CN101484320B - 涂布非连续特征图案的方法和设备 - Google Patents

涂布非连续特征图案的方法和设备 Download PDF

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Publication number
CN101484320B
CN101484320B CN2007800243213A CN200780024321A CN101484320B CN 101484320 B CN101484320 B CN 101484320B CN 2007800243213 A CN2007800243213 A CN 2007800243213A CN 200780024321 A CN200780024321 A CN 200780024321A CN 101484320 B CN101484320 B CN 101484320B
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CN
China
Prior art keywords
features
discontinuous
imaging
pattern
receiver element
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Expired - Fee Related
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CN2007800243213A
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English (en)
Chinese (zh)
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CN101484320A (zh
Inventor
G·西尔顿
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Creo Inc
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Creo Inc
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Publication of CN101484320A publication Critical patent/CN101484320A/zh
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Publication of CN101484320B publication Critical patent/CN101484320B/zh
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41MPRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M5/00Duplicating or marking methods; Sheet materials for use therein
    • B41M5/025Duplicating or marking methods; Sheet materials for use therein by transferring ink from the master sheet
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41MPRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M5/00Duplicating or marking methods; Sheet materials for use therein
    • B41M5/26Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used
    • B41M5/382Contact thermal transfer or sublimation processes
    • B41M5/38207Contact thermal transfer or sublimation processes characterised by aspects not provided for in groups B41M5/385 - B41M5/395
    • B41M5/38221Apparatus features
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41MPRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M5/00Duplicating or marking methods; Sheet materials for use therein
    • B41M5/26Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41MPRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M5/00Duplicating or marking methods; Sheet materials for use therein
    • B41M5/26Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used
    • B41M5/265Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used for the production of optical filters or electrical components
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/20Filters
    • G02B5/201Filters in the form of arrays
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1335Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509Filters, e.g. light shielding masks
    • G02F1/133514Colour filters
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20Exposure; Apparatus therefor
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41MPRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M2205/00Printing methods or features related to printing methods; Location or type of the layers
    • B41M2205/02Dye diffusion thermal transfer printing (D2T2)
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41MPRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M2205/00Printing methods or features related to printing methods; Location or type of the layers
    • B41M2205/06Printing methods or features related to printing methods; Location or type of the layers relating to melt (thermal) mass transfer
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F2201/00Constructional arrangements not provided for in groups G02F1/00 - G02F7/00
    • G02F2201/52RGB geometrical arrangements
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10Deposition of organic active material
    • H10K71/12Deposition of organic active material using liquid deposition, e.g. spin coating
    • H10K71/13Deposition of organic active material using liquid deposition, e.g. spin coating using printing techniques, e.g. ink-jet printing or screen printing
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10Deposition of organic active material
    • H10K71/18Deposition of organic active material using non-liquid printing techniques, e.g. thermal transfer printing from a donor sheet

Landscapes

  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • General Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Engineering & Computer Science (AREA)
  • Electronic Switches (AREA)
  • Facsimile Heads (AREA)
  • Optical Filters (AREA)
  • Image Processing (AREA)
  • Thermal Transfer Or Thermal Recording In General (AREA)
  • Electroluminescent Light Sources (AREA)
  • Apparatus For Radiation Diagnosis (AREA)
  • Color Television Image Signal Generators (AREA)
CN2007800243213A 2006-06-30 2007-06-18 涂布非连续特征图案的方法和设备 Expired - Fee Related CN101484320B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US80645206P 2006-06-30 2006-06-30
US60/806,452 2006-06-30
PCT/IB2007/001631 WO2008004048A2 (en) 2006-06-30 2007-06-18 Methods and apparatus for applying patterns of non-contiguous features

Publications (2)

Publication Number Publication Date
CN101484320A CN101484320A (zh) 2009-07-15
CN101484320B true CN101484320B (zh) 2012-12-05

Family

ID=38894930

Family Applications (2)

