CN101166681B - Reticle pod with isolation system - Google Patents
Reticle pod with isolation system Download PDFInfo
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- CN101166681B CN101166681B CN2006800139751A CN200680013975A CN101166681B CN 101166681 B CN101166681 B CN 101166681B CN 2006800139751 A CN2006800139751 A CN 2006800139751A CN 200680013975 A CN200680013975 A CN 200680013975A CN 101166681 B CN101166681 B CN 101166681B
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- China
- Prior art keywords
- pedestal
- capping
- light shield
- auxiliary box
- box
- Prior art date
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
- H01L21/6735—Closed carriers
- H01L21/67353—Closed carriers specially adapted for a single substrate
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65D—CONTAINERS FOR STORAGE OR TRANSPORT OF ARTICLES OR MATERIALS, e.g. BAGS, BARRELS, BOTTLES, BOXES, CANS, CARTONS, CRATES, DRUMS, JARS, TANKS, HOPPERS, FORWARDING CONTAINERS; ACCESSORIES, CLOSURES, OR FITTINGS THEREFOR; PACKAGING ELEMENTS; PACKAGES
- B65D85/00—Containers, packaging elements or packages, specially adapted for particular articles or materials
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65D—CONTAINERS FOR STORAGE OR TRANSPORT OF ARTICLES OR MATERIALS, e.g. BAGS, BARRELS, BOTTLES, BOXES, CANS, CARTONS, CRATES, DRUMS, JARS, TANKS, HOPPERS, FORWARDING CONTAINERS; ACCESSORIES, CLOSURES, OR FITTINGS THEREFOR; PACKAGING ELEMENTS; PACKAGES
- B65D85/00—Containers, packaging elements or packages, specially adapted for particular articles or materials
- B65D85/30—Containers, packaging elements or packages, specially adapted for particular articles or materials for articles particularly sensitive to damage by shock or pressure
- B65D85/38—Containers, packaging elements or packages, specially adapted for particular articles or materials for articles particularly sensitive to damage by shock or pressure for delicate optical, measuring, calculating or control apparatus
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/66—Containers specially adapted for masks, mask blanks or pellicles; Preparation thereof
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
- G03F7/70741—Handling masks outside exposure position, e.g. reticle libraries
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
- H01L21/6735—Closed carriers
- H01L21/67359—Closed carriers specially adapted for containing masks, reticles or pellicles
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
- H01L21/6735—Closed carriers
- H01L21/67369—Closed carriers characterised by shock absorbing elements, e.g. retainers or cushions
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
- H01L21/6735—Closed carriers
- H01L21/67376—Closed carriers characterised by sealing arrangements
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
- H01L21/6735—Closed carriers
- H01L21/67386—Closed carriers characterised by the construction of the closed carrier
Abstract
The present invention provides a reticle container that is equipped with a secondary container which houses the reticle and is housed in the primary container. The secondary container is held within the primary container with shock and vibration isolation members so that the secondary container has multiple degrees of freedom of motion within the primary container. The reticle is secured inside the secondary container such that shock and vibration transmission from the reticle container to the reticle is substantially attenuated.
Description
Related application
The application's case advocate based on filed an application on February 27th, 2005 the 60/657th, file an application in No. 616 U.S. Provisional Application cases, on February 27th, 2005 the 60/657th, the right of the U.S. Provisional Application case (attorney docket phnl is 2267.1110US01) that the numbering of filing an application in No. 355 U.S. Provisional Application cases and on February 18th, 2006 is not yet known, these U.S. Provisional Application cases all are incorporated herein in full with way of reference.
Technical field
The present invention relates to substrate carrier, and in particular to treater carrier and transportation utensil, more specifically relate to the light shield container.
Background technology
Photolithography is one of them processing step that usually runs into when processing silicon wafer in semiconductor application.In photolithography, depositing coating photo sensitivity liquid polymers or photoresist on the wafer surface of silicon nitride, and using subsequently the template with expected pattern to make wafer surface optionally be exposed to radiant.Usually, make UV-irradiation cross mask or light shield or reflect from the surface of described mask or light shield, so that expected pattern is projected on the wafer that is coated with photoresist.Through the photoresist of overexposure part, chemical modification can occur, and unaffected when removing unexposed photoresist at the work that makes subsequently wafer stand chemical media, thereby stay the photoresist of the modification that just presents the mask pattern shape on wafer.Usually, make wafer stand etch process, removing the nitride layer part that is exposed, thereby stay the nitride pattern that just presents mask design on wafer.
Make chip more and more less and/or that logic density is more and more higher and be the trend in described industry, this just need to have more and more less live width becoming gradually on large wafer.Obviously, the fine degree of patterning is carried out on the light shield surface and degree that described pattern can verily be copied on wafer surface is the factor of the quality of the final semiconductor product of impact.The resolution that pattern can be reproduced on wafer surface depends on ultraviolet light wavelength used when pattern being projected on the wafer surface that scribbles photoresist.The lithography tool of prior art is to use wavelength to be the DUV of 193nm, and it makes minimum feature size can reach the 100nm order of magnitude.The instrument of developing at present uses the extreme ultraviolet light (Extreme Ultraviolet, EUV) of 157nm, and it makes body resolution can reach the following size of 70nm.
Light shield is very smooth glass board, and it comprises the pattern that will be reproduced on wafer.Typical light shield backing material is quartzy.Because the key element of modern integrated circuits has very little size, thereby the significant surface (being patterned surface) that makes light shield is upper most important without pollutants, otherwise in treating process, these pollutantss may damage described surface or make the image distorted that is projected on photoresist layer, thereby cause the quality of final products to make us and can't accept.Usually, during as photoetching process a part of, the critical particle diameter of non-patterned surface and patterned surface is respectively 0.1 μ m and 0.03 μ m as EUV.Usually, scribble optically transparent film on the patterned surface of light shield, described film is made by nitrocellulose usually, and it is pasted on framework and by described frame supported, and is pasted on light shield.Its effect is isolated pollutants and reduces the printing defects that may be caused by these pollutantss that migrate on the plane of delineation.Yet peculiar to make the light transmission cross light shield different from the DUV photolithography, and EUV extremely far away is the reflection that utilizes on patterned surface.At present, do not provide transparent light shield protective film material to EUV in affiliated technical field.Therefore, the reflective light mask (light shield) that adopts in the EUV photolithography is more easily polluted and is damaged more than light shield used in conventional photolithography.This kind situation is to being exclusively used in any container that the photolithographic light shield of EUV designs and having proposed higher functional requirement for holding, store, transport and transporting.
