CN101024736B - 包含氧化铝的分散体、包含这种分散体和三聚氰胺树脂的制备物以及通过这种制备物制备的固化产品 - Google Patents
包含氧化铝的分散体、包含这种分散体和三聚氰胺树脂的制备物以及通过这种制备物制备的固化产品 Download PDFInfo
- Publication number
- CN101024736B CN101024736B CN2007100051925A CN200710005192A CN101024736B CN 101024736 B CN101024736 B CN 101024736B CN 2007100051925 A CN2007100051925 A CN 2007100051925A CN 200710005192 A CN200710005192 A CN 200710005192A CN 101024736 B CN101024736 B CN 101024736B
- Authority
- CN
- China
- Prior art keywords
- dispersion
- preparation
- alumina
- dispersion according
- acid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 239000006185 dispersion Substances 0.000 title claims abstract description 87
- 238000002360 preparation method Methods 0.000 title claims abstract description 24
- 229920000877 Melamine resin Polymers 0.000 title claims abstract description 21
- 239000004640 Melamine resin Substances 0.000 title claims abstract description 18
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 title claims description 30
- PNEYBMLMFCGWSK-UHFFFAOYSA-N Alumina Chemical compound [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims abstract description 54
- 239000002253 acid Substances 0.000 claims abstract description 33
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 20
- 150000003839 salts Chemical class 0.000 claims abstract description 15
- 239000011164 primary particle Substances 0.000 claims abstract description 5
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims abstract description 4
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 claims abstract description 3
- 239000002245 particle Substances 0.000 claims description 22
- 150000001875 compounds Chemical class 0.000 claims description 17
- 238000000034 method Methods 0.000 claims description 15
- BVKZGUZCCUSVTD-UHFFFAOYSA-N carbonic acid Chemical compound OC(O)=O BVKZGUZCCUSVTD-UHFFFAOYSA-N 0.000 claims description 14
- 239000000203 mixture Substances 0.000 claims description 14
- 125000000217 alkyl group Chemical group 0.000 claims description 10
- 125000004432 carbon atom Chemical group C* 0.000 claims description 10
- 125000003118 aryl group Chemical group 0.000 claims description 9
- 230000007062 hydrolysis Effects 0.000 claims description 7
- 238000006460 hydrolysis reaction Methods 0.000 claims description 7
- 239000000843 powder Substances 0.000 claims description 7
- 239000000126 substance Substances 0.000 claims description 6
- 230000008569 process Effects 0.000 claims description 5
- 125000005372 silanol group Chemical group 0.000 claims description 5
- 150000003009 phosphonic acids Chemical group 0.000 claims description 4
- 239000007864 aqueous solution Substances 0.000 claims description 3
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 claims description 3
- 238000010438 heat treatment Methods 0.000 claims description 3
- 238000004519 manufacturing process Methods 0.000 claims description 3
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 3
- 230000004048 modification Effects 0.000 claims description 3
- 238000012986 modification Methods 0.000 claims description 3
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 claims description 3
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 claims description 2
- ABLZXFCXXLZCGV-UHFFFAOYSA-N Phosphorous acid Chemical compound OP(O)=O ABLZXFCXXLZCGV-UHFFFAOYSA-N 0.000 claims 5
