CN100542685C - Coating process and apparatus for coating - Google Patents
Coating process and apparatus for coating Download PDFInfo
- Publication number
- CN100542685C CN100542685C CNB2004100784068A CN200410078406A CN100542685C CN 100542685 C CN100542685 C CN 100542685C CN B2004100784068 A CNB2004100784068 A CN B2004100784068A CN 200410078406 A CN200410078406 A CN 200410078406A CN 100542685 C CN100542685 C CN 100542685C
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- Prior art keywords
- coating
- nozzle
- back side
- substrate
- against corrosion
- Prior art date
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D1/00—Processes for applying liquids or other fluent materials
- B05D1/40—Distributing applied liquids or other fluent materials by members moving relatively to surface
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C5/00—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
- B05C5/02—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D1/00—Processes for applying liquids or other fluent materials
- B05D1/26—Processes for applying liquids or other fluent materials performed by applying the liquid or other fluent material from an outlet device in contact with, or almost in contact with, the surface
Abstract
The invention provides a kind of coating process, on strip coating nozzle, often stably obtain good saturation, thus on processed substrate formation certain thickness and be not coated with the coated film of spot.Saturation bottoming handling part (125), by the liquid supply unit against corrosion in multi-functional unit (172) with liquid against corrosion or dilute liquid against corrosion and be supplied to from the front and ooze out the coated mat (162) that liquid against corrosion constitutes like that, and with the pressure of regulation coated mat (162) is pressed in the Lower Half of the spray nozzle part back side (160) by the press section in multi-functional unit (172), simultaneously, by directly advance driving progressively of drive division (176) always, make the end of coated mat (162) slide into the other end right according to straight line along nozzle vertical (Y direction) from nozzle for liquid against corrosion (120).
Description
Technical field
The present invention relates to use nozzle coating liquid on processed substrate of strip to form the coating process and the apparatus for coating of coated film.
Background technology
At present, in the photoetching process operation in the manufacturing processing procedure of LCD and semiconductor devices etc., as a form for the employed nozzle for liquid against corrosion of coating liquid against corrosion on processed substrate (glass substrate, semiconductor wafer etc.), for example disclosed strip nozzle for liquid against corrosion with slit-shaped outlet is known in the patent documentation 1.
In the liquid apparatus for coating against corrosion that uses such strip nozzle, as shown in figure 13, go up at mounting table or holding plate (not shown) between the outlet of lower surface of the substrate G of horizontal mounting and strip nozzle for liquid 200 against corrosion, be set with the following minim gap of hundreds of μ m, above substrate G, make on one side nozzle for liquid 200 against corrosion in the scanning direction (generally be and nozzle vertically perpendicular direction) go up and move, on one side on substrate G, discharge liquid against corrosion.At this moment, discharge the liquid against corrosion on substrate G, on nozzle for liquid 200 lower backside 200a against corrosion, on short transverse, form projection, vertically form the meniscus of convex-shaped along nozzle owing to soak into (wet) phenomenon.The shape of this meniscus is by the decisions such as shape to back side portion of the discharge portion of the surface tension of liquid against corrosion and viscosity and nozzle, and under stable state, the position is that saturation WL stablizes because of the line of certain certain altitude on the top of meniscus.As long as this saturation WL is in level on the certain altitude position, just can on substrate G, form the coated film of liquid against corrosion with certain thickness.
[patent documentation] spy opens flat 8-138991
As mentioned above, in the liquid apparatus for coating against corrosion that uses strip nozzle for liquid 200 against corrosion, in coating is handled, reach the standard grade in the top that is attached to the lower backside of nozzle for liquid 200 against corrosion because of infiltration phenomenon or saturation WL is related to the profile of the liquid coated film against corrosion on the substrate, as long as saturation WL remains level one straight line with the certain height position, just can on substrate, form liquid coated film against corrosion with certain thickness.But, in existing this apparatus for coating, exist following problem, promptly, be difficult to often stably obtain being the saturation WL of level one straight line, form wavy meniscus easily along with the difference of liquid kind against corrosion, as shown in figure 13, produce on the crest portion 202 corresponding positions on substrate G with so wavy meniscus along the coating spot 204 of the muscle shape of scanning direction.
Summary of the invention
The present invention proposes in view of such prior art problems point, its purpose is to provide a kind of coating process and apparatus for coating, can often stably obtain good saturation, on processed substrate, form the coated film that is not coated with spot with certain thickness at strip coating nozzle place.
To achieve these goals, coating process of the present invention is, at the processed substrate of approximate horizontal be arranged between the outlet on the lower surface of strip nozzle and set required minim gap, in coating is handled, using the coating fluid that is expelled on the aforesaid substrate from above-mentioned outlet to soak under the state of bottom, the above-mentioned coating nozzle back side, make above-mentioned coating nozzle with the horizontal direction of the vertical approximate vertical of nozzle on relatively move, above-mentioned coating fluid is coated on the aforesaid substrate, wherein: be included in to be coated with and handle the saturation bottoming treatment process of vertically coating coating fluid or coating fluid being diluted the dilution coating fluid that obtains along nozzle before in the bottom, the back side of above-mentioned coating nozzle.
Apparatus for coating of the present invention comprises: the strip coating nozzle that has outlet in the lower surface; Be used for supplying with the first coating fluid supply unit of coating fluid to above-mentioned coating nozzle; Be used for approximate horizontal ground and support the substrate support sector of processed substrate; Be used for handling the nozzle support sector that the aforesaid substrate of being supported with respect to aforesaid substrate support sector separates required minim gap and supports above-mentioned coating nozzle in coating; Be used for relatively move horizontally between aforesaid substrate support sector and the said nozzle support sector, make handle under the state of bottom, the back side using the coating fluid that is expelled to from the outlet of above-mentioned coating nozzle on the aforesaid substrate to soak into above-mentioned coating nozzle in coating, make above-mentioned coating nozzle with the horizontal direction of the vertical approximate vertical of nozzle on the scanner section that relatively moves; With, be used for before being coated with processing vertically coating coating fluid or the saturation bottoming handling part of dilution coating fluid that the coating fluid dilution is obtained in the bottom, the back side of above-mentioned coating nozzle along nozzle.
In the present invention, before being coated with processing, at saturation bottoming handling part, vertically coat coating fluid or dilute the dilution coating fluid that coating fluid obtains along nozzle by bottom, the back side at the coating nozzle, can be when being coated with processing, when making the expansion of coating bottom, the nozzle back side become level and smooth, make the liquid level top go up the position or saturation is as the criterion and stabilisation with the coating direction because of the infiltration phenomenon of the coating fluid of discharging from the coating nozzle.
According to a preferred embodiment of the present invention, in saturation bottoming treatment process, for the bottom, the back side of coating nozzle, Yi Bian push down the coated mat of oozing out coating fluid or dilution coating fluid, Yi Bian vertically relatively slide along nozzle.In the case, because coated mat while oozing out and smear coating fluid or the dilution coating fluid vertically slides along nozzle, comprises coating fluid the area of application of being used to make obliterating line that saturation with a straight line be as the criterion so can well and effectively form in the bottom, the back side of coating nozzle.Be preferably, coated mat has the pad parts that are made of spongy material or porous metallic substance, and it is also passable to make these pad parts and the bottom, the back side of coating nozzle contact the line slip of going forward side by side.In order to obtain good linearity obliterating line, preferably make coated mat slide into the other end right from an end of the bottom, the back side of coating nozzle.