Application Number Title Priority Date Filing Date
CN2007800243213A Expired - Fee Related CN101484320B (zh) 2006-06-30 2007-06-18 涂布非连续特征图案的方法和设备
CNA2007800299134A Pending CN101522430A (zh) 2006-06-30 2007-06-18 用多个成像头形成图像

Family Applications After (1)

Application Number Title Priority Date Filing Date
CNA2007800299134A Pending CN101522430A (zh) 2006-06-30 2007-06-18 用多个成像头形成图像

Country Status (8)

Country Link
US (2) US8305409B2 (https=)
JP (2) JP5334847B2 (https=)
KR (2) KR20090024205A (https=)
CN (2) CN101484320B (https=)
DE (2) DE112007001591T5 (https=)
GB (2) GB2452192A (https=)
TW (2) TW200817200A (https=)
WO (2) WO2008004048A2 (https=)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE112007001591T5 (de) * 2006-06-30 2009-05-07 Kodak Graphic Communications Canada Company, Burnaby Formen eines Bildes mit einer Vielzahl von Abbildungsköpfen
WO2008004047A2 (en) * 2006-06-30 2008-01-10 Kodak Graphic Communications Canada Methods and apparatus for selecting and applying non-contiguous features in a pattern
KR20090034351A (ko) * 2006-07-28 2009-04-07 코닥 그래픽 커뮤니케이션즈 캐나다 캄파니 피쳐의 증진된 이미지화
KR20100015935A (ko) * 2007-04-26 2010-02-12 코닥 그래픽 커뮤니케이션즈 캐나다 캄파니 복수의 스캔으로 피쳐를 이미징하는 방법
CN106371241B (zh) * 2010-07-26 2021-09-28 伊英克公司 用于在显示器基板上形成滤光元件的方法、设备和系统
US9269149B2 (en) 2014-05-08 2016-02-23 Orbotech Ltd. Calibration of a direct-imaging system
DE102016225484B3 (de) * 2016-12-19 2018-06-07 Carl Zeiss Industrielle Messtechnik Gmbh Verfahren und optischer Sensor zur Bestimmung mindestens einer Koordinate mindestens eines Messobjekts

Citations (5)

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US5691759A (en) * 1996-01-05 1997-11-25 Hewlett-Packard Company Method and apparatus for interleaving raster scan lines in a multi-beam laser imaging device
EP0947950A2 (en) * 1998-04-03 1999-10-06 Hewlett-Packard Company Method and apparatus for interleaving raster scan lines in a multi-beam laser imaging device
US6597388B2 (en) * 2001-06-21 2003-07-22 Kodak Polychrome Graphics, Llc Laser-induced thermal imaging with masking
US6765604B2 (en) * 2001-02-22 2004-07-20 Heidelberger Druckmaschinen Ag Banding-reduced imaging of a printing form
CN1519652A (zh) * 2003-01-31 2004-08-11 ������������ʽ���� 投影曝光用掩模、投影曝光装置、及投影曝光方法

