JP2009545652A - 低屈折率組成物 - Google Patents

低屈折率組成物 Download PDF

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Publication number
JP2009545652A
JP2009545652A JP2009522887A JP2009522887A JP2009545652A JP 2009545652 A JP2009545652 A JP 2009545652A JP 2009522887 A JP2009522887 A JP 2009522887A JP 2009522887 A JP2009522887 A JP 2009522887A JP 2009545652 A JP2009545652 A JP 2009545652A
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JP
Japan
Prior art keywords
oxysilane
refractive index
low refractive
nanosilica particles
solid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2009522887A
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English (en)
Japanese (ja)
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JP2009545652A5 (enExample
Inventor
コスタンティノス・コウルタキス
マーク・アール・マッキーヴァー
ポール・グレゴリー・ベキアリアン
シェクハル・スブラモネイ
マリア・ペトルーチ−サミジャ
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
EIDP Inc
Original Assignee
EI Du Pont de Nemours and Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by EI Du Pont de Nemours and Co filed Critical EI Du Pont de Nemours and Co
Publication of JP2009545652A publication Critical patent/JP2009545652A/ja
Publication of JP2009545652A5 publication Critical patent/JP2009545652A5/ja
Pending legal-status Critical Current

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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/118—Anti-reflection coatings having sub-optical wavelength surface structures designed to provide an enhanced transmittance, e.g. moth-eye structures
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L27/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Compositions of derivatives of such polymers
    • C08L27/02—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Compositions of derivatives of such polymers not modified by chemical after-treatment
    • C08L27/12—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Compositions of derivatives of such polymers not modified by chemical after-treatment containing fluorine atoms
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/0008—Organic ingredients according to more than one of the "one dot" groups of C08K5/01 - C08K5/59
    • C08K5/0025—Crosslinking or vulcanising agents; including accelerators
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/54—Silicon-containing compounds
    • C08K5/541—Silicon-containing compounds containing oxygen
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/54—Silicon-containing compounds
    • C08K5/541—Silicon-containing compounds containing oxygen
    • C08K5/5425—Silicon-containing compounds containing oxygen containing at least one C=C bond
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K7/00—Use of ingredients characterised by shape
    • C08K7/22—Expanded, porous or hollow particles
    • C08K7/24—Expanded, porous or hollow particles inorganic
    • C08K7/26—Silicon- containing compounds
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Paints Or Removers (AREA)
  • Laminated Bodies (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Coating Of Shaped Articles Made Of Macromolecular Substances (AREA)
  • Polymerisation Methods In General (AREA)
JP2009522887A 2006-08-04 2007-08-03 低屈折率組成物 Pending JP2009545652A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US83558106P 2006-08-04 2006-08-04
PCT/US2007/017362 WO2008019078A1 (en) 2006-08-04 2007-08-03 Low refractive index composition

Publications (2)

Publication Number Publication Date
JP2009545652A true JP2009545652A (ja) 2009-12-24
JP2009545652A5 JP2009545652A5 (enExample) 2010-09-16

Family

ID=38698877

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2009522887A Pending JP2009545652A (ja) 2006-08-04 2007-08-03 低屈折率組成物

Country Status (6)

Country Link
US (1) US20080032052A1 (enExample)
JP (1) JP2009545652A (enExample)
KR (1) KR20090046856A (enExample)
CN (1) CN101501118A (enExample)
TW (1) TW200831588A (enExample)
WO (1) WO2008019078A1 (enExample)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2021507087A (ja) * 2017-12-18 2021-02-22 スリーエム イノベイティブ プロパティズ カンパニー 化学線によって硬化されたフッ素化エラストマー及びその方法
JP2021512984A (ja) * 2018-02-09 2021-05-20 ソルベイ スペシャルティ ポリマーズ イタリー エス．ピー．エー． フルオロエラストマー硬化性組成物
JP2023501265A (ja) * 2019-11-04 2023-01-18 スリーエム イノベイティブ プロパティズ カンパニー エチレン性不飽和と電子供与性基とを有する硬化剤を含むフルオロポリマー組成物、及びそれを用いてコーディングされた基材

Families Citing this family (16)

