TWD209928S - The base of the mask transfer box - Google Patents
The base of the mask transfer box Download PDFInfo
- Publication number
- TWD209928S TWD209928S TW108304631F TW108304631F TWD209928S TW D209928 S TWD209928 S TW D209928S TW 108304631 F TW108304631 F TW 108304631F TW 108304631 F TW108304631 F TW 108304631F TW D209928 S TWD209928 S TW D209928S
- Authority
- TW
- Taiwan
- Prior art keywords
- base
- transfer box
- mask transfer
- designed
- case
- Prior art date
Links
- 239000004065 semiconductor Substances 0.000 abstract description 4
- 238000010586 diagram Methods 0.000 abstract description 2
- 238000004519 manufacturing process Methods 0.000 abstract description 2
- 238000000034 method Methods 0.000 abstract description 2
- 230000000007 visual effect Effects 0.000 abstract description 2
- 235000012431 wafers Nutrition 0.000 abstract 1
Images
Abstract
【物品用途】;本設計物品係為一種光罩傳送盒之底座,尤其是用於半導體製程中光罩傳送盒之底座,用於保護半導體晶片。;【設計說明】;本案創作光罩傳送盒之底座係為一新穎獨特之設計,藉由獨特地設計的光罩傳送盒之底座,可顯現出先前技藝未曾有過的視覺效果。;圖式所揭露之虛線部分,為本案不主張設計之部分。[Use of article] This designed article is a base for a mask transfer box, especially for the base of a mask transfer box used in semiconductor manufacturing processes to protect semiconductor wafers. ;[Design Description];The base of the mask transfer box created in this case is a novel and unique design. Through the uniquely designed base of the mask transfer box, visual effects that have never been achieved by previous techniques can be displayed. ; The dotted line portion disclosed in the diagram is the portion of the case that is not intended to be designed.
Description
本設計物品係為一種光罩傳送盒之底座,尤其是用於半導體製程中光罩傳送盒之底座,用於保護半導體晶片。This design item is a base of a photomask transfer box, especially a base for a photomask transfer box in the semiconductor manufacturing process, to protect semiconductor chips.
本案創作光罩傳送盒之底座係為一新穎獨特之設計,藉由獨特地設計的光罩傳送盒之底座,可顯現出先前技藝未曾有過的視覺效果。The base of the mask transfer box created in this case is a novel and unique design. With the uniquely designed base of the mask transfer box, it can show a visual effect that has never been seen in previous techniques.
圖式所揭露之虛線部分,為本案不主張設計之部分。The dotted line exposed in the diagram is a part of this case that does not advocate design.
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW108304631F TWD209928S (en) | 2019-08-02 | 2019-08-02 | The base of the mask transfer box |
| US29/711,299 USD964950S1 (en) | 2019-08-02 | 2019-10-30 | Base for an ultraviolet light reticle transfer box |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW108304631F TWD209928S (en) | 2019-08-02 | 2019-08-02 | The base of the mask transfer box |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| TWD209928S true TWD209928S (en) | 2021-02-21 |
Family
ID=83356751
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW108304631F TWD209928S (en) | 2019-08-02 | 2019-08-02 | The base of the mask transfer box |
Country Status (2)
| Country | Link |
|---|---|
| US (1) | USD964950S1 (en) |
| TW (1) | TWD209928S (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWD214306S (en) | 2021-07-02 | 2021-09-21 | 家登精密工業股份有限公司 | Support for lower cover of reticle box |
| TWD214307S (en) | 2021-07-02 | 2021-09-21 | 家登精密工業股份有限公司 | Support for upper cover of reticle box |
| TWD241611S (en) | 2022-09-15 | 2025-11-21 | 美商恩特葛瑞斯股份有限公司 (美國) | Spacer applied to reticle container |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20250073197A (en) | 2022-09-20 | 2025-05-27 | 엔테그리스, 아이엔씨. | Lead frame for spacing out the reticle pod |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWM555966U (en) | 2017-10-31 | 2018-02-21 | 中勤實業股份有限公司 | Mask box |
| TW201827919A (en) | 2017-01-26 | 2018-08-01 | 家登精密工業股份有限公司 | Mask box |
| TWI666510B (en) | 2017-01-25 | 2019-07-21 | 家登精密工業股份有限公司 | Extreme ultraviolet ray container |
Family Cites Families (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6338409B1 (en) * | 2000-04-13 | 2002-01-15 | International Business Machines Corporation | Reticle SMIF pod in situ orientation |
| US6948619B2 (en) * | 2002-07-05 | 2005-09-27 | Taiwan Semiconductor Manufacturing Co., Ltd | Reticle pod and reticle with cut areas |
| US7477358B2 (en) * | 2004-09-28 | 2009-01-13 | Nikon Corporation | EUV reticle handling system and method |
| JP4710308B2 (en) * | 2004-10-29 | 2011-06-29 | 株式会社ニコン | Reticle conveying apparatus, exposure apparatus, and reticle conveying method |
| US7607543B2 (en) * | 2005-02-27 | 2009-10-27 | Entegris, Inc. | Reticle pod with isolation system |
| CN101321674B (en) * | 2005-09-27 | 2010-10-13 | 诚实公司 | mask box |
| TWI414464B (en) * | 2011-01-11 | 2013-11-11 | 家登精密工業股份有限公司 | Extreme ultraviolet reticle storage transfer box with fixed structure |
| TWI501910B (en) * | 2011-11-17 | 2015-10-01 | 家登精密工業股份有限公司 | Extreme ultraviolet ray storage transfer box with drainage structure |
| USD712364S1 (en) * | 2012-05-09 | 2014-09-02 | Gudeng Precision Industrial Co., Ltd. | EUV pod |
| KR20150067375A (en) * | 2012-10-19 | 2015-06-17 | 인티그리스, 인코포레이티드 | Reticle pod with cover to baseplate alignment system |
| USD732482S1 (en) * | 2013-03-01 | 2015-06-23 | Randl Industries, Inc. | Plaster ring |
| USD807303S1 (en) * | 2016-09-06 | 2018-01-09 | S.J. Electro Systems, Inc. | Panel enclosure |
-
2019
- 2019-08-02 TW TW108304631F patent/TWD209928S/en unknown
- 2019-10-30 US US29/711,299 patent/USD964950S1/en active Active
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI666510B (en) | 2017-01-25 | 2019-07-21 | 家登精密工業股份有限公司 | Extreme ultraviolet ray container |
| TW201827919A (en) | 2017-01-26 | 2018-08-01 | 家登精密工業股份有限公司 | Mask box |
| TWM555966U (en) | 2017-10-31 | 2018-02-21 | 中勤實業股份有限公司 | Mask box |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWD214306S (en) | 2021-07-02 | 2021-09-21 | 家登精密工業股份有限公司 | Support for lower cover of reticle box |
| TWD214307S (en) | 2021-07-02 | 2021-09-21 | 家登精密工業股份有限公司 | Support for upper cover of reticle box |
| TWD241611S (en) | 2022-09-15 | 2025-11-21 | 美商恩特葛瑞斯股份有限公司 (美國) | Spacer applied to reticle container |
Also Published As
| Publication number | Publication date |
|---|---|
| USD964950S1 (en) | 2022-09-27 |
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