- 238000003756 stirring Methods 0.000 claims 2
- 125000002947 alkylene group Chemical group 0.000 claims 1
- 230000001698 pyrogenic effect Effects 0.000 claims 1
- 239000000758 substrate Substances 0.000 claims 1
- 150000007513 acids Chemical class 0.000 abstract 2
- -1 phospho Chemical class 0.000 description 31
- 239000000047 product Substances 0.000 description 30
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 24
- 239000011248 coating agent Substances 0.000 description 12
- 238000000576 coating method Methods 0.000 description 12
- 238000000197 pyrolysis Methods 0.000 description 9
- 229960004106 citric acid Drugs 0.000 description 8
- 125000003277 amino group Chemical group 0.000 description 7
- 238000010008 shearing Methods 0.000 description 7
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 6
- VSCWAEJMTAWNJL-UHFFFAOYSA-K aluminium trichloride Chemical compound Cl[Al](Cl)Cl VSCWAEJMTAWNJL-UHFFFAOYSA-K 0.000 description 4
- 239000003795 chemical substances by application Substances 0.000 description 4
- FZHAPNGMFPVSLP-UHFFFAOYSA-N silanamine Chemical compound [SiH3]N FZHAPNGMFPVSLP-UHFFFAOYSA-N 0.000 description 4
- 239000000243 solution Substances 0.000 description 4
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical group Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 3
- 239000008367 deionised water Substances 0.000 description 3
- 229910021641 deionized water Inorganic materials 0.000 description 3
- 230000002349 favourable effect Effects 0.000 description 3
- 238000000227 grinding Methods 0.000 description 3
- 229910052739 hydrogen Inorganic materials 0.000 description 3
- 150000001282 organosilanes Chemical class 0.000 description 3
- WGYKZJWCGVVSQN-UHFFFAOYSA-N propylamine Chemical compound CCCN WGYKZJWCGVVSQN-UHFFFAOYSA-N 0.000 description 3
- 235000011121 sodium hydroxide Nutrition 0.000 description 3
- 230000003595 spectral effect Effects 0.000 description 3
- JJJOZVFVARQUJV-UHFFFAOYSA-N 2-ethylhexylphosphonic acid Chemical compound CCCCC(CC)CP(O)(O)=O JJJOZVFVARQUJV-UHFFFAOYSA-N 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- XZMCDFZZKTWFGF-UHFFFAOYSA-N Cyanamide Chemical compound NC#N XZMCDFZZKTWFGF-UHFFFAOYSA-N 0.000 description 2
- RPNUMPOLZDHAAY-UHFFFAOYSA-N Diethylenetriamine Chemical compound NCCNCCN RPNUMPOLZDHAAY-UHFFFAOYSA-N 0.000 description 2
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 2
- 238000013019 agitation Methods 0.000 description 2
- 125000001931 aliphatic group Chemical group 0.000 description 2
- 239000003513 alkali Substances 0.000 description 2
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 2
- 239000010431 corundum Substances 0.000 description 2
- 229910052593 corundum Inorganic materials 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- 229910000077 silane Inorganic materials 0.000 description 2
- SCPYDCQAZCOKTP-UHFFFAOYSA-N silanol Chemical compound [SiH3]O SCPYDCQAZCOKTP-UHFFFAOYSA-N 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 238000007669 thermal treatment Methods 0.000 description 2
- WYTZZXDRDKSJID-UHFFFAOYSA-N (3-aminopropyl)triethoxysilane Chemical compound CCO[Si](OCC)(OCC)CCCN WYTZZXDRDKSJID-UHFFFAOYSA-N 0.000 description 1
- DXIYRKVXLUOOON-UHFFFAOYSA-N (hydroxyamino)phosphonic acid Chemical class ONP(O)(O)=O DXIYRKVXLUOOON-UHFFFAOYSA-N 0.000 description 1
