TW200831588A - Low refractive index composition - Google Patents

Low refractive index composition Download PDF

Info

Publication number
TW200831588A
TW200831588A TW096128693A TW96128693A TW200831588A TW 200831588 A TW200831588 A TW 200831588A TW 096128693 A TW096128693 A TW 096128693A TW 96128693 A TW96128693 A TW 96128693A TW 200831588 A TW200831588 A TW 200831588A
Authority
TW
Taiwan
Prior art keywords
refractive index
group
nano
low refractive
coating
Prior art date
Application number
TW096128693A
Other languages
English (en)
Chinese (zh)
Inventor
Kostantinos Kourtakis
Mark R Mckeever
Paul Gregory Bekiarian
Shekhar Subramoney
Maria Petrucci-Samija
Original Assignee
Du Pont
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Du Pont filed Critical Du Pont
Publication of TW200831588A publication Critical patent/TW200831588A/zh

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/118—Anti-reflection coatings having sub-optical wavelength surface structures designed to provide an enhanced transmittance, e.g. moth-eye structures
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L27/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Compositions of derivatives of such polymers
    • C08L27/02—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Compositions of derivatives of such polymers not modified by chemical after-treatment
    • C08L27/12—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Compositions of derivatives of such polymers not modified by chemical after-treatment containing fluorine atoms
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/0008—Organic ingredients according to more than one of the "one dot" groups of C08K5/01 - C08K5/59
    • C08K5/0025—Crosslinking or vulcanising agents; including accelerators
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/54—Silicon-containing compounds
    • C08K5/541—Silicon-containing compounds containing oxygen
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/54—Silicon-containing compounds
    • C08K5/541—Silicon-containing compounds containing oxygen
    • C08K5/5425—Silicon-containing compounds containing oxygen containing at least one C=C bond
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K7/00—Use of ingredients characterised by shape
    • C08K7/22—Expanded, porous or hollow particles
    • C08K7/24—Expanded, porous or hollow particles inorganic
    • C08K7/26—Silicon- containing compounds
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Paints Or Removers (AREA)
  • Laminated Bodies (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Coating Of Shaped Articles Made Of Macromolecular Substances (AREA)
  • Polymerisation Methods In General (AREA)
TW096128693A 2006-08-04 2007-08-03 Low refractive index composition TW200831588A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US83558106P 2006-08-04 2006-08-04

Publications (1)

Publication Number Publication Date
TW200831588A true TW200831588A (en) 2008-08-01

Family

ID=38698877

Family Applications (1)

Application Number Title Priority Date Filing Date
TW096128693A TW200831588A (en) 2006-08-04 2007-08-03 Low refractive index composition

Country Status (6)