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US4900130A (en) 1988-10-07 1990-02-13 Eastman Kodak Company Method of scanning
US5278578A (en) 1989-12-18 1994-01-11 Eastman Kodak Company Thermal printer capable of using dummy lines to prevent banding
US5164742A (en) 1989-12-18 1992-11-17 Eastman Kodak Company Thermal printer
US5220348A (en) * 1991-08-23 1993-06-15 Eastman Kodak Company Electronic drive circuit for multi-laser thermal printer
US5517359A (en) 1995-01-23 1996-05-14 Gelbart; Daniel Apparatus for imaging light from a laser diode onto a multi-channel linear light valve
US5724086A (en) * 1995-05-12 1998-03-03 Eastman Kodak Company Printhead having data channels with revisable addresses for interleaving scan lines
US5808655A (en) * 1995-05-12 1998-09-15 Eastman Kodak Company Interleaving thermal printing with discontiguous dye-transfer tracks on an individual multiple-source printhead pass
US6271957B1 (en) * 1998-05-29 2001-08-07 Affymetrix, Inc. Methods involving direct write optical lithography
DE10031915A1 (de) 2000-06-30 2002-01-10 Heidelberger Druckmasch Ag Kompakte Mehrstrahllaserlichtquelle und Interleafrasterscanlinien-Verfahren zur Belichtung von Druckplatten
JP2002103597A (ja) * 2000-07-25 2002-04-09 Sony Corp プリンタ及びプリンタヘッド
US6582875B1 (en) * 2002-01-23 2003-06-24 Eastman Kodak Company Using a multichannel linear laser light beam in making OLED devices by thermal transfer
US6900826B2 (en) 2002-02-19 2005-05-31 Presstek, Inc. Multiple resolution helical imaging system and method
JP2003255552A (ja) * 2002-03-06 2003-09-10 Nec Corp レーザ照射装置並びに走査レーザ光を用いた露光方法及び走査レーザ光を用いたカラーフィルタの製造方法
JP4355170B2 (ja) * 2002-05-17 2009-10-28 コダック グラフィック コミュニケーションズ カナダ カンパニー 高速フラットベッドスキャナ
TW200537259A (en) * 2004-01-28 2005-11-16 Du Pont Method for imaging regular patterns
WO2008004047A2 (en) * 2006-06-30 2008-01-10 Kodak Graphic Communications Canada Methods and apparatus for selecting and applying non-contiguous features in a pattern
DE112007001591T5 (de) * 2006-06-30 2009-05-07 Kodak Graphic Communications Canada Company, Burnaby Formen eines Bildes mit einer Vielzahl von Abbildungsköpfen

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5691759A (en) * 1996-01-05 1997-11-25 Hewlett-Packard Company Method and apparatus for interleaving raster scan lines in a multi-beam laser imaging device
EP0947950A2 (en) * 1998-04-03 1999-10-06 Hewlett-Packard Company Method and apparatus for interleaving raster scan lines in a multi-beam laser imaging device
US6765604B2 (en) * 2001-02-22 2004-07-20 Heidelberger Druckmaschinen Ag Banding-reduced imaging of a printing form
US6597388B2 (en) * 2001-06-21 2003-07-22 Kodak Polychrome Graphics, Llc Laser-induced thermal imaging with masking
CN1519652A (zh) * 2003-01-31 2004-08-11 ������������ʽ���� 投影曝光用掩模、投影曝光装置、及投影曝光方法

Also Published As

Publication number Publication date
GB0822905D0 (en) 2009-01-21
WO2008004048A8 (en) 2009-02-05
WO2008004046A3 (en) 2008-03-13
CN101522430A (zh) 2009-09-02
US20100039490A1 (en) 2010-02-18
JP2009543109A (ja) 2009-12-03
GB2452192A (en) 2009-02-25
KR101405701B1 (ko) 2014-06-10
US8305409B2 (en) 2012-11-06
TW200817200A (en) 2008-04-16
TW200811484A (en) 2008-03-01
DE112007001591T5 (de) 2009-05-07
US8199175B2 (en) 2012-06-12
CN101484320A (zh) 2009-07-15
WO2008004048A3 (en) 2008-03-13
WO2008004048A2 (en) 2008-01-10
WO2008004046A2 (en) 2008-01-10
KR20090024216A (ko) 2009-03-06
GB2452205B (en) 2011-04-13
GB2452205A (en) 2009-02-25
GB0822048D0 (en) 2009-01-07
KR20090024205A (ko) 2009-03-06
TWI357856B (en) 2012-02-11
US20100188472A1 (en) 2010-07-29
JP2009543110A (ja) 2009-12-03
JP5334847B2 (ja) 2013-11-06
DE112007001551T5 (de) 2009-05-14

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Granted publication date: 20121205

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CF01 Termination of patent right due to non-payment of annual fee