- QHDDRDRAOHTCKB-UHFFFAOYSA-N C1=CC=C(C(=C1)N)OP(=O)(CP(=O)(O)O)O Chemical compound C1=CC=C(C(=C1)N)OP(=O)(CP(=O)(O)O)O QHDDRDRAOHTCKB-UHFFFAOYSA-N 0.000 description 1
- FEWJPZIEWOKRBE-JCYAYHJZSA-N Dextrotartaric acid Chemical compound OC(=O)[C@H](O)[C@@H](O)C(O)=O FEWJPZIEWOKRBE-JCYAYHJZSA-N 0.000 description 1
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 1
- 206010013786 Dry skin Diseases 0.000 description 1
- 229940120146 EDTMP Drugs 0.000 description 1
- QUSNBJAOOMFDIB-UHFFFAOYSA-N Ethylamine Chemical compound CCN QUSNBJAOOMFDIB-UHFFFAOYSA-N 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- WDZSBBQIFWIRCR-UHFFFAOYSA-N NOP(=O)ON Chemical class NOP(=O)ON WDZSBBQIFWIRCR-UHFFFAOYSA-N 0.000 description 1
- VDVJBLBBQLHKKM-UHFFFAOYSA-N OOP(=O)OO Chemical class OOP(=O)OO VDVJBLBBQLHKKM-UHFFFAOYSA-N 0.000 description 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical class OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 1
- 229920001807 Urea-formaldehyde Polymers 0.000 description 1
- KIDJHPQACZGFTI-UHFFFAOYSA-N [6-[bis(phosphonomethyl)amino]hexyl-(phosphonomethyl)amino]methylphosphonic acid Chemical compound OP(O)(=O)CN(CP(O)(O)=O)CCCCCCN(CP(O)(O)=O)CP(O)(O)=O KIDJHPQACZGFTI-UHFFFAOYSA-N 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 150000007933 aliphatic carboxylic acids Chemical class 0.000 description 1
- 150000004996 alkyl benzenes Chemical class 0.000 description 1
- 125000001118 alkylidene group Chemical group 0.000 description 1
- 229920003180 amino resin Polymers 0.000 description 1
- 125000004103 aminoalkyl group Chemical group 0.000 description 1
- 235000011114 ammonium hydroxide Nutrition 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 229960002303 citric acid monohydrate Drugs 0.000 description 1
- 230000003750 conditioning effect Effects 0.000 description 1
- 239000007822 coupling agent Substances 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000012470 diluted sample Substances 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000002296 dynamic light scattering Methods 0.000 description 1
- NFDRPXJGHKJRLJ-UHFFFAOYSA-N edtmp Chemical group OP(O)(=O)CN(CP(O)(O)=O)CCN(CP(O)(O)=O)CP(O)(O)=O NFDRPXJGHKJRLJ-UHFFFAOYSA-N 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 230000004927 fusion Effects 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 238000009998 heat setting Methods 0.000 description 1
- 238000010316 high energy milling Methods 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 239000000413 hydrolysate Substances 0.000 description 1
- 230000008676 import Effects 0.000 description 1
- 239000003999 initiator Substances 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000007791 liquid phase Substances 0.000 description 1
- 238000003760 magnetic stirring Methods 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 150000007974 melamines Chemical class 0.000 description 1
- 229940102859 methylene diphosphonate Drugs 0.000 description 1
- HPEUEJRPDGMIMY-IFQPEPLCSA-N molybdopterin Chemical compound O([C@H]1N2)[C@H](COP(O)(O)=O)C(S)=C(S)[C@@H]1NC1=C2N=C(N)NC1=O HPEUEJRPDGMIMY-IFQPEPLCSA-N 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- YWAKXRMUMFPDSH-UHFFFAOYSA-N pentene Chemical compound CCCC=C YWAKXRMUMFPDSH-UHFFFAOYSA-N 0.000 description 1
- 239000012071 phase Substances 0.000 description 1
