSA-N 3-chloropropyl-diethoxy-methylsilane Chemical compound CCO[Si](C)(OCC)CCCCl KEZMLECYELSZDC-UHFFFAOYSA-N 0.000 description 1
- KNTKCYKJRSMRMZ-UHFFFAOYSA-N 3-chloropropyl-dimethoxy-methylsilane Chemical compound CO[Si](C)(OC)CCCCl KNTKCYKJRSMRMZ-UHFFFAOYSA-N 0.000 description 1
- XDLMVUHYZWKMMD-UHFFFAOYSA-N 3-trimethoxysilylpropyl 2-methylprop-2-enoate Chemical compound CO[Si](OC)(OC)CCCOC(=O)C(C)=C XDLMVUHYZWKMMD-UHFFFAOYSA-N 0.000 description 1
- XPWHRQHBPRSUAW-UHFFFAOYSA-N 4-[5-(4-fluorophenyl)-3-[1-(1,2-oxazol-3-ylmethyl)piperidin-4-yl]imidazol-4-yl]pyrimidin-2-amine Chemical compound NC1=NC=CC(C=2N(C=NC=2C=2C=CC(F)=CC=2)C2CCN(CC3=NOC=C3)CC2)=N1 XPWHRQHBPRSUAW-UHFFFAOYSA-N 0.000 description 1
- 101150030352 Arsi gene Proteins 0.000 description 1
- NJOPBCZQSPNWLW-UHFFFAOYSA-N C(C)O[SiH2]OCC.CC=C Chemical compound C(C)O[SiH2]OCC.CC=C NJOPBCZQSPNWLW-UHFFFAOYSA-N 0.000 description 1
- BZRLVSADAKFHNS-UHFFFAOYSA-N C(CCCCCCCCC)[Si](OC)(OC)C.[F] Chemical class C(CCCCCCCCC)[Si](OC)(OC)C.[F] BZRLVSADAKFHNS-UHFFFAOYSA-N 0.000 description 1
- GZBAUYZREARCNR-UHFFFAOYSA-N C(CCCCCCCCC)[Si](OC)(OC)OC.[F] Chemical class C(CCCCCCCCC)[Si](OC)(OC)OC.[F] GZBAUYZREARCNR-UHFFFAOYSA-N 0.000 description 1
- PXJZCBUXFVZSLL-UHFFFAOYSA-N CO[SiH2]OC.C=CC Chemical compound CO[SiH2]OC.C=CC PXJZCBUXFVZSLL-UHFFFAOYSA-N 0.000 description 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
- PXRROZVNOOEPPZ-UHFFFAOYSA-N Flupropanate Chemical compound OC(=O)C(F)(F)C(F)F PXRROZVNOOEPPZ-UHFFFAOYSA-N 0.000 description 1
- 239000004721 Polyphenylene oxide Substances 0.000 description 1
- RHQDFWAXVIIEBN-UHFFFAOYSA-N Trifluoroethanol Chemical compound OCC(F)(F)F RHQDFWAXVIIEBN-UHFFFAOYSA-N 0.000 description 1
- YSSVPNGVUUAZEF-UHFFFAOYSA-N [methoxy(diphenyl)silyl]oxymethanamine Chemical compound C=1C=CC=CC=1[Si](OCN)(OC)C1=CC=CC=C1 YSSVPNGVUUAZEF-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 238000000862 absorption spectrum Methods 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 125000001118 alkylidene group Chemical group 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- 150000001450 anions Chemical class 0.000 description 1
- 150000001491 aromatic compounds Chemical class 0.000 description 1
- BTANRVKWQNVYAZ-UHFFFAOYSA-N butan-2-ol Chemical class CCC(C)O BTANRVKWQNVYAZ-UHFFFAOYSA-N 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 125000001309 chloro group Chemical group Cl* 0.000 description 1
- UUAGAQFQZIEFAH-UHFFFAOYSA-N chlorotrifluoroethylene Chemical group FC(F)=C(F)Cl UUAGAQFQZIEFAH-UHFFFAOYSA-N 0.000 description 1
- 238000000748 compression moulding Methods 0.000 description 1
- 238000006482 condensation reaction Methods 0.000 description 1
- 238000007334 copolymerization reaction Methods 0.000 description 1
- 238000003851 corona treatment Methods 0.000 description 1
- 150000004292 cyclic ethers Chemical class 0.000 description 1
- UKJLNMAFNRKWGR-UHFFFAOYSA-N cyclohexatrienamine Chemical group NC1=CC=C=C[CH]1 UKJLNMAFNRKWGR-UHFFFAOYSA-N 0.000 description 1
- ZZNQQQWFKKTOSD-UHFFFAOYSA-N diethoxy(diphenyl)silane Chemical compound C=1C=CC=CC=1[Si](OCC)(OCC)C1=CC=CC=C1 ZZNQQQWFKKTOSD-UHFFFAOYSA-N 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- AHUXYBVKTIBBJW-UHFFFAOYSA-N dimethoxy(diphenyl)silane Chemical compound C=1C=CC=CC=1[Si](OC)(OC)C1=CC=CC=C1 AHUXYBVKTIBBJW-UHFFFAOYSA-N 0.000 description 1
- DIJRHOZMLZRNLM-UHFFFAOYSA-N dimethoxy-methyl-(3,3,3-trifluoropropyl)silane Chemical compound CO[Si](C)(OC)CCC(F)(F)F DIJRHOZMLZRNLM-UHFFFAOYSA-N 0.000 description 1
- YYLGKUPAFFKGRQ-UHFFFAOYSA-N dimethyldiethoxysilane Chemical compound CCO[Si](C)(C)OCC YYLGKUPAFFKGRQ-UHFFFAOYSA-N 0.000 description 1
