CN101501118A - 低折射率组合物 - Google Patents
低折射率组合物 Download PDFInfo
- Publication number
- CN101501118A CN101501118A CNA2007800291556A CN200780029155A CN101501118A CN 101501118 A CN101501118 A CN 101501118A CN A2007800291556 A CNA2007800291556 A CN A2007800291556A CN 200780029155 A CN200780029155 A CN 200780029155A CN 101501118 A CN101501118 A CN 101501118A
- Authority
- CN
- China
- Prior art keywords
- oxysilane
- coating
- refractive index
- solid
- low refractive
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Images
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/118—Anti-reflection coatings having sub-optical wavelength surface structures designed to provide an enhanced transmittance, e.g. moth-eye structures
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L27/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Compositions of derivatives of such polymers
- C08L27/02—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Compositions of derivatives of such polymers not modified by chemical after-treatment
- C08L27/12—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Compositions of derivatives of such polymers not modified by chemical after-treatment containing fluorine atoms
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/0008—Organic ingredients according to more than one of the "one dot" groups of C08K5/01 - C08K5/59
- C08K5/0025—Crosslinking or vulcanising agents; including accelerators
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/54—Silicon-containing compounds
- C08K5/541—Silicon-containing compounds containing oxygen
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/54—Silicon-containing compounds
- C08K5/541—Silicon-containing compounds containing oxygen
- C08K5/5425—Silicon-containing compounds containing oxygen containing at least one C=C bond
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K7/00—Use of ingredients characterised by shape
- C08K7/22—Expanded, porous or hollow particles
- C08K7/24—Expanded, porous or hollow particles inorganic
- C08K7/26—Silicon- containing compounds
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
Landscapes
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Paints Or Removers (AREA)
- Laminated Bodies (AREA)
- Surface Treatment Of Optical Elements (AREA)
- Coating Of Shaped Articles Made Of Macromolecular Substances (AREA)
- Polymerisation Methods In General (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US83558106P | 2006-08-04 | 2006-08-04 | |
| US60/835,581 | 2006-08-04 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN101501118A true CN101501118A (zh) | 2009-08-05 |
Family
ID=38698877
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNA2007800291556A Pending CN101501118A (zh) | 2006-08-04 | 2007-08-03 | 低折射率组合物 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US20080032052A1 (enExample) |
| JP (1) | JP2009545652A (enExample) |
| KR (1) | KR20090046856A (enExample) |
| CN (1) | CN101501118A (enExample) |
| TW (1) | TW200831588A (enExample) |
| WO (1) | WO2008019078A1 (enExample) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102634277A (zh) * | 2011-02-14 | 2012-08-15 | 住龙纳米技术材料(深圳)有限公司 | 用于形成低折射率膜的涂料、低折射率膜的制造方法以及低折射率膜 |
| CN102713702A (zh) * | 2010-01-13 | 2012-10-03 | 3M创新有限公司 | 具有粘弹性光导的照明装置 |
| CN103109234A (zh) * | 2010-09-16 | 2013-05-15 | 株式会社Lg化学 | 光敏树脂组合物、干膜阻焊膜以及电路板 |