- PTMHPRAIXMAOOB-UHFFFAOYSA-N phosphoramidic acid Chemical compound NP(O)(O)=O PTMHPRAIXMAOOB-UHFFFAOYSA-N 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 238000000518 rheometry Methods 0.000 description 1
- 238000004062 sedimentation Methods 0.000 description 1
- 230000011218 segmentation Effects 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- 229920002545 silicone oil Polymers 0.000 description 1
- 238000007711 solidification Methods 0.000 description 1
- 230000008023 solidification Effects 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 239000011029 spinel Substances 0.000 description 1
- 229910052596 spinel Inorganic materials 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- BDHFUVZGWQCTTF-UHFFFAOYSA-M sulfonate Chemical compound [O-]S(=O)=O BDHFUVZGWQCTTF-UHFFFAOYSA-M 0.000 description 1
- 229920003002 synthetic resin Polymers 0.000 description 1
- 239000000057 synthetic resin Substances 0.000 description 1
- 229940095064 tartrate Drugs 0.000 description 1
- 150000005622 tetraalkylammonium hydroxides Chemical class 0.000 description 1
- 238000004448 titration Methods 0.000 description 1
- 238000009827 uniform distribution Methods 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09C—TREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS, TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES ; PREPARATION OF CARBON BLACK ; PREPARATION OF INORGANIC MATERIALS WHICH ARE NO SINGLE CHEMICAL COMPOUNDS AND WHICH ARE MAINLY USED AS PIGMENTS OR FILLERS
- C09C1/00—Treatment of specific inorganic materials other than fibrous fillers; Preparation of carbon black
- C09C1/40—Compounds of aluminium
- C09C1/407—Aluminium oxides or hydroxides
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/50—Agglomerated particles
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2004/00—Particle morphology
- C01P2004/60—Particles characterised by their size
- C01P2004/64—Nanometer sized, i.e. from 1-100 nanometer
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/12—Surface area
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/22—Rheological behaviour as dispersion, e.g. viscosity, sedimentation stability
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Nanotechnology (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Materials Engineering (AREA)
- Crystallography & Structural Chemistry (AREA)
- Composite Materials (AREA)
- Organic Chemistry (AREA)
- Colloid Chemistry (AREA)
- Paints Or Removers (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Pigments, Carbon Blacks, Or Wood Stains (AREA)
- Compounds Of Alkaline-Earth Elements, Aluminum Or Rare-Earth Metals (AREA)
- Catalysts (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102006007888.8 | 2006-02-21 | ||
| DE102006007888A DE102006007888A1 (de) | 2006-02-21 | 2006-02-21 | Aluminiumoxid enthaltende Dispersion, Zubereitung enthaltend diese Dispersion und ein Melaminharz und mittels dieser Zubereitung hergestelles gehärtetes Produkt |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN101024736A CN101024736A (zh) | 2007-08-29 |
| CN101024736B true CN101024736B (zh) | 2011-03-30 |
Family
ID=37836898
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2007100051925A Expired - Fee Related CN101024736B (zh) | 2006-02-21 | 2007-02-15 | 包含氧化铝的分散体、包含这种分散体和三聚氰胺树脂的制备物以及通过这种制备物制备的固化产品 |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US7834076B2 (https=) |