Obviously, in view of the lip-deep accurate body of mask patternization easily is damaged because of cliding friction and wearing and tearing, thereby make, process, transport, carry, unnecessary or unexpected contact occurs is very disadvantageous for transportation or memory period.Secondly, the lip-deep any particle contamination of light shield all might make light shield damage is enough to have a strong impact on any final products that use this light shield to obtain by in treating process.In processing, transport and transporting process, may produce particulate within holding the controlled environment of light shield.Cliding friction and the wearing and tearing that cause thus are exactly that a contaminate particulate is originated.In transportation, for example light shield its desired position of slipping away in the light shield container is another particulate source.When taking out from container light shield with automated manner and being located in treatment facility, this kind light shield of offing normal also might misplace, thereby might cause the quality of final products unpredictable.The chance of placing from container and shifting out the cliding friction of light shield to little shadow device procedures and also can cause particulate to produce and pollute.At last, the vibrations of container and vibration may be passed to light shield and hold the assembly of light shield, thereby cause friction and produce together particulate.
Traditionally, light shield is be transported to the fabrication shop that will use light shield in a container in, and between each time used with other container storage in fabrication shop.Described conveying containers is dropped afterwards usually in use.Light shield when being transferred in its storage container fabrication shop, conveying containers can be formed another opportunities for contamination.Light shield is transported utensil to differ greatly with conventional need to the container that uses in fabrication shop.Combined will the elimination of this container double-duty is transferred to the chance of fabrication shop with the intrusion of the particulate container processes and generation from conveying containers, but can bringing huge design challenge.For example, this kind container will need to tackle the great variety of bar pressure in transportation, for example the variation relevant to height above sea level and temperature traverse.In addition, also much higher when shifting than carry out controlled manipulator in fabrication shop to the requirement of cushioning ability in transportation.
Some Consideration mentioned above also is applicable to semiconductor wafer substrate.Need to have controlled environment at storage, processing and In transit owing to having recognized that especially around wafer, prior art has developed out the isolation technology method, it is by being provided for holding the container of wafer, make wafer can keep relatively can not invaded by particulated matter, and realize the control near near the environment wafer.
Wafer normally is transported to fabrication shop in transfer cask, be transferred to subsequently in independent container, and described independent container is used for managing throughout memory chip between step in fabrication shop.The wafer of 200mm normally transports in the plastics " transportation utensil " of sealing, plastics of these sealings " transportation utensil " or support by the edge with alternate matrix form perhaps use sheeting spacer vertical pile with " Coin stacker formula wafer handling utensil (coinstack wafer shipper) " form.Be used for managing throughout in fabrication shop the industrial standard container that holds the 200mm wafer between step and be called standard mechanical interface box or SMIF box, and have the door of drop-bottom.For the wafer of 300mm, its transportation utensil is called front open type transport case or FOSBS, is used for managing throughout the container that holds wafer between step and is called front open type unified standard box or FOUPS.The light shield of storing between each manufacturing step in fabrication shop usually is stored in the drop-bottom container that is similar to standard SMIF box now, and is called light shield SMIP box or RSP.
Even when substrate (being wafer and light shield) when being in this kind controlled environment, because the pressure of the air of catching in controlled environment changes or because of caused turbulent flow of catching air when the container rapid movement and/or when catching volume of air (for example only because opening and the container that closes) breaking, the particulate that is present in described controlled environment inside also can be moved.In addition, thin wall-type transportation utensil or FOSBS may experience the wall motion because the pressure relevant to height above sea level changes, and cause that the air of catching in controlled environment is moved.Temperature traverse can form convection current in container.The change in size of container and assembly thereof can be damaged the function of support and fixed mechanism, causes the wafer dislocation and/or the substrate warpage that carry in container.Because the wall of container change in size that fluctuation of pressure causes can be damaged the capping of carrier and the sealing between door, thereby particulate can be invaded in carrier.
The method of prior art (especially aspect chip container) is externally to utilize breather apparatus between environment and inner controlled volume of air.Described breather apparatus provides the path of flowing through for air.The filter that is folded in described path is expected to provide barrier, invades the controlled environment of carrier from external environment condition to stop particulate.Yet as indicated above, light shield used has very tiny and accurate body in the EUV photoetching process, thereby the critical particle diameter of the non-patterned surface of light shield and patterned surface is only respectively about 0.1 μ m and 0.03 μ m.For little particle diameter like this, filter has very little aperture with needs, thus the flow that flows through filter is caused very large resistance, thereby needs larger filter surfaces long-pending.Be to change in response to suddenly pressure more slowly to the alternative of using larger filter face area, the pressure suddenly that for example runs into when transporting this kind container changes.These two kinds of methods all do not meet people's expectation, because a design objective of light shield SMIF box is to make controlled volume keep minimum, invade to prevent particulate thereby can carry out effective sealing to it.Make the controlled space that is placed with light shield minimum, provide larger filter area to realize that in controlled space all pressing is conflicting target simultaneously.
Wish to make the particulate that produces in controlled environment or otherwise introduce or exist can not fall on light shield.Thus, better make to carry therein light shield and for the space of avoiding the environment that particle contamination must be controlled minimum.Also wish to make the air in controlled space to keep relatively being static.For example, the corresponding large and pressure reduction suddenly of wall of container and the deflection that occurs can cause pressure wave in container.
