CN100547014C - 高折射率聚硅氧烷及其制备 - Google Patents
高折射率聚硅氧烷及其制备 Download PDFInfo
- Publication number
- CN100547014C CN100547014C CNB028166167A CN02816616A CN100547014C CN 100547014 C CN100547014 C CN 100547014C CN B028166167 A CNB028166167 A CN B028166167A CN 02816616 A CN02816616 A CN 02816616A CN 100547014 C CN100547014 C CN 100547014C
- Authority
- CN
- China
- Prior art keywords
- sub
- sup
- polysiloxane
- refractive index
- units
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/14—Polysiloxanes containing silicon bound to oxygen-containing groups
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
- C09D183/04—Polysiloxanes
- C09D183/08—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen, and oxygen
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/12—Organo silicon halides
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/12—Organo silicon halides
- C07F7/121—Preparation or treatment not provided for in C07F7/14, C07F7/16 or C07F7/20
- C07F7/122—Preparation or treatment not provided for in C07F7/14, C07F7/16 or C07F7/20 by reactions involving the formation of Si-C linkages
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/06—Preparatory processes
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/22—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen
- C08G77/24—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen halogen-containing groups
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/38—Polysiloxanes modified by chemical after-treatment
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/38—Polysiloxanes modified by chemical after-treatment
- C08G77/382—Polysiloxanes modified by chemical after-treatment containing atoms other than carbon, hydrogen, oxygen or silicon
- C08G77/385—Polysiloxanes modified by chemical after-treatment containing atoms other than carbon, hydrogen, oxygen or silicon containing halogens
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
- C09D183/04—Polysiloxanes
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/04—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Health & Medical Sciences (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Engineering & Computer Science (AREA)
- Life Sciences & Earth Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Wood Science & Technology (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Silicon Polymers (AREA)
- Paints Or Removers (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GB0118473.8 | 2001-07-28 | ||
| GBGB0118473.8A GB0118473D0 (en) | 2001-07-28 | 2001-07-28 | High refractive index polysiloxanes and their preparation |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2009101680340A Division CN101633735B (zh) | 2001-07-28 | 2002-07-18 | 高折射率聚硅氧烷及其制备 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1636031A CN1636031A (zh) | 2005-07-06 |
| CN100547014C true CN100547014C (zh) | 2009-10-07 |
Family
ID=9919401
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2009101680340A Expired - Fee Related CN101633735B (zh) | 2001-07-28 | 2002-07-18 | 高折射率聚硅氧烷及其制备 |
| CNB028166167A Expired - Fee Related CN100547014C (zh) | 2001-07-28 | 2002-07-18 | 高折射率聚硅氧烷及其制备 |
Family Applications Before (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2009101680340A Expired - Fee Related CN101633735B (zh) | 2001-07-28 | 2002-07-18 | 高折射率聚硅氧烷及其制备 |
Country Status (9)
| Country | Link |
|---|---|
| US (1) | US7429638B2 (enExample) |
| EP (1) | EP1417252B1 (enExample) |
| JP (1) | JP2004536210A (enExample) |
| KR (3) | KR20040030870A (enExample) |
| CN (2) | CN101633735B (enExample) |
| AU (1) | AU2002321283A1 (enExample) |
| CA (1) | CA2455331A1 (enExample) |
| GB (1) | GB0118473D0 (enExample) |
| WO (1) | WO2003011944A2 (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104487516A (zh) * | 2012-07-19 | 2015-04-01 | 东丽株式会社 | 聚硅氧烷组合物、电子器件及光学器件 |