According to a preferred embodiment of the present invention, coated mat has the recess in bottom of filling up interarea and the extension of nozzle parallel longitudinal ground that contacts with the bottom, the back side of coating nozzle, forms along the hydrops portion of the coating fluid or the dilution coating fluid of nozzle longitudinal extension in the bottom, the back side of coating nozzle.Increase in the bottom, the back side of coating nozzle under the state of hydrops portion of such coating fluid or dilution coating fluid, beginning to carry out following coating handles, outlet by the coating nozzle is expelled to coating fluid on the substrate, because of the bottom of infiltration phenomenon attached to the spray nozzle part back side, the time that shortening is expanded, can begin nozzle scan quickly on short transverse.
According to a preferred embodiment of the present invention, in saturation bottoming treatment process, for the bottom, the back side of coating nozzle, constantly supply with coating fluid or dilute coating fluid and push down obliterating pad on one side, vertically carry out along nozzle on one side with respect to slip.In the case, because the obliterating pad is while making in advance coating fluid or dilution coating fluid attached to the bottom, the back side of coating nozzle slide along the nozzle extend longitudinally, comprise the coating fluid the area of application that is used to make the obliterating line that saturation is as the criterion with a straight line so can well and effectively form.Be preferably, the obliterating spacer has the pad parts that are made of spongy material or porous metallic substance, and it is also passable to make these pad parts and the bottom, the back side of coating nozzle contact the line slip of going forward side by side.In order to obtain good linearity obliterating line, preferably make the obliterating pad slide into the other end right from an end of the bottom, the back side of coating nozzle.
In the present invention, in saturation bottoming treatment process, be coated in the coating fluid of the bottom, the back side of coating nozzle, most preferably be coated on substrate on coating fluid identical, but so long as make fundamental component identical, so composition than or aspect such as concentration more or less difference also can.
The invention effect
According to coating process of the present invention and apparatus for coating, by structure as described above and effect, can on the coating nozzle of strip, often stably obtain good saturation, just can on processed substrate, form the coated film that is not coated with spot thus with certain thickness.
Description of drawings
Fig. 1 is the plane of the applicable coating developing system structure of the present invention of expression.
Fig. 2 is the side view of heat treatment portion structure in the coating developing system of expression embodiment.
Fig. 3 is the flow chart of processing sequence in the coating developing system of expression embodiment.
Fig. 4 is that the coating in the coating developing system of expression embodiment adds the vertical view of Ministry of worker's structure.
Fig. 5 is the figure that the coating of expression embodiment adds the coating handling part structure in the Ministry of worker.
Fig. 6 is the surface structure of nozzle for liquid against corrosion of an embodiment of expression and the stereogram of saturation bottoming handling part.
Fig. 7 is the major part profile of the major part structure of the major part structure of nozzle for liquid against corrosion of an embodiment of expression and saturation bottoming handling part.
Fig. 8 is the side view that schematically shows the effect of the saturation bottoming handling part among the embodiment.
Fig. 9 is the profile of the action effect of the saturation bottoming processing among the expression embodiment.
Figure 10 is the stereogram of the action effect of the saturation bottoming processing among the expression embodiment.
Figure 11 is the major part structure of saturation bottoming handling part of a variation of expression and the stereogram of effect.
Figure 12 is the major part structure of saturation bottoming handling part of another embodiment of expression and the stereogram of effect.
Figure 13 is the stereogram of expression existing slit-type nozzle for liquid surface structure against corrosion and effect.
Symbol description: 16 processing stations, 28 coatings add the Ministry of worker, 82 liquid coater units against corrosion (CT), 118,120 nozzle for liquid against corrosion, 122 coating handling parts, 125 saturations bottoming handling part, 150 nozzle bodies, 152 outlets, 156 spray nozzle parts, 158 spray nozzle part fronts, the 160 spray nozzle part back sides, 162 coated mat, 163 obliterating pads, 168 pad parts, 170 stay pipes, 171 holding components, 172 multi-functional unit, 176 directly advance drive division, 184 recesses.
The specific embodiment
Below with reference to Fig. 1～Figure 12 preferred implementation of the present invention is described.
In Fig. 1, expression is as the coating developing system that can adopt a configuration example of coating process of the present invention and apparatus for coating.This coating developing system 10 is arranged in the clean room, makes in the processing at LCD as processed substrate with for example LCD substrate, cleans, is coated with a series of processing such as liquid against corrosion, prebake conditions, development and back baking in the photoetching process operation.Exposure-processed is to carry out in the exposure device 12 of the outside of the adjacent setting of treatment system therewith.
This is coated with developing system 10, has disposed the processing stations (P/S) 16 of growing crosswise at central part, vertically disposes box station (C/S) 14 and interface station (I/F) 18 in (directions X) both ends at it.
Box station (C/S) the 14th, the box of system 10 are moved into and are taken out of mouth, comprise with make box C that square glass substrate G multilayer overlappingly can the mounting multi-disc in the horizontal direction for example can be side by side on the Y direction 4 box platforms 20 that carry out mounting and the transport mechanism 22 sent into respect to the taking-up that this box C on 20 carries out substrate G.Transport mechanism 22 has the device carrying arm 22a for example that can keep substrate G, can do in X, Y, the enterprising action of four axles of Z, θ, carry out giving and accepting of substrate G with adjacent processing stations (P/S) 16 sides.
Processing stations (P/S) 16 is gone up on parallel and pair of opposite processing line A, the B that extends, with each handling part of arranged in order of work flow or operation at vertical (directions X) of system.In more detail, on the processing line A of the upstream portion of interface station (I/F) 18 sides from box station (C/S) 14 side direction, a horizontal row ground has disposed to clean and has added the Ministry of worker 24, the first heat treatment portion 26, is coated with the Ministry of worker 28, the second heat treatment portion 30 of adding.On the other hand, from interface station (I/F) 18 side direction on the processing line B of downstream portion of box station (C/S) 14 sides, a horizontal row ground disposed the second heat treatment portion 30, develop add the Ministry of worker 32, decolouring adds the Ministry of worker 34 and the 3rd heat treatment portion 36.Under the form of this processing line, when the second heat treatment portion 30 is positioned at the last tail of processing line A of upstream side, be positioned at the beginning of the processing line B in downstream again, between two processing line A, B.
Be provided with auxiliary conveyance space 38 between two processing line A, B, being driven by not shown driving mechanism can be that the reciprocal transportation body 40 of the mounting substrate G of unit carries out two-way moving with a slice on processing line direction (directions X).
On the processing line A of upstream portion, to clean and to add the Ministry of worker 24 and comprise that washing cleans unit (SCR) 42, the place of cleaning in the unit (SCR) 42 in this washing adjacent with box station (C/S) 10 disposed excimers UV illumination unit (e-UV) 41.The clean portion in the unit (SCR) 42 is cleaned in washing, on one side by roller bearing conveyance or conveyer belt conveyance with flat-hand position conveyance substrate G on processing line A direction, (processed face) scrubbed and cleaned or purge is cleaned on substrate G on one side.