Light shield has various sizes, comprises the light shield of diameter be 5 ", 6 ", 7 ", 8 ", 150mm and 200mm.Yet the door of SMIF box is equipped with the body that meets existing " SMIF " (standard mechanical interface) box standard, makes the automatic light shield transportation processing of the Men Keyu machinery of SMIF box carry out interface.Along with light shield size evolve, if the SMIF box be for generation large-size light shield early designed leave over the SMIF box, support the light shield that the very little diameter of volume that light shield carries environment reduces and become more and more challenging.Thus, can utilize leave over the SMIF box but support be not this kind box initial designed for the light shield that reduces of diameter will be comparatively favourable.
Therefore, need a kind ofly both to be suitable as the transportation utensil, also to be suitable in fabrication shop the substrate container of storage substrate between various processes.Need a kind of container that the cushioning ability of improvement can during transportation be provided.Also need a kind of particulate that can stop better to produce and make the particulate disturbance in substrate container or the minimized container that moves during container traffic and folding.
Summary of the invention
The present invention relates to a kind of for the device of support substrates to provide vibrations and vibration to isolate, described device comprises the main box in the outside and is supported in wherein auxiliary box by vibration elastic and vibration isolated part, the main box in the described outside comprises capping and pedestal, and described pedestal advantageous configurations becomes the drop-bottom door.The capping of described main box and base configuration become intermeshing, so that the first shell of airtight sealing to be provided.Described auxiliary box better by from capping and pedestal both extended elastomeric element support uniquely.In preferred embodiment, described auxiliary box with respect to main box have a plurality of, be preferably the freedom of motion of six, and and the light shield that wherein holds move isolator with the main box in the outside together.The actual motion that allows may be very little, but be enough to absorb the part energy that main box stands to shake.Described auxiliary box disposes the bottom that is configured to tray form, and described pallet has the light shield supporting construction, is preferably the corner stake with horizontal limited part and makes light shield be placed in top cushion.The top of described pallet is meshed to define auxiliaring shell with the bottom, and also better have cushion with the engagement light shield end face.Described top can for example provide airtight sealing by elastomeric element or other seal means (for example hard flat surface contacts hard flat surface) with the bottom, perhaps can have limited opening, be the elongate gap that essence is extended around the auxiliary box periphery, so that pressure surge minimizes and in the situation that stop particulate without airtight sealing.
In addition, the capping of described main box can be supported by elastic sealing element, to provide damping with respect to top cover and pedestal.In preferred embodiment, described elastic sealing element can have two cantilever portion and a central span section, and can be arranged in the groove towards upper surface of pedestal, with engagement and the rib of top cover all-in-one-piece to downward-extension.
Can utilize and be configured to therein that the essence same configuration of the main box with top and bottom of a fastening different size light shield replaces described inboard auxiliary box.
The feature of preferred embodiment of the present invention and advantage are that vibrations and the vibration isolation of enhancing are provided for light shield.
The feature of preferred embodiment of the present invention and advantage are that damping and the vibration damping of enhancing were provided before vibrations and vibration arrive the light shield wherein hold.
The feature of preferred embodiment of the present invention and advantage are for light shield provides double seal, and this is particularly conducive to described box is reached as conveyer simultaneously and is used in fabrication shop, manages especially throughout the device of storage light shield between step.
The feature of preferred embodiment of the present invention and advantage are to provide and can be used for using regular size (being 200mm) to transport and store the light shield SMIF box of the light shield of different size.
The feature of preferred embodiment of the present invention and advantage are to provide the light shield SMIF box that is specially adapted to the EUV photoetching technique.
Description of drawings
Fig. 1 is the sectional front view of the container that assembles according to an embodiment of the invention;
Fig. 2 is the perspective exploded view of the container assembly of the exemplary embodiment according to the present invention;
Fig. 3 faces exploded drawings for the analysing and observe of container assembly of the main embodiment according to the present invention, and described container assembly comprises the assembly of isolated system;
Fig. 4 is the transparent view of the capping of main embodiment according to the present invention;
Fig. 5 is the pedestal of the main embodiment according to the present invention and the transparent view that is supported in the substrate on described pedestal;
Fig. 6 is the capping of the exemplary embodiment according to the present invention and the perspective bottom view of auxiliary box assembly;
Fig. 7 A is the sectional side view of the container that assembles of an alternate embodiment according to the present invention;
Fig. 7 B is the perspective cut-away schematic view of the container that assembles according to an embodiment of the invention;
Fig. 8 A is for looking in detail cutaway view, and it illustrates the capping of the alternate embodiment according to the present invention and the engagement between pedestal;
Fig. 8 B is for looking in detail cutaway view, and it illustrates the capping of the main embodiment according to the present invention and the engagement between pedestal, and it shows capping contact pedestal;
Fig. 9 A is for being in the not schematic diagram of the exemplary seal of deformation form according to the present invention;
Fig. 9 B is the schematic diagram of form after the distortion of Fig. 9 A example illustrated sealing member;
Figure 10 A is the birds-eye view of the bottom (or pallet) of the exemplary embodiment according to the present invention;
Figure 10 B is the side view cutaway drawing of bottom shown in Figure 10 A (or pallet);
Figure 10 C is the birds-eye perspective of the bottom (or pallet) of the exemplary embodiment according to the present invention;
Figure 10 D is the upper detailed view that is used for the supporting construction of fixing substrate in bottom shown in Figure 10 A-10D (or pallet);
Figure 11 is the schematic diagram that illustrates according to an example of the present invention vibrations and vibration isolation system; And
Figure 12 illustrates the vibrations of the main embodiment according to the present invention and the schematic diagram of vibration isolation system.
The specific embodiment
Mentioned relativism terms such as up and down, all around is intended to be convenient to explanation in this article, but not intention is defined as times position or a particular orientation with the present invention or its assembly.All sizes shown in accompanying drawing all can and be drafted purposes and different with the potential design of the specific embodiment of the invention, and this does not deviate from scope of the present invention.
