TW200831588A - Low refractive index composition - Google Patents
Low refractive index composition Download PDFInfo
- Publication number
- TW200831588A TW200831588A TW096128693A TW96128693A TW200831588A TW 200831588 A TW200831588 A TW 200831588A TW 096128693 A TW096128693 A TW 096128693A TW 96128693 A TW96128693 A TW 96128693A TW 200831588 A TW200831588 A TW 200831588A
- Authority
- TW
- Taiwan
- Prior art keywords
- refractive index
- group
- nano
- low refractive
- coating
- Prior art date
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- TYIXMATWDRGMPF-UHFFFAOYSA-N dibismuth;oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[Bi+3].[Bi+3] TYIXMATWDRGMPF-UHFFFAOYSA-N 0.000 description 1
- 150000001993 dienes Chemical class 0.000 description 1
- 239000012895 dilution Substances 0.000 description 1
- 238000010790 dilution Methods 0.000 description 1
- AXTYOFUMVKNMLR-UHFFFAOYSA-N dioxobismuth Chemical compound O=[Bi]=O AXTYOFUMVKNMLR-UHFFFAOYSA-N 0.000 description 1
- 229910001882 dioxygen Inorganic materials 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- DLAHAXOYRFRPFQ-UHFFFAOYSA-N dodecyl benzoate Chemical compound CCCCCCCCCCCCOC(=O)C1=CC=CC=C1 DLAHAXOYRFRPFQ-UHFFFAOYSA-N 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000000635 electron micrograph Methods 0.000 description 1
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- 238000000921 elemental analysis Methods 0.000 description 1
- 239000000839 emulsion Substances 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 125000000816 ethylene group Chemical group [H]C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
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- 125000003983 fluorenyl group Chemical group C1(=CC=CC=2C3=CC=CC=C3CC12)* 0.000 description 1
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- 239000004811 fluoropolymer Substances 0.000 description 1
- 239000004446 fluoropolymer coating Substances 0.000 description 1
- 235000019253 formic acid Nutrition 0.000 description 1
- 238000009472 formulation Methods 0.000 description 1
- 238000009615 fourier-transform spectroscopy Methods 0.000 description 1
- 239000012949 free radical photoinitiator Substances 0.000 description 1
- 230000004927 fusion Effects 0.000 description 1
- 239000003292 glue Substances 0.000 description 1
- 150000002314 glycerols Chemical class 0.000 description 1
- 238000007756 gravure coating Methods 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- ZRALSGWEFCBTJO-UHFFFAOYSA-O guanidinium Chemical compound NC(N)=[NH2+] ZRALSGWEFCBTJO-UHFFFAOYSA-O 0.000 description 1
- 238000013007 heat curing Methods 0.000 description 1
- QXUUXBLWFVBECQ-UHFFFAOYSA-N hexa-1,3-diene ruthenium Chemical compound [Ru].C=CC=CCC QXUUXBLWFVBECQ-UHFFFAOYSA-N 0.000 description 1
- ACCCMOQWYVYDOT-UHFFFAOYSA-N hexane-1,1-diol Chemical compound CCCCCC(O)O ACCCMOQWYVYDOT-UHFFFAOYSA-N 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- 239000000413 hydrolysate Substances 0.000 description 1
- 125000004356 hydroxy functional group Chemical group O* 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 125000003454 indenyl group Chemical group C1(C=CC2=CC=CC=C12)* 0.000 description 1
- 239000012442 inert solvent Substances 0.000 description 1
- 238000012844 infrared spectroscopy analysis Methods 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 230000026045 iodination Effects 0.000 description 1
- 238000006192 iodination reaction Methods 0.000 description 1
- 125000002346 iodo group Chemical group I* 0.000 description 1
