CN101283118B - 复合结构物 - Google Patents

复合结构物 Download PDF

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Publication number
CN101283118B
CN101283118B CN2006800375538A CN200680037553A CN101283118B CN 101283118 B CN101283118 B CN 101283118B CN 2006800375538 A CN2006800375538 A CN 2006800375538A CN 200680037553 A CN200680037553 A CN 200680037553A CN 101283118 B CN101283118 B CN 101283118B
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CN
China
Prior art keywords
yttrium oxide
aforementioned
fine particles
structure made
composite structure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
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CN2006800375538A
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English (en)
Chinese (zh)
Other versions
CN101283118A (zh
Inventor
岩泽顺一
西水亮市
鸠野广典
芦泽宏明
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Toto Ltd
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Toto Ltd
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Publication date
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Publication of CN101283118A publication Critical patent/CN101283118A/zh
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Publication of CN101283118B publication Critical patent/CN101283118B/zh
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C30/00—Coating with metallic material characterised only by the composition of the metallic material, i.e. not characterised by the coating process
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C24/00—Coating starting from inorganic powder
    • C23C24/02—Coating starting from inorganic powder by application of pressure only
    • C23C24/04—Impact or kinetic deposition of particles
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F2998/00—Supplementary information concerning processes or compositions relating to powder metallurgy
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
    • C04B2235/02—Composition of constituents of the starting material or of secondary phases of the final product
    • C04B2235/30—Constituents and secondary phases not being of a fibrous nature
    • C04B2235/32—Metal oxides, mixed metal oxides, or oxide-forming salts thereof, e.g. carbonates, nitrates, (oxy)hydroxides, chlorides
    • C04B2235/3293—Tin oxides, stannates or oxide forming salts thereof, e.g. indium tin oxide [ITO]

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Other Surface Treatments For Metallic Materials (AREA)
  • Compounds Of Alkaline-Earth Elements, Aluminum Or Rare-Earth Metals (AREA)
  • Compositions Of Oxide Ceramics (AREA)
CN2006800375538A 2005-10-12 2006-10-10 复合结构物 Expired - Fee Related CN101283118B (zh)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JP2005298223 2005-10-12
JP298223/2005 2005-10-12
JP2006274848A JP5093745B2 (ja) 2005-10-12 2006-10-06 複合構造物
JP274848/2006 2006-10-06
PCT/JP2006/320203 WO2007043520A1 (ja) 2005-10-12 2006-10-10 複合構造物

Publications (2)

Publication Number Publication Date
CN101283118A CN101283118A (zh) 2008-10-08
CN101283118B true CN101283118B (zh) 2011-04-20

Family

ID=37942756

Family Applications (1)

Application Number Title Priority Date Filing Date
CN2006800375538A Expired - Fee Related CN101283118B (zh) 2005-10-12 2006-10-10 复合结构物

Country Status (6)

Country Link
US (1) US7897268B2 (enExample)
JP (1) JP5093745B2 (enExample)
KR (1) KR100983952B1 (enExample)
CN (1) CN101283118B (enExample)
TW (1) TWI315356B (enExample)
WO (1) WO2007043520A1 (enExample)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6084464B2 (ja) * 2010-12-01 2017-02-22 株式会社東芝 プラズマエッチング装置用部品およびプラズマエッチング装置用部品の製造方法
TW201334035A (zh) * 2011-10-06 2013-08-16 Greene Tweed Of Delaware 抗電漿蝕刻膜，承載抗電漿蝕刻膜之物品及相關的方法
US9988702B2 (en) * 2012-05-22 2018-06-05 Kabushiki Kaisha Toshiba Component for plasma processing apparatus and method for manufacturing component for plasma processing apparatus
JP5656036B2 (ja) * 2013-03-28 2015-01-21 Toto株式会社 複合構造物
JP5888458B2 (ja) * 2014-06-26 2016-03-22 Toto株式会社 耐プラズマ性部材及びその製造方法
JP2016008352A (ja) * 2014-06-26 2016-01-18 Toto株式会社 耐プラズマ性部材
JP6808168B2 (ja) * 2015-12-24 2021-01-06 Toto株式会社 耐プラズマ性部材
US11047035B2 (en) 2018-02-23 2021-06-29 Applied Materials, Inc. Protective yttria coating for semiconductor equipment parts
CN113260732A (zh) * 2018-12-05 2021-08-13 京瓷株式会社 等离子体处理装置用构件和具备它的等离子体处理装置
CN113728124B (zh) * 2019-04-26 2023-12-05 京瓷株式会社 等离子体处理装置用构件及等离子体处理装置
KR102490570B1 (ko) * 2022-05-23 2023-01-20 주식회사 코미코 희토류 금속 화합물 분말의 열처리 공정을 이용하여 저 명도의 내플라즈마성 코팅막의 제조방법 및 이에 의해 형성된 내플라즈마성 코팅막
TW202409316A (zh) * 2022-08-19 2024-03-01 日商Ａｇｃ股份有限公司 釔質保護膜及其製造方法以及構件

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3655402B2 (ja) 1996-09-03 2005-06-02 日本放送協会 光メモリ材料およびその製造方法
JP3265481B2 (ja) * 1999-04-23 2002-03-11 独立行政法人産業技術総合研究所 脆性材料超微粒子成形体の低温成形法
CN1243848C (zh) * 1999-10-12 2006-03-01 东陶机器株式会社 复合构造物及其制作方法和制作装置
JP4205912B2 (ja) 2002-08-13 2009-01-07 時田シーブイディーシステムズ株式会社 透明な酸化イットリウム膜とその製造方法
JP4006535B2 (ja) 2003-11-25 2007-11-14 独立行政法人産業技術総合研究所 半導体または液晶製造装置部材およびその製造方法
JP3864958B2 (ja) * 2004-02-02 2007-01-10 東陶機器株式会社 耐プラズマ性を有する半導体製造装置用部材およびその作製方法
JP2005217349A (ja) 2004-02-02 2005-08-11 Toto Ltd 耐プラズマ性を有する半導体製造装置用部材およびその作製方法
JP2005217350A (ja) 2004-02-02 2005-08-11 Toto Ltd 耐プラズマ性を有する半導体製造装置用部材およびその作製方法
TW200724506A (en) * 2005-10-07 2007-07-01 Ohara Kk Inorganic composition
JP2007109828A (ja) * 2005-10-12 2007-04-26 Toto Ltd 耐プラズマ性部材
JP2007109827A (ja) * 2005-10-12 2007-04-26 Toto Ltd 静電チャック

Also Published As

Publication number Publication date
US20090233126A1 (en) 2009-09-17
US7897268B2 (en) 2011-03-01
WO2007043520A1 (ja) 2007-04-19
KR20080044335A (ko) 2008-05-20
JP5093745B2 (ja) 2012-12-12
CN101283118A (zh) 2008-10-08
TWI315356B (en) 2009-10-01
KR100983952B1 (ko) 2010-09-27
JP2007131943A (ja) 2007-05-31
TW200734485A (en) 2007-09-16

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Granted publication date: 20110420