The container of improvement and the method that is used for making and using described container all can be used separately or be combined with other features and method to provide to each accompanying drawing disclosed herein and method.Therefore, the combination of each feature disclosed herein and method may not be to be essential to the invention for putting into practice on the widest meaning, and just discloses in order to illustrate representativeness of the present invention and preferred embodiment.
Referring now to Fig. 1,, it illustrates the light shield container 10 (also referred to as light shield " box " or light shield " carrier " or " main box ") of the main embodiment according to the present invention.Light shield container 10 comprises the capping 15 that can be sealed and matched with pedestal 20 (also referred to as door) substantially, to define in container 10 for the airtight sealing shell 25 that holds light shield 30 during storing, transport, process and transporting.The light shield 30 that so is positioned at containment shell 25 is just effectively isolated with the fume of shell 25 outsides.As the explanation best of reference Fig. 3 institute, container 10 comprises light shield supporting construction 32 and the light shield fixed sturcture 34 that is installed on respectively in pedestal 20 and capping 15 substantially in containment shell 25.Light shield 30 is positioned at and is supported on the light shield supporting construction 32 that is mounted on pedestal 20.When making capping 15 engages base 20, just the light shield fixed sturcture 34 that is installed in capping 15 plays a role and light shield 30 is anchored on light shield supporting construction 32, show best as institute in the schematic diagram of Fig. 1.Light shield supporting construction 32 defines the bottom 35 of the auxiliary box 39 with inner chamber 41, and light shield fixed sturcture 34 defines the top 37 of auxiliary box 39.
Referring now to Fig. 1,2 and 3,, use for carry out automation in various types of wafer fabrication equipment, pedestal 20 is provided with the body that meets semiconductor equipment and international (Semiconductor Equipment andMaterials International, the SEMI) standard of material.In exemplary embodiment, pedestal 20 is at least in part with consistent for the similar pedestal on light shield " SMIF " (standard mechanical interface) box of the well-known etching system in affiliated field.In the exemplary embodiment shown in Fig. 2 and 5, it is relative with pedestal upper surface 40 that pedestal 20 has a pedestal lower surface 21, pedestal lower surface 21 is by pedestal periphery 35 gauges and have the area occupied (not shown), and pedestal side 42 and the lower surface of shell wall separate pedestal upper surface 40 by having outdoors.The pedestal lower surface is provided with the body that meets the SMIF standard, with compatible with the semiconductor processing equipment (not shown).The pedestal 20 that conforms to SMIF also is suitable for removably being coupled to capping 15 by pedestal-bolt lock mechanism 23, and described pedestal-bolt lock mechanism 23 can be opened by the breech lock opening device (not shown) that meets SEMI.Namely disclose the exemplary bolt lock mechanism in had the 4th, 995, No. 430 US Patent also incorporated herein by reference by the application's case owner.Capping 15 generally is equipped with automation flange 45, is used for carrying out interface with the handling implement (not shown) and being used for using grasped during transportation, storage or conveying containers 10 with configuration.In the embodiment shown in Fig. 1,2 and 3, show that capping 15 and pedestal 20 are roughly rectangle, with consistent with the shape of light shield 30.Yet the those skilled in the art will easily know, capping and pedestal also can have other shapes, and this does not deviate from scope of the present invention.
By for example capping 15 and illustrated each container component of pedestal 20 is better is made by the thermoplastic polymer of rigidity by penetrating the manufacturing process that mould moulding process or other are fit to.Described poly-mer can be transparent, in order to can see light shield 30.In addition, these container components static that can dissipate.An example of the material of the transparent and static that can dissipate of this kind is polymethyl methacrylate.Perhaps, these container components also can be made by the opaque polycarbonate through filled with carbon fibers of the static that can dissipate, and are configured to comprise (or a plurality of) transparent window (not shown), see light shield in order to can see through form.One be chosen as, these container components can be made by transparent polycarbonate again.As to the substituting of polycarbonate, each element can further be made by flame resistance polyethers acid imide.Should be appreciated that, in alternate embodiment, each container component also can be made by other materials.These container components are better to be made by penetrating mold forming, but also contains other known manufacture methods.Namely set forth a kind of exemplary light shield SMIF box in the 6th, 216, No. 873 US Patent giving Asyst Technologies company, the content of described US Patent is incorporated herein by reference.The use of box for photomask in EUV uses is disclosed in the 6th, 906, No. 783 US Patent, and described US Patent is incorporated herein by reference.
Fig. 2 illustrates embodiment according to the present invention light shield 30.As shown in FIG. 2, light shield 30 is substantially square, has the first patterned surface 50 relative with the second clamping surface 55, and the first patterned surface 50 and the second clamping surface 55 separate by side 60.The first patterned surface 50 respectively on first and second relative lower parallel limit 65 and 70 places and side 60 intersect.The second 55 of clamping surfaces intersect upper parallel limit 75 and 80 places and side 60 at first and second respectively.In typical rectangle light shield shown in Figure 2, first and second is parallel to respectively first and second to top edge 75 and 80 to lower edge 65 and 70, and the parallel edges of every a pair of correspondence on surface all crosses to corresponding parallel edges with another at rounding 85 places.Patterned surface 50 etchings have desired circuit pattern (not shown).Clamping surface 55 can be as reference plane during the manufacturing of light shield and carrying.For example, clamping surface 55 can be immobilizated in electrostatic chuck.Body very tiny on patterned surface 55 may be easy to when contacting be damaged with other surfaces (for example surface of container 10).For avoiding this kind contact, generally the circumference office of 50 and 55 close rounding 85 is supported light shield 30 on the light shield surface, because these parts do not contain pattern usually.Equally, also can be along the edge contact light shield 30 of light shield 30, and it is damaged.But must move relative to each other by the Restricted Contact face, because the wearing and tearing of contact surface can produce particulate potentially.Can comprise position locator and other structural feature in capping 15, with to capping and the door between dislocation adjust, thereby reduce the light shield cliding friction.The present invention describes with reference to square light shield, but is understood by those skilled in the art that, the light shield of all shapes all is in scope of the present invention.Light shield can be but is not limited to polygon or rectangular shape.