- 125000004185 ester group Chemical group 0.000 description 1
- JEWCZPTVOYXPGG-UHFFFAOYSA-N ethenyl-ethoxy-dimethylsilane Chemical compound CCO[Si](C)(C)C=C JEWCZPTVOYXPGG-UHFFFAOYSA-N 0.000 description 1
- NUFVQEIPPHHQCK-UHFFFAOYSA-N ethenyl-methoxy-dimethylsilane Chemical compound CO[Si](C)(C)C=C NUFVQEIPPHHQCK-UHFFFAOYSA-N 0.000 description 1
- 125000002573 ethenylidene group Chemical group [*]=C=C([H])[H] 0.000 description 1
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 1
- RSIHJDGMBDPTIM-UHFFFAOYSA-N ethoxy(trimethyl)silane Chemical compound CCO[Si](C)(C)C RSIHJDGMBDPTIM-UHFFFAOYSA-N 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- 229920001519 homopolymer Polymers 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 238000002454 metastable transfer emission spectrometry Methods 0.000 description 1
- POPACFLNWGUDSR-UHFFFAOYSA-N methoxy(trimethyl)silane Chemical compound CO[Si](C)(C)C POPACFLNWGUDSR-UHFFFAOYSA-N 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 229960004692 perflenapent Drugs 0.000 description 1
- 229950008618 perfluamine Drugs 0.000 description 1
- YPJUNDFVDDCYIH-UHFFFAOYSA-N perfluorobutyric acid Chemical compound OC(=O)C(F)(F)C(F)(F)C(F)(F)F YPJUNDFVDDCYIH-UHFFFAOYSA-N 0.000 description 1
- BPHQIXJDBIHMLT-UHFFFAOYSA-N perfluorodecane Chemical compound FC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F BPHQIXJDBIHMLT-UHFFFAOYSA-N 0.000 description 1
- ZWBAMYVPMDSJGQ-UHFFFAOYSA-N perfluoroheptanoic acid Chemical compound OC(=O)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F ZWBAMYVPMDSJGQ-UHFFFAOYSA-N 0.000 description 1
- ZJIJAJXFLBMLCK-UHFFFAOYSA-N perfluorohexane Chemical compound FC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F ZJIJAJXFLBMLCK-UHFFFAOYSA-N 0.000 description 1
- UZUFPBIDKMEQEQ-UHFFFAOYSA-N perfluorononanoic acid Chemical compound OC(=O)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F UZUFPBIDKMEQEQ-UHFFFAOYSA-N 0.000 description 1
- YFSUTJLHUFNCNZ-UHFFFAOYSA-N perfluorooctane-1-sulfonic acid Chemical class OS(=O)(=O)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F YFSUTJLHUFNCNZ-UHFFFAOYSA-N 0.000 description 1
- SNGREZUHAYWORS-UHFFFAOYSA-N perfluorooctanoic acid Chemical compound OC(=O)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F SNGREZUHAYWORS-UHFFFAOYSA-N 0.000 description 1
- RVZRBWKZFJCCIB-UHFFFAOYSA-N perfluorotributylamine Chemical compound FC(F)(F)C(F)(F)C(F)(F)C(F)(F)N(C(F)(F)C(F)(F)C(F)(F)C(F)(F)F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F RVZRBWKZFJCCIB-UHFFFAOYSA-N 0.000 description 1
- 229920000570 polyether Polymers 0.000 description 1
- 239000003505 polymerization initiator Substances 0.000 description 1
- BWJUFXUULUEGMA-UHFFFAOYSA-N propan-2-yl propan-2-yloxycarbonyloxy carbonate Chemical compound CC(C)OC(=O)OOC(=O)OC(C)C BWJUFXUULUEGMA-UHFFFAOYSA-N 0.000 description 1
- HCOKJWUULRTBRS-UHFFFAOYSA-N propan-2-yloxysilane Chemical compound CC(C)O[SiH3] HCOKJWUULRTBRS-UHFFFAOYSA-N 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- BFKJFAAPBSQJPD-UHFFFAOYSA-N tetrafluoroethene Chemical compound FC(F)=C(F)F BFKJFAAPBSQJPD-UHFFFAOYSA-N 0.000 description 1
- ZQZCOBSUOFHDEE-UHFFFAOYSA-N tetrapropyl silicate Chemical compound CCCO[Si](OCCC)(OCCC)OCCC ZQZCOBSUOFHDEE-UHFFFAOYSA-N 0.000 description 1
- 230000008719 thickening Effects 0.000 description 1
- CPUDPFPXCZDNGI-UHFFFAOYSA-N triethoxy(methyl)silane Chemical compound CCO[Si](C)(OCC)OCC CPUDPFPXCZDNGI-UHFFFAOYSA-N 0.000 description 1
- JCVQKRGIASEUKR-UHFFFAOYSA-N triethoxy(phenyl)silane Chemical compound CCO[Si](OCC)(OCC)C1=CC=CC=C1 JCVQKRGIASEUKR-UHFFFAOYSA-N 0.000 description 1
