CN101304070B - 磁阻元件、其制造方法和磁性多层膜制造装置 - Google Patents

磁阻元件、其制造方法和磁性多层膜制造装置 Download PDF

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Publication number
CN101304070B
CN101304070B CN200810095658XA CN200810095658A CN101304070B CN 101304070 B CN101304070 B CN 101304070B CN 200810095658X A CN200810095658X A CN 200810095658XA CN 200810095658 A CN200810095658 A CN 200810095658A CN 101304070 B CN101304070 B CN 101304070B
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layer
ferromagnetic
target
pinned layer
sputtering
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CN101304070A (zh
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恒川孝二
D·D·贾雅帕瓦拉
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Canon Anelva Corp
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  • Mram Or Spin Memory Techniques (AREA)
  • Magnetic Heads (AREA)
  • Thin Magnetic Films (AREA)
CN200810095658XA 2007-05-07 2008-05-07 磁阻元件、其制造方法和磁性多层膜制造装置 Active CN101304070B (zh)

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JP2007122367 2007-05-07
JP2007-122367 2007-05-07
JP2008-110434 2008-04-21
JP2008110434A JP2008306169A (ja) 2007-05-07 2008-04-21 磁気抵抗素子、磁気抵抗素子の製造方法及び磁性多層膜作成装置

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CN101304070A CN101304070A (zh) 2008-11-12
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Families Citing this family (10)

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Publication number Priority date Publication date Assignee Title
CN102082018B (zh) * 2009-11-26 2013-10-16 中国科学院物理研究所 一种磁性多层膜单元及其制备和磁矩翻转方法
US8508221B2 (en) * 2010-08-30 2013-08-13 Everspin Technologies, Inc. Two-axis magnetic field sensor having reduced compensation angle for zero offset
US8325448B2 (en) * 2011-02-11 2012-12-04 Headway Technologies, Inc. Pinning field in MR devices despite higher annealing temperature
US20130065075A1 (en) * 2011-09-12 2013-03-14 Klemens Pruegl Magnetoresistive spin valve layer systems
JP2020068214A (ja) * 2017-02-28 2020-04-30 Tdk株式会社 強磁性多層膜、磁気抵抗効果素子、及び強磁性多層膜を製造する方法
US10700267B2 (en) * 2017-11-13 2020-06-30 Tdk Corporation Magnetoresistive element, manufacturing method thereof and magnetic sensor
CN110491990B (zh) * 2019-08-13 2024-09-13 上海新微技术研发中心有限公司 磁存储器件
CN112750944A (zh) * 2019-10-30 2021-05-04 上海磁宇信息科技有限公司 磁性隧道结结构及磁性随机存储器
CN114284428B (zh) * 2021-11-17 2025-09-30 天津理工大学 一种基于pmn-pt的铁电/铁磁复合薄膜的磁电存储元件及其制备方法
CN115101284B (zh) * 2022-08-25 2022-12-20 季华实验室 一种磁性多层膜及其制备方法和应用

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1075651C (zh) * 1994-07-26 2001-11-28 国际商业机器公司 自旋阀磁电阻元件及应用该元件的磁存贮系统

Family Cites Families (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08111315A (ja) * 1994-10-07 1996-04-30 Mitsui Mining & Smelting Co Ltd 磁気抵抗効果多層膜
US6226159B1 (en) * 1999-06-25 2001-05-01 International Business Machines Corporation Multilayered pinned layer of cobalt based films separated by a nickel base film for improved coupling field and GMR for spin valve sensors
JP3473016B2 (ja) * 1999-08-25 2003-12-02 日本電気株式会社 強磁性トンネル接合素子と磁気ヘッドと磁気メモリ
JP4693292B2 (ja) * 2000-09-11 2011-06-01 株式会社東芝 強磁性トンネル接合素子およびその製造方法
JP2002167661A (ja) * 2000-11-30 2002-06-11 Anelva Corp 磁性多層膜作製装置
JP4167428B2 (ja) * 2001-02-01 2008-10-15 株式会社東芝 磁気抵抗効果素子、磁気抵抗効果ヘッド、および磁気記録再生装置
JP4387955B2 (ja) * 2001-04-24 2009-12-24 パナソニック株式会社 磁気抵抗効果素子
JP3551196B2 (ja) * 2001-06-26 2004-08-04 松下電器産業株式会社 磁気抵抗素子の製造方法
JP3607265B2 (ja) * 2001-06-26 2005-01-05 松下電器産業株式会社 磁気抵抗素子
JP3737986B2 (ja) * 2001-07-25 2006-01-25 アルプス電気株式会社 交換結合膜と前記交換結合膜を用いた磁気検出素子
JP2003258335A (ja) * 2002-03-04 2003-09-12 Matsushita Electric Ind Co Ltd トンネル磁気抵抗効果素子の製造方法
JP2003304012A (ja) * 2002-04-10 2003-10-24 Matsushita Electric Ind Co Ltd トンネル磁気抵抗効果素子
JP2003324225A (ja) * 2002-04-26 2003-11-14 Nec Corp 積層フェリ型磁性薄膜並びにそれを使用した磁気抵抗効果素子及び強磁性トンネル素子
JP2004047583A (ja) * 2002-07-09 2004-02-12 Matsushita Electric Ind Co Ltd 磁気抵抗効果素子とこれを用いた磁気ヘッドおよび磁気メモリならびに磁気記録装置
JP2005223193A (ja) * 2004-02-06 2005-08-18 Tdk Corp 磁気抵抗効果素子、薄膜磁気ヘッド、薄膜磁気ヘッドのウエハ、ヘッドジンバルアセンブリ、ヘッドアームアセンブリ、ヘッドスタックアセンブリ、およびハードディスク装置
JP4292128B2 (ja) * 2004-09-07 2009-07-08 キヤノンアネルバ株式会社 磁気抵抗効果素子の製造方法
JP2006156893A (ja) * 2004-12-01 2006-06-15 Tdk Corp 磁気メモリ
JP2006165265A (ja) * 2004-12-07 2006-06-22 Sony Corp 記憶素子及びメモリ
JP4661230B2 (ja) * 2005-01-21 2011-03-30 ソニー株式会社 記憶素子及びメモリ
JP4008478B2 (ja) * 2005-07-13 2007-11-14 Ｔｄｋ株式会社 磁界検出素子、基体、ウエハ、ヘッドジンバルアセンブリ、ハードディスク装置、および磁界検出素子の製造方法
JP2007027493A (ja) * 2005-07-19 2007-02-01 Nec Corp 磁気抵抗効果素子およびその製造方法
JP2007073638A (ja) * 2005-09-05 2007-03-22 Sony Corp 記憶素子及びメモリ

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1075651C (zh) * 1994-07-26 2001-11-28 国际商业机器公司 自旋阀磁电阻元件及应用该元件的磁存贮系统

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JP2010123978A (ja) 2010-06-03
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