| CN110914354A (zh) * | 2017-07-20 | 2020-03-24 | 3M创新有限公司 | 通过光化辐射固化的氟化弹性体及其方法 |
| CN111742005A (zh) * | 2018-02-09 | 2020-10-02 | 索尔维特殊聚合物意大利有限公司 | 氟弹性体可固化的组合物 |
Families Citing this family (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2011505465A (ja) * | 2007-11-30 | 2011-02-24 | イー・アイ・デュポン・ドウ・ヌムール・アンド・カンパニー | 低屈折率組成物、耐摩耗性反射防止コーティングおよび耐摩耗性反射防止コーティングを形成する方法 |
| US8092905B2 (en) * | 2008-10-10 | 2012-01-10 | E.I Du Pont De Nemours And Company | Compositions containing multifunctional nanoparticles |
| US8557877B2 (en) | 2009-06-10 | 2013-10-15 | Honeywell International Inc. | Anti-reflective coatings for optically transparent substrates |
| WO2012121858A1 (en) | 2011-03-09 | 2012-09-13 | 3M Innovative Properties Company | Antireflective film comprising large particle size fumed silica |
| WO2012147527A1 (ja) * | 2011-04-26 | 2012-11-01 | 大日本印刷株式会社 | 反射防止フィルム、偏光板及び画像表示装置 |
| US8864898B2 (en) | 2011-05-31 | 2014-10-21 | Honeywell International Inc. | Coating formulations for optical elements |
| EP3138875B1 (en) * | 2011-08-04 | 2019-11-20 | 3M Innovative Properties Company | Crosslinked fluorinated polymers with manganese or cerium as additives |
| CN103389530A (zh) * | 2012-08-22 | 2013-11-13 | 宁波东旭成化学有限公司 | 一种反射膜 |
| KR101900538B1 (ko) * | 2015-03-31 | 2018-09-20 | 삼성에스디아이 주식회사 | 투명도전체, 이의 제조방법 및 이를 포함하는 광학표시장치 |
| EP3194502A4 (en) | 2015-04-13 | 2018-05-16 | Honeywell International Inc. | Polysiloxane formulations and coatings for optoelectronic applications |
| JP7361042B2 (ja) * | 2017-12-18 | 2023-10-13 | スリーエム イノベイティブ プロパティズ カンパニー | 化学線によって硬化されたフッ素化エラストマー及びその方法 |
| JP2022550833A (ja) | 2019-10-03 | 2022-12-05 | スリーエム イノベイティブ プロパティズ カンパニー | フリーラジカル媒介硬化によるシリコーンエラストマー |
| WO2021090111A1 (en) | 2019-11-04 | 2021-05-14 | 3M Innovative Properties Company | Fluoropolymer compositions comprising a curing agent with ethylenically unsaturated and electron donor groups, and substrates coated therewith |
| CN119661958A (zh) * | 2023-09-21 | 2025-03-21 | 北京小米移动软件有限公司 | 一种组合物、塑胶的制作方法、塑胶、腕带及穿戴式设备 |
Family Cites Families (20)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4491508A (en) * | 1981-06-01 | 1985-01-01 | General Electric Company | Method of preparing curable coating composition from alcohol, colloidal silica, silylacrylate and multiacrylate monomer |
| DE4114598A1 (de) * | 1991-05-04 | 1992-11-05 | Bayer Ag | Unvernetzte copolymerisate mit reaktiven doppelbindungen aus fluormonomeren und nicht konjugierten dienen und verfahren zu ihrer herstellung |
| US5739180A (en) * | 1996-05-02 | 1998-04-14 | Lucent Technologies Inc. | Flat panel displays and methods and substrates therefor |
| JP4240716B2 (ja) * | 1999-02-01 | 2009-03-18 | ユニマテック株式会社 | 含フッ素エラストマー組成物 |
| US6238798B1 (en) * | 1999-02-22 | 2001-05-29 | 3M Innovative Properties Company | Ceramer composition and composite comprising free radically curable fluorochemical component |
| DE60031148T2 (de) * | 1999-08-31 | 2007-10-25 | Daikin Industries, Ltd. | Uv-vernetzbare polymerzusammensetzung |
| KR100711156B1 (ko) * | 2000-08-29 | 2007-04-24 | 다이킨 고교 가부시키가이샤 | 경화성 함불소 중합체, 이것을 이용한 경화성 수지 조성물및 반사 방지막 |
| US6896958B1 (en) * | 2000-11-29 | 2005-05-24 | Nanophase Technologies Corporation | Substantially transparent, abrasion-resistant films containing surface-treated nanocrystalline particles |