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- PHTQWCKDNZKARW-UHFFFAOYSA-N isoamylol Chemical compound CC(C)CCO PHTQWCKDNZKARW-UHFFFAOYSA-N 0.000 description 1
- 239000012948 isocyanate Substances 0.000 description 1
- 150000002513 isocyanates Chemical class 0.000 description 1
- 230000000670 limiting effect Effects 0.000 description 1
- 239000007937 lozenge Substances 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 150000002734 metacrylic acid derivatives Chemical class 0.000 description 1
- 125000005395 methacrylic acid group Chemical group 0.000 description 1
- 230000011987 methylation Effects 0.000 description 1
- 238000007069 methylation reaction Methods 0.000 description 1
- 238000001000 micrograph Methods 0.000 description 1
- 239000008267 milk Substances 0.000 description 1
- 210000004080 milk Anatomy 0.000 description 1
- 235000013336 milk Nutrition 0.000 description 1
- 150000007522 mineralic acids Chemical class 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 125000002757 morpholinyl group Chemical group 0.000 description 1
- VMGAPWLDMVPYIA-HIDZBRGKSA-N n'-amino-n-iminomethanimidamide Chemical compound N\N=C\N=N VMGAPWLDMVPYIA-HIDZBRGKSA-N 0.000 description 1
- IJDNQMDRQITEOD-UHFFFAOYSA-N n-butane Chemical compound CCCC IJDNQMDRQITEOD-UHFFFAOYSA-N 0.000 description 1
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- OFBQJSOFQDEBGM-UHFFFAOYSA-N n-pentane Natural products CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 1
- 239000002159 nanocrystal Substances 0.000 description 1
- 125000006611 nonyloxy group Chemical group 0.000 description 1
- 239000012038 nucleophile Substances 0.000 description 1
- QYSGYZVSCZSLHT-UHFFFAOYSA-N octafluoropropane Chemical compound FC(F)(F)C(F)(F)C(F)(F)F QYSGYZVSCZSLHT-UHFFFAOYSA-N 0.000 description 1
- TVMXDCGIABBOFY-UHFFFAOYSA-N octane Chemical compound CCCCCCCC TVMXDCGIABBOFY-UHFFFAOYSA-N 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 235000005985 organic acids Nutrition 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- CELWCAITJAEQNL-UHFFFAOYSA-N oxan-2-ol Chemical compound OC1CCCCO1 CELWCAITJAEQNL-UHFFFAOYSA-N 0.000 description 1
- AHHWIHXENZJRFG-UHFFFAOYSA-N oxetane Chemical compound C1COC1 AHHWIHXENZJRFG-UHFFFAOYSA-N 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 125000003544 oxime group Chemical group 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- NFHFRUOZVGFOOS-UHFFFAOYSA-N palladium;triphenylphosphane Chemical compound [Pd].C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 NFHFRUOZVGFOOS-UHFFFAOYSA-N 0.000 description 1
- 229960005489 paracetamol Drugs 0.000 description 1
- 230000036961 partial effect Effects 0.000 description 1
- 239000008188 pellet Substances 0.000 description 1
- QYZLKGVUSQXAMU-UHFFFAOYSA-N penta-1,4-diene Chemical compound C=CCC=C QYZLKGVUSQXAMU-UHFFFAOYSA-N 0.000 description 1
- YWAKXRMUMFPDSH-UHFFFAOYSA-N pentene Chemical compound CCCC=C YWAKXRMUMFPDSH-UHFFFAOYSA-N 0.000 description 1
- 238000005502 peroxidation Methods 0.000 description 1
- 229940097156 peroxyl Drugs 0.000 description 1
- 239000003880 polar aprotic solvent Substances 0.000 description 1
- 229920000058 polyacrylate Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 239000004633 polyglycolic acid Substances 0.000 description 1
- 229920006254 polymer film Polymers 0.000 description 1
- 230000000379 polymerizing effect Effects 0.000 description 1
- 229920005862 polyol Polymers 0.000 description 1
- 229920000098 polyolefin Polymers 0.000 description 1
