TWD209927S - Top cover of reticle transfer box - Google Patents

Top cover of reticle transfer box Download PDF

Info

Publication number
TWD209927S
TWD209927S TW108304629F TW108304629F TWD209927S TW D209927 S TWD209927 S TW D209927S TW 108304629 F TW108304629 F TW 108304629F TW 108304629 F TW108304629 F TW 108304629F TW D209927 S TWD209927 S TW D209927S
Authority
TW
Taiwan
Prior art keywords
transfer box
mask transfer
cover
designed
top cover
Prior art date
Application number
TW108304629F
Other languages
Chinese (zh)
Inventor
莊家和
薛新民
邱銘乾
Original Assignee
家登精密工業股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 家登精密工業股份有限公司 filed Critical 家登精密工業股份有限公司
Priority to TW108304629F priority Critical patent/TWD209927S/en
Priority to US29/711,295 priority patent/USD964948S1/en
Publication of TWD209927S publication Critical patent/TWD209927S/en

Links

Images

Abstract

【物品用途】;本設計物品係為一種光罩傳送盒之上蓋，尤其是用於半導體製程中光罩傳送盒之上蓋，用於保護半導體晶片。;【設計說明】;本案創作光罩傳送盒之上蓋係為一新穎獨特之設計，藉由獨特地設計的光罩傳送盒之上蓋，可顯現出先前技藝未曾有過的視覺效果。;圖式所揭露之虛線部分，為本案不主張設計之部分。[Use of article] This designed article is a cover for a mask transfer box, especially used for the cover of the mask transfer box in the semiconductor manufacturing process to protect semiconductor wafers. ;[Design Description];The upper cover of the mask transfer box created in this case is a novel and unique design. Through the uniquely designed upper cover of the mask transfer box, visual effects that have never been achieved by previous techniques can be displayed. ; The dotted line portion disclosed in the diagram is the portion of the case that is not intended to be designed.

Description

光罩傳送盒之上蓋Top cover of reticle transfer box

本設計物品係為一種光罩傳送盒之上蓋，尤其是用於半導體製程中光罩傳送盒之上蓋，用於保護半導體晶片。This design article is a kind of upper cover of the photomask transfer box, especially used for the upper cover of the photomask transfer box in the semiconductor manufacturing process, for protecting semiconductor wafers.

本案創作光罩傳送盒之上蓋係為一新穎獨特之設計，藉由獨特地設計的光罩傳送盒之上蓋，可顯現出先前技藝未曾有過的視覺效果。The upper cover of the mask transfer box created in this case is a novel and unique design. With the uniquely designed upper cover of the mask transfer box, it can show visual effects that have never been seen before.

圖式所揭露之虛線部分，為本案不主張設計之部分。The dotted line exposed in the diagram is a part of this case that does not advocate design.

TW108304629F 2019-08-02 2019-08-02 Top cover of reticle transfer box TWD209927S (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
TW108304629F TWD209927S (en) 2019-08-02 2019-08-02 Top cover of reticle transfer box
US29/711,295 USD964948S1 (en) 2019-08-02 2019-10-30 Upper cover for an ultraviolet light reticle transfer box

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW108304629F TWD209927S (en) 2019-08-02 2019-08-02 Top cover of reticle transfer box

Publications (1)

Publication Number Publication Date
TWD209927S true TWD209927S (en) 2021-02-21

Family

ID=83356748

Family Applications (1)

Application Number Title Priority Date Filing Date
TW108304629F TWD209927S (en) 2019-08-02 2019-08-02 Top cover of reticle transfer box

Country Status (2)

Country Link
US (1) USD964948S1 (en)
TW (1) TWD209927S (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD1020818S1 (en) * 2021-01-05 2024-04-02 Dn Solutions Co., Ltd. Machine center
TWD214306S (en) * 2021-07-02 2021-09-21 家登精密工業股份有限公司 Support for lower cover of reticle box
USD1066292S1 (en) * 2022-09-15 2025-03-11 Entegris, Inc. Spacer applied to reticle container
CN119816457A (en) 2022-09-20 2025-04-11 恩特格里斯公司 Peripheral frame for spacing mask boxes

