CN101076712A - 用于分析表面的视觉特性的装置和方法 - Google Patents

用于分析表面的视觉特性的装置和方法 Download PDF

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Publication number
CN101076712A
CN101076712A CNA2005800427576A CN200580042757A CN101076712A CN 101076712 A CN101076712 A CN 101076712A CN A2005800427576 A CNA2005800427576 A CN A2005800427576A CN 200580042757 A CN200580042757 A CN 200580042757A CN 101076712 A CN101076712 A CN 101076712A
Authority
CN
China
Prior art keywords
sample
chamber
cavity
light
inwall
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CNA2005800427576A
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English (en)
Chinese (zh)
Inventor
S·L·恩乔
I·B·N·范德兰斯
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Akzo Nobel Coatings International BV
Original Assignee
Akzo Nobel Coatings International BV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Akzo Nobel Coatings International BV filed Critical Akzo Nobel Coatings International BV
Publication of CN101076712A publication Critical patent/CN101076712A/zh
Pending legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J1/00—Photometry, e.g. photographic exposure meter
    • G01J1/48—Photometry, e.g. photographic exposure meter using chemical effects
    • G01J1/52—Photometry, e.g. photographic exposure meter using chemical effects using photographic effects
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J1/00—Photometry, e.g. photographic exposure meter
    • G01J1/02—Details
    • G01J1/04—Optical or mechanical part supplementary adjustable parts
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J1/00—Photometry, e.g. photographic exposure meter
    • G01J1/02—Details
    • G01J1/08—Arrangements of light sources specially adapted for photometry standard sources, also using luminescent or radioactive material
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8806—Specially adapted optical and illumination features
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J1/00—Photometry, e.g. photographic exposure meter
    • G01J1/02—Details
    • G01J1/0214—Constructional arrangements for removing stray light
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J1/00—Photometry, e.g. photographic exposure meter
    • G01J1/02—Details
    • G01J1/0223—Sample holders for photometry

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Microscoopes, Condenser (AREA)
  • Image Input (AREA)
  • Image Processing (AREA)
  • Length Measuring Devices By Optical Means (AREA)
CNA2005800427576A 2004-12-14 2005-12-13 用于分析表面的视觉特性的装置和方法 Pending CN101076712A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP04078382.1 2004-12-14
EP04078382 2004-12-14

Publications (1)

Publication Number Publication Date
CN101076712A true CN101076712A (zh) 2007-11-21

Family

ID=34928732

Family Applications (1)

Application Number Title Priority Date Filing Date
CNA2005800427576A Pending CN101076712A (zh) 2004-12-14 2005-12-13 用于分析表面的视觉特性的装置和方法

Country Status (9)

Country Link
US (1) US20070273885A1 (enExample)
EP (1) EP1831655A1 (enExample)
JP (1) JP2008523521A (enExample)
KR (1) KR20070085589A (enExample)
CN (1) CN101076712A (enExample)
AU (1) AU2005315602A1 (enExample)
BR (1) BRPI0519038A2 (enExample)
RU (1) RU2007126795A (enExample)
WO (1) WO2006064010A1 (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104964979A (zh) * 2008-07-25 2015-10-07 德比尔斯百年公司 宝石观察器
US12148146B2 (en) 2019-09-19 2024-11-19 Ppg Industries Ohio, Inc. Systems and methods for mapping coatings to a spatial appearance space

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2019184537A (ja) * 2018-04-17 2019-10-24 日本ペイント・オートモーティブコーティングス株式会社 外観評価装置及び外観評価方法
JP7632472B2 (ja) * 2020-09-25 2025-02-19 コニカミノルタ株式会社 光学特性測定装置及び光学特性測定方法
KR102890328B1 (ko) 2021-11-12 2025-11-24 포항공과대학교 산학협력단 다중감각미디어시스템에서 질감모션효과를 제공하는 방법 및 모션효과렌더링장치

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4032327A1 (de) * 1990-10-11 1992-04-16 Abos Automation Bildverarbeitu Verfahren und vorrichtung zur automatisierten ueberwachung der herstellung von halbleiterbauteilen
US5365084A (en) * 1991-02-20 1994-11-15 Pressco Technology, Inc. Video inspection system employing multiple spectrum LED illumination
DE4413832C2 (de) * 1994-04-20 2000-05-31 Siemens Ag Vorrichtungen zur Kontrolle von Halbleiterscheiben
US6034769A (en) * 1997-06-27 2000-03-07 Yufa; Aleksandr L. Method and device for counting and measuring particles
US6207946B1 (en) * 1998-09-03 2001-03-27 Semiconductor Technologies & Instruments, Inc. Adaptive lighting system and method for machine vision apparatus
JP3626387B2 (ja) * 2000-02-04 2005-03-09 関西ペイント株式会社 コンピュータ調色装置及びこの装置を用いた塗料の調色方法
DE10106032B4 (de) * 2000-02-25 2006-11-16 Laser-Laboratorium Göttingen eV Vorrichtung zur homogenen Ausleuchtung einer kleinen Fläche mit einer Ulbricht'schen Kugel
WO2003030524A2 (en) 2001-10-04 2003-04-10 Digieye Plc. A method of predicting reflectance functions
EP1516284A2 (en) * 2002-06-21 2005-03-23 Pressco Technology, Inc. Patterned illumination method and apparatus for machine vision systems

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104964979A (zh) * 2008-07-25 2015-10-07 德比尔斯百年公司 宝石观察器
US12148146B2 (en) 2019-09-19 2024-11-19 Ppg Industries Ohio, Inc. Systems and methods for mapping coatings to a spatial appearance space

Also Published As

Publication number Publication date
WO2006064010A1 (en) 2006-06-22
AU2005315602A1 (en) 2006-06-22
BRPI0519038A2 (pt) 2008-12-23
KR20070085589A (ko) 2007-08-27
JP2008523521A (ja) 2008-07-03
EP1831655A1 (en) 2007-09-12
RU2007126795A (ru) 2009-01-27
US20070273885A1 (en) 2007-11-29

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C02 Deemed withdrawal of patent application after publication (patent law 2001)
WD01 Invention patent application deemed withdrawn after publication

Open date: 20071121