- 150000003077 polyols Chemical class 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 229920001451 polypropylene glycol Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 1
- 239000004810 polytetrafluoroethylene Substances 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 238000010926 purge Methods 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 238000000985 reflectance spectrum Methods 0.000 description 1
- 238000010992 reflux Methods 0.000 description 1
- BOLDJAUMGUJJKM-LSDHHAIUSA-N renifolin D Natural products CC(=C)[C@@H]1Cc2c(O)c(O)ccc2[C@H]1CC(=O)c3ccc(O)cc3O BOLDJAUMGUJJKM-LSDHHAIUSA-N 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 235000009566 rice Nutrition 0.000 description 1
- 238000001878 scanning electron micrograph Methods 0.000 description 1
- 238000004611 spectroscopical analysis Methods 0.000 description 1
- 210000005070 sphincter Anatomy 0.000 description 1
- 159000000008 strontium salts Chemical class 0.000 description 1
- 229910021653 sulphate ion Inorganic materials 0.000 description 1
- 150000003608 titanium Chemical class 0.000 description 1
- 238000004448 titration Methods 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- 238000013519 translation Methods 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- 125000005270 trialkylamine group Chemical group 0.000 description 1
- 150000005671 trienes Chemical class 0.000 description 1
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 1
- 238000001291 vacuum drying Methods 0.000 description 1
- 229940070710 valerate Drugs 0.000 description 1
- 230000003313 weakening effect Effects 0.000 description 1
- RUDFQVOCFDJEEF-UHFFFAOYSA-N yttrium(III) oxide Inorganic materials [O-2].[O-2].[O-2].[Y+3].[Y+3] RUDFQVOCFDJEEF-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/118—Anti-reflection coatings having sub-optical wavelength surface structures designed to provide an enhanced transmittance, e.g. moth-eye structures
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L27/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Compositions of derivatives of such polymers
- C08L27/02—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Compositions of derivatives of such polymers not modified by chemical after-treatment
- C08L27/12—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Compositions of derivatives of such polymers not modified by chemical after-treatment containing fluorine atoms
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/0008—Organic ingredients according to more than one of the "one dot" groups of C08K5/01 - C08K5/59
- C08K5/0025—Crosslinking or vulcanising agents; including accelerators
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/54—Silicon-containing compounds
- C08K5/541—Silicon-containing compounds containing oxygen
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/54—Silicon-containing compounds
- C08K5/541—Silicon-containing compounds containing oxygen
- C08K5/5425—Silicon-containing compounds containing oxygen containing at least one C=C bond
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K7/00—Use of ingredients characterised by shape
- C08K7/22—Expanded, porous or hollow particles
- C08K7/24—Expanded, porous or hollow particles inorganic
- C08K7/26—Silicon- containing compounds
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
Landscapes
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Paints Or Removers (AREA)
- Laminated Bodies (AREA)
- Surface Treatment Of Optical Elements (AREA)
- Coating Of Shaped Articles Made Of Macromolecular Substances (AREA)