With the clean first adjacent heat treatment portion 26 of downstream that adds the Ministry of worker 24, be provided with the transport mechanism 46 of longitudinal type along processing line A at central part, to be provided with the unit collapsed configuration of passing through that a plurality of single sheet types bakings unit is used with the substrate of giving and accepting be multi-level unit portion or the baking tower (TB) 44,48 that multilayer forms in both sides before and after it.
For example, as shown in Figure 2, in the baking tower (TB) 44 of upstream side, pass through unit (PASS by what substrate was moved into usefulness
L) 50, the heating unit (DHP) 52,54 of dehydration baking usefulness and adhesion unit (AD) 56 under begin overlapping successively forming.At this, by unit (PASS
L) the 50 substrate G that are provided for having finished clean processing from wash clean unit (SCR) 42 move into the space in the first heat treatment portion 26.In the baking tower (TB) 48 in downstream, what substrate was taken out of usefulness passes through unit (PASS
R) 60, the cooling unit (COL) 62,64 of substrate temperature adjustment usefulness and adhesion unit (AD) 66 under begin overlapping successively.At this, by unit (PASS
R) 60 be provided for adding the space that the Ministry of worker 28 takes out of with in the first heat treatment portion 26, having finished the required heat treated substrate G coating of side downstream.
In Fig. 2, transport mechanism 46 comprises: along the guide rail 68 that extends in vertical direction can lifting moving lifting conveyance body 70; The rotation conveyance body 72 that on this lifting conveyance body 70, on the θ direction, can rotate or rotate; On one side at this carrying arm or pliers 74 that rotates support substrate G on conveyance body 72, can on fore-and-aft direction, advance and retreat or stretch on one side.The drive division 76 that is used for lifting driving lifting conveyance body 70 is arranged on the base end side of vertical guide rail 68, is used to rotate the drive division 78 that drives rotation conveyance body 72 and is installed in lifting conveyance body 70.The drive division 80 that drives carrying arm 74 that is used to advance and retreat is installed in rotation conveyance body 72.Each drive division 76,78,80 can be made of for example motor etc.
The transport mechanism 46 that as above constitutes like that can also can carry out giving and accepting of substrate G with the reciprocal transportation body 40 of auxiliary conveyance space 38 sides with the high speed lifting and even in any unit in the baking tower (TB) 44,48 that enters both sides that rotatablely moves.
The coating adjacent with the downstream of the first heat treatment portion 26 adds the Ministry of worker 28, as shown in Figure 1, disposing liquid coater unit against corrosion (CT) 82 and drying under reduced pressure unit (VD) 84 along processing line A with becoming row.The structure that coating adds the Ministry of worker 28 inside will explain in the back.
Add the second adjacent heat treatment portion 30 of downstream of the Ministry of worker 28 with coating, has same structure with the above-mentioned first heat treatment portion 26, between two processing line A, B, be provided with the transport mechanism 90 of longitudinal type, be provided with a baking tower (TB) 88 in processing line A side (end), be provided with another baking tower (TB) 92 in processing line B side (beginning).
Though omitted diagram, for example, in the baking tower (TB) 88 of processing line A side, that disposes in the bottom that substrate moves into usefulness passes through unit (PASS
L), in the above can overlapping for example three grades of heating units (PREBAKE) that prebake conditions is used.In addition, in the baking tower (TB) 92 of processing line B side, that disposes in the bottom that substrate takes out of usefulness passes through unit (PASS
R), cooling unit (COL) that in the above can overlapping for example level substrate temperature adjustment usefulness, the heating unit of in the above can overlapping for example two-stage prebake conditions using (PREBAKE).
On the processing line B of downstream portion, developing adds the Ministry of worker 32 and comprises so-called flat flow developing cell (DEV) 94, Yi Bian its on one side with flat-hand position conveyance substrate G, carry out a series of development treatment operation.
Add the downstream of the Ministry of worker 32 in development, add the Ministry of worker 34 across decolouring and disposing the 3rd heat treatment portion 36.Decolouring adds the i line UV illumination unit (i-UV) 96 that the Ministry of worker 34 comprises that the processed surface irradiation i line (wavelength 365nm) that is used for to substrate G decolours and handles.
The 3rd heat treatment portion 36 has and the above-mentioned first heat treatment portion 26, the same structure of the second heat treatment portion 30, along processing line B the transport mechanism 100 of longitudinal type is set and before and after it both sides a pair of baking tower (TB) 98,102 is set.
Though omit diagram, for example, in the baking tower (TB) 98 of upstream side, what be provided with in the bottom that substrate moves into usefulness passes through unit (PASS
L), in the above can be overlapping the heating unit (POBAKE) of baking usefulness after three grades for example.In addition, in the baking tower (TB) 102 in downstream, can be provided with baking unit (POBAKE) in back in the bottom, overlapping in the above level substrate take out of and cool off usefulness pass through cooling unit (PASS
RCOL), the heating unit (POBAKE) of baking usefulness behind the overlapping more in the above secondary.
The transport mechanism 100 of the 3rd heat treatment portion 36, not only can be by two multi-level unit portions (TB) 98,102 pass through unit (PASS
L) and by cooling unit (PASS
RCOL) be respectively that unit and i line UV illumination unit (i-UV) 96 and box station (C/S) 14 carry out giving and accepting of substrate G with a slice, but also can be that reciprocal transportation body 40 in unit and the auxiliary conveyance space 38 also can carry out giving and accepting of substrate G with a slice.
Interface station (I/F) 18 has the carrying device 104 that is used for carrying out with adjacent exposure device 12 substrate G exchange, has disposed buffer table (BUF) 106, expansion cooling bench (EXTCOL) 108 and peripheral device 110 around it.Buffer table (BUF) 106 is provided with the buffer pocket (not shown) of fixation type.Expansion cooling bench (EXTCOL) the 108th, the substrate that the has possessed refrigerating function platform of usefulness of giving and accepting uses when changing substrate G with processing stations (P/S) 16 top-cross.Peripheral device 110 can be the structure that for example header record machine (TITLER) and peripheral exposure device (EE) are overlapped up and down.Carrying device 104 has the device carrying arm 104a for example that can keep substrate G, can carry out giving and accepting of substrate G with adjacent exposure device 12, each unit (BUF) 106, (EXTCOL) 108, (TITLER/EE) 110.
Fig. 3 represents the processing sequence in this coating developing system.At first, in box station (C/S) 14, take out a substrate G transport mechanism 22 any one box C from platform 20, (step S among clean excimers UV illumination unit (e-UV) 41 that adds the Ministry of worker 24 that moves into processing stations (P/S) 16
1).
In excimers UV illumination unit (e-UV) 41, substrate G is carried out thermal drying (step S by the ultraviolet ray irradiation
2).When carrying out this ultraviolet cleaning, mainly be the organic matter of removing substrate surface.After end is cleaned in ultraviolet ray, by the transport mechanism 22 of box station (C/S) 14 substrate G is shifted to the clean washing that adds the Ministry of worker 24 and clean unit (SCR) 42.