- JLGNHOJUQFHYEZ-UHFFFAOYSA-N trimethoxy(3,3,3-trifluoropropyl)silane Chemical compound CO[Si](OC)(OC)CCC(F)(F)F JLGNHOJUQFHYEZ-UHFFFAOYSA-N 0.000 description 1
- YUYCVXFAYWRXLS-UHFFFAOYSA-N trimethoxysilane Chemical compound CO[SiH](OC)OC YUYCVXFAYWRXLS-UHFFFAOYSA-N 0.000 description 1
- 229940005605 valeric acid Drugs 0.000 description 1
- 238000012795 verification Methods 0.000 description 1
- 238000004017 vitrification Methods 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/54—Silicon-containing compounds
- C08K5/541—Silicon-containing compounds containing oxygen
- C08K5/5415—Silicon-containing compounds containing oxygen containing at least one Si—O bond
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G7/00—Capacitors in which the capacitance is varied by non-mechanical means; Processes of their manufacture
- H01G7/02—Electrets, i.e. having a permanently-polarised dielectric
- H01G7/021—Electrets, i.e. having a permanently-polarised dielectric having an organic dielectric
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F16/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an alcohol, ether, aldehydo, ketonic, acetal or ketal radical
- C08F16/12—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an alcohol, ether, aldehydo, ketonic, acetal or ketal radical by an ether radical
- C08F16/14—Monomers containing only one unsaturated aliphatic radical
- C08F16/24—Monomers containing halogen
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/54—Silicon-containing compounds
- C08K5/544—Silicon-containing compounds containing nitrogen
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L27/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Compositions of derivatives of such polymers
- C08L27/02—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Compositions of derivatives of such polymers not modified by chemical after-treatment
- C08L27/12—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Compositions of derivatives of such polymers not modified by chemical after-treatment containing fluorine atoms
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D147/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds; Coating compositions based on derivatives of such polymers
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
- C09D7/20—Diluents or solvents
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G7/00—Capacitors in which the capacitance is varied by non-mechanical means; Processes of their manufacture
- H01G7/02—Electrets, i.e. having a permanently-polarised dielectric
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G7/00—Capacitors in which the capacitance is varied by non-mechanical means; Processes of their manufacture
- H01G7/02—Electrets, i.e. having a permanently-polarised dielectric
- H01G7/021—Electrets, i.e. having a permanently-polarised dielectric having an organic dielectric
- H01G7/023—Electrets, i.e. having a permanently-polarised dielectric having an organic dielectric of macromolecular compounds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/54—Silicon-containing compounds
- C08K5/541—Silicon-containing compounds containing oxygen
- C08K5/5415—Silicon-containing compounds containing oxygen containing at least one Si—O bond
- C08K5/5419—Silicon-containing compounds containing oxygen containing at least one Si—O bond containing at least one Si—C bond
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04R—LOUDSPEAKERS, MICROPHONES, GRAMOPHONE PICK-UPS OR LIKE ACOUSTIC ELECTROMECHANICAL TRANSDUCERS; DEAF-AID SETS; PUBLIC ADDRESS SYSTEMS
- H04R19/00—Electrostatic transducers
- H04R19/01—Electrostatic transducers characterised by the use of electrets
- H04R19/016—Electrostatic transducers characterised by the use of electrets for microphones
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Organic Chemistry (AREA)
- Polymers & Plastics (AREA)
- Health & Medical Sciences (AREA)
- Medicinal Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Life Sciences & Earth Sciences (AREA)
- Materials Engineering (AREA)
- Wood Science & Technology (AREA)
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Paints Or Removers (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Abstract
为了提供提高了表面电位的驻极体及具备该驻极体的静电感应型变换元件,将涂布用含氟聚合物组合物旋涂于铜基板上,将其烧成,由此形成驻极体,所述涂布用含氟聚合物组合物含有在主链中具有环结构的含氟聚合物以及硅烷偶联剂、非质子性含氟溶剂及作为质子性含氟溶剂的含氟醇。
Description
技术领域
本发明涉及驻极体及具备该驻极体的静电感应型变换元件的改良。
背景技术
迄今为止,提出了使用在绝缘材料中注入了电荷的驻极体的发电装置、麦克风等静电感应型变换元件。作为上述驻极体的材料,例如可以使用下述专利文献1所记载的含氟聚合物。
但是,在上述现有的含氟聚合物中,存在下述问题:无法提高注入于驻极体的电荷的密度,并且表面电位不充分,无法提高使用了驻极体的静电感应型变换元件的电能与动能的变换效率。
专利文献1:日本特开平4-189880号公报
发明内容
本发明是鉴于上述现有的课题而得到的,其目的在于提供提高了表面电位的驻极体以及具备该驻极体的静电感应型变换元件。
为了达到上述目的,技术方案1记载的驻极体的发明的特征在于,含有在主链中具有环结构的含氟聚合物与硅烷偶联剂的混合物。
技术方案2记载的发明的特征在于,在技术方案1记载的驻极体中,所述在主链中具有环结构的含氟聚合物含有羧基作为末端基团。
技术方案3记载的发明的特征在于,技术方案1或技术方案2记载的驻极体含有键合于所述羧基的硅烷化合物。
技术方案4记载的发明的特征在于,在技术方案1至技术方案3中任一项记载的驻极体中,所述在主链中具有环结构的含氟聚合物是在主链中具有环结构的含氟脂肪族聚合物。
技术方案5记载的发明的特征在于,在技术方案1至技术方案4中任一项记载的驻极体中,所述在主链中具有环结构的含氟聚合物是在主链中具有含醚性氧原子的环结构的含氟脂肪族聚合物。
技术方案6记载的静电感应型变换元件的发明的特征在于,具备技术方案1至技术方案5中任一项记载的驻极体。
根据本发明,可以提供提高了表面电位的驻极体及具备该驻极体的静电感应型变换元件。
附图说明
[图1]是在充电试验中使用的电晕充电装置的示意图。
[图2]是表示表面电位的测定点的设定例的图。
[图3]是表示驻极体A、B所保持的电荷的经时变化的情况的图。
[图4]是表示驻极体C、D所保持的电荷的经时变化的情况的图。
[图5]是热稳定性试验中所用的装置的示意图。
[图6]是表示驻极体A、B的热稳定性试验的结果的图。
[图7]是表示图案化的电极的图。
[图8]是振动发电试验的装置示意图。
符号说明
10铜基板、12直流高压电源装置、14电晕针、16栅极、18栅极用电源、19加热板、20对置电极、22电流计、24基电极、26保护电极、28玻璃基板
具体实施方式
以下,对用于实施本发明的最佳方式(以下称为实施方式)进行说明。
本实施方式的特征在于,驻极体由下述材料构成,该材料含有在主链中具有环结构的含氟聚合物与硅烷偶联剂的混合物。另外,上述在主链中具有环结构的含氟聚合物优选含有羧基作为末端基团,可以在该羧基上键合硅烷化合物。
另外,上述在主链中具有环结构的含氟聚合物优选为在主链中具有环结构的含氟脂肪族聚合物,进而特别优选在主链中具有含醚性氧原子的环结构的含氟脂肪族聚合物。
本实施方式的驻极体可以通过将涂布用含氟聚合物组合物制膜来得到,所述涂布用含氟聚合物组合物将上述在主链中具有环结构的含氟聚合物以及硅烷偶联剂、非质子性含氟溶剂及作为质子性含氟溶剂的含氟醇作为必需成分。该制膜例如通过将上述涂布用含氟聚合物组合物旋涂在铜基板上并进行烧成来进行。
上述本实施方式的驻极体优选作为驱动器、传感器等对电能与动能进行变换的静电感应型变换元件。
此处,在主链中具有环结构的含氟聚合物是可溶于溶剂的聚合物,作为其优选的例子,可以举出在可溶于含氟溶剂的在主链中具有含氟脂肪族环结构的非晶质全氟聚合物。含氟聚合物优选为非晶质的含氟聚合物,但只要是结晶度为30%以下、优选为20%以下的含氟聚合物,均可以优选适用。
作为上述非晶质全氟聚合物的具体例,可以举出CF2=CFO(CF2)nCF=CF2(n=1~3)的环化聚合物、全氟(2,2-二甲基-1,3-二氧杂环戊烯)、全氟(1,3-二氧杂环戊烯)、全氟(4-甲氧基-1,3-二氧杂环戊烯)等的均聚物或共聚物。也优选为使用了2种以上的这些单体的共聚物。另外,也优选这些单体与四氟乙烯、氯三氟乙烯、偏氟乙烯等氟烯烃的共聚物。另外,上述环化聚合、均聚及共聚中可以应用例如日本特开平4-189880号公报等中公开的现有公知的方法。
另外,作为溶解上述在主链中具有环结构的含氟聚合物的非质子性含氟溶剂,可以例示出以下的含氟化合物。
全氟苯、五氟苯、1,3-双(三氟甲基)苯、1,4-双(三氟甲基)苯等多氟芳香族化合物;全氟三丁胺、全氟三丙胺等多氟三烷基胺化合物;全氟十氢萘、全氟环己烷、全氟(1,3,5-三甲基环己烷)等多氟环烷烃化合物;全氟(2-丁基四氢呋喃)等多氟环状醚化合物、含氟低分子量聚醚等。
全氟己烷、全氟辛烷、全氟癸烷、全氟十二烷、全氟(2,7-二甲基辛烷)、1,1,2-三氯-1,2,2-三氟乙烷、1,1,1-三氯-2,2,2-三氟乙烷、1,3-二氯-1,1,2,2,3-五氟丙烷、1,1,1,3-四氯-2,2,3,3-四氟丙烷、1,1,3,4-四氯-1,2,2,3,4,4-六氟丁烷、全氟(1,2-二甲基己烷)、全氟(1,3-二甲基己烷)、2H,3H-全氟戊烷、1H-全氟己烷、1H-全氟辛烷、1H-全氟癸烷、1H,1H,1H,2H,2H-全氟己烷、1H,1H,1H,2H,2H-全氟辛烷、1H,1H,1H,2H,2H-全氟癸烷、3H,4H-全氟-2-甲基戊烷、2H,3H-全氟-2-甲基戊烷、1H-1,1-二氯全氟丙烷、1H-1,3-二氯全氟丙烷等多氟链烷化合物等。
这些非质子性含氟溶剂可以单独或混合使用。另外,除上述溶剂之外,还可以使用广泛围的化合物。例如,优选氢氟醚(HFE)等含氟溶剂。上述含氟溶剂是通式R1-O-R2(R1为可以具有醚键的碳原子数为5~12的直链状或支链状多氟烷基,R2是碳原子数为1~5的直链状或支链状烷基)表示的含氟溶剂。
如果R1的碳原子数为4以下,则难以溶解含有含氟环结构的聚合物,R1的碳原子数为13以上时,难以工业上购得,因此,R1的碳原子数选自5~12的范围。R1的碳原子数优选为6~10,更优选为6~7及9~10。
所谓多氟烷基是烷基的2个以上氢原子被取代为氟原子的基团,包括烷基的全部氢原子被氟原子取代的全氟烷基、以及烷基的2个以上氢原子被氟原子取代且烷基的1个以上氢原子被氟原子以外的卤原子取代而得到的基团。作为氟原子以外的卤原子,优选为氯原子。
作为多氟烷基,优选为对应的烷基的氢原子数的60%以上被氟原子取代而得到的基团,更优选为80%以上。进一步优选多氟烷基为全氟烷基。
在R1具有醚键的情况下,如果醚键数过多,则阻碍溶解性,因此R1中的醚键优选为1~3个,更优选为1~2个。如果R2的碳原子数为6以上,则显著抑制含有含氟环结构的聚合物的溶解性。R2的优选例为甲基或乙基。
如果含氟溶剂的分子量过大,不仅使得含氟聚合物组合物的粘度升高,而且使得含有含氟环结构的聚合物的溶解性降低,因此含氟溶剂的分子量优选为1000以下。另外,为了提高含有含氟环结构的聚合物的溶解性,含氟溶剂的氟含量优选为60~80重量%。作为优选的含氟溶剂,可以例示出下述溶剂。
F(CF2)5OCH3、F(CF2)6OCH3、F(CF2)7OCH3、F(CF2)8OCH3、F(CF2)9OCH3、F(CF2)10OCH3、H(CF2)6OCH3、(CF3)2CF(OCH3)CFCF2CF3、F(CF2)3OCF(CF3)CF2OCH3、F(CF2)3OCF(CF3)CF2OCF(CF3)CF2OCH3、F(CF2)8OCH2CH2CH3、(CF3)2CFCF2CF2OCH3、F(CF2)2O(CF2)4OCH2CH3。
上述含氟溶剂中,特别优选为(CF3)2CF(OCH3)CFCF2CF3。
另外,作为上述硅烷偶联剂,在包括目前公知或周知的硅烷偶联剂的广范围中,可以例示出以下的溶剂。
三甲基甲氧基硅烷、三甲基乙氧基硅烷、二甲基乙烯基甲氧基硅烷、二甲基乙烯基乙氧基硅烷等单烷氧基硅烷类。
γ-氯丙基甲基二甲氧基硅烷、γ-氯丙基甲基二乙氧基硅烷、γ-氨基丙基甲基二乙氧基硅烷、γ-氨基丙基甲基二甲氧基硅烷、N-(β-氨基乙基)-γ-氨基丙基甲基二甲氧基硅烷、N-(β-氨基乙基)-γ-氨基丙基甲基二乙氧基硅烷、γ-缩水甘油基氧基丙基甲基二甲氧基硅烷、γ-缩水甘油基氧基丙基甲基二乙氧基硅烷、γ-甲基丙烯酰氧基丙基甲基二甲氧基硅烷、甲基二甲氧基硅烷、甲基二乙氧基硅烷、二甲基二甲氧基硅烷、二甲基二乙氧基硅烷、甲基乙烯基二甲氧基硅烷、甲基乙烯基二乙氧基硅烷、二苯基二甲氧基硅烷、二苯基二乙氧基硅烷、3,3,3-三氟丙基甲基二甲氧基硅烷、3,3,4,4,5,5,6,6,7,7,8,8,8-十三氟辛基甲基二甲氧基硅烷、3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,10-十七氟癸基甲基二甲氧基硅烷等二烷氧基硅烷类。
γ-氨基丙基三甲氧基硅烷、γ-氨基丙基三乙氧基硅烷、N-(β-氨基乙基)-γ-氨基丙基三甲氧基硅烷、N-(β-氨基乙基)-γ-氨基丙基三乙氧基硅烷、γ-巯基丙基三甲氧基硅烷、γ-缩水甘油基氧基丙基三甲氧基硅烷、γ-缩水甘油基氧基丙基三乙氧基硅烷、γ-甲基丙烯酰氧基丙基三甲氧基硅烷、γ-氯丙基三甲氧基硅烷、甲基三乙氧基硅烷、苯基三甲氧基硅烷、苯基三乙氧基硅烷、3,3,3-三氟丙基三甲氧基硅烷、3,3,4,4,5,5,6,6,7,7,8,8,8-十三氟辛基三甲氧基硅烷、3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,10-十七氟癸基三甲氧基硅烷、四甲氧基硅烷、四乙氧基硅烷等三烷氧基硅烷或四烷氧基硅烷类。
作为具有芳香族胺结构的硅烷偶联剂的芳香族胺系硅烷偶联剂(发现使用该硅烷偶联剂时,即使是三烷氧基化合物,也难以发生凝胶化或增稠。如果使用该硅烷偶联剂,则烷氧基硅烷发生缩合反应后,可以形成不具有碳原子数为2以上的烷基或亚烷基结构的结构,从而能提高耐热性)。
优选的芳香族胺系硅烷偶联剂是通式ArSi(OR1)(OR2)(OR3)、ArSiR4(OR1)(OR2)或ArSiR4R5(OR1)[式中,R1~R5分别独立地表示氢原子、碳原子数为1~20的烷基或芳基,Ar表示邻、间、或对氨基苯基]所表示的化合物。以下举出具体例。
氨基苯基三甲氧基硅烷、氨基苯基三乙氧基硅烷、氨基苯基三丙氧基硅烷、氨基苯基三异丙氧基硅烷、氨基苯基甲基二甲氧基硅烷、氨基苯基甲基二乙氧基硅烷、氨基苯基甲基二丙氧基硅烷、氨基苯基甲基二异丙氧基硅烷、氨基苯基苯基二甲氧基硅烷、氨基苯基苯基二乙氧基硅烷、氨基苯基苯基二丙氧基硅烷、氨基苯基苯基二异丙氧基硅烷等。
氨基的氢原子可以被烷基或芳基取代。例如,可以举出N,N-二甲基氨基苯基三烷氧基硅烷或N,N-二甲基氨基苯基甲基二烷氧基硅烷等。此外,例如,可以使用美国专利第3,481,815号说明书所记载的芳香族胺系硅烷偶联剂等。
这些硅烷偶联剂可以单独或组合使用。另外,优选使用它们的部分共水解物(partial cohydrolysate)。进而,优选使用上述硅烷偶联剂与四甲氧基硅烷、四乙氧基硅烷、四丙氧基硅烷等四烷氧基硅烷的部分共水解物。其中,作为无损含氟聚合物的透明性、提高含氟聚合物的粘合性的部分共水解物,可以例示出如下的特别优选的例子:作为具有氨基的硅烷偶联剂,包括γ-氨基丙基三乙氧基硅烷、γ-氨基丙基甲基二乙氧基硅烷、γ-氨基丙基三甲氧基硅烷、γ-氨基丙基甲基二甲氧基硅烷、N-(β-氨基乙基)-γ-氨基丙基三甲氧基硅烷、N-(β-氨基乙基)-γ-氨基丙基甲基二甲氧基硅烷、N-(β-氨基乙基)-γ-氨基丙基三乙氧基硅烷、N-(β-氨基乙基)-γ-氨基丙基甲基二乙氧基硅烷、氨基苯基三甲氧基硅烷、氨基苯基三乙氧基硅烷、氨基苯基甲基二甲氧基硅烷、氨基苯基甲基二乙氧基硅烷等;或作为具有环氧基的硅烷偶联剂,包括γ-缩水甘油基氧基丙基三甲氧基硅烷、γ-缩水甘油基氧基丙基甲基二甲氧基硅烷、γ-缩水甘油基氧基丙基三乙氧基硅烷、γ-缩水甘油基氧基丙基甲基二乙氧基硅烷等。更优选为具有氨基的硅烷偶联剂。
对于预先在主链末端或侧链导入了羧基的含氟聚合物,特别是具有氨基或环氧基的烷氧基硅烷类是有效的,对于预先在主链末端或侧链导入了酯基的含氟聚合物,特别是具有氨基或氨基苯基的烷氧基硅烷类是有效的。
在上述非质子性含氟溶剂中,具有氨基或环氧基的三烷氧基硅烷类与具有相同基团的二烷氧基硅烷类相比,本发明的液状组合物容易发生经时粘度上升或凝胶化。另外,三烷氧基硅烷类与二烷氧基硅烷类相比,在含氟聚合物的非质子性含氟溶剂溶液中的溶解性小。因此,在使用三烷氧基硅烷类时,优选添加质子性含氟溶剂、特别是含氟醇。
在二烷氧基硅烷类的情况下,虽然其溶解性不像三烷氧基硅烷类那么小,但是,同样可以通过添加质子性含氟溶剂、特别是含氟醇来提高溶解性。在二烷氧基硅烷类的情况下,由于液状组合物的经时粘度上升不像三烷氧基硅烷类那么明显,因此也可以不必添加含氟醇等质子性含氟溶剂,但添加的情况下能可靠地抑制粘度上升。
如上所述,如果在含氟聚合物溶液中添加质子性含氟溶剂,则能增加硅烷偶联剂在含氟聚合物溶液中的溶解性。进而,能抑制被认为是由硅烷偶联剂间的反应导致的粘度上升或凝胶化。作为上述质子性含氟溶剂,可以举出以下的溶剂。
三氟乙醇、2,2,3,3,3-五氟-1-丙醇、2-(全氟丁基)乙醇、2-(全氟己基)乙醇、2-(全氟辛基)乙醇、2-(全氟癸基)乙醇、2-(全氟-3-甲基丁基)乙醇、1H,1H,3H-四氟-1-丙醇、1H,1H,5H-八氟-1-戊醇、1H,1H,7H-十二氟-1-庚醇、1H,1H,9H-十六氟-1-壬醇、2H-六氟-2-丙醇、1H,1H,3H-六氟-2-丁醇等含氟醇。
三氟乙酸、全氟丙酸、全氟丁酸、全氟戊酸、全氟己酸、全氟庚酸、全氟辛酸、全氟壬酸、全氟癸酸、3H-四氟丙酸、5H-八氟戊酸、7H-十二氟庚酸、9H-十六氟壬酸等含氟羧酸、上述含氟羧酸的酰胺、三氟甲磺酸、十七氟辛烷磺酸等含氟磺酸等。
上述质子性含氟溶剂可以单独使用或制成2种以上的混合物。
在非质子性含氟溶剂与质子性含氟溶剂的混合物中的含氟聚合物浓度通常为0.1~30重量%,优选为0.5~20重量%。硅烷偶联剂的配合量相对于100重量份含氟聚合物为0.01~50重量份,优选为0.1~30重量份。质子性含氟溶剂在非质子性含氟溶剂与质子性含氟溶剂的混合物中的配合量为0.01~50重量%,优选为0.1~30重量%。
实施例
以下,以上述实施方式的具体例为实施例进行说明。另外,本发明不限定于以下的实施例。
实施例1
按照以下的顺序制造本实施例的驻极体。
(1)涂布用含氟聚合物组合物的制造
使全氟聚丁烯基乙烯基醚以13%的浓度溶解于全氟三丁基胺中,得到聚合物溶液B。测定溶解于该聚合物溶液B中的聚合物的压缩成形膜的红外线吸收光谱,结果确认来自-COOH基的1775、1810cm-1的特征吸收,另外,溶解的聚合物用全氟(2-丁基四氢呋喃)溶液测定的固有粘度[η]为0.23。
另外,全氟聚丁烯基乙烯基醚是以过氧化二碳酸二异丙酯(((CH3)2CHOCOO)2)为聚合引发剂将全氟丁烯基乙烯基醚(CF2=CFOCF2CF2CF=CF2)环化聚合,将来自引发剂的不稳定末端通过热处理转化为-COF后,通过水解而制成-COOH。
(2)与硅烷偶联剂的混合物的制造
在84.6g的上述聚合物溶液B中加入4.7g的2-(全氟己基)乙醇与10.6g的全氟三丁基胺,进而加入0.4g的γ-氨基丙基甲基二乙氧基硅烷进行混合,得到均匀的聚合物溶液A。