Country Link
US (1) US20080032052A1 (enExample)
JP (1) JP2009545652A (enExample)
KR (1) KR20090046856A (enExample)
CN (1) CN101501118A (enExample)
TW (1) TW200831588A (enExample)
WO (1) WO2008019078A1 (enExample)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20100311868A1 (en) * 2007-11-30 2010-12-09 E. I. Du Pont De Nemours And Company Low refractive index composition, abrasion resistant anti-reflective coating, and method for forming abrasion resistant anti-reflective coating
US8092905B2 (en) * 2008-10-10 2012-01-10 E.I Du Pont De Nemours And Company Compositions containing multifunctional nanoparticles
US8557877B2 (en) 2009-06-10 2013-10-15 Honeywell International Inc. Anti-reflective coatings for optically transparent substrates
KR101822672B1 (ko) 2010-01-13 2018-01-26 쓰리엠 이노베이티브 프로퍼티즈 컴파니 점탄성 도광체를 구비한 조명 장치
KR101256553B1 (ko) * 2010-09-16 2013-04-23 주식회사 엘지화학 감광성 수지 조성물, 드라이 필름 솔더 레지스트 및 회로 기판
CN102634277A (zh) * 2011-02-14 2012-08-15 住龙纳米技术材料(深圳)有限公司 用于形成低折射率膜的涂料、低折射率膜的制造方法以及低折射率膜
WO2012121858A1 (en) 2011-03-09 2012-09-13 3M Innovative Properties Company Antireflective film comprising large particle size fumed silica
WO2012147527A1 (ja) * 2011-04-26 2012-11-01 大日本印刷株式会社 反射防止フィルム、偏光板及び画像表示装置
US8864898B2 (en) 2011-05-31 2014-10-21 Honeywell International Inc. Coating formulations for optical elements
JP6382105B2 (ja) * 2011-08-04 2018-08-29 スリーエム イノベイティブ プロパティズ カンパニー 低当量重量ポリマー
CN103389530A (zh) * 2012-08-22 2013-11-13 宁波东旭成化学有限公司 一种反射膜
KR101900538B1 (ko) * 2015-03-31 2018-09-20 삼성에스디아이 주식회사 투명도전체, 이의 제조방법 및 이를 포함하는 광학표시장치
WO2016167892A1 (en) 2015-04-13 2016-10-20 Honeywell International Inc. Polysiloxane formulations and coatings for optoelectronic applications
EP3655478A1 (en) 2017-07-20 2020-05-27 3M Innovative Properties Company Fluorinated elastomers cured by actinic radiation and methods thereof
CN111601858B (zh) * 2017-12-18 2022-06-21 3M创新有限公司 通过光化辐射固化的氟化弹性体及其方法
US11873357B2 (en) * 2018-02-09 2024-01-16 Solvay Specialty Polymers Italy S.P.A. Fluoroelastomer curable composition
CN114502662A (zh) 2019-10-03 2022-05-13 3M创新有限公司 采用自由基介导固化的有机硅弹性体
CN114630874B (zh) * 2019-11-04 2023-12-05 3M创新有限公司 包含具有烯键式不饱和基团和电子供体基团的固化剂的含氟聚合物组合物及用其涂覆的基底
CN119661958A (zh) * 2023-09-21 2025-03-21 北京小米移动软件有限公司 一种组合物、塑胶的制作方法、塑胶、腕带及穿戴式设备