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW201523126A (en) 2013-10-31 2015-06-16 Entegris Inc A modular reticle pod system
TW201640219A (en) 2015-03-18 2016-11-16 安堤格里斯公司 Substrate container, seal member, door assembly and method of assembling the same for a reticle pod

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI319123B (en) * 2002-02-22 2010-01-01 Asml Holding Nv System and method for using a two part cover for protecting a reticle
USD473523S1 (en) * 2002-06-25 2003-04-22 Lyall Assemblies, Inc. Convoluted tubing with an overmolded end cap
US7477358B2 (en) * 2004-09-28 2009-01-13 Nikon Corporation EUV reticle handling system and method
JP4710308B2 (en) * 2004-10-29 2011-06-29 株式会社ニコン Reticle conveying apparatus, exposure apparatus, and reticle conveying method
US7607543B2 (en) * 2005-02-27 2009-10-27 Entegris, Inc. Reticle pod with isolation system
EP1928764B1 (en) * 2005-09-27 2011-11-02 Entegris, Inc. Reticle pod
TWI411563B (en) * 2009-09-25 2013-10-11 Gudeng Prec Industral Co Ltd Reticle pod
USD712364S1 (en) * 2012-05-09 2014-09-02 Gudeng Precision Industrial Co., Ltd. EUV pod
USD732482S1 (en) * 2013-03-01 2015-06-23 Randl Industries, Inc. Plaster ring
USD807303S1 (en) * 2016-09-06 2018-01-09 S.J. Electro Systems, Inc. Panel enclosure
TWI579215B (en) * 2016-10-07 2017-04-21 家登精密工業股份有限公司 Vertical Fixing Transmission Box and Transmission Method Using the Same
US11249392B2 (en) * 2017-01-25 2022-02-15 Gudeng Precision Industrial Co., Ltd EUV reticle pod
USD917402S1 (en) * 2017-08-22 2021-04-27 Foxconn Interconnect Technology Limited Protective cap
TWI690771B (en) * 2018-01-11 2020-04-11 家登精密工業股份有限公司 Photomask pressing unit and extreme ultraviolet photomask container using the same
TWI693671B (en) * 2019-04-16 2020-05-11 家登精密工業股份有限公司 Reticle pod and gripping unit thereof
CN112289718A (en) * 2019-07-13 2021-01-29 家登精密工业股份有限公司 Substrate carrier and gas diffusion module thereof
TWI705522B (en) * 2019-07-30 2020-09-21 家登精密工業股份有限公司 Apparatus for containing a substrate and method of manufacturing the apparatus
US11442370B2 (en) * 2019-10-16 2022-09-13 Gudeng Precision Industrial Co., Ltd Reticle retaining system

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW201523126A (en) 2013-10-31 2015-06-16 Entegris Inc A modular reticle pod system
TW201640219A (en) 2015-03-18 2016-11-16 安堤格里斯公司 Substrate container, seal member, door assembly and method of assembling the same for a reticle pod

Also Published As

Publication number Publication date
USD964948S1 (en) 2022-09-27

Similar Documents

Publication Publication Date Title
TWD209927S (en) Top cover of reticle transfer box
TWD209928S (en) The base of the mask transfer box
TWD207742S (en) Process shield for a substrate processing chamber
TWD210894S (en) Process shield for a substrate processing chamber
TWD209150S (en) Susceptor shaft
TWD209793S (en) Transportable semiconductor wafer rack
TWD211239S (en) Wafer holder part
TWD209426S (en) The base of the mask transfer box
TWD203878S (en) Parts of the box
TWD209117S (en) Top cover of reticle transfer box
TWD214307S (en) Support for upper cover of reticle box
TWD211387S (en) Lower shield for a substrate processing chamber
TWD202849S (en) Substrate retaining ring
TWD209792S (en) Transportable semiconductor wafer rack
TWD217848S (en) Susceptor support
TWD211778S (en) Mask box
TWD194379S (en) Tubes
TWD214590S (en) Packaging container
TWD237543S (en) Reticle Box
TWD203974S (en) Substrate retaining ring
TWD203064S (en) Substrate retaining ring
TWD210793S (en) Part of the mask
TWD209073S (en) Part of the packing box
TWD211779S (en) Mask box connector
TWD222403S (en) Part of the mask