Families Citing this family (28)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB0118473D0 (en) | 2001-07-28 | 2001-09-19 | Dow Corning | High refractive index polysiloxanes and their preparation |
| JP5296297B2 (ja) | 2005-04-04 | 2013-09-25 | 東レ・ファインケミカル株式会社 | 縮合多環式炭化水素基を有するシリコーン共重合体及びその製造方法 |
| JP4800383B2 (ja) * | 2005-05-26 | 2011-10-26 | ダウ・コーニング・コーポレイション | 小さい形状を成形するための方法およびシリコーン封止剤組成物 |
| KR101325792B1 (ko) * | 2006-01-17 | 2013-11-04 | 다우 코닝 코포레이션 | 열 안정성 투명 실리콘 수지 조성물 및 이의 제조 방법 및용도 |
| EP1979774A1 (en) * | 2006-02-01 | 2008-10-15 | Dow Corning Corporation | Impact resistant optical waveguide and method of manufacture thereof |
| EP1987084B1 (en) * | 2006-02-24 | 2014-11-05 | Dow Corning Corporation | Light emitting device encapsulated with silicones and curable silicone compositions for preparing the silicones |
| US8222364B2 (en) * | 2006-04-11 | 2012-07-17 | Dow Corning Corporation | Composition including a siloxane and a method of forming the same |
| US20070272934A1 (en) * | 2006-05-23 | 2007-11-29 | Kee Yean Ng | LED device with improved life performance |
| US20070284687A1 (en) * | 2006-06-13 | 2007-12-13 | Rantala Juha T | Semiconductor optoelectronics devices |
| TWI473255B (zh) * | 2006-07-13 | 2015-02-11 | Silecs Oy | 半導體光電裝置 |
| JP5035770B2 (ja) * | 2007-02-16 | 2012-09-26 | 東レ・ファインケミカル株式会社 | 縮合多環式炭化水素基を有するシリコーン共重合体、及び、その製造方法 |
| KR101430261B1 (ko) * | 2007-02-23 | 2014-08-14 | 삼성전자주식회사 | 유기 실리콘 나노클러스터, 이의 제조방법, 이를 이용한박막형성 방법 |
| JP5318383B2 (ja) * | 2007-08-07 | 2013-10-16 | デクセリアルズ株式会社 | 光学部品封止材及び発光装置 |
| EP2422845B1 (en) | 2010-08-24 | 2013-04-24 | Polyphotonix Limited | Lightguide phototherapy apparatus |
| EP2422844A1 (en) | 2010-08-24 | 2012-02-29 | Polyphotonix Limited | Wearable phototherapy device |
| US8258636B1 (en) | 2011-05-17 | 2012-09-04 | Rohm And Haas Electronic Materials Llc | High refractive index curable liquid light emitting diode encapsulant formulation |
| US8257988B1 (en) | 2011-05-17 | 2012-09-04 | Rohm And Haas Electronic Materials Llc | Method of making light emitting diodes |
| KR20140048240A (ko) * | 2011-07-07 | 2014-04-23 | 다우 코닝 도레이 캄파니 리미티드 | 오르가노폴리실록산 및 그 제조 방법 |
| JPWO2013005858A1 (ja) * | 2011-07-07 | 2015-02-23 | 東レ・ダウコーニング株式会社 | 硬化性シリコーン組成物、その硬化物、および光半導体装置 |
| US8455607B2 (en) | 2011-08-17 | 2013-06-04 | Rohm And Haas Electronic Materials Llc | Curable liquid composite light emitting diode encapsulant |
| US8450445B2 (en) | 2011-08-17 | 2013-05-28 | Rohm And Haas Electronic Materials Llc | Light emitting diode manufacturing method |
| JP6022236B2 (ja) * | 2012-06-28 | 2016-11-09 | 東レ・ダウコーニング株式会社 | コーティング剤、電気・電子機器、および電気・電子機器の金属部の保護方法 |
| JP2014077117A (ja) * | 2012-09-21 | 2014-05-01 | Dow Corning Toray Co Ltd | 高屈折性表面処理剤、それを用いて表面処理された微細部材および光学材料 |
| TWI689533B (zh) * | 2014-03-28 | 2020-04-01 | 美商道康寧公司 | 包含與多氟聚醚矽烷反應的固化聚有機矽氧烷中間物之共聚物組成物及其相關形成方法 |
| JP7357505B2 (ja) * | 2018-11-21 | 2023-10-06 | 信越化学工業株式会社 | ヨウ素含有熱硬化性ケイ素含有材料、これを含むeuvリソグラフィー用レジスト下層膜形成用組成物、及びパターン形成方法 |
| JP7368324B2 (ja) | 2019-07-23 | 2023-10-24 | 信越化学工業株式会社 | ケイ素含有レジスト下層膜形成用組成物及びパターン形成方法 |
| US11685702B2 (en) * | 2019-12-20 | 2023-06-27 | Jsi Silicone Co. | Method for producing arene compounds and arene compounds produced by the same |
| DE102020118247A1 (de) * | 2020-07-10 | 2022-01-13 | OSRAM Opto Semiconductors Gesellschaft mit beschränkter Haftung | Precursor zur Herstellung eines Polysiloxans, Polysiloxan, Polysiloxanharz, Verfahren zur Herstellung eines Polysiloxans, Verfahren zur Herstellung eines Polysiloxanharzes und optoelektronisches Bauelement |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6084050A (en) * | 1997-01-09 | 2000-07-04 | Nippon Telegraph And Telephone Corporation | Thermo-optic devices |
Family Cites Families (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2528355A (en) * | 1949-09-14 | 1950-10-31 | Dow Corning | Halogenated xenyl trichlorosilanes |