As institute's best image in the schematic diagram of Fig. 4 and 6, capping 15 comprises overhead guard 90, capping sidewall 95 and capping active flank 100.Overhead guard 90 comprises concave inner surface 110 under overhead guard periphery 105, overhead guard and relative overhead guard outside face 115.Capping active flank 100 extends between overhead guard periphery 105 and capping sidewall 95 and around overhead guard periphery 105 and capping sidewall 95 and locates.When making capping 15 engages base 20, pedestal upper surface 40 faces capping active flank 100 location, capping sidewall 95 is arranged around pedestal side 42, thereby pedestal 100 essence are arranged in overhead guard 90.In this kind configuration, the lower concave inner surface 110 of overhead guard and pedestal upper surface 40 together be combined form as hereinafter institute with the containment shell 25 that illustrates.In the exemplary embodiment shown in Fig. 4 and 6, overhead guard 90 further comprises the structure that defines air extractor vent 20.Air extractor vent 120 is used for when capping 15 coordinates with pedestal 20, the containment shell 25 in container 10 being communicated to the ambient atmosphere of container 10 outsides.Flexible diaphragm 125 shown in Figure 5 adheres on overhead guard 90 hermetically, and is configured to hide air extractor vent 115, is communicated with ambient atmosphere by air extractor vent 115 to prevent containment shell 25.Advantageously make the pressure variation in containment shell 25 reach balance by diaphragm movement.Automation flange 45 is attached on the outside face 115 of overhead guard 90, and disposes the cheese part 128 with perforate that hides barrier film 125, prevents from being subject to external contact in order to cover barrier film 125 when allowing to be exposed to ambient atmosphere.
In the main embodiment shown in Fig. 2,5,10A, 10B, 10C and 10D, the light shield supporting construction comprises a plurality of better Elastic Coupling spares of being made by elastomeric material (being preferably thermoplastic elastomer), and these Elastic Coupling spares are configured to light shield pillar stiffener 130 and light shield support frame 135 (also referred to as lower tray or the bottom of auxiliary box) form.Also can utilize alternative vibration-absorptive material.Light shield pillar stiffener 130 is mounted to or is formed on pedestal 20, and is configured to stretch out and end at pillar stiffener end 140 from upper surface 40.The exemplary embodiment of light shield support frame 135 comprises the foursquare plate 140 of essence, and plate 140 has the support frame upper surface 145 that extends between support frame angle 155 and support frame limit 160 and relative support frame lower surface 150.Support frame upper surface 145 separates by variable support frame thickness 165 and support frame lower surface 150, makes support frame panel edges 160 present the cross section 170 of camber profile.Each support frame angle 155 is provided with the first support frame joint plate 170 and the second support frame joint plate 175 that is formed on support frame lower surface 150, and wherein first and second support frame joint plate 170 and 175 155 extends internally and extends in relative support frame angle towards the support frame diagonal angle respectively.Light shield pillar stiffener 130 can be attached to support frame lower surface 150 near each angle 155 at 140 places, pillar stiffener end.Relative with the attachment point of elastomeric support column 130 each support frame angle 155 is provided with light shield supporting pad 180, and light shield supporting pad 180 stretches out and presents the recess 185 with the inclined-plane that shifts out from support frame upper surface 145 from light shield support frame upper surface 145.Comprise a pair of band inclined-plane recess sidewalls 190 and 195 with the recess 185 on inclined-plane, downward-sloping and form each other the right angle in the plane perpendicular to the side 60 of light shield 30 generally along light shield stay bearing plate 135 with inclined-plane recess sidewalls 190 and 195.Be contained in these two with between inclined- plane recess sidewalls 190 and 195 and with sidewall 190 and 195 essence equidistant be the cheese projection 200 of stretching out from the first support frame upper surface 145 near support frame angle 155.Each sloped sidewall 190 and 195 with inclined-plane recess 185 all supports light shield 30 by at first and second, parallel lower edge 65 being contacted light shield 30 with 70 places near rounding 85.Light shield 30 contacts cheese projection 200 on very little area of contact, thereby light shield 30 is minimized with overall contact of container 10.In the alternate embodiment shown in Fig. 7 A, the size of cheese projection is suitable for light shield 30 is separated with support frame upper surface 145 and forms the diffusion zone 210 that limit fluid flows on patterned surface 50, is transferred on patterned surface 50 to prevent particulate.