- Polymerisation Methods In General (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US83558106P | 2006-08-04 | 2006-08-04 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| TW200831588A true TW200831588A (en) | 2008-08-01 |
Family
ID=38698877
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW096128693A TW200831588A (en) | 2006-08-04 | 2007-08-03 | Low refractive index composition |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US20080032052A1 (enExample) |
| JP (1) | JP2009545652A (enExample) |
| KR (1) | KR20090046856A (enExample) |
| CN (1) | CN101501118A (enExample) |
| TW (1) | TW200831588A (enExample) |
| WO (1) | WO2008019078A1 (enExample) |
Families Citing this family (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2009073441A1 (en) * | 2007-11-30 | 2009-06-11 | E. I. Du Pont De Nemours And Company | Low refractive index composition, abrasion resistant anti-reflective coating, and method for forming abrasion resistant anti-reflective coating |
| US8092905B2 (en) * | 2008-10-10 | 2012-01-10 | E.I Du Pont De Nemours And Company | Compositions containing multifunctional nanoparticles |
| US8557877B2 (en) | 2009-06-10 | 2013-10-15 | Honeywell International Inc. | Anti-reflective coatings for optically transparent substrates |
| EP2524252A2 (en) | 2010-01-13 | 2012-11-21 | 3M Innovative Properties Company | Illumination device having viscoelastic lightguide |
| JP2013539072A (ja) * | 2010-09-16 | 2013-10-17 | エルジー・ケム・リミテッド | 感光性樹脂組成物、ドライフィルムソルダーレジスト及び回路基板 |
| CN102634277A (zh) * | 2011-02-14 | 2012-08-15 | 住龙纳米技术材料(深圳)有限公司 | 用于形成低折射率膜的涂料、低折射率膜的制造方法以及低折射率膜 |
| US9310527B2 (en) | 2011-03-09 | 2016-04-12 | 3M Innovative Properties Company | Antireflective film comprising large particle size fumed silica |
| CN103460079B (zh) * | 2011-04-26 | 2016-01-20 | 大日本印刷株式会社 | 防反射膜、偏振片和图像显示装置 |
| US8864898B2 (en) | 2011-05-31 | 2014-10-21 | Honeywell International Inc. | Coating formulations for optical elements |
| US9711816B2 (en) * | 2011-08-04 | 2017-07-18 | 3M Innovative Properties Company | Low equivalent weight polymers |
| CN103389530A (zh) * | 2012-08-22 | 2013-11-13 | 宁波东旭成化学有限公司 | 一种反射膜 |
| KR101900538B1 (ko) * | 2015-03-31 | 2018-09-20 | 삼성에스디아이 주식회사 | 투명도전체, 이의 제조방법 및 이를 포함하는 광학표시장치 |
| US10544329B2 (en) | 2015-04-13 | 2020-01-28 | Honeywell International Inc. | Polysiloxane formulations and coatings for optoelectronic applications |
| US11248117B2 (en) | 2017-07-20 | 2022-02-15 | 3M Innovative Properties Company | Fluorinated elastomers cured by actinic radiation and methods thereof |
| WO2019126016A1 (en) * | 2017-12-18 | 2019-06-27 | 3M Innovative Properties Company | Fluorinated elastomers cured by actinic radiation and methods thereof |
| EP3749711A1 (en) * | 2018-02-09 | 2020-12-16 | Solvay Specialty Polymers Italy S.p.A. | Fluoroelastomer curable composition |
| US12234389B2 (en) | 2019-10-03 | 2025-02-25 | 3M Innovative Properties Company | Silicone elastomers by free radical mediated cure |
| CN114630874B (zh) * | 2019-11-04 | 2023-12-05 | 3M创新有限公司 | 包含具有烯键式不饱和基团和电子供体基团的固化剂的含氟聚合物组合物及用其涂覆的基底 |
| CN119661958A (zh) * | 2023-09-21 | 2025-03-21 | 北京小米移动软件有限公司 | 一种组合物、塑胶的制作方法、塑胶、腕带及穿戴式设备 |
Family Cites Families (20)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4491508A (en) * | 1981-06-01 | 1985-01-01 | General Electric Company | Method of preparing curable coating composition from alcohol, colloidal silica, silylacrylate and multiacrylate monomer |
| DE4114598A1 (de) * | 1991-05-04 | 1992-11-05 | Bayer Ag | Unvernetzte copolymerisate mit reaktiven doppelbindungen aus fluormonomeren und nicht konjugierten dienen und verfahren zu ihrer herstellung |