另外,在84.6g的上述聚合物溶液B中加入4.7g的2-(全氟己基)乙醇与10.6g的全氟三丁基胺,进而加入0.4g的γ-氨基丙基三乙氧基硅烷并进行混合,得到均匀的聚合物溶液C。
另外,在84.6g的上述聚合物溶液B中加入0.4g的N-(β-氨基乙基)-γ-氨基丙基三乙氧基硅烷并进行混合,得到均匀的聚合物溶液D。
(3)将上述聚合物溶液A以1000rpm、20秒的条件旋涂在3cm见方、厚度为350μm的铜基板上,在100℃下预烘烤10分钟后,以1080rpm、20秒的条件实施旋涂,在100℃下预烘烤10分钟,将上述一连串的层叠膜形成操作反复进行2次后,通过在100℃下1小时、在200℃下1小时的后烘烤,得到厚度为15μm的涂膜。按照实施例2的顺序在该涂膜中注入电荷,得到驻极体A。
另外,除使用上述聚合物溶液C及聚合物溶液D以外,与上述相同地将旋涂、预烘烤、旋涂、预烘烤的一连串的层叠膜形成操作重复2次后,进行后烘烤,由此得到厚度为15μm的涂膜。按照实施例2的顺序在上述涂膜中注入电荷,分别得到驻极体C及驻极体D。
比较例1
按照以下的顺序制造作为比较例的驻极体。
(1)将上述聚合物溶液B以1000rpm、20秒的条件旋涂在3cm见方、厚度为350μm的铜基板上,在100℃下预烘烤10分钟后,以1850rpm、20秒的条件实施旋涂,在100℃下预烘烤10分钟,将上述一连串的层叠膜形成操作反复2次后,最后通过在100℃下1小时、在200℃下1小时的后烘烤,得到厚度为15μm的涂膜。按照实施例2的顺序在该涂膜中注入电荷,制成驻极体B。
实施例2
对于上述驻极体A、B、C、D,按照以下的顺序进行充电试验。
图1表示用于充电试验的电晕充电装置的示意图。图1中,利用电晕放电向在铜基板(基电极)10上涂布聚合物溶液A、B、C、D而形成的膜中注入电荷,由此制成驻极体A、B、C、D。电荷的注入如下进行:以铜基板10为电极,利用直流高压电源装置12(HAR-20R5:Matsusada Precision制)在电晕针14与铜基板10间施加-8kV的高电压来进行。从电晕针14放电的负离子被栅极16均匀化后,射入到涂膜中,从而注入电荷。另外,从栅极用电源18向栅极16施加-600V的电压。另外,涂膜利用加热板19加热到玻璃化温度(Tg)以上,使注入的电荷稳定。
本实施例中,在大气气氛下,将各涂膜的试样在温度为120℃、充电电压为-8kV、充电时间为3分钟的条件下进行电晕充电后,将试样恢复至常温,用表面电位计(model 279;Monroe Electronics制)从膜的中心每隔3mm成格子状地测定9点的表面电位,求出其平均值。图2表示上述9点测定点的设定例。
另外,将各涂膜的试样在20℃、65%RH(相对湿度)的条件下保管,经时实施电位测定直至2500小时。
图3表示保持于上述各涂膜(驻极体A、B)中的电荷经时变化的情况。图3中,横坐标为经过时间,纵坐标为表面电位。保持于驻极体中的电荷密度越高,表面电位也越高。
由图3可知,混合了氨基硅烷的驻极体A相对于不混合氨基硅烷的比较例的驻极体B,电荷密度、经时稳定性均大幅提高。
同样,由图4可知,关于驻极体C、D,电荷密度、经时稳定性也均大幅提高。
表1中示出了各驻极体的表面电位在经时变化后基本变得稳定后的值。由表1可知,驻极体A、C、D中的任意一者的经时变化后的表面电位均高于驻极体B。
[表1]
驻极体A | 驻极体B | 驻极体C | 驻极体D | |
表面电位(V) | 1240 | 490 | 1070 | 1120 |
经过时间(hr) | 1200 | 1300 | 900 | 900 |
实施例3
对于上述驻极体A、B、C、D,按照以下的顺序进行热稳定性试验。
图5表示用于热稳定性试验的装置的示意图。图5中,利用电晕放电向在铜基板10上涂布聚合物溶液A、B而形成的膜注入电荷而形成驻极体A、B,与该驻极体A、B对置地配置对置电极20。由此,在各驻极体A、B与对置电极20之间形成电容。因此,如果在将各驻极体A、B加热时,被捕获于膜中的电荷变得不稳定,因扩散等,使表面附近的电荷消失,则蓄积于对置电极20中的电荷也减少。因此,能根据从对置电极20流出的电流值的大小来测定各驻极体A、B的热稳定性。
因此,将图5的用虚线表示的部分的温度以一定速度(1℃/分钟)升高,用电流计22对从各驻极体A、B释放的电荷量进行测定来作为从对置电极20流出的电流值i。另外,电流计22使用微电流计(Keithley制Model 6517A)。
图6表示利用图5的装置进行的各驻极体A、B的热稳定性试验的结果。由图6可知,混合了氨基硅烷的驻极体A相对于不混合氨基硅烷的比较例的驻极体B,热稳定性提高。驻极体A的峰位置的温度(185℃)比驻极体B的峰位置的温度(145℃)高,表示热稳定性高。
与上述相同,利用图5的装置进行驻极体C、D的热稳定性试验。驻极体C及D的峰位置的温度分别为176℃及168℃,与驻极体B相比耐热性优异。表2记载了各驻极体的峰位置的温度。
[表2]
驻极体A | 驻极体B | 驻极体C | 驻极体D | |
TSD峰顶温度(℃) | 185 | 145 | 176 | 168 |
实施例4(振动发电试验)
在厚度为0.7mm的Pyrex(注册商标)制玻璃基板28上,以Cr/Au/Cr(厚度50/200/50nm)的顺序通过蒸镀形成电极后,利用光刻法如图7所示地进行图案化。电极图案由在上表面形成驻极体的基电极(宽度150μm、间距300μm)24与保护电极26构成。将上述聚合物溶液A以1000rpm、20秒的条件进行旋涂,在100℃下预烘烤10分钟后,以1080rpm、20秒的条件下实施旋涂,在100℃下预烘烤10分钟,将上述有一连串的层叠膜形成操作重复2次后,通过在100℃下1小时、在200℃下1小时的后烘烤,得到厚度为16μm的涂膜(膜A)。
然后,在该膜A上蒸镀Cu,利用光刻进行图案化,制成金属掩模,以100W的RF功率利用O2等离子体将膜A干蚀刻60~70分钟。通过以上的工艺,得到仅在基电极24上图案化了的聚合物A涂膜(膜E)。将该膜E用实施例2记载的方法进行电晕放电处理,得到表面电位为-640V的驻极体膜(膜F)。
另外,通过相同的工艺同样地在厚度为0.7um的Pyrex制玻璃基板上制作图案化了的Cr/Au/Cr电极(对置电极A),如图8所示,以30μm的间隔配置膜F与对置电极A,将膜F固定,使对置电极A以20Hz、1.2mm的幅度向图的箭头方向水平振动,由此得到最大为0.698毫瓦的电输出功率。
Claims (8)
1.一种驻极体,其特征在于,其是通过在下述涂膜中注入电荷而得到的,所述涂膜是通过将含有在主链中具有环结构的含氟聚合物、硅烷偶联剂、非质子性含氟溶剂及作为质子性含氟溶剂的含氟醇的涂布用含氟聚合物组合物制膜而得到的。
2.根据权利要求1所述的驻极体,其特征在于,所述在主链中具有环结构的含氟聚合物含有羧基作为末端基团。
3.根据权利要求2所述的驻极体,其特征在于,所述驻极体含有键合于所述羧基上的硅烷化合物。
4.根据权利要求1所述的驻极体,其特征在于,所述在主链中具有环结构的含氟聚合物是在主链中具有环结构的含氟脂肪族聚合物。
5.根据权利要求1所述的驻极体,其特征在于,所述在主链中具有环结构的含氟聚合物是在主链中具有含醚性氧原子的环结构的含氟脂肪族聚合物。
6.根据权利要求1~5中任一项所述的驻极体,其特征在于,所述硅烷偶联剂为具有氨基的硅烷偶联剂。
7.根据权利要求1~5中任一项所述的驻极体,其特征在于,所述硅烷偶联剂的配合量相对于每100重量份所述在主链中具有环结构的含氟聚合物为0.01~50重量份。
8.一种静电感应型变换元件,其特征在于,具备权利要求1~7中任一项所述的驻极体。
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007075191 | 2007-03-22 | ||
JP075191/2007 | 2007-03-22 | ||
JP2007303041A JP4921325B2 (ja) | 2007-03-22 | 2007-11-22 | エレクトレット、これを備える静電誘導型変換素子及びエレクトレットの製造方法 |
JP303041/2007 | 2007-11-22 | ||