| EP (1) | EP1987095B1 (https=) |
| JP (1) | JP5215874B2 (https=) |
| CN (1) | CN101024736B (https=) |
| AT (1) | ATE490997T1 (https=) |
| DE (2) | DE102006007888A1 (https=) |
| ES (1) | ES2357696T3 (https=) |
| WO (1) | WO2007096226A1 (https=) |
Families Citing this family (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102005059961A1 (de) * | 2005-12-15 | 2007-06-28 | Degussa Gmbh | Hochgefüllte Aluminiumoxid enthaltende Dispersionen |
| DE102007021199B4 (de) * | 2006-07-17 | 2016-02-11 | Evonik Degussa Gmbh | Zusammensetzungen aus organischem Polymer als Matrix und anorganischen Partikeln als Füllstoff, Verfahren zu deren Herstellung sowie deren Verwendung und damit hergestellte Formkörper |
| US9205155B2 (en) | 2009-10-30 | 2015-12-08 | General Electric Company | Treating water insoluble nanoparticles with hydrophilic alpha-hydroxyphosphonic acid conjugates, the so modified nanoparticles and their use as contrast agents |
| JP5582999B2 (ja) * | 2010-12-20 | 2014-09-03 | 多木化学株式会社 | アルミナコロイド含有水溶液の製造方法及び該製造方法で得られたアルミナコロイド含有水溶液 |
| JP5733758B2 (ja) * | 2011-12-27 | 2015-06-10 | 多木化学株式会社 | 無機材料の結着方法 |
| US9474810B2 (en) * | 2012-03-02 | 2016-10-25 | General Electric Company | Superparamagnetic nanoparticles with PEG substituted α-hydroxy phosphonate shells |
| JP6253178B2 (ja) * | 2013-05-23 | 2017-12-27 | 多木化学株式会社 | アルミナ分散液の製造方法 |
| WO2020072607A1 (en) * | 2018-10-03 | 2020-04-09 | Sasol (Usa) Corporation | Aluminas and methods for producing same |
| WO2024175389A1 (en) | 2023-02-21 | 2024-08-29 | Evonik Operations Gmbh | Aluminum oxide dispersions for use as separator coating in secondary batteries |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2004096941A1 (en) * | 2003-04-25 | 2004-11-11 | Saint-Gobain Ceramics & Plastics, Inc. | Methods for machining ceramics |
| CN1561376A (zh) * | 2001-09-03 | 2005-01-05 | 昭和电工株式会社 | 抛光组合物 |
| JP2005023313A (ja) * | 2003-06-13 | 2005-01-27 | Showa Denko Kk | 研磨用組成物および研磨方法 |
Family Cites Families (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE19943291A1 (de) * | 1999-09-10 | 2001-03-15 | Degussa | Pyrogen hergestelltes Aluminiumoxid |
| US6887559B1 (en) * | 1999-10-01 | 2005-05-03 | Cabot Corporation | Recording medium |
| DE19952383A1 (de) * | 1999-10-30 | 2001-05-17 | Henkel Kgaa | Wasch- und Reinigungsmittel |
| JP2001200023A (ja) | 2000-01-17 | 2001-07-24 | Jsr Corp | 硬化性組成物、その硬化物及び積層体 |
| US6399670B1 (en) | 2000-01-21 | 2002-06-04 | Congoleum Corporation | Coating having macroscopic texture and process for making same |
| WO2003020839A1 (en) | 2001-09-03 | 2003-03-13 | Showa Denko K.K. | Polishing composition |
| DE10225125A1 (de) * | 2002-06-06 | 2003-12-18 | Goldschmidt Ag Th | Wässerige Dispersion enthaltend pyrogen hergestellte Metalloxidpartikel und Dispergierhilfsmittel |
| US7244498B2 (en) * | 2002-06-12 | 2007-07-17 | Tda Research, Inc. | Nanoparticles modified with multiple organic acids |
| DE10304849A1 (de) * | 2003-02-06 | 2004-08-19 | Institut für Neue Materialien gemeinnützige Gesellschaft mit beschränkter Haftung | Chemomechanische Herstellung von Funktionskolloiden |
| WO2004111145A1 (en) | 2003-06-13 | 2004-12-23 | Showa Denko K.K. | Polishing composition and polishing method |
| JP4347622B2 (ja) * | 2003-06-27 | 2009-10-21 | 学校法人日本大学 | 親水性薄膜の製造方法および親水性薄膜 |