| US5739180A (en) * | 1996-05-02 | 1998-04-14 | Lucent Technologies Inc. | Flat panel displays and methods and substrates therefor |
| JP4240716B2 (ja) * | 1999-02-01 | 2009-03-18 | ユニマテック株式会社 | 含フッ素エラストマー組成物 |
| US6238798B1 (en) * | 1999-02-22 | 2001-05-29 | 3M Innovative Properties Company | Ceramer composition and composite comprising free radically curable fluorochemical component |
| WO2001016234A1 (en) * | 1999-08-31 | 2001-03-08 | Daikin Industries, Ltd. | Polymer composition crosslinkable with ultraviolet |
| US20040019176A1 (en) * | 2000-08-29 | 2004-01-29 | Takayuki Araki | Curable fluoropolymer, curable resin composition containing the same, and antireflection film |
| US6896958B1 (en) * | 2000-11-29 | 2005-05-24 | Nanophase Technologies Corporation | Substantially transparent, abrasion-resistant films containing surface-treated nanocrystalline particles |
| US7351471B2 (en) * | 2000-12-06 | 2008-04-01 | 3M Innovative Properties Company | Fluoropolymer coating compositions with multifunctional fluoroalkyl crosslinkers for anti-reflective polymer films |
| WO2003027189A1 (fr) * | 2001-09-04 | 2003-04-03 | Dai Nippon Printing Co., Ltd. | Composition de revetement, revetement forme a partir de celle-ci, revetement antireflet, film antireflet et dispositif d'affichage d'image |
| EP2219051A1 (en) * | 2002-08-15 | 2010-08-18 | Fujifilm Corporation | Antireflection film, polarizing plate and image display device |
| KR101304381B1 (ko) * | 2003-08-28 | 2013-09-11 | 다이니폰 인사츠 가부시키가이샤 | 반사 방지 적층체의 제조방법 |
| TWI388876B (zh) * | 2003-12-26 | 2013-03-11 | Fujifilm Corp | 抗反射膜、偏光板，其製造方法，液晶顯示元件，液晶顯示裝置，及影像顯示裝置 |
| JP2005283872A (ja) * | 2004-03-29 | 2005-10-13 | Fuji Photo Film Co Ltd | 反射防止能付き偏光板、その製造方法、およびそれを用いた画像表示装置 |
| WO2006007243A1 (en) * | 2004-06-30 | 2006-01-19 | Dow Corning Corporation | Fluorocarbon elastomer silicone vulcanizates |
| JP4895343B2 (ja) * | 2004-09-22 | 2012-03-14 | 富士フイルム株式会社 | 反射防止フィルム、その製造方法、偏光板、及び画像表示装置 |
| US7323514B2 (en) * | 2004-12-30 | 2008-01-29 | 3M Innovative Properties Company | Low refractive index fluoropolymer coating compositions for use in antireflective polymer films |
| US20060147177A1 (en) * | 2004-12-30 | 2006-07-06 | Naiyong Jing | Fluoropolymer coating compositions with olefinic silanes for anti-reflective polymer films |
| US7691459B2 (en) * | 2005-03-22 | 2010-04-06 | Fujifilm Corporation | Inorganic fine particle-containing composition, optical film, antireflection film and polarizing film, and polarizing plate and display device using the same |
| US7553543B2 (en) * | 2005-12-16 | 2009-06-30 | E. I. Du Pont De Nemours And Company | Composite structure having a fluoroelastomeric anti-reflective coating with non-fluorinated cross-linking |
-
2007
- 2007-08-01 US US11/888,382 patent/US20080032052A1/en not_active Abandoned
- 2007-08-03 JP JP2009522887A patent/JP2009545652A/ja active Pending
- 2007-08-03 CN CNA2007800291556A patent/CN101501118A/zh active Pending
- 2007-08-03 KR KR1020097003729A patent/KR20090046856A/ko not_active Withdrawn
- 2007-08-03 TW TW096128693A patent/TW200831588A/zh unknown
- 2007-08-03 WO PCT/US2007/017362 patent/WO2008019078A1/en not_active Ceased
Also Published As
| Publication number | Publication date |
|---|---|
| JP2009545652A (ja) | 2009-12-24 |
| US20080032052A1 (en) | 2008-02-07 |
| KR20090046856A (ko) | 2009-05-11 |
| CN101501118A (zh) | 2009-08-05 |
| WO2008019078A1 (en) | 2008-02-14 |
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