PCT/JP2008/000359 WO2008114489A1 (ja) | 2007-03-22 | 2008-02-27 | エレクトレット及びこれを備える静電誘導型変換素子 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN101641752A CN101641752A (zh) | 2010-02-03 |
CN101641752B true CN101641752B (zh) | 2012-05-02 |
Family
ID=39765608
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN2008800087934A Expired - Fee Related CN101641752B (zh) | 2007-03-22 | 2008-02-27 | 驻极体及具备该驻极体的静电感应型变换元件 |
Country Status (8)
Country | Link |
---|---|
US (1) | US8339012B2 (zh) |
EP (1) | EP2128878B1 (zh) |
JP (1) | JP4921325B2 (zh) |
KR (1) | KR101366146B1 (zh) |
CN (1) | CN101641752B (zh) |
RU (1) | RU2465673C2 (zh) |
TW (1) | TWI429662B (zh) |
WO (1) | WO2008114489A1 (zh) |
Families Citing this family (23)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP2256761A4 (en) * | 2008-02-22 | 2011-08-31 | Asahi Glass Co Ltd | ELECTRON AND CONVERTER WITH ELECTROSTATIC INDUCTION |
KR20110002458A (ko) | 2008-03-27 | 2011-01-07 | 아사히 가라스 가부시키가이샤 | 일렉트릿 및 정전 유도형 변환 소자 |
CN101981456B (zh) | 2008-03-31 | 2013-11-06 | 旭硝子株式会社 | 加速度传感器装置及传感器网络系统 |
KR20110008009A (ko) | 2008-04-17 | 2011-01-25 | 아사히 가라스 가부시키가이샤 | 일렉트릿 및 정전 유도형 변환 소자 |
CN102159649B (zh) * | 2008-09-19 | 2014-04-16 | 旭硝子株式会社 | 驻极体及静电感应型转换元件 |
KR101577851B1 (ko) * | 2009-02-20 | 2015-12-15 | 아사히 가라스 가부시키가이샤 | 일렉트렛의 제조 방법 및 정전 유도형 변환 소자 |
CN102308351B (zh) | 2009-02-20 | 2014-03-19 | 旭硝子株式会社 | 驻极体的制造方法及静电感应型转换元件 |
JP5407668B2 (ja) * | 2009-08-28 | 2014-02-05 | 旭硝子株式会社 | 静電誘導型発電素子の製造方法 |
EP2648196A4 (en) * | 2010-12-03 | 2018-04-04 | Asahi Glass Company, Limited | Charge retention medium |
JP2012138514A (ja) * | 2010-12-27 | 2012-07-19 | Asahi Glass Co Ltd | 携帯装置 |
WO2013015385A1 (ja) | 2011-07-28 | 2013-01-31 | 旭硝子株式会社 | エレクトレットおよびその製造方法、ならびに静電誘導型変換素子 |
JP5516616B2 (ja) | 2012-02-07 | 2014-06-11 | 日立化成株式会社 | 懸濁粒子装置及びこれを用いた調光装置並びにその駆動方法 |
JPWO2013129142A1 (ja) * | 2012-02-29 | 2015-07-30 | 日本バルカー工業株式会社 | 圧電素子用多孔質樹脂シートおよびその製造方法 |
JP5795976B2 (ja) * | 2012-03-13 | 2015-10-14 | ムネカタ株式会社 | 被コーティング物の表面に高圧電率の圧電性樹脂膜を形成する方法 |
CN103051244B (zh) * | 2012-12-15 | 2016-01-13 | 华中科技大学 | 一种纸基柔性发电装置及其制造方法 |
KR20150107815A (ko) * | 2013-01-16 | 2015-09-23 | 바이엘 머티리얼사이언스 아게 | 다층 전기기계 변환기의 제조 방법 |
JP5598581B2 (ja) * | 2013-07-25 | 2014-10-01 | 旭硝子株式会社 | 静電誘導型発電素子およびその製造方法 |
RU2528618C1 (ru) * | 2013-11-19 | 2014-09-20 | федеральное государственное бюджетное образовательное учреждение высшего профессионального образования "Российский государственный педагогический университет им. А.И. Герцена" (РГПУ им. А.И. Герцена) | Способ изготовления пленочного электрета |
JP2019104156A (ja) * | 2017-12-12 | 2019-06-27 | 日東電工株式会社 | エレクトレットフィルムおよび透明導電層付エレクトレットフィルム |
JP2019106440A (ja) * | 2017-12-12 | 2019-06-27 | 日東電工株式会社 | エレクトレットフィルム |
RU2696623C1 (ru) * | 2018-07-05 | 2019-08-05 | Федеральное государственное бюджетное образовательное учреждение высшего образования "Саратовский государственный технический университет имени Гагарина Ю.А." (СГТУ имени Гагарина Ю.А.) | Способ получения полимерного электрета |
JP7390687B2 (ja) * | 2019-12-13 | 2023-12-04 | 株式会社デンソー | エレクトレット |
US11917919B2 (en) | 2019-12-13 | 2024-02-27 | Denso Corporation | Electret |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3481815A (en) * | 1967-06-20 | 1969-12-02 | Dow Corning | Silane coupling agents for aryl-containing,thermally stable polymers ii |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DD141881B1 (de) * | 1978-12-29 | 1981-07-29 | Rudi Danz | Verfahren und vorrichtung zur polarisierung von polymerformkoerpern |
US4642504A (en) * | 1983-04-08 | 1987-02-10 | Sarcos, Inc. | Electric field machine |
JPS60225416A (ja) * | 1984-04-24 | 1985-11-09 | 三井化学株式会社 | 高性能エレクトレツトおよびエアフイルタ− |