Still referring to Fig. 2,3,5,6,10A, 10B, 10C and 10D, the light shield fixed sturcture comprises a plurality of light shield fixed legs 230 and light shield fixed frame 235 (also referred to as top tray or the top of auxiliary box).The better Elastic Coupling spare of being made by elastomeric material (being preferably thermoplastic elastomer) is configured to the form of light shield fixed leg 230 and is mounted to or is formed in capping 15, and is configured under the overhead guard concave inner surface 110 and stretches out and end at fixed leg end 240.The exemplary embodiment of light shield fixed frame 235 comprises the foursquare plate 240 of essence, and it has fixed frame upper surface 245 and the framework lower surface 250 that is relatively fixed that extends between fixed frame angle 255 and fixed frame limit 160.Each fixed frame angle 255 is provided with the first fixed frame joint plate 270 and the second fixed frame joint plate 275 that is formed on fixed frame lower surface 250, and wherein first and second fixed frame joint plate 270 and 275 255 extends internally and extends internally towards the frame corners that is relatively fixed towards the fixed frame diagonal angle respectively.Light shield fixed leg 230 can be attached to support frame lower surface 250 near each angle 255 at 240 places, fixed leg end.Relative with the attachment point of flexible fastening post 230 each fixed frame angle 255 is provided with near fixed frame angle 255 from the extended cheese fixed lobe 300 of fixed frame upper surface 245.When making capping 15 engages base 20, light shield support frame 135 is intermeshing and form auxiliary box 300 with light shield fixed frame 235, holds the auxiliaring shell 310 of light shield 30 with restriction.In this kind configuration, cheese fixed lobe 301 makes it can not move with respect to auxiliary box 300 near angle 85 places contact light shield upper surface 55 with fastening light shield 30.Centering fin 302 or guiding joint plate can help to make light shield between two parties or help top is properly positioned on the bottom.After on being centered at voluntarily band inclined-plane recess sidewalls 190 and 195, light shield 30 is supported on alternate light shield supporting pad 180 in the plane of essence perpendicular to side 60, makes patterned surface 50 be positioned on cheese projection 200 and cheese fixed lobe 300 is pressed against on clamping surface 55.Light shield pillar stiffener 130 both all is adapted at having low rigidity on axial direction (z direction) and horizontal direction (being x and/or y direction) with light shield fixed leg 230, so that any vibrations on corresponding these directions and vibrational load and deform and deflection.Light shield fixed leg 230 is fit to match with light shield pillar stiffener 130, cheese projection 200 and cheese fixed lobe 300, with when capping 15 matches with pedestal 20, light shield fixed leg 230 and light shield pillar stiffener 130 are out of shape on the z direction, in order to keep continuous Offset with cheese projection 200 and 300 on the surface 50 and 55 of light shield 30, light shield 30 is fixed on the desired fixed reference position that is sandwiched between light shield supporting construction 32 and light shield fixed sturcture 34 thereby apply enough local pressures at storage and In transit.Cheese projection 200 and cheese fixed lobe 300 can be made by elastomeric material, to realize and the surface 50 of light shield 30 and 55 high damping by friction engagement.Be understood by those skilled in the art that, the layout of light shield pillar stiffener 130 and light shield fixed leg 230 will alleviate the vibrations of mount pad (i.e. door and/or capping 15) to the impact of light shield 30, and according to the schematic diagram in Figure 11 and 12, this will be apparent.
Referring to Fig. 1,2,3 and 12, Elastic Coupling spare 130 and 230 is suspended in auxiliary box 300 in main box 10 effectively, that is auxiliary box structurally is connected to main box by the elastomeric material that consists of Elastic Coupling spare fully or only.Described Elastic Coupling spare can be tubulose, with axial hole 231, to be easy to be assembled to pillar 232 and the pillar 236 in the pillar 233 on the bottom and main box capping and the pillar 237 on pedestal on auxiliary box top.
Figure 11 and 12 main box 10 of serving as reasons supports the idealized schematic diagram of the auxiliary box 300 that accommodates light shield 30.As shown in the schematic diagram of Figure 11 and 12, the behavior of light shield pillar stiffener 130 and light shield fixed leg 230 is vibrated isolated component just as spring damper, and it can be supported in main box 10 with six degrees of freedom of motion auxiliary box 300 (and the light shield 30 that wherein holds).The those skilled in the art will easily learn, the layout shown in Figure 11 and 12 will decay in fact and be passed to any vibrations and the vibration of auxiliary box 300 from main box.Light shield support frame 130 and light shield fixed frame 230 can be rigidity by essence, the non-corpuscular property material of the static that can dissipate is made, and for example (for example) made by the polyetheretherketone (polyetheretherkeytone, PEEK) through filled with carbon fibers.When light shield container 10 runs into the vibration that makes elastomeric support column 130 and flexible fastening post 230 be tending towards deflection or shock loads, the light shield support frame 135 of rigidity moves as the entity that essence is rigidity with 235 meetings of light shield fixed frame, to be used for restriction pillar stiffener 130 and fixed leg 230 deflections and Tuned mass damper is provided, thereby being remained, light shield 30 is in desired form in container 10.In alternate embodiment, light shield fixed frame 235 forms auxiliaring shell 310 (protective case) with light shield support frame 135 in interior cooperation of main airtight sealing shell 25, shows best as institute in Fig. 1 and 7A.Auxiliaring shell 310 is communicated with airtight sealing shell 25 fluids; but the interior air that holds of auxiliaring shell 310 is not prone to turbulent flow relatively, this be because the volume of air that comprises is less and main shell 25 with by the fluid flow path that has complications between the formed auxiliaring shell 310 of protective case.
Another feature of isolated system of the present invention is described best with reference to Fig. 7 A, 7B, 8A, 8B, 9A and 9B.Pedestal upper surface 40 is provided with the structure that defines a plurality of concentric convex ridges 400, and these a plurality of concentric convex ridges 400 define respectively peak 405 and paddy 410, and it extends and extend to diametrically the outside of auxiliary box 300 around pedestal side 42 annular on pedestal upper surface 40.The elastic sealing element 415 that is configured to loop type is provided.Elastic sealing element 415 is included in horizontal expansion between the inner peripheral 430 of sealing member and outer peripheral edges 435 and forms first and second primary sealing area 420 and 425 of continuous loop.The second primary sealing area 420 disposes from the outward extending a plurality of alternate concentric wedges 440 of the second primary sealing area 425 (also referred to as " finger ", projection, protrusion, tenon shape protrusion), and the size of wedge 440 is suitable for bearing fit ground and holds and be immobilizated in each continuous paddy 410 of the concentric convex ridge 400 on pedestal upper surface 40.With one heart the transverse part 445 and 450 on convex ridge 400 each side all is overhung at pedestal upper surface 40 tops.Capping active flank 100 is provided with a plurality of ribs 455, rib 455 with paddy 410 complementary and its size be suitable for being pressed against on the first primary sealing area 420 of elastic sealing element 415 and essence near wedge 440 so that when capping 15 and pedestal 20 being coordinated form airtight sealing shell 25 compression wedge thing 440 and it is sealed in the interior formation of paddy 410 contact.