Family Cites Families (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4491508A (en) * 1981-06-01 1985-01-01 General Electric Company Method of preparing curable coating composition from alcohol, colloidal silica, silylacrylate and multiacrylate monomer
DE4114598A1 (de) * 1991-05-04 1992-11-05 Bayer Ag Unvernetzte copolymerisate mit reaktiven doppelbindungen aus fluormonomeren und nicht konjugierten dienen und verfahren zu ihrer herstellung
US5739180A (en) * 1996-05-02 1998-04-14 Lucent Technologies Inc. Flat panel displays and methods and substrates therefor
JP4240716B2 (ja) * 1999-02-01 2009-03-18 ユニマテック株式会社 含フッ素エラストマー組成物
US6238798B1 (en) * 1999-02-22 2001-05-29 3M Innovative Properties Company Ceramer composition and composite comprising free radically curable fluorochemical component
US6974845B1 (en) * 1999-08-31 2005-12-13 Daikin Industries, Ltd. Polymer composition crosslinkable with ultraviolet
ATE323726T1 (de) * 2000-08-29 2006-05-15 Daikin Ind Ltd Härtbares fluoropolymer, härtbare harzzusammensetzungen diese enthaltend und antireflexionsfilm
US6896958B1 (en) * 2000-11-29 2005-05-24 Nanophase Technologies Corporation Substantially transparent, abrasion-resistant films containing surface-treated nanocrystalline particles
US7351471B2 (en) * 2000-12-06 2008-04-01 3M Innovative Properties Company Fluoropolymer coating compositions with multifunctional fluoroalkyl crosslinkers for anti-reflective polymer films
KR100953927B1 (ko) * 2001-09-04 2010-04-22 다이니폰 인사츠 가부시키가이샤 코팅 조성물, 그것으로 형성된 코팅, 반사 방지막, 반사방지 필름 및 화상 표시장치
JP4404769B2 (ja) * 2002-08-15 2010-01-27 富士フイルム株式会社 反射防止フィルム、偏光板、及び画像表示装置
KR101237822B1 (ko) * 2003-08-28 2013-02-28 니끼 쇼꾸바이 카세이 가부시키가이샤 반사 방지 적층체
TWI388876B (zh) * 2003-12-26 2013-03-11 Fujifilm Corp 抗反射膜、偏光板,其製造方法,液晶顯示元件,液晶顯示裝置,及影像顯示裝置
JP2005283872A (ja) * 2004-03-29 2005-10-13 Fuji Photo Film Co Ltd 反射防止能付き偏光板、その製造方法、およびそれを用いた画像表示装置
WO2006007243A1 (en) * 2004-06-30 2006-01-19 Dow Corning Corporation Fluorocarbon elastomer silicone vulcanizates
JP4895343B2 (ja) * 2004-09-22 2012-03-14 富士フイルム株式会社 反射防止フィルム、その製造方法、偏光板、及び画像表示装置
US7323514B2 (en) * 2004-12-30 2008-01-29 3M Innovative Properties Company Low refractive index fluoropolymer coating compositions for use in antireflective polymer films
US20060147177A1 (en) * 2004-12-30 2006-07-06 Naiyong Jing Fluoropolymer coating compositions with olefinic silanes for anti-reflective polymer films
US7691459B2 (en) * 2005-03-22 2010-04-06 Fujifilm Corporation Inorganic fine particle-containing composition, optical film, antireflection film and polarizing film, and polarizing plate and display device using the same
US7553543B2 (en) * 2005-12-16 2009-06-30 E. I. Du Pont De Nemours And Company Composite structure having a fluoroelastomeric anti-reflective coating with non-fluorinated cross-linking

Also Published As

Publication number Publication date
CN101501118A (zh) 2009-08-05
JP2009545652A (ja) 2009-12-24
US20080032052A1 (en) 2008-02-07
KR20090046856A (ko) 2009-05-11
WO2008019078A1 (en) 2008-02-14

Similar Documents

Publication Publication Date Title
CN101501130A (zh) 低折射率组合物
TW200934816A (en) Low refractive index composition, abrasion resistant anti-reflective coating, and method for forming abrasion resistant anti-reflective coating
JP2009545652A (ja) 低屈折率組成物
US8092905B2 (en) Compositions containing multifunctional nanoparticles
JP6651609B2 (ja) 低屈折層及びこれを含む反射防止フィルム
CN102471583B (zh) 包含氟化的混合组合物的制品
CN1125991C (zh) 抗反射处理的制品
JP5706414B2 (ja) フッ素化ハイブリッド組成物
TW200934665A (en) Bilayer anti-reflective films containing nanoparticles in both layers
TW200940340A (en) Bilayer anti-reflective films containing nanoparticles
CN1791635A (zh) 液态树脂组合物、固化膜及层叠体
CN101437911B (zh) 耐磨涂层组合物和涂层制品
US12291588B2 (en) Fluoropolymer compositions comprising a curing agent with ethylenically unsaturated and electron donor groups, and substrates coated therewith
TWI625368B (zh) 低折射層及含彼的抗反射膜
JP4701492B2 (ja) 構造体
CN102516459B (zh) 含氟化合物、含氟聚合物和含氟树脂组合物
US20100296167A1 (en) Bilayer anti-reflective films containing non-oxide nanoparticles
CN1646584A (zh) 含氟烯烃类聚合物、固化性树脂组合物以及防反射膜
JP2013072065A (ja) ポリマー修飾無機粒子、ポリマー修飾無機粒子を含む塗料組成物、およびポリマー修飾無機粒子の製造方法