US5731116A (en) * | 1989-05-17 | 1998-03-24 | Dai Nippon Printing Co., Ltd. | Electrostatic information recording medium and electrostatic information recording and reproducing method |
JPH0736916B2 (ja) | 1990-05-14 | 1995-04-26 | 荏原インフイルコ株式会社 | 有機性汚水の生物膜濾過装置 |
JP3005040B2 (ja) * | 1990-11-22 | 2000-01-31 | 旭硝子株式会社 | コーティング用樹脂組成物 |
JPH05155936A (ja) * | 1991-12-04 | 1993-06-22 | Asahi Glass Co Ltd | 含フッ素重合体 |
JP4288855B2 (ja) * | 1998-08-24 | 2009-07-01 | ダイキン工業株式会社 | フッ素ポリマーからなる薄層被膜およびその形成方法 |
JP2004128361A (ja) * | 2002-10-04 | 2004-04-22 | Daikin Ind Ltd | 帯電性部材、帯電性部材製造方法及びエレクトレットマイクロホン・アセンブリーの製造方法 |
US7449811B2 (en) * | 2004-11-26 | 2008-11-11 | The University Of Tokyo | Electrostatic induction conversion device |
JP4670050B2 (ja) * | 2004-11-26 | 2011-04-13 | 国立大学法人 東京大学 | エレクトレット及び静電誘導型変換素子 |
RU2298245C1 (ru) * | 2005-12-20 | 2007-04-27 | Государственное образовательное учреждение высшего профессионального образования Саратовский государственный технический университет (ГОУ ВПО СГТУ) | Способ получения полимерного электрета |
-
2007
- 2007-11-22 JP JP2007303041A patent/JP4921325B2/ja active Active
-
2008
- 2008-02-25 TW TW097106483A patent/TWI429662B/zh not_active IP Right Cessation
- 2008-02-27 KR KR1020097018327A patent/KR101366146B1/ko active IP Right Grant
- 2008-02-27 RU RU2009138001/07A patent/RU2465673C2/ru not_active IP Right Cessation
- 2008-02-27 CN CN2008800087934A patent/CN101641752B/zh not_active Expired - Fee Related
- 2008-02-27 WO PCT/JP2008/000359 patent/WO2008114489A1/ja active Application Filing
- 2008-02-27 EP EP08720273.5A patent/EP2128878B1/en not_active Not-in-force
- 2008-02-27 US US12/449,928 patent/US8339012B2/en not_active Expired - Fee Related
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3481815A (en) * | 1967-06-20 | 1969-12-02 | Dow Corning | Silane coupling agents for aryl-containing,thermally stable polymers ii |
Also Published As
Publication number | Publication date |
---|---|
US8339012B2 (en) | 2012-12-25 |
EP2128878B1 (en) | 2017-01-11 |
TWI429662B (zh) | 2014-03-11 |
EP2128878A4 (en) | 2013-01-30 |
EP2128878A1 (en) | 2009-12-02 |
JP4921325B2 (ja) | 2012-04-25 |
RU2009138001A (ru) | 2011-04-27 |
RU2465673C2 (ru) | 2012-10-27 |
TW200904833A (en) | 2009-02-01 |
KR20100014895A (ko) | 2010-02-11 |
CN101641752A (zh) | 2010-02-03 |
WO2008114489A1 (ja) | 2008-09-25 |
US20100127595A1 (en) | 2010-05-27 |
KR101366146B1 (ko) | 2014-02-24 |
JP2008266563A (ja) | 2008-11-06 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN101641752B (zh) | 驻极体及具备该驻极体的静电感应型变换元件 | |
CN101946295B (zh) | 驻极体及静电感应型转换元件 | |
CN102318021B (zh) | 驻极体的制造方法及静电感应型转换元件 | |
CN102308351B (zh) | 驻极体的制造方法及静电感应型转换元件 | |
CN103229261B (zh) | 电荷保持介质的制造方法 | |
CN103222021B (zh) | 电荷保持介质 | |
WO2013015385A1 (ja) | エレクトレットおよびその製造方法、ならびに静電誘導型変換素子 | |
CN102159649B (zh) | 驻极体及静电感应型转换元件 | |
CN102007002A (zh) | 驻极体及静电感应型转换元件 | |
JP2009249313A (ja) | スルホニウム塩、並びにこれを用いた蓄電デバイス用電解液、蓄電デバイス、及び電気二重層キャパシタ | |
CN105408532A (zh) | 氟聚合物纤维 | |
JP2012257368A (ja) | 静電誘導型発電素子およびその製造方法 | |
JP2020065055A (ja) | エレクトレット材料及びこれを使用した静電誘導型発電素子 | |
TWI608022B (zh) | 具高導電性聚乙二醇共聚合物 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
CP01 | Change in the name or title of a patent holder | ||
CP01 | Change in the name or title of a patent holder |
Address after: Tokyo, Japan, Japan Co-patentee after: AGC Corporation Patentee after: Univ Tokyo Address before: Tokyo, Japan, Japan Co-patentee before: Asahi Glass Co., Ltd. Patentee before: Univ Tokyo |
|
CF01 | Termination of patent right due to non-payment of annual fee | ||
CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20120502 Termination date: 20200227 |