In the exemplary embodiment shown in Fig. 9 A and 9B, elastic sealing element 415 is deformed into and is essence as the shape of Greek alphabet ∏.Under deformation state not, the horizontal line of ∏ curves the same arc of " C " of image inversion.Vertical " branch " of ∏ shape sealing member 415 is the wedges 440 that are contained in paddy 410.In the embodiment shown in Fig. 9 A and 9B, provide two concentric rings that formed by wedge 415.Capping 20 has three alternate concentric rings that formed by rib 460,465 and 470, make central rib 465 essence contact the first primary sealing area 415 between these two wedge 415 concentric rings, and the transverse part 445 and 450 of outer ribs 460 and 470 wipe contact elastic sealing elements 415.This kind layout makes elastic sealing element 415 contact capping 15 and pedestal 20 both when capping 15 is combined together with pedestal 20.Yet when taking off pedestal 20, sealing member 415 is from returning with pedestal upper surface 40 contact positions " bullet ", thus avoid sealing member adhere on pedestal and need to by the pedestal operator be used for peeling off the time cause forming particulate.
Above-mentioned structure is particularly suitable for utilizing less light shield by only replacing auxiliary box with the box with the turning post 461 that arranges inwardly.Whole main box with the isolation body still can utilize.
Another embodiment of container 10 provides grounding path, so that static dissipates through light shield supporting constructions 32 and light shield fixed sturcture 34 and capping 15 and pedestal 20 from the patterned surface 50 of light shield 30 and clamping surface 55.Protect thus light shield 30 electrostatic discharge (Electrostatic Discharge, ESD) can not occur.In the 6th, 513, No. 654 US Patent giving Asyst Technologies company, described method and device are discussed, the content of described US Patent is incorporated herein by reference.
Claims (22)
1. one kind is used for support substrates so that the device of vibrations and vibration isolation to be provided, and the feature of described device is to comprise:
Main box, it comprises capping and the pedestal that disposes lower concave inner surface, described capping is suitable for removably meshing described pedestal, and to define the first seal casinghousing between described lower concave inner surface and described pedestal, described pedestal has the inside that wherein accommodates bolt lock mechanism;
Auxiliary box, it comprises bottom and top, described top is suitable for meshing described bottom, to define be used to the second housing that holds described substrate, described bottom comprises supporting construction with fixing substrate in the above, and described top comprises fixed sturcture and fixes described substrate when being used on described top with the engagement of described bottom; And
a plurality of Elastic Coupling spares, extend upwardly to the described bottom of described auxiliary box from the described pedestal of described main box, in addition a plurality of Elastic Coupling spares extend downward described top from described capping, provide described auxiliary box to comprise described top and described bottom both with respect to the master site of described main box, described auxiliary box comprises described bottom and described top both can move apart described master site because shaking or vibrating with returning, described a plurality of Elastic Coupling spare extends upward the resilient mounting that described bottom is provided from described pedestal, described other a plurality of Elastic Coupling spares provide the resilient mounting on described top from described capping to downward-extension, described a plurality of Elastic Coupling spare and described other a plurality of Elastic Coupling spares comprise described bottom for described auxiliary box and described top both provides unique support, and for comprising described top and described bottom, described auxiliary box both is provided at a plurality of displacement degree of freedom in described main box.
2. device as claimed in claim 1 is characterized in that described a plurality of Elastic Coupling spares provide six degrees of freedom of motion when described auxiliary box comprises described top and described bottom and both moves apart its master site.
3. device as claimed in claim 1, is characterized in that further being included in a plurality of elastic support spares that extend between described main box and described auxiliary box.
4. device as claimed in claim 2, is characterized in that described auxiliary box has four angles, and described a plurality of Elastic Coupling spare vertically extends between described auxiliary box and described main box at each place at described four angles.
5. device as claimed in claim 4, it is characterized in that each described Elastic Coupling spare all has first end and the second end, and has opening at each described end place, and wherein all by being connected to described main box and auxiliary box both from described main box and the extended a plurality of projections of auxiliary box, described projection is contained in the described opening at described end place each described Elastic Coupling spare.
6. device as claimed in claim 1, the described bottom that it is characterized in that described auxiliary box has the foursquare profile of quadricorn essence, and have four limits of extending between described angle, every one side all has bowed shape, thereby when making described substrate present recess in described bottom the time described substrate supports.
7. device as claimed in claim 1, the described bottom that it is characterized in that described auxiliary box has top side and bottom side, described bottom has the foursquare profile of quadricorn essence, and wherein each described angle all has the joint plate that extends internally towards the diagonal angle that is formed on described bottom side.
8. device as claimed in claim 6, the described bottom that it is characterized in that described auxiliary box has top side and bottom side, described bottom has the foursquare profile of quadricorn essence, and wherein each described angle all has the joint plate that extends internally towards the diagonal angle that is formed on described bottom side.
9. device as claimed in claim 7, the described top that it is characterized in that described auxiliary box has top side and bottom side, described top has the foursquare profile of quadricorn essence, and wherein each described angle all has the joint plate that radially extends on the described top side on described top.
10. device as claimed in claim 9, it is characterized in that each joint plate on described top has the central portion of projection, the central portion of described projection has a pair of sidewall from described lug boss to downward-extension, and each joint plate of described bottom has the sinking section to downward-extension that pair of sidewalls is arranged.
11. device as claimed in claim 1, the described pedestal that it is characterized in that described main box have have outer peripheral towards upper surface, described have the groove that extends along described edge part in upper surface, described device further comprises elastic sealing element, described elastic sealing element is configured to be arranged in the ring of described groove, and wherein said capping have for the engagement projections of described elastic sealing element engagement, wherein said sealing member and described engagement projections provide continuous engagement to provide sealed engagement between described capping and pedestal.
12. device as claimed in claim 11 is characterized in that described sealing member is compressed between described capping and described pedestal, and wherein when described capping is latched on described pedestal, described capping can move vertically to the distance of few 0.10 inch on described pedestal.
13. device as claimed in claim 11, it is characterized in that described sealing member has end face, described end face has two cantilever portion and pars intermedia, and wherein said capping has outer peripheral edges, described outer peripheral edges have three engagement ribs that extend around described outer peripheral edges, and wherein said three engagement rib described two cantilever portion of engagement and described pars intermedia.
14. device as claimed in claim 1 is characterized in that described base portion comprises four angle guides.