Clean in the unit (SCR) 42 in washing, as mentioned above, by roller bearing conveyance and conveyer belt conveyance substrate G is carried out the conveyance of advection ground with flat-hand position in processing line A direction on one side, one side (processed face) on substrate G is scrubbed clean or purge is cleaned, and removes particle shape dirt (step S from substrate surface
3).Then, carry out conveyance in advection ground on one side,, carry out the drying of substrate G at last with air knife etc. Yi Bian carry out the rinsing processing with cleaning later substrate G.
In unit (SCR) 42 is cleaned in washing, clean the substrate G that disposes, the upstream side of moving into the first heat treatment portion 26 advection toast tower (TB) 44 interior pass through unit (PASS
L) in 50.
In the first heat treatment portion 26, order according to the rules is transferred to substrate G in the baking unit of regulation successively by transport mechanism 46.For example, at first with substrate G from by unit (PASS
L) in the middle of 50 one of shifting in the heating unit (DHP) 52,54, carry out processed (step S herein
4).Then, substrate G is shifted in the middle of in the cooling unit (COL) 62,64 one, substrate temperature is cooled to certain temperature (step S at this
5).After this, substrate G is shifted to adhesion unit (AD) 56, carry out hydrophobization at this and handle (step S
6).After this hydrophobization processing finishes, will be cooled to certain substrate temperature (step S in the middle of substrate G in cooling unit (COL) 62,64
7).At last, substrate G is shifted to pass through unit (PASS in the downstream baking tower (TB) 48
R) in 60.
Like this, in the first heat treatment portion 26, can be by transport mechanism 46 with substrate G contact arbitrarily between the baking tower (TB) 48 in multistage baking tower (TB) 44 of upstream side and downstream.In second and third heat treatment portion 30,36, also carry out same substrate transferring action.
Stood the substrate G of aforesaid a succession of heat treatment or hot system handles in the first heat treatment portion 26, liquid coater unit against corrosion (CT) 82 is shifted in the unit (PASSR) 60 that passes through in downstream baking tower (TB) 48.
In liquid coater unit against corrosion (CT) 82, as described later, go up coating liquid against corrosion at the upper surface (processed face) of substrate G by the spin-coating method that uses slit-type nozzle for liquid against corrosion.Then, in adjacent drying under reduced pressure unit (VD) 84, downstream, make substrate G accept drying under reduced pressure and handle (step S
8).
Accepted the substrate G that aforesaid liquid against corrosion coating is handled, from drying under reduced pressure unit (VD) 84, moved into and pass through unit (PASS in the upstream side baking tower (TB) 88 of the second adjacent with it heat treatment portion 30
L) in.
In the second heat treatment portion 30, order according to the rules is transplanted on substrate G in the unit of regulation successively by transport mechanism 90.For example, at first with substrate G by by unit (PASS
L) be transplanted in the middle of in the heating unit (PREBAKE), accept heat treated (the step S of prebake conditions at this
9).Then, substrate G is shifted in the middle of in the cooling unit (COL) one, be cooled to certain substrate temperature (step S at this
10).After this, substrate G passes through unit (PASS via what tower (TB) 92 sides were toasted in the downstream
R), perhaps do not give and accept with the expansion cooling bench (EXTCOL) 108 of interface station (I/F) 18 sides via it.
In interface station (I/F) 18, substrate G is moved into the peripheral exposure device (EE) of peripheral device 110 from expansion cooling bench (EXTCOL) 108.When this acceptance is used for developing, remove after the exposure attached to the etchant resist of substrate G periphery, be admitted to (step S in the adjacent exposure device 12
11).
In exposure device 12, the etchant resist exposure on the substrate G becomes the circuit pattern of regulation.Then, the substrate G that has finished pattern exposure turns back to (step S interface station (I/F) 18 from exposure device 12
11) time, at first move in the header record machine (TITLER) of peripheral device 110, at information (the step S of this regulation on the record of the regulation position on the substrate
12).After this, substrate G turns back on the expansion cooling bench (EXTCOL) 108.By carrying device 104 carry out the substrate G in the interface station (I/F) 18 conveyance and with the giving and accepting of the substrate G of exposure device 12.
In processing stations (P/S) 16, in the second heat treatment portion 30, transport mechanism 90 is by taking out the substrate G that has exposed on the expansion cooling bench (EXTCOL) 108, by passing through unit (PASS in the baking tower (TB) 92 of processing line B side
R) move into to develop and add in the Ministry of worker 32.
Add in the Ministry of worker 32 in development, will toast by this and pass through unit (PASS in tower (TB) 92
R) in the substrate G that takes out move in the developing cell (DEV) 94.In developing cell (DEV) 94, substrate G is sent to the downstream of processing line B in the advection mode, in the process of this conveyance, develops, a series of development treatment operation (step S such as rinsing, drying
13).
Add the substrate G that has accepted development treatment in the Ministry of worker 32 in development and moved into the adjacent decolouring in downstream in the advection mode and add in the Ministry of worker 34, stand i line irradiation processing (the step S that decolours at this
14).The substrate G that disposes of decolouring is moved into passes through unit (PASS in the upstream side baking tower (TB) 98 of the 3rd heat treatment portion 36
L) in.
In the 3rd heat treatment portion 36, substrate G passes through unit (PASS from this at first
L) move on in the middle of in the heating unit (POBAKE), accept heat treated (the step S of back baking at this
15).Then, substrate G is moved on to pass through cooling unit (PASS in the downstream baking tower (TB) 102
RCOL) in, be cooled to substrate temperature (the step S of regulation at this
16).The conveyance of substrate G in the 3rd heat treatment portion 36 is undertaken by transport mechanism 100.
In box station (C/S) 14 sides, transport mechanism 22 just passes through cooling unit (PASS by the 3rd heat treatment portion 36
RCOL) take out the substrate G of the whole operation of the coating development treatment that is through with in, the substrate G that takes out is stored in (step S in the middle of any one box C on the platform 20
1).
In this coating developing system 10, add the Ministry of worker 28, particularly in liquid coater unit against corrosion (CT) 82, can adopt the present invention in coating.Below just illustrate to add in the Ministry of worker 28 and adopt an embodiment of the invention in coating with reference to Fig. 4～Figure 12.
As shown in Figure 4, coating adds the Ministry of worker 28 and is, is supporting to have disposed liquid coater unit against corrosion (CT) 82 and drying under reduced pressure unit (VD) 84 along directions X (along processing line A) on the platform 112 with becoming row.The pair of guide rails 114,114 of extending along directions X is laid on the both ends of supporting platform 112 abreast, utilization guides a group or several groups the carrying arm 116,116 that moves on two guide rails 114,114, substrate G can be sent to the drying under reduced pressure unit (VD) 84 from liquid coater unit against corrosion (CT) 82.And, two guide rails 114,114 enter and be coated with the unit that adds adjacent upstream side of the Ministry of worker 28 and downstream, promptly belong to the first heat treatment portion 26 downstream baking tower (TB) 48 pass through unit (PASS
R) 60 and belong to the second heat treatment portion 30 upstream side baking tower (TB) 88 pass through unit (PASS
L) in, what make that carrying arm 116,116 can be in both sides passes through unit (PASS
R), (PASS
L) middle discrepancy.Therefore, will be coated with substrate G before handling by carrying arm 116,116 and pass through unit (PASS from baking tower (TB) 48
R) move in the liquid coater unit against corrosion (CT) 82, pass through unit (PASS with having finished substrate G that coating handles from what drying under reduced pressure unit (VD) 84 took out of baking tower (TB) 88
L) in.