* Cited by examiner, † Cited by third party
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JP2011505465A (ja) * 2007-11-30 2011-02-24 イー・アイ・デュポン・ドウ・ヌムール・アンド・カンパニー 低屈折率組成物、耐摩耗性反射防止コーティングおよび耐摩耗性反射防止コーティングを形成する方法
US8092905B2 (en) * 2008-10-10 2012-01-10 E.I Du Pont De Nemours And Company Compositions containing multifunctional nanoparticles
US8557877B2 (en) 2009-06-10 2013-10-15 Honeywell International Inc. Anti-reflective coatings for optically transparent substrates
WO2011088216A2 (en) 2010-01-13 2011-07-21 3M Innovative Properties Company Illumination device having viscoelastic lightguide
WO2012036477A2 (ko) * 2010-09-16 2012-03-22 주식회사 엘지화학 감광성 수지 조성물, 드라이 필름 솔더 레지스트 및 회로 기판
CN102634277A (zh) * 2011-02-14 2012-08-15 住龙纳米技术材料(深圳)有限公司 用于形成低折射率膜的涂料、低折射率膜的制造方法以及低折射率膜
WO2012121858A1 (en) 2011-03-09 2012-09-13 3M Innovative Properties Company Antireflective film comprising large particle size fumed silica
WO2012147527A1 (ja) * 2011-04-26 2012-11-01 大日本印刷株式会社 反射防止フィルム、偏光板及び画像表示装置
US8864898B2 (en) 2011-05-31 2014-10-21 Honeywell International Inc. Coating formulations for optical elements
EP3138875B1 (en) * 2011-08-04 2019-11-20 3M Innovative Properties Company Crosslinked fluorinated polymers with manganese or cerium as additives
CN103389530A (zh) * 2012-08-22 2013-11-13 宁波东旭成化学有限公司 一种反射膜
KR101900538B1 (ko) * 2015-03-31 2018-09-20 삼성에스디아이 주식회사 투명도전체, 이의 제조방법 및 이를 포함하는 광학표시장치
EP3194502A4 (en) 2015-04-13 2018-05-16 Honeywell International Inc. Polysiloxane formulations and coatings for optoelectronic applications
US11248117B2 (en) 2017-07-20 2022-02-15 3M Innovative Properties Company Fluorinated elastomers cured by actinic radiation and methods thereof
JP2022550833A (ja) 2019-10-03 2022-12-05 スリーエム イノベイティブ プロパティズ カンパニー フリーラジカル媒介硬化によるシリコーンエラストマー
CN119661958A (zh) * 2023-09-21 2025-03-21 北京小米移动软件有限公司 一种组合物、塑胶的制作方法、塑胶、腕带及穿戴式设备

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Publication number Priority date Publication date Assignee Title
JP2005283872A (ja) * 2004-03-29 2005-10-13 Fuji Photo Film Co Ltd 反射防止能付き偏光板、その製造方法、およびそれを用いた画像表示装置
JP2006117924A (ja) * 2004-09-22 2006-05-11 Fuji Photo Film Co Ltd 硬化組成物、反射防止フィルム、その製造方法、偏光板、及び画像表示装置
WO2006073867A1 (en) * 2004-12-30 2006-07-13 3M Innovative Properties Company Low refractive index fluoropolymer coating compositions for use in antireflective polymer films
JP2008527417A (ja) * 2004-12-30 2008-07-24 スリーエム イノベイティブ プロパティズ カンパニー 反射防止ポリマーフィルムのためのオレフィンシランを有するフルオロポリマー塗料組成物