| US7351471B2 (en) * | 2000-12-06 | 2008-04-01 | 3M Innovative Properties Company | Fluoropolymer coating compositions with multifunctional fluoroalkyl crosslinkers for anti-reflective polymer films |
| WO2003027189A1 (fr) * | 2001-09-04 | 2003-04-03 | Dai Nippon Printing Co., Ltd. | Composition de revetement, revetement forme a partir de celle-ci, revetement antireflet, film antireflet et dispositif d'affichage d'image |
| KR20080005612A (ko) * | 2002-08-15 | 2008-01-14 | 후지필름 가부시키가이샤 | 반사 방지 필름, 편광판 및 영상 디스플레이 장치 |
| US20060269733A1 (en) * | 2003-08-28 | 2006-11-30 | Dai Nippon Printing Co., Ltd. | Antireflection laminate |
| JP2005283872A (ja) * | 2004-03-29 | 2005-10-13 | Fuji Photo Film Co Ltd | 反射防止能付き偏光板、その製造方法、およびそれを用いた画像表示装置 |
| TWI388876B (zh) * | 2003-12-26 | 2013-03-11 | Fujifilm Corp | 抗反射膜、偏光板,其製造方法,液晶顯示元件,液晶顯示裝置,及影像顯示裝置 |
| WO2006007243A1 (en) * | 2004-06-30 | 2006-01-19 | Dow Corning Corporation | Fluorocarbon elastomer silicone vulcanizates |
| JP4895343B2 (ja) * | 2004-09-22 | 2012-03-14 | 富士フイルム株式会社 | 反射防止フィルム、その製造方法、偏光板、及び画像表示装置 |
| US7323514B2 (en) * | 2004-12-30 | 2008-01-29 | 3M Innovative Properties Company | Low refractive index fluoropolymer coating compositions for use in antireflective polymer films |
| US20060147177A1 (en) * | 2004-12-30 | 2006-07-06 | Naiyong Jing | Fluoropolymer coating compositions with olefinic silanes for anti-reflective polymer films |
| US7691459B2 (en) * | 2005-03-22 | 2010-04-06 | Fujifilm Corporation | Inorganic fine particle-containing composition, optical film, antireflection film and polarizing film, and polarizing plate and display device using the same |
| US7553543B2 (en) * | 2005-12-16 | 2009-06-30 | E. I. Du Pont De Nemours And Company | Composite structure having a fluoroelastomeric anti-reflective coating with non-fluorinated cross-linking |
-
2007
- 2007-08-01 US US11/888,382 patent/US20080032052A1/en not_active Abandoned
- 2007-08-03 TW TW096128693A patent/TW200831588A/zh unknown
- 2007-08-03 JP JP2009522887A patent/JP2009545652A/ja active Pending
- 2007-08-03 CN CNA2007800291556A patent/CN101501118A/zh active Pending
- 2007-08-03 KR KR1020097003729A patent/KR20090046856A/ko not_active Withdrawn
- 2007-08-03 WO PCT/US2007/017362 patent/WO2008019078A1/en not_active Ceased
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102713702A (zh) * | 2010-01-13 | 2012-10-03 | 3M创新有限公司 | 具有粘弹性光导的照明装置 |
| CN103109234A (zh) * | 2010-09-16 | 2013-05-15 | 株式会社Lg化学 | 光敏树脂组合物、干膜阻焊膜以及电路板 |
| CN102634277A (zh) * | 2011-02-14 | 2012-08-15 | 住龙纳米技术材料(深圳)有限公司 | 用于形成低折射率膜的涂料、低折射率膜的制造方法以及低折射率膜 |
| CN110914354A (zh) * | 2017-07-20 | 2020-03-24 | 3M创新有限公司 | 通过光化辐射固化的氟化弹性体及其方法 |
| CN110914354B (zh) * | 2017-07-20 | 2022-07-19 | 3M创新有限公司 | 通过光化辐射固化的氟化弹性体及其方法 |
| TWI791559B (zh) * | 2017-07-20 | 2023-02-11 | 美商3M新設資產公司 | 藉由光化輻射固化之氟化彈性體及其方法 |
| CN111742005A (zh) * | 2018-02-09 | 2020-10-02 | 索尔维特殊聚合物意大利有限公司 | 氟弹性体可固化的组合物 |
| CN111742005B (zh) * | 2018-02-09 | 2023-01-20 | 索尔维特殊聚合物意大利有限公司 | 氟弹性体可固化的组合物 |
Also Published As
| Publication number | Publication date |
|---|---|
| US20080032052A1 (en) | 2008-02-07 |
| KR20090046856A (ko) | 2009-05-11 |
| WO2008019078A1 (en) | 2008-02-14 |
| TW200831588A (en) | 2008-08-01 |
| JP2009545652A (ja) | 2009-12-24 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C02 | Deemed withdrawal of patent application after publication (patent law 2001) | ||
| WD01 | Invention patent application deemed withdrawn after publication |
Open date: 20090805 |