Liquid coater unit against corrosion (CT) 82 has: be used for mounting flatly and keep the platform 118 of substrate G; Be used to use strip nozzle for liquid 120 against corrosion mounting in this above substrate G on 118 (processed face) go up the coating handling part 122 that is coated with liquid against corrosion with spin-coating method; Be used for that liquid discharge function against corrosion with nozzle for liquid 120 against corrosion maintains normal condition or to its nozzle renewal portion 124 that upgrades; With, be used for carrying out saturation bottoming handling part 125 that the saturation bottoming handles etc. what be coated with the saturation WL that on nozzle for liquid 120 against corrosion, reliablely and stablely obtains level one straight line when handling.In this embodiment, saturation bottoming handling part 125 is arranged in the coating nozzle renewal portion 124.The structure and the effect of each one in the liquid coater unit against corrosion (CT) 82 will be described in detail in the back with reference to Fig. 5～Figure 12.
Drying under reduced pressure unit (VD) 84 has: the bottom container 126 of the pallet of top opening or container type of the shallow end; With, hermetic driving fit or can be chimeric and the upper container (not shown) of the lid shape that constitutes on bottom container 126.Bottom container 126 is roughly tetragonal, is equipped with at central part to be used for flatly supporting the also platform 128 of mounting substrate G, and the Si Jiaochu in the bottom surface is provided with exhaust outlet 130.Each exhaust outlet 130 leads to vavuum pump (not shown) by blast pipe (not shown).Covering under the state of upper container on the bottom container 126, the airtight processing space in two containers is decompressed to the specified vacuum degree by this vavuum pump.
Fig. 5 represents the structure of the coating handling part 122 in the liquid coater unit against corrosion (CT) 82.Coating handling part 122 has: the liquid supply unit 132 against corrosion that comprises nozzle for liquid 120 against corrosion; With, when handling, coating make nozzle for liquid 120 against corrosion on platform 118, move horizontally the scanner section 134 of scanning along the direction of arrow (X_ direction).In liquid supply unit 132 against corrosion, nozzle for liquid 120 against corrosion has the strip nozzle body 150 that extends along the Y direction with the length that can cover the substrate G on the platform 118 with passing through, is connecting the liquid supply pipe 136 against corrosion from liquid supply source against corrosion (not shown).On the lower surface of nozzle body 150, form along the outlet 152 of the slit-shaped of coating nozzle vertical (Y direction) extension.Scanner section 134 has: the support 138 of flatly supporting the word of the falling U shape of nozzle for liquid 120 against corrosion; With, make this support 138 scanning driving part that the twocouese straight line moves on directions X 140.This scanning driving part 140 also can constitute with linear electrical machine mechanism that for example has guide rail or ball screw framework.Fixing support 138 on directions X, the structure that platform 118 side straight lines are moved also is fine.Preferably be provided for changing or regulating the elevating mechanism that has guide rail of the height and position of nozzle for liquid 120 against corrosion at connecting portion 142 places that connect support 138 and nozzle for liquid against corrosion 120.By regulating the height and position of nozzle for liquid 120 against corrosion, the distance that can at random set or regulate between top (the processed face) of the lower surface of nozzle for liquid 120 against corrosion or outlet 152 and platform 118 upper substrate G is the size in gap at interval.
Fig. 6 and Fig. 7 represent the structure of nozzle for liquid against corrosion 120 and the saturation bottoming handling part 125 of an embodiment.Saturation bottoming handling part 125 is arranged in the adjacent nozzles renewal portion 124 of downstream in platform 118 and nozzle scan direction (upstream side also can).
In nozzle for liquid 120 against corrosion, nozzle body 150 has: the buffer part 154 of being formed, be the square tube shape by corrosion resistance such as for example stainless steel and all excellent metal of processability; With, from then on buffer part 154 is the spray nozzle part 156 that taper ground extends towards the outlet 152 of lower surface.Spray nozzle part 156 relatively to the conical surface 158,160 among, a conical surface 158 becomes the front, another conical surface 160 becomes the back side.That is, nozzle for liquid 120 against corrosion in coating is handled, makes the front 158 of spray nozzle part 156 move towards the place ahead of nozzle scan direction (X_ direction), makes the back side 160 of spray nozzle part 156 move (Fig. 5, Fig. 9, Figure 10) towards unidirectional rear.In the inside of buffer part 154, be provided with and be used for temporary transient surge chamber or the inner chamber (not shown) that the liquid against corrosion that is imported by liquid supply pipe 136 against corrosion makes nozzle pressure equalization longitudinally that store.In the inside of spray nozzle part 156, be provided with the stream 161 of the slit-shaped that the outlet 152 from the inner chamber in the buffer part 154 to the lower end extends vertically downward.
Saturation bottoming handling part 125 has: ooze out the coated mat 162 that liquid against corrosion constitutes like that from the front; With, being used for this coated mat 162 is pushed down in the Lower Half at the back side 160 of the spray nozzle part 156 of nozzle for liquid 120 against corrosion also can be with respect to the coated mat sliding part 164 of nozzle longitudinal sliding motion.
As shown in Figure 7, coated mat 162 has: the framework 166 of front openings; With, be filled in the pad parts 168 in this framework 166.Pad parts 168 can for example spongy material or porous material constitute by the cellulosic material that preferably has swelling and elastic force.At the back side of framework 166, in conjunction with the stay pipe 170 that constitutes by the hollow tube of rigidity.When carrying out saturation bottoming and handle, the flow through stream of this stay pipe 170 of the liquid against corrosion from liquid supply unit against corrosion multifunctional box 172 described later in is supplied to the interior pad parts 168 of framework 166.In the inside of pad parts 168, can be provided with the liquid against corrosion that is used to make the back side by framework 166 to import and be evenly distributed in pad parts inner chamber 168a on the whole.
Coated mat sliding part 164, the saturation bottoming of setting in nozzle renewal portion 124 is handled in the station of usefulness, be configured on the position relative, have: comprise the various drive divisions or the multi-functional unit 172 of portion etc. firmly with the nozzle back side portion 160 of nozzle for liquid 120 against corrosion; The support 174 of this multi-functional unit 172 of mounting; With, make this support 174 the horizontal direction parallel with vertical (the Y direction) of nozzle for liquid 120 against corrosion be one move point-blank directly advance drive division 176.Directly advancing drive division 176 can constitute with the ball screw framework that for example has guide rail (not shown), perhaps also can use formations such as linear electrical machine mechanism or conveyer mechanism.The structure of fixing, make nozzle for liquid 120 against corrosion always to move progressively multi-functional unit 172 on the Y direction also is fine.In multi-functional unit 172, harvesting be useful on through the stream of stay pipe 170 to coated mat 162 supply with liquid against corrosion liquid supply unit against corrosion, be used for can moving and flatly support the support sector of coated mat 162 and the press section that is used for coated mat 162 and stay pipe 170 are forwards compressed integratedly etc. at fore-and-aft direction by stay pipe 170.In illustrated embodiment, the spring of coated mat 162 and multi-functional unit 172 sides bears between the portion (not shown), and setting up with stay pipe 170 is the ring spring 178 of supporting axis.Above-mentioned press section in the multi-functional unit 172 has for example cylinder, utilizes the required pressure that spring deflection produced along with ring spring 178 coated mat 162 to be pressed on the Lower Half at the nozzle back side 160 of nozzle for liquid 120 against corrosion.
