CN101419398B - 掩模坯板的制造方法及光掩模的制造方法 - Google Patents

掩模坯板的制造方法及光掩模的制造方法 Download PDF

Info

Publication number
CN101419398B
CN101419398B CN2008101778611A CN200810177861A CN101419398B CN 101419398 B CN101419398 B CN 101419398B CN 2008101778611 A CN2008101778611 A CN 2008101778611A CN 200810177861 A CN200810177861 A CN 200810177861A CN 101419398 B CN101419398 B CN 101419398B
Authority
CN
China
Prior art keywords
liquid
substrate
contact
resist
coating nozzle
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN2008101778611A
Other languages
English (en)
Chinese (zh)
Other versions
CN101419398A (zh
Inventor
浅川敬司
宫田凉司
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hoya Corp
Hoya Electronics Malaysia Sdn Bhd
Original Assignee
Hoya Corp
Hoya Electronics Malaysia Sdn Bhd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoya Corp, Hoya Electronics Malaysia Sdn Bhd filed Critical Hoya Corp
Publication of CN101419398A publication Critical patent/CN101419398A/zh
Application granted granted Critical
Publication of CN101419398B publication Critical patent/CN101419398B/zh
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Materials For Photolithography (AREA)
CN2008101778611A 2007-06-13 2008-06-12 掩模坯板的制造方法及光掩模的制造方法 Active CN101419398B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2007-155937 2007-06-13
JP2007155937A JP5073375B2 (ja) 2007-06-13 2007-06-13 マスクブランクの製造方法及びフォトマスクの製造方法
JP2007155937 2007-06-13

Publications (2)

Publication Number Publication Date
CN101419398A CN101419398A (zh) 2009-04-29
CN101419398B true CN101419398B (zh) 2012-06-20

Family

ID=40238700

Family Applications (1)

Application Number Title Priority Date Filing Date
CN2008101778611A Active CN101419398B (zh) 2007-06-13 2008-06-12 掩模坯板的制造方法及光掩模的制造方法

Country Status (5)

Country Link
JP (1) JP5073375B2 (https=)
KR (1) KR101487550B1 (https=)
CN (1) CN101419398B (https=)
MY (1) MY150117A (https=)
TW (1) TWI439803B (https=)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5086714B2 (ja) * 2007-07-13 2012-11-28 Ｈｏｙａ株式会社 マスクブランクの製造方法及びフォトマスクの製造方法
JP2011013321A (ja) * 2009-06-30 2011-01-20 Hoya Corp フォトマスクブランクの製造方法、フォトマスクの製造方法及び塗布装置
JP6659422B2 (ja) * 2016-03-29 2020-03-04 アルバック成膜株式会社 塗布装置、マスクブランクの製造方法
CN114082602A (zh) * 2021-11-30 2022-02-25 Tcl华星光电技术有限公司 涂胶机构以及涂胶装置

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4445985A1 (de) * 1994-12-22 1996-06-27 Steag Micro Tech Gmbh Verfahren und Vorrichtung zur Belackung oder Beschichtung eines Substrats
JP2000343015A (ja) * 1999-06-08 2000-12-12 Dainippon Screen Mfg Co Ltd 塗布装置
JP3252325B2 (ja) * 1999-10-29 2002-02-04 株式会社ヒラノテクシード 塗工方法及び塗工装置
JP3808741B2 (ja) * 2001-10-01 2006-08-16 東京エレクトロン株式会社 処理装置
KR20070017228A (ko) * 2003-07-17 2007-02-08 호야 가부시키가이샤 레지스트막 부착 기판의 제조방법
JP2005051220A (ja) * 2003-07-17 2005-02-24 Hoya Corp レジスト膜付基板の製造方法
JP2005246274A (ja) * 2004-03-05 2005-09-15 Nidek Co Ltd 塗工方法及び塗工装置
JP4169719B2 (ja) * 2004-03-30 2008-10-22 Ｈｏｙａ株式会社 レジスト膜付基板の製造方法
JP4410063B2 (ja) * 2004-09-06 2010-02-03 東京エレクトロン株式会社 基板処理装置
JP4673157B2 (ja) * 2004-10-01 2011-04-20 株式会社ヒラノテクシード 塗工装置
JP2006269599A (ja) * 2005-03-23 2006-10-05 Sony Corp パターン形成方法、有機電界効果型トランジスタの製造方法、及び、フレキシブルプリント回路板の製造方法

Also Published As

Publication number Publication date
TWI439803B (zh) 2014-06-01
CN101419398A (zh) 2009-04-29
KR101487550B1 (ko) 2015-02-26
MY150117A (en) 2013-11-29
JP2008311327A (ja) 2008-12-25
TW200912518A (en) 2009-03-16
KR20080109650A (ko) 2008-12-17
JP5073375B2 (ja) 2012-11-14

Similar Documents

Publication Publication Date Title
JP5111015B2 (ja) 感光性有機物及びその塗布方法並びにこれを用いた有機膜パターンの形成方法及びこの有機膜を有する表示装置
CN101419398B (zh) 掩模坯板的制造方法及光掩模的制造方法
JP4563409B2 (ja) リフロー処理方法およびｔｆｔの製造方法
TW200831982A (en) Dispensing apparatus for manufacturing liquid display panel
CN101308325A (zh) 掩模坯料的制造方法及光掩模的制造方法
KR100796617B1 (ko) 마스크 장치와 마스크 장치의 제조방법 및 이를 이용한유기전계발광표시장치의 제조방법
TWI313672B (https=)
KR20110001945A (ko) 포토마스크 블랭크의 제조 방법, 포토마스크의 제조 방법 및 도포 장치
CN102109700A (zh) 制造平板显示器的设备和方法
JP2008283098A (ja) マスクブランクの製造方法及びフォトマスクの製造方法
KR101412912B1 (ko) 마스크 블랭크의 제조 방법 및 포토 마스크의 제조 방법
JP6659422B2 (ja) 塗布装置、マスクブランクの製造方法
JP2020202228A (ja) マスクブランクの製造方法、塗布装置
KR20090124449A (ko) 약액 분사 노즐 및 이를 이용한 감광액 도포 장치
JP5127127B2 (ja) 塗膜形成方法
JP2010120797A (ja) ガラス基板およびこれを用いたフラットパネルディスプレイ並びにガラス基板の製造方法
CN114721187A (zh) 配向膜的制作方法及液晶显示面板
JP5086714B2 (ja) マスクブランクの製造方法及びフォトマスクの製造方法
JP5169162B2 (ja) 着色フォトレジストの塗布方法及び塗布装置
JP2007271774A (ja) マスクブランク及びフォトマスク
TWI511180B (zh) 薄膜塗佈方法
CN111682032A (zh) 显示面板及其制造方法
KR20070122100A (ko) 슬릿코터
KR20050016831A (ko) 액정표시장치용 도포유닛
JP2001319926A (ja) 成膜装置

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C14 Grant of patent or utility model
GR01 Patent grant