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US4491508A (en) * 1981-06-01 1985-01-01 General Electric Company Method of preparing curable coating composition from alcohol, colloidal silica, silylacrylate and multiacrylate monomer
DE4114598A1 (de) * 1991-05-04 1992-11-05 Bayer Ag Unvernetzte copolymerisate mit reaktiven doppelbindungen aus fluormonomeren und nicht konjugierten dienen und verfahren zu ihrer herstellung
US5739180A (en) * 1996-05-02 1998-04-14 Lucent Technologies Inc. Flat panel displays and methods and substrates therefor
JP4240716B2 (ja) * 1999-02-01 2009-03-18 ユニマテック株式会社 含フッ素エラストマー組成物
US6238798B1 (en) * 1999-02-22 2001-05-29 3M Innovative Properties Company Ceramer composition and composite comprising free radically curable fluorochemical component
DE60031148T2 (de) * 1999-08-31 2007-10-25 Daikin Industries, Ltd. Uv-vernetzbare polymerzusammensetzung
KR100711156B1 (ko) * 2000-08-29 2007-04-24 다이킨 고교 가부시키가이샤 경화성 함불소 중합체, 이것을 이용한 경화성 수지 조성물및 반사 방지막
US6896958B1 (en) * 2000-11-29 2005-05-24 Nanophase Technologies Corporation Substantially transparent, abrasion-resistant films containing surface-treated nanocrystalline particles
US7351471B2 (en) * 2000-12-06 2008-04-01 3M Innovative Properties Company Fluoropolymer coating compositions with multifunctional fluoroalkyl crosslinkers for anti-reflective polymer films
WO2003027189A1 (fr) * 2001-09-04 2003-04-03 Dai Nippon Printing Co., Ltd. Composition de revetement, revetement forme a partir de celle-ci, revetement antireflet, film antireflet et dispositif d'affichage d'image
KR20080005612A (ko) * 2002-08-15 2008-01-14 후지필름 가부시키가이샤 반사 방지 필름, 편광판 및 영상 디스플레이 장치
US20060269733A1 (en) * 2003-08-28 2006-11-30 Dai Nippon Printing Co., Ltd. Antireflection laminate
TWI388876B (zh) * 2003-12-26 2013-03-11 Fujifilm Corp 抗反射膜、偏光板，其製造方法，液晶顯示元件，液晶顯示裝置，及影像顯示裝置
WO2006007243A1 (en) * 2004-06-30 2006-01-19 Dow Corning Corporation Fluorocarbon elastomer silicone vulcanizates
US7691459B2 (en) * 2005-03-22 2010-04-06 Fujifilm Corporation Inorganic fine particle-containing composition, optical film, antireflection film and polarizing film, and polarizing plate and display device using the same
US7553543B2 (en) * 2005-12-16 2009-06-30 E. I. Du Pont De Nemours And Company Composite structure having a fluoroelastomeric anti-reflective coating with non-fluorinated cross-linking

Patent Citations (5)

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Publication number Priority date Publication date Assignee Title
JP2005283872A (ja) * 2004-03-29 2005-10-13 Fuji Photo Film Co Ltd 反射防止能付き偏光板、その製造方法、およびそれを用いた画像表示装置
JP2006117924A (ja) * 2004-09-22 2006-05-11 Fuji Photo Film Co Ltd 硬化組成物、反射防止フィルム、その製造方法、偏光板、及び画像表示装置
WO2006073867A1 (en) * 2004-12-30 2006-07-13 3M Innovative Properties Company Low refractive index fluoropolymer coating compositions for use in antireflective polymer films
JP2008527417A (ja) * 2004-12-30 2008-07-24 スリーエム イノベイティブ プロパティズ カンパニー 反射防止ポリマーフィルムのためのオレフィンシランを有するフルオロポリマー塗料組成物
JP2008527083A (ja) * 2004-12-30 2008-07-24 スリーエム イノベイティブ プロパティズ カンパニー 反射防止ポリマーフィルムに使用するための低屈折率フルオロポリマーコーティング組成物

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2021507087A (ja) * 2017-12-18 2021-02-22 スリーエム イノベイティブ プロパティズ カンパニー 化学線によって硬化されたフッ素化エラストマー及びその方法
JP7361042B2 (ja) 2017-12-18 2023-10-13 スリーエム イノベイティブ プロパティズ カンパニー 化学線によって硬化されたフッ素化エラストマー及びその方法
JP2021512984A (ja) * 2018-02-09 2021-05-20 ソルベイ スペシャルティ ポリマーズ イタリー エス．ピー．エー． フルオロエラストマー硬化性組成物
JP7345484B2 (ja) 2018-02-09 2023-09-15 ソルベイ スペシャルティ ポリマーズ イタリー エス．ピー．エー． フルオロエラストマー硬化性組成物
JP2023501265A (ja) * 2019-11-04 2023-01-18 スリーエム イノベイティブ プロパティズ カンパニー エチレン性不飽和と電子供与性基とを有する硬化剤を含むフルオロポリマー組成物、及びそれを用いてコーディングされた基材
JP7676382B2 (ja) 2019-11-04 2025-05-14 スリーエム イノベイティブ プロパティズ カンパニー エチレン性不飽和と電子供与性基とを有する硬化剤を含むフルオロポリマー組成物、及びそれを用いてコーディングされた基材

Also Published As

Publication number Publication date
US20080032052A1 (en) 2008-02-07
KR20090046856A (ko) 2009-05-11
WO2008019078A1 (en) 2008-02-14
TW200831588A (en) 2008-08-01
CN101501118A (zh) 2009-08-05

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