At this, the effect of saturation bottoming handling part 125 is described based on Fig. 6～Fig. 8.When the coating processing of carrying out at the substrate G on the platform 118 finished, scanner section 134 was transplanted on nozzle renewal portion 124 places with nozzle for liquid 120 against corrosion, was positioned at the station that usefulness is handled in the saturation bottoming, so that the processed substrate G of next time is coated with processing.In saturation bottoming handling part 125, in the end place near the nozzle for liquid against corrosion 120 of having located, Lower Half that coated mat sliding part 164 makes coated mat 162 aim at the spray nozzle part back sides 160.Then, in coated mat 162, supply with liquid against corrosion by the liquid supply unit against corrosion in the multi-functional unit 172, coated mat 162 is pressed in the Lower Half at the spray nozzle part back side 160 by the press section in the multi-functional unit 172 with certain pressure, simultaneously, by directly advance driving progressively of drive division 176 always, the end of coated mat 162 along nozzle vertical (Y direction) from nozzle for liquid 120 against corrosion linearly and continuously slided to the other end.Be preferably, coated mat 162 is slided with certain speed, near the other end of nozzle for liquid 120 against corrosion, can not stop also can not leave with slowing down.
Its result, as shown in Figure 8, the Lower Half at the spray nozzle part back side 160 on the zone 180 of coated mat 162 processes, has been coated liquid against corrosion along nozzle vertical (Y direction).In liquid the area of application 180 against corrosion in this spray nozzle part back side 160,, form parallel and linearly extended many and even do not have several line 182 along level one with nozzle vertical (Y direction) as the road mark that the pad parts 168 of coated mat 162 nuzzle up.These obliterating lines 182, be coated with the function that plays horizontal guide line when beginning next time, feasible liquid against corrosion from discharge to substrate G that go up can push up liquid level the position owing to infiltration phenomenon and be limited to level one straight line when expanding on liquid the area of application 180 against corrosion on short transverse.Being preferably at this, is benchmark with the lower surface (outlet 152) of nozzle for liquid 120 against corrosion, and the upper end height and position H that makes liquid the area of application 180 against corrosion is than height and position (desired value) h of saturation WL high (for example more than 2 times).As an example,, can set H=1.0～2.0mm with respect to h=0.5mm.
In this liquid coater unit against corrosion (CT) 82, after saturation bottoming handling part 125 has carried out saturation bottoming processing as described above, nozzle for liquid 120 against corrosion is transplanted on the upstream side of platform 118 by scanner section 134.Then, when uploading at platform 118 when depositing the untreated processed substrate G of a slice, by scanner section 134 nozzle for liquid 120 against corrosion and the upstream-side-end of this substrate G being carried out the position coincide, then as shown in Figure 5, on one side according to certain speed nozzle for liquid 120 against corrosion being scanned in the mode that passes through on the X_ direction above the platform 118, on one side liquid supply unit 132 against corrosion by the outlet 152 of nozzle for liquid 120 against corrosion with along nozzle vertically the discharge currents of (Y direction) wire of extending liquid R against corrosion is supplied to above the substrate G on the platform 118.
At this moment, as Fig. 9 and shown in Figure 10, the liquid R against corrosion that is expelled on the substrate G by nozzle outlet 152 expands (protuberance) by infiltration phenomenon attached to the bottom at the spray nozzle part back side 160 of nozzle for liquid 120 against corrosion and on short transverse, forms along the meniscus of the convex-shaped of nozzle longitudinal extension.At this moment, owing to handle by saturation bottoming in advance in the Lower Half at the spray nozzle part back side 160 and to have formed liquid coating against corrosion portion 180, so the liquid R against corrosion on the substrate G just is subjected to from the lower end at the spray nozzle part back side 160 restriction of the guide line that produced along the obliterating line 182 of countless levels one straight line of liquid coating against corrosion portion 180 in the same area and expands in short transverse simultaneously, make the liquid level top go up the position stabilisation according to arbitrary obliterating line 182, thereby established the saturation WL of level one straight line.Thus, make the thickness d that is formed on the liquid coated film RM against corrosion on the substrate G remain certain value in the downstream of saturation WL.
Even under the situation because of the wavy meniscus of easy formation when the kind difference viscosity that is coated with the liquid against corrosion that uses when handling is unstable, according to this embodiment, also can utilize the horizontal guide line function in the liquid coating against corrosion as described above portion 180 and position on the top of meniscus is restricted to level one straight line.Thus, just can be reduced in the possibility that liquid coated film RM against corrosion goes up the coating spot that produces the muscle shape significantly.
In nozzle renewal portion 124, though omitted diagram, the nozzle that also is provided with the spray nozzle part 156 that is used for cleaning nozzle for liquid 120 against corrosion is cleaned portion and is used for the simulation dispenser etc. that liquid against corrosion in the nozzle alternately is expelled to nozzle for liquid 120 against corrosion.Carrying out the clean or simulation branch timing of nozzle, can just carry out saturation bottoming processing by saturation bottoming handling part 125 as described above subsequently.
Figure 11 represents a variation of the saturation bottoming handling part 125 in the above embodiments.This variation is to be provided with the recess 184 that extends with the nozzle parallel longitudinal in the bottom of the front of coated mat 162 (interarea).In illustrated embodiment, shown in Figure 11 (A), (B), all be provided with recess 184 respectively on both at framework 166 and pad parts 168.
According to such structure, in the bottom that coated mat 162 is pressed in the spray nozzle part back side 160 when nozzle vertically slides, the liquid against corrosion that oozes out from pad parts 168 just is trapped in the recess 184, with the bottom of this state attached to the spray nozzle part back side 160.Its result shown in Figure 11 (C), is formed with along the hydrops portion 186 of the liquid against corrosion of nozzle longitudinal extension in the bottom at the spray nozzle part back side 160.When under this state, beginning to carry out next time coating and handle, just shortened from the outlet 152 of nozzle for liquid 120 against corrosion be expelled to liquid against corrosion on the substrate G by infiltration phenomenon attached to the bottom at the spray nozzle part back side 160 and the time of expanding in short transverse.Thus, can begin nozzle scan quickly.
Figure 12 represents the major part structure of the saturation bottoming handling part 125 of another embodiment.This embodiment is to use the obliterating pad 163 of obliterating special use to replace oozing out the coated mat 162 of liquid against corrosion.Need be at the stream that is used to support be provided with on the holding components 171 of this obliterating pad 163 by liquid against corrosion.Instead, glide direction upstream side at obliterating pad 163 disposes liquid assigning unit 188 against corrosion, be used for the bottom that liquid against corrosion is conducted to the spray nozzle part back side 160 of nozzle for liquid 120 against corrosion by for example spraying, directly advance drive division 176 (Fig. 6) and drive liquid assigning unit 188 against corrosion and obliterating pad 163 and vertically advance simultaneously at nozzle by common.Liquid assigning unit 188 against corrosion also can connect the liquid supply unit against corrosion in the multi-functional unit 172 (Fig. 6).Obliterating pad 163, can be same with the coated mat 162 of the foregoing description, be will for example constitute by spongy material or porous metallic substance the pad parts be filled in and constitute in the framework, the liquid against corrosion that is supplied on the spray nozzle part back side 160 by liquid assigning unit 188 against corrosion is slided along nozzle longitudinal extension ground.Pressure with regulation is pressed in the Lower Half at the spray nozzle part back side 160 with this obliterating pad 163, simultaneously, vertically linearly slides into the other end continuously from an end of nozzle for liquid 120 against corrosion with certain speed at nozzle.