| GB2433515B (en) * | 2005-12-22 | 2011-05-04 | Kao Corp | Polishing composition for hard disk substrate |
-
2006
- 2006-02-21 DE DE102006007888A patent/DE102006007888A1/de not_active Withdrawn
-
2007
- 2007-01-26 WO PCT/EP2007/050779 patent/WO2007096226A1/en not_active Ceased
- 2007-01-26 DE DE602007011040T patent/DE602007011040D1/de active Active
- 2007-01-26 US US12/159,998 patent/US7834076B2/en not_active Expired - Fee Related
- 2007-01-26 AT AT07726236T patent/ATE490997T1/de not_active IP Right Cessation
- 2007-01-26 ES ES07726236T patent/ES2357696T3/es active Active
- 2007-01-26 JP JP2008555727A patent/JP5215874B2/ja not_active Expired - Fee Related
- 2007-01-26 EP EP07726236A patent/EP1987095B1/en not_active Not-in-force
- 2007-02-15 CN CN2007100051925A patent/CN101024736B/zh not_active Expired - Fee Related
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1561376A (zh) * | 2001-09-03 | 2005-01-05 | 昭和电工株式会社 | 抛光组合物 |
| WO2004096941A1 (en) * | 2003-04-25 | 2004-11-11 | Saint-Gobain Ceramics & Plastics, Inc. | Methods for machining ceramics |
| JP2005023313A (ja) * | 2003-06-13 | 2005-01-27 | Showa Denko Kk | 研磨用組成物および研磨方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| ES2357696T3 (es) | 2011-04-28 |
| WO2007096226A1 (en) | 2007-08-30 |
| EP1987095B1 (en) | 2010-12-08 |
| CN101024736A (zh) | 2007-08-29 |
| ATE490997T1 (de) | 2010-12-15 |
| DE602007011040D1 (de) | 2011-01-20 |
| US20090111919A1 (en) | 2009-04-30 |
| JP5215874B2 (ja) | 2013-06-19 |
| JP2009527444A (ja) | 2009-07-30 |
| DE102006007888A1 (de) | 2007-08-23 |
| US7834076B2 (en) | 2010-11-16 |
| EP1987095A1 (en) | 2008-11-05 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN101024736B (zh) | 包含氧化铝的分散体、包含这种分散体和三聚氰胺树脂的制备物以及通过这种制备物制备的固化产品 | |
| US10723628B2 (en) | SiO2 containing dispersion with high salt stability | |
| US8900658B2 (en) | Metal effect pigments coated with SiO2, method for producing said metallic effect pigments and use | |
| CN102352168B (zh) | 一种镁合金用防腐耐磨涂料及其制备方法 | |
| US8641925B2 (en) | Use of yttrium, zirconium, lanthanum, cerium, praseodymium and/or neodymium as reinforcing agent for an anticorrosion coating composition | |
| AU2010223304B2 (en) | Aqueous silanized silica dispersion | |
| CN102618165B (zh) | 纳米聚硅氧烷无毒低表面能船舶防污涂料及其制备方法 | |
| CN101802036B (zh) | 酚醛树脂配制品以及用于磨料产品的涂层 | |
| US7846409B2 (en) | Deagglomerated barium sulfate | |
| CN107922199A (zh) | 具有高盐稳定性的含SiO2的分散体 | |
| CN107779052A (zh) | 一种含偶联分散改性颜填料的防腐型环氧树脂带绣涂料的制备方法 | |
| EP1554220A1 (en) | Colloidal silica dispersion | |
| KR101583688B1 (ko) | 실리카 입자, 그 제조 방법 및 수지 입자 | |
| CN111320917A (zh) | 汽车板簧涂装的水性单组分环氧防腐涂料及其制备方法 | |
| US10920084B2 (en) | Metal oxide-containing dispersion with high salt stability | |
| KR20190071602A (ko) | 트리메틸술폭소늄 양이온을 갖는 실리카를 함유하는 cmp 슬러리 조성물 | |
| JP2024525103A (ja) | アルキルホスフィン酸塩組成物及びその製造方法と応用 | |
| CA3143084A1 (en) | Stabilized gypsum particles | |
| US20250129253A1 (en) | Modified layered silicate novel barrier and shielding pigment and method thereof | |
| JP5292809B2 (ja) | 超微粒子硫酸バリウム、水性塗料組成物及び水性インキ組成物 | |
| JPH09156924A (ja) | 硫酸バリウムとその製造方法ならびに樹脂組成物 | |
| CN115838544B (zh) | 改性层状硅酸盐新颖阻隔屏蔽颜料及其制备方法 | |
| CN110982387A (zh) | 一种在金属底材表面具有良好附着力与防腐性的水性环氧涂料及制备方法 | |
| CN107573744A (zh) | 利用棒销式纳米球磨机制备磷酸锌系复合防锈颜料的方法 | |
| TW200521195A (en) | Non-aqueous coating compositions |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20110330 Termination date: 20160215 |