15. one kind is used for supporting light shield so that the container of vibrations and vibration isolation to be provided, the feature of described container is to comprise:
Main box, it comprises capping and the breech locked door to the described capping to define the first shell;
Auxiliary box, it comprises bottom and top, described top is suitable for meshing described bottom, to define be used to the second housing that holds described light shield, described bottom comprises for the supporting construction of fixing substrate in the above, and described top comprises fixed sturcture and fixes described substrate when being used on described top with the engagement of described bottom;
A plurality of Elastic Coupling spares, extend upwardly to the described bottom of described auxiliary box from the described door of described main box, in addition a plurality of Elastic Coupling spares extend downward the described top of described auxiliary box from the described capping of described main box, extend upward with other a plurality of Elastic Coupling spares to downward-extension by described a plurality of Elastic Coupling spares, for described auxiliary box comprises described bottom and described top both provides unique support.
16. container as claimed in claim 15 is characterized in that described auxiliary box has four angles, and described a plurality of Elastic Coupling spare vertically extends between described auxiliary box and described main box at each place at described four angles.
17. container as claimed in claim 15, it is characterized in that each described Elastic Coupling spare all has first end and the second end, and has opening at each described end place, and wherein all by being connected to described main box and auxiliary box both from described main box and the extended a plurality of projections of auxiliary box, described projection is contained in the described opening at described end place each described Elastic Coupling spare.
18. container as claimed in claim 15, the described bottom that it is characterized in that described auxiliary box has the foursquare profile of quadricorn essence, and have four limits of extending between described angle, every one side all has bowed shape, thereby when being supported in described light shield in described bottom, described light shield is presented recess.
19. container as claimed in claim 15 is characterized in that the described top of described auxiliary box and bottom have the gap that extends to the inside of described auxiliary box from the outside of described auxiliary box.
20. container as claimed in claim 15 is characterized in that described Elastic Coupling spare is to be made by thermoplastic elastomer.
21. one kind is held and isolated substrate avoids the method for fume, the feature of described method is to comprise following steps:
Formation comprises the main box of capping and pedestal, selects the thermoplastic polymer of rigidity for described capping, and is the thermoplastic polymer that described pedestal is selected rigidity, and described pedestal and described capping are sealed and matched;
Define the airtight sealing shell in described main box;
Provide bolt lock mechanism in described pedestal, to be used for that described pedestal removably is coupled to described capping;
Elastic sealing element is provided, mesh hermetically with described capping and described pedestal being used for, wherein said pedestal have have outer peripheral towards upper surface, described have the groove that extends along described edge part in upper surface, and described elastic sealing element is configured to be arranged in the ring of described groove, described capping have for the engagement projections of described elastic sealing element engagement, wherein said sealing member and described engagement projections provide continuous engagement to provide sealed engagement between described capping and described pedestal;
The auxiliary box that comprises light shield supporting construction and light shield fixed sturcture is provided, substrate is anchored on wherein being used for;
A plurality of elastic supporting member for supporting optical member of the described light shield supporting construction by extending upwardly to described auxiliary box from described pedestal flexibly are supported in described auxiliary box in described main box uniquely, and other a plurality of elastic supporting member for supporting optical member extends downward the described light shield fixed sturcture of described auxiliary box from described capping.
22. the method holding and store light shield, the feature of described method is to comprise following steps:
Formation comprises the main box of capping and pedestal;
Elastic sealing element is provided, mesh hermetically with described capping and described pedestal being used for, wherein said pedestal have have outer peripheral towards upper surface, described have the groove that extends along described edge part in upper surface, and described elastic sealing element is configured to be arranged in the ring of described groove, described capping have for the engagement projections of described elastic sealing element engagement, wherein said sealing member and described engagement projections provide continuous engagement to provide sealed engagement between described capping and described pedestal;
Light shield is supported in the auxiliary box with light shield supporting construction and light shield fixed sturcture rigidly, and
Flexibly be supported in uniquely described auxiliary box in main box with six-freedom degree, extend upwardly to the described light shield supporting construction of described auxiliary box from pedestal by a plurality of elastic supporting member for supporting optical member, and other a plurality of elastic supporting member for supporting optical member extends downward the described light shield fixed sturcture of described auxiliary box from the end face capping, provide pedestal-bolt lock mechanism in described pedestal, the described capping that described main box has removably utilizes described pedestal-bolt lock mechanism to be coupled to described pedestal.
Applications Claiming Priority (9)
| Application Number | Priority Date | Filing Date | Title |
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| US65761605P | 2005-02-27 | 2005-02-27 | |
| US65735505P | 2005-02-27 | 2005-02-27 | |
| US60/657,355 | 2005-02-27 | ||
| US60/657,616 | 2005-02-27 | ||
| US77483406P | 2006-02-18 | 2006-02-18 | |
| US60/774,834 | 2006-02-18 | ||
| US11/364,562 | 2006-02-26 | ||
| US11/364,562 US7607543B2 (en) | 2005-02-27 | 2006-02-26 | Reticle pod with isolation system |
| PCT/US2006/007370 WO2006094100A2 (en) | 2005-02-27 | 2006-02-27 | Reticle pod with isolation system |
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| CN101166681A CN101166681A (en) | 2008-04-23 |
| CN101166681B true CN101166681B (en) | 2013-06-12 |
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| CN2006800139751A Expired - Fee Related CN101166681B (en) | 2005-02-27 | 2006-02-27 | Reticle pod with isolation system |
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| EP (1) | EP1853497A2 (en) |
| JP (1) | JP2008531416A (en) |
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Also Published As
| Publication number | Publication date |
|---|---|
| US7607543B2 (en) | 2009-10-27 |
| CN101166681A (en) | 2008-04-23 |
| IL185520A0 (en) | 2008-01-06 |
| KR20070106037A (en) | 2007-10-31 |
| WO2006094100A2 (en) | 2006-09-08 |
| WO2006094100A3 (en) | 2007-09-20 |
| US20060260978A1 (en) | 2006-11-23 |
| EP1853497A2 (en) | 2007-11-14 |
| JP2008531416A (en) | 2008-08-14 |
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