In this embodiment, make obliterating pad 163 by after the Lower Half at the spray nozzle part back side 160, same with the foregoing description, formed liquid the area of application 180 against corrosion, in this zone, comprised many of extending point-blank and even do not had several rub line (not shown) with nozzle parallel longitudinal and level one.Therefore, when nozzle for liquid 120 against corrosion can often stably be established the saturation WL of level one straight line, can also on processed substrate, form certain thickness and not be coated with the liquid coated film against corrosion of spot.
In the above-described embodiment, in saturation bottoming handling part 125, used liquid against corrosion as being coated on the liquid of 160 bottoms, the spray nozzle part back side of nozzle for liquid 120 against corrosion, diluted the resulting dilution of liquid against corrosion liquid against corrosion but also can use with appropriate solvent.The liquid against corrosion that in saturation bottoming handling part 125, uses, most preferably be with the liquid phase of in coating handling part 122, using against corrosion with, but also can be the identical and composition of Main Ingredients and Appearance than or concentration more or less different.
In the above-described embodiment, the spray nozzle part front 158 and the spray nozzle part back side 160 of nozzle for liquid 120 against corrosion is fixing, just carry out the saturation bottoming and handle in the coating spray nozzle part back side of single face 160 sides.But, with two-way (X
-Direction and X
+Direction) nozzle scan is coated with under the situation of processing, also can implement the saturation bottoming of above-mentioned embodiment and handle on the two sides 158,160 of spray nozzle part 156.Folk prescription to or fixed situation under, also be what it doesn't matter carrying out on spray nozzle part front 158 also with the spray nozzle part back side 160 that saturation bottoming handles.
When carrying out saturation bottoming processing, after having applied liquid against corrosion on the spray nozzle part back side 160, also can whether there be the coating of liquid against corrosion residual to check with cameras such as for example CCD cameras to 160 photographies of the spray nozzle part back side.When the coating that liquid against corrosion is arranged is residual, clean portion (not shown) with nozzle and clean the spray nozzle part back side 160, then, on the spray nozzle part back side 160, be coated with liquid against corrosion more again.Camera also can be configured near nozzle renewal portion 124 or its.By such audit function be coated with function again, just can improve the reliability that the saturation bottoming is handled more, thereby can improve the reliability of coated film quality more.
Above-mentioned embodiment relates to the strip coating nozzle with slit-shaped outlet, but the present invention also goes for having the strip coating nozzle of the outlet that is made of a plurality of minute apertures of vertically arranging by nozzle.In addition, above-mentioned embodiment also relates to the liquid apparatus for coating against corrosion in the coating developing system of making LCD, but the present invention is applicable to supplying with in the purposes arbitrarily of coating fluid on processed substrate.As the coating fluid among the present invention, except liquid against corrosion, also comprise for example various coating fluids such as interlayer dielectic, dielectric material, wiring material.Processed substrate among the present invention is not limited to the LCD substrate, and the flat-panel monitor that also comprises other is with substrate, semiconductor wafer, CD substrate, glass substrate, photomask, tellite etc.
Claims (17)
1. coating process, at the processed substrate of approximate horizontal be arranged between the outlet on the lower surface of strip nozzle and set required minim gap, in coating is handled, using the coating fluid that is expelled on the described substrate from described outlet to soak under the state of bottom, the described coating nozzle back side, make described coating nozzle with the horizontal direction of the vertical approximate vertical of nozzle on relatively move, described coating fluid is coated on the described substrate, it is characterized in that:
Be included in to be coated with and vertically coat coating fluid or the dilution coating fluid that the coating fluid dilution is obtained, form with the nozzle parallel longitudinal and along the saturation bottoming treatment process of linearly extended many obliterating lines that constitute by coating fluid or dilution coating fluid of level one in nozzle back side portion thus along nozzle before handling in the bottom, the back side of described coating nozzle.
2. coating process as claimed in claim 1, it is characterized in that: described saturation bottoming treatment process is, for the bottom, the back side of described coating nozzle, Yi Bian push down the coated mat of oozing out described coating fluid or dilution coating fluid, Yi Bian vertically relatively slide along nozzle.
3. coating process as claimed in claim 2 is characterized in that: described coated mat is to make the pad parts that are made of spongy material or porous metallic substance contact the line slip of going forward side by side with the bottom, the back side of described coating nozzle.
4. as claim 2 or 3 described coating processes, it is characterized in that: make described coated mat slide into the other end right from an end of the bottom, the back side of described coating nozzle.
5. as claim 2 or 3 described coating processes, it is characterized in that: form in the bottom, the back side of described coating nozzle along the hydrops portion of the described coating fluid or the dilution coating fluid of nozzle longitudinal extension.
6. coating process as claimed in claim 1, it is characterized in that: described saturation bottoming treatment process is, for the bottom, the back side of described coating nozzle, Yi Bian supply with described coating fluid or dilute coating fluid and push down the obliterating pad, Yi Bian vertically carry out with respect to slip along nozzle.
7. coating process as claimed in claim 6 is characterized in that: described obliterating pad is to make the pad parts that are made of spongy material or porous metallic substance contact the line slip of going forward side by side with the bottom, the back side of described coating nozzle.
8. as claim 6 or 7 described coating processes, it is characterized in that: make described obliterating pad slide into the other end right from an end of the bottom, the back side of described coating nozzle.
9. apparatus for coating is characterized in that: comprising:
The strip coating nozzle that has outlet in the lower surface;
Be used for supplying with the first coating fluid supply unit of coating fluid to described coating nozzle;
Be used for approximate horizontal ground and support the substrate support sector of processed substrate;
Be used for handling the nozzle support sector that the described substrate of being supported with respect to described substrate support sector separates required minim gap and supports described coating nozzle in coating;
Be used for relatively move horizontally between described substrate support sector and the described nozzle support sector, make handle under the state of bottom, the back side of using the coating fluid that is expelled to from the outlet of described coating nozzle on the described substrate to soak into described coating nozzle in coating, make described coating nozzle with the horizontal direction of the vertical approximate vertical of nozzle on the scanner section that relatively moves; With
Before being coated with processing, vertically coating coating fluid or the dilution coating fluid that coating fluid dilution is obtained, form with the nozzle parallel longitudinal and along the saturation bottoming handling part of linearly extended many obliterating lines that constitute by coating fluid or dilution coating fluid of level one in nozzle back side portion thus in the bottom, the back side of described coating nozzle along nozzle.
