CN101258263B - 溅射靶、透明导电膜及透明电极 - Google Patents
溅射靶、透明导电膜及透明电极 Download PDFInfo
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- CN101258263B CN101258263B CN2006800322564A CN200680032256A CN101258263B CN 101258263 B CN101258263 B CN 101258263B CN 2006800322564 A CN2006800322564 A CN 2006800322564A CN 200680032256 A CN200680032256 A CN 200680032256A CN 101258263 B CN101258263 B CN 101258263B
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- Non-Insulated Conductors (AREA)
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Applications Claiming Priority (7)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP253986/2005 | 2005-09-01 | ||
JP2005253986A JP4933756B2 (ja) | 2005-09-01 | 2005-09-01 | スパッタリングターゲット |
JP2005271665A JP4947942B2 (ja) | 2005-09-20 | 2005-09-20 | スパッタリングターゲット |
JP271665/2005 | 2005-09-20 | ||
JP303024/2005 | 2005-10-18 | ||
JP2005303024A JP4804867B2 (ja) | 2005-10-18 | 2005-10-18 | 透明導電膜、透明電極、電極基板及びその製造方法 |
PCT/JP2006/317135 WO2007026783A1 (ja) | 2005-09-01 | 2006-08-30 | スパッタリングターゲット、透明導電膜及び透明電極 |
Related Child Applications (2)
Application Number | Title | Priority Date | Filing Date |
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CN2011102672334A Division CN102337505A (zh) | 2005-09-01 | 2006-08-30 | 溅射靶、透明导电膜、透明电极和电极基板及其制造方法 |
CN2013103616148A Division CN103469167A (zh) | 2005-09-01 | 2006-08-30 | 溅射靶、透明导电膜、透明电极和电极基板及其制造方法 |
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CN101258263A CN101258263A (zh) | 2008-09-03 |
CN101258263B true CN101258263B (zh) | 2012-01-11 |
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CN2006800322564A Active CN101258263B (zh) | 2005-09-01 | 2006-08-30 | 溅射靶、透明导电膜及透明电极 |
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CN (1) | CN101258263B (ja) |
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JP4846726B2 (ja) * | 2005-09-20 | 2011-12-28 | 出光興産株式会社 | スパッタリングターゲット、透明導電膜及び透明電極 |
US8753548B2 (en) * | 2008-12-12 | 2014-06-17 | Idemitsu Kosan Co., Ltd. | Composite oxide sintered body and sputtering target comprising same |
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