| US5260469A (en) * | 1992-03-26 | 1993-11-09 | Ppg Industries, Inc. | Organo-siloxane with modified solubility |
| US5233007A (en) * | 1992-04-14 | 1993-08-03 | Allergan, Inc. | Polysiloxanes, methods of making same and high refractive index silicones made from same |
| WO1994008557A1 (en) | 1992-10-22 | 1994-04-28 | The Procter & Gamble Company | Hair care compositions providing conditioning and enhanced shine |
| JPH0782378A (ja) * | 1993-09-10 | 1995-03-28 | Nippon Telegr & Teleph Corp <Ntt> | シロキサン共重合体およびその合成方法 |
| US5384383A (en) * | 1994-01-31 | 1995-01-24 | Dow Corning Corporation | Pristine phenylpropylalkylsiloxanes |
| US5539137A (en) * | 1995-06-07 | 1996-07-23 | General Electic Company | Aryl substituted silicone fluids having high refractive indices and method for making |
| DE69911529T2 (de) * | 1998-02-05 | 2004-08-05 | Nippon Sheet Glass Co., Ltd. | Gegenstand mit unebener oberfläche, verfahren zu dessen herstellung und zusammenstellung dafür |
| JPH11310755A (ja) | 1998-04-27 | 1999-11-09 | Seiko Epson Corp | コーティング用組成物及び積層体 |
| JP2000231001A (ja) * | 1999-02-10 | 2000-08-22 | Konica Corp | 光学用レンズ |
| US6285513B1 (en) * | 1999-02-10 | 2001-09-04 | Konica Corporation | Optical element |
| JP4127599B2 (ja) | 2001-02-07 | 2008-07-30 | Tdk株式会社 | 焼結体の製造方法及びこれにより製造される焼結体と磁歪材料 |
| GB0118473D0 (en) | 2001-07-28 | 2001-09-19 | Dow Corning | High refractive index polysiloxanes and their preparation |
-
2001
- 2001-07-28 GB GBGB0118473.8A patent/GB0118473D0/en not_active Ceased
-
2002
- 2002-07-18 KR KR10-2004-7001259A patent/KR20040030870A/ko not_active Ceased
- 2002-07-18 KR KR1020097001646A patent/KR20090016019A/ko not_active Ceased
- 2002-07-18 WO PCT/EP2002/008545 patent/WO2003011944A2/en not_active Ceased
- 2002-07-18 CN CN2009101680340A patent/CN101633735B/zh not_active Expired - Fee Related
- 2002-07-18 US US10/486,375 patent/US7429638B2/en not_active Expired - Lifetime
- 2002-07-18 KR KR1020107001483A patent/KR20100024506A/ko not_active Ceased
- 2002-07-18 CN CNB028166167A patent/CN100547014C/zh not_active Expired - Fee Related
- 2002-07-18 EP EP02754964.1A patent/EP1417252B1/en not_active Expired - Lifetime
- 2002-07-18 CA CA002455331A patent/CA2455331A1/en not_active Abandoned
- 2002-07-18 JP JP2003517130A patent/JP2004536210A/ja active Pending
- 2002-07-18 AU AU2002321283A patent/AU2002321283A1/en not_active Abandoned
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6084050A (en) * | 1997-01-09 | 2000-07-04 | Nippon Telegraph And Telephone Corporation | Thermo-optic devices |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104487516A (zh) * | 2012-07-19 | 2015-04-01 | 东丽株式会社 | 聚硅氧烷组合物、电子器件及光学器件 |
| CN104487516B (zh) * | 2012-07-19 | 2017-10-24 | 东丽株式会社 | 聚硅氧烷组合物、电子器件及光学器件 |
Also Published As
| Publication number | Publication date |
|---|---|
| US20040236057A1 (en) | 2004-11-25 |
| KR20040030870A (ko) | 2004-04-09 |
| GB0118473D0 (en) | 2001-09-19 |
| EP1417252A2 (en) | 2004-05-12 |
| EP1417252B1 (en) | 2015-07-01 |
| KR20090016019A (ko) | 2009-02-12 |
| CN1636031A (zh) | 2005-07-06 |
| WO2003011944A2 (en) | 2003-02-13 |
| CN101633735B (zh) | 2011-07-20 |
| KR20100024506A (ko) | 2010-03-05 |
| JP2004536210A (ja) | 2004-12-02 |
| AU2002321283A1 (en) | 2003-02-17 |
| WO2003011944A3 (en) | 2003-05-08 |
| CA2455331A1 (en) | 2003-02-13 |
| US7429638B2 (en) | 2008-09-30 |
| CN101633735A (zh) | 2010-01-27 |
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| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CP03 | Change of name, title or address | ||
| CP03 | Change of name, title or address |
Address after: michigan Patentee after: Dow organosilicon company Address before: Michigan Patentee before: Dow Corning Corporation |
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| CF01 | Termination of patent right due to non-payment of annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20091007 Termination date: 20200718 |