10. apparatus for coating as claimed in claim 9 is characterized in that: described saturation bottoming handling part has: the coated mat of oozing out described coating fluid or dilution coating fluid; With, be used for pushing down in the bottom, the back side of described coating nozzle described coated mat and the coated mat sliding part that vertically relatively slides along nozzle.
11. apparatus for coating as claimed in claim 10 is characterized in that: described saturation bottoming handling part has the second coating fluid supply unit from dilution coating fluid to described coated mat that supply with coating fluid or.
12. as claim 10 or 11 described apparatus for coating, it is characterized in that: described coated mat has the pad parts that are made of spongy material or porous metallic substance, described pad parts contact with the bottom, the back side of described coating nozzle.
13. as claim 10 or 11 described apparatus for coating, it is characterized in that: described coated mat has the recess that extends with nozzle parallel longitudinal ground in the bottom of the pad interarea that contacts with the bottom, the back side of described coating nozzle.
14. as claim 10 or 11 described apparatus for coating, it is characterized in that: described coated mat sliding part has and is used to make described coated mat directly to advance drive division from an end of the bottom, the back side of described coating nozzle according to what straight line slided into the other end right.
15. apparatus for coating as claimed in claim 9 is characterized in that: described saturation bottoming handling part has: the coating fluid applicator that is used for described coating fluid or dilution coating fluid are coated in the bottom, the back side of described coating nozzle; The obliterating pad that is used for the bottom, the back side of the described coating nozzle of obliterating; With, be used for pushing down in the bottom, the back side of described coating nozzle described obliterating pad and the obliterating pad sliding part that vertically relatively slides along nozzle.
16. apparatus for coating as claimed in claim 15 is characterized in that: described obliterating spacer has the pad parts that are made of spongy material or porous metallic substance, and described pad parts contact with the bottom, the back side of described coating nozzle.
17. as claim 15 or 16 described apparatus for coating, it is characterized in that: described obliterating pad sliding part has and is used to make described obliterating pad directly to advance drive division from what an end of the bottom, the back side of described coating nozzle slided into the other end right.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2003320845 | 2003-09-12 | ||
| JP2003320845A JP4071183B2 (en) | 2003-09-12 | 2003-09-12 | Coating method and coating apparatus |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1593787A CN1593787A (en) | 2005-03-16 |
| CN100542685C true CN100542685C (en) | 2009-09-23 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNB2004100784068A Expired - Fee Related CN100542685C (en) | 2003-09-12 | 2004-09-10 | Coating process and apparatus for coating |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JP4071183B2 (en) |
| KR (1) | KR101065876B1 (en) |
| CN (1) | CN100542685C (en) |
| TW (1) | TWI299286B (en) |
Families Citing this family (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4980644B2 (en) * | 2005-05-30 | 2012-07-18 | 東京エレクトロン株式会社 | Coating method and coating apparatus |
| KR101097519B1 (en) * | 2005-06-25 | 2011-12-22 | 엘지디스플레이 주식회사 | Coating apparatus and method of forming coating layer |
| JP4799390B2 (en) * | 2006-12-15 | 2011-10-26 | 中外炉工業株式会社 | Application method |
| KR100834145B1 (en) | 2006-12-27 | 2008-06-02 | 세메스 주식회사 | Apparatus for coating photoresist including a weight supporter |
| JP5121778B2 (en) * | 2009-06-26 | 2013-01-16 | 東京エレクトロン株式会社 | Priming processing method and priming processing apparatus |
| CN102221784B (en) * | 2010-04-19 | 2013-07-24 | 北京京东方光电科技有限公司 | Glue coating device and glue coating method |
| JP5841449B2 (en) * | 2012-02-10 | 2016-01-13 | 東京エレクトロン株式会社 | Wiping pad, nozzle maintenance device using the pad, and coating treatment device |
| JP6310179B2 (en) * | 2013-01-31 | 2018-04-11 | 積水化学工業株式会社 | Gel coating machine and lithium ion secondary battery manufacturing device |
| CN103223396B (en) * | 2013-05-10 | 2016-02-03 | 深圳市华星光电技术有限公司 | A kind of contact immersion slot for light blockage coating equipment |
| CN104338706B (en) * | 2013-08-02 | 2018-04-13 | 盛美半导体设备（上海）有限公司 | Cleaning device |
| CN105728256A (en) * | 2016-04-29 | 2016-07-06 | 玖龙纸业（太仓）有限公司 | Production device and production method for coated duplex board with grey back |
| CN105880104B (en) * | 2016-05-25 | 2020-03-31 | 成都国珈星际固态锂电科技有限公司 | Coating mechanism, slit coating device and film preparation method |
| CN106125178A (en) * | 2016-08-19 | 2016-11-16 | 武汉华星光电技术有限公司 | Colored filter and the apparatus for coating of acquisition thereof and acquisition methods |
| WO2018143342A1 (en) | 2017-02-03 | 2018-08-09 | 日立オートモティブシステムズ株式会社 | Coating die, coating device, coating method, and method for manufacturing secondary cell |
| CN107282371A (en) * | 2017-08-17 | 2017-10-24 | 京东方科技集团股份有限公司 | A kind of coating head and its apparatus for coating |
| CN213315692U (en) * | 2020-06-30 | 2021-06-01 | 东莞宇宙电路板设备有限公司 | Vertical spraying device and surface treatment equipment |
| CN113262930A (en) * | 2021-04-07 | 2021-08-17 | 李来旺 | Steel pipe anticorrosion painting device |
| CN115025935B (en) * | 2022-07-28 | 2023-02-28 | 深圳市三维机电设备有限公司 | Automatic heating, wiping, dispensing and curing all-in-one machine for liquid crystal workpieces |
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| CN1140104C (en) * | 1998-09-16 | 2004-02-25 | 深圳矽感科技有限公司 | Light moving scanner |
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| JP3604987B2 (en) | 1994-04-21 | 2004-12-22 | 大日本スクリーン製造株式会社 | Coating device and coating method |
| JPH10216598A (en) | 1997-02-04 | 1998-08-18 | Toray Ind Inc | Method and device for coating and method and device for manufacture of color filter |
| JP2002177848A (en) | 2000-12-15 | 2002-06-25 | Toray Ind Inc | Apparatus and method for cleaning coating die, and apparatus and method for manufacturing color filter using them |
-
2003
- 2003-09-12 JP JP2003320845A patent/JP4071183B2/en not_active Expired - Fee Related
-
2004
- 2004-09-09 TW TW093127298A patent/TWI299286B/en not_active IP Right Cessation
- 2004-09-10 CN CNB2004100784068A patent/CN100542685C/en not_active Expired - Fee Related
- 2004-09-10 KR KR1020040072641A patent/KR101065876B1/en not_active IP Right Cessation
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1140104C (en) * | 1998-09-16 | 2004-02-25 | 深圳矽感科技有限公司 | Light moving scanner |
Also Published As
| Publication number | Publication date |
|---|---|
| JP4071183B2 (en) | 2008-04-02 |
| JP2005087777A (en) | 2005-04-07 |
| CN1593787A (en) | 2005-03-16 |
| KR20050027076A (en) | 2005-03-17 |
| TW200518849A (en) | 2005-06-16 |
| KR101065876B1 (en) | 2011-09-19 |
| TWI299286B (en) | 2008-08-01 |
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