KR100834145B1 - Apparatus for coating photoresist including a weight supporter - Google Patents

Apparatus for coating photoresist including a weight supporter Download PDF

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Publication number
KR100834145B1
KR100834145B1 KR1020060135650A KR20060135650A KR100834145B1 KR 100834145 B1 KR100834145 B1 KR 100834145B1 KR 1020060135650 A KR1020060135650 A KR 1020060135650A KR 20060135650 A KR20060135650 A KR 20060135650A KR 100834145 B1 KR100834145 B1 KR 100834145B1
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KR
South Korea
Prior art keywords
flat panel
panel display
reinforcing
reinforcing bar
nozzle
Prior art date
Application number
KR1020060135650A
Other languages
Korean (ko)
Inventor
박종호
이동기
Original Assignee
세메스 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by 세메스 주식회사 filed Critical 세메스 주식회사
Priority to KR1020060135650A priority Critical patent/KR100834145B1/en
Application granted granted Critical
Publication of KR100834145B1 publication Critical patent/KR100834145B1/en

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C5/00—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
    • B05C5/02—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor

Abstract

A photoresist coating apparatus including a weight supporter is provided to form uniformly a photoresist layer on a surface of a flat panel display by maintaining a leveling state of a nozzle unit. A holding plate(130) is installed at a nozzle unit(120) in order to be integrated with the nozzle unit. A reinforcing plate(150) is horizontally positioned in parallel to an upper part of the holding plate. A plurality of reinforcing columns(160a-160d) are formed to connect perpendicularly the holding plate with the reinforcing plate. A plurality of supporters(140a,140b) are formed to support the weight of the nozzle unit, the holding plate, the reinforcing plate, and the reinforcing columns. The reinforcing plate is directly connected to the supporters or the reinforcing plate is not directly connected with the supporters.

Description

[0001] Apparatus for Coating Photoresist Including a Weight Supporter [0002]

1 is a perspective view schematically showing an apparatus for applying a photoresist film on the surface of a flat panel display according to the prior art.

2 is a perspective view schematically showing an apparatus for applying a photoresist film on a surface of a flat panel display according to an embodiment of the present invention and a nozzle thereof.

3 is a perspective view schematically showing an apparatus for applying a photoresist film on a surface of a flat panel display according to another embodiment of the present invention and a nozzle thereof.

4 is a perspective view schematically showing an apparatus for applying a photoresist film on a surface of a flat panel display according to another embodiment of the present invention and a nozzle thereof.

Description of the Related Art [0002]

110: Photoresist application device

120: nozzle unit 