AU2002334406A1 - Polishing composition - Google Patents

Polishing composition

Info

Publication number
AU2002334406A1
AU2002334406A1 AU2002334406A AU2002334406A AU2002334406A1 AU 2002334406 A1 AU2002334406 A1 AU 2002334406A1 AU 2002334406 A AU2002334406 A AU 2002334406A AU 2002334406 A AU2002334406 A AU 2002334406A AU 2002334406 A1 AU2002334406 A1 AU 2002334406A1
Authority
AU
Australia
Prior art keywords
polishing composition
polishing
composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2002334406A
Inventor
Junichiro Ando
Gong-Hong Hong
Norihiko Miyata
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Yamaguchi Seiken Kogyo Co Ltd
Resonac Holdings Corp
Original Assignee
Showa Denko KK
Yamaguchi Seiken Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2002132738A external-priority patent/JP4074126B2/en
Application filed by Showa Denko KK, Yamaguchi Seiken Kogyo Co Ltd filed Critical Showa Denko KK
Publication of AU2002334406A1 publication Critical patent/AU2002334406A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09G—POLISHING COMPOSITIONS; SKI WAXES
    • C09G1/00—Polishing compositions
    • C09G1/02—Polishing compositions containing abrasives or grinding agents
AU2002334406A 2001-09-03 2002-09-03 Polishing composition Abandoned AU2002334406A1 (en)

Applications Claiming Priority (7)

Application Number Priority Date Filing Date Title
JP2001-266315 2001-09-03
JP2001266315 2001-09-03
US31796201P 2001-09-10 2001-09-10
US60/317,962 2001-09-10
JP2002-132738 2002-05-08
JP2002132738A JP4074126B2 (en) 2001-09-03 2002-05-08 Polishing composition
PCT/JP2002/008925 WO2003020839A1 (en) 2001-09-03 2002-09-03 Polishing composition

Publications (1)

Publication Number Publication Date
AU2002334406A1 true AU2002334406A1 (en) 2003-03-18

Family

ID=27347431

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2002334406A Abandoned AU2002334406A1 (en) 2001-09-03 2002-09-03 Polishing composition

Country Status (4)

Country Link
US (1) US20050028449A1 (en)
EP (1) EP1425357A1 (en)
AU (1) AU2002334406A1 (en)
WO (1) WO2003020839A1 (en)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7306748B2 (en) * 2003-04-25 2007-12-11 Saint-Gobain Ceramics & Plastics, Inc. Methods for machining ceramics
WO2004111145A1 (en) * 2003-06-13 2004-12-23 Showa Denko K.K. Polishing composition and polishing method
JP4202201B2 (en) * 2003-07-03 2008-12-24 株式会社フジミインコーポレーテッド Polishing composition
JP4644434B2 (en) 2004-03-24 2011-03-02 株式会社フジミインコーポレーテッド Polishing composition
JP4267546B2 (en) * 2004-04-06 2009-05-27 花王株式会社 Substrate manufacturing method
JP2006077127A (en) * 2004-09-09 2006-03-23 Fujimi Inc Polishing composition and polishing method using the composition
US7678702B2 (en) * 2005-08-31 2010-03-16 Air Products And Chemicals, Inc. CMP composition of boron surface-modified abrasive and nitro-substituted sulfonic acid and method of use
US20070075042A1 (en) * 2005-10-05 2007-04-05 Siddiqui Junaid A Stabilizer-Fenton's reaction metal-vinyl pyridine polymer-surface-modified chemical mechanical planarization composition and associated method
DE102006007888A1 (en) * 2006-02-21 2007-08-23 Degussa Gmbh Aqueous alumina dispersion for use in melamine resin formulation for making cured product e.g. laminate for furniture or flooring contains highly disperse alumina surface modified with amino- and/or hydroxy-substituted organophosphonic acid
SG139699A1 (en) 2006-08-02 2008-02-29 Fujimi Inc Polishing composition and polishing process
US20090124173A1 (en) * 2007-11-09 2009-05-14 Cabot Microelectronics Corporation Compositions and methods for ruthenium and tantalum barrier cmp
JP2009164186A (en) 2007-12-28 2009-07-23 Fujimi Inc Polishing composition
US8974561B2 (en) * 2011-09-30 2015-03-10 Hoya Corporation Manufacturing method of glass substrate for magnetic disk, magnetic disk, and magnetic recording / reproducing device
JP6940315B2 (en) * 2017-06-22 2021-09-22 山口精研工業株式会社 Abrasive composition for magnetic disk substrates

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5783489A (en) * 1996-09-24 1998-07-21 Cabot Corporation Multi-oxidizer slurry for chemical mechanical polishing
WO1998023697A1 (en) * 1996-11-26 1998-06-04 Cabot Corporation Composition and method for polishing rigid disks
US5759917A (en) * 1996-12-30 1998-06-02 Cabot Corporation Composition for oxide CMP
US6217416B1 (en) * 1998-06-26 2001-04-17 Cabot Microelectronics Corporation Chemical mechanical polishing slurry useful for copper/tantalum substrates
DE60015411T2 (en) * 1999-03-18 2005-10-27 Kabushiki Kaisha Toshiba, Kawasaki Aqueous dispersion slurry for chemical mechanical polishing process
WO2001012741A1 (en) * 1999-08-13 2001-02-22 Cabot Microelectronics Corporation Polishing system with stopping compound and method of its use
US6527817B1 (en) * 1999-11-15 2003-03-04 Cabot Microelectronics Corporation Composition and method for planarizing surfaces
US6471884B1 (en) * 2000-04-04 2002-10-29 Cabot Microelectronics Corporation Method for polishing a memory or rigid disk with an amino acid-containing composition
JP2003530227A (en) * 2000-04-07 2003-10-14 キャボット マイクロエレクトロニクス コーポレイション Integrated chemical mechanical polishing

Also Published As

Publication number Publication date
EP1425357A1 (en) 2004-06-09
WO2003020839A1 (en) 2003-03-13
WO2003020839A8 (en) 2004-04-15
US20050028449A1 (en) 2005-02-10

Similar Documents

Publication Publication Date Title
AU2003215261A1 (en) Polishing composition
AU2002363477A1 (en) Chemical mechanical polishing compositions
AU2002359200A1 (en) New composition
AU2002360661A1 (en) Polishing pad
AU2002332019A1 (en) Adjuvant compositions
AU2002366308A1 (en) Rubber composition
AU2002249895A1 (en) Autoantigen composition
AU2002359320A1 (en) Novel anit-infectives
AU2002241114A1 (en) Composition
AU2002334406A1 (en) Polishing composition
AU2002359464A1 (en) Angiopioetin related factors
AU2002354567A1 (en) Not given
AU2002329703A1 (en) Metal polishing
GB2385057B (en) Polishing composition
AU2002366218A1 (en) Cleaning composition
AUPR311101A0 (en) Slurry-chum polish
AU2002348114A1 (en) E1-revertant-free adenoviral composition
AU2002321593A1 (en) Composition
AU2002238835A1 (en) Fenofibrate-containing composition
AU2002257631A1 (en) Perticidal composition
AU2002301193A1 (en) Sander
AU2002313736A1 (en) Cleaning composition
AU2002251750A1 (en) Cleaning composition
AU2002334588A1 (en) Cleaning composition
AU2001236040A1 (en) Skin-improving composition set

Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase