CN101471278A - 静电夹盘和基板温度调节固定装置 - Google Patents

静电夹盘和基板温度调节固定装置 Download PDF

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Publication number
CN101471278A
CN101471278A CNA2008101765999A CN200810176599A CN101471278A CN 101471278 A CN101471278 A CN 101471278A CN A2008101765999 A CNA2008101765999 A CN A2008101765999A CN 200810176599 A CN200810176599 A CN 200810176599A CN 101471278 A CN101471278 A CN 101471278A
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China
Prior art keywords
substrate
electrostatic chuck
substrate temperature
temperature adjustment
outer edge
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Pending
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CNA2008101765999A
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English (en)
Chinese (zh)
Inventor
儿山智昭
玉川晃树
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Shinko Electric Co Ltd
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Shinko Electric Co Ltd
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Publication of CN101471278A publication Critical patent/CN101471278A/zh
Pending legal-status Critical Current

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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/70—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
    • H10P72/76—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using mechanical means, e.g. clamps or pinches
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/70—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
    • H10P72/72—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using electrostatic chucks

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  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
CNA2008101765999A 2007-12-26 2008-12-25 静电夹盘和基板温度调节固定装置 Pending CN101471278A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007333867A JP4974873B2 (ja) 2007-12-26 2007-12-26 静電チャック及び基板温調固定装置
JP2007333867 2007-12-26

Publications (1)

Publication Number Publication Date
CN101471278A true CN101471278A (zh) 2009-07-01

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US (1) US8199454B2 (https=)
JP (1) JP4974873B2 (https=)
KR (1) KR101458990B1 (https=)
CN (1) CN101471278A (https=)

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CN103794527A (zh) * 2012-10-30 2014-05-14 中微半导体设备(上海)有限公司 静电卡盘加热方法及系统
CN104008957A (zh) * 2013-02-22 2014-08-27 中微半导体设备(上海)有限公司 基片补偿刻蚀的方法
CN104520770A (zh) * 2012-04-23 2015-04-15 Asml荷兰有限公司 静电夹持装置、光刻设备和方法
CN105474381A (zh) * 2014-07-23 2016-04-06 应用材料公司 可调谐温度受控的基板支撑组件
CN106024610A (zh) * 2016-07-28 2016-10-12 京东方科技集团股份有限公司 一种下部电极、干法刻蚀设备
CN107615474A (zh) * 2015-04-02 2018-01-19 株式会社爱发科 吸附装置、吸附装置的制造方法、以及真空处理装置
CN108364845A (zh) * 2018-03-20 2018-08-03 武汉华星光电技术有限公司 一种干法刻蚀设备
CN108359957A (zh) * 2010-10-29 2018-08-03 应用材料公司 用于物理气相沉积腔室的沉积环及静电夹盘
CN110149071A (zh) * 2019-05-22 2019-08-20 夏义捷 一种库仑力电机及直线加速装置
CN110289241A (zh) * 2019-07-04 2019-09-27 北京北方华创微电子装备有限公司 静电卡盘及其制作方法、工艺腔室和半导体处理设备
CN111212931A (zh) * 2017-10-27 2020-05-29 应用材料公司 具有空间分离的单个晶片处理环境

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JP7209515B2 (ja) * 2018-11-27 2023-01-20 東京エレクトロン株式会社 基板保持機構および成膜装置
TWI794131B (zh) * 2018-12-21 2023-02-21 日商Ｔｏｔｏ股份有限公司 靜電吸盤
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CN108359957A (zh) * 2010-10-29 2018-08-03 应用材料公司 用于物理气相沉积腔室的沉积环及静电夹盘
CN104520770A (zh) * 2012-04-23 2015-04-15 Asml荷兰有限公司 静电夹持装置、光刻设备和方法
US9429857B2 (en) 2012-04-23 2016-08-30 Asml Netherlands B.V. Electrostatic clamp, lithographic apparatus and method
CN104520770B (zh) * 2012-04-23 2017-01-18 Asml荷兰有限公司 静电夹持装置、光刻设备和方法
CN103794527B (zh) * 2012-10-30 2016-08-24 中微半导体设备(上海)有限公司 静电卡盘加热方法
CN103794527A (zh) * 2012-10-30 2014-05-14 中微半导体设备(上海)有限公司 静电卡盘加热方法及系统
CN104008957A (zh) * 2013-02-22 2014-08-27 中微半导体设备(上海)有限公司 基片补偿刻蚀的方法
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CN105474381B (zh) * 2014-07-23 2018-06-05 应用材料公司 可调谐温度受控的基板支撑组件
CN107615474A (zh) * 2015-04-02 2018-01-19 株式会社爱发科 吸附装置、吸附装置的制造方法、以及真空处理装置
CN107615474B (zh) * 2015-04-02 2020-12-01 株式会社爱发科 吸附装置、吸附装置的制造方法、以及真空处理装置
CN106024610B (zh) * 2016-07-28 2019-06-07 京东方科技集团股份有限公司 一种下部电极、干法刻蚀设备
CN106024610A (zh) * 2016-07-28 2016-10-12 京东方科技集团股份有限公司 一种下部电极、干法刻蚀设备
CN111212931A (zh) * 2017-10-27 2020-05-29 应用材料公司 具有空间分离的单个晶片处理环境
CN108364845A (zh) * 2018-03-20 2018-08-03 武汉华星光电技术有限公司 一种干法刻蚀设备
WO2019179327A1 (zh) * 2018-03-20 2019-09-26 武汉华星光电技术有限公司 干法刻蚀设备
CN110149071A (zh) * 2019-05-22 2019-08-20 夏义捷 一种库仑力电机及直线加速装置
CN110289241A (zh) * 2019-07-04 2019-09-27 北京北方华创微电子装备有限公司 静电卡盘及其制作方法、工艺腔室和半导体处理设备
CN110289241B (zh) * 2019-07-04 2022-03-22 北京北方华创微电子装备有限公司 静电卡盘及其制作方法、工艺腔室和半导体处理设备

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Publication number Publication date
JP4974873B2 (ja) 2012-07-11
KR20090071439A (ko) 2009-07-01
JP2009158664A (ja) 2009-07-16
KR101458990B1 (ko) 2014-11-07
US8199454B2 (en) 2012-06-12
US20090168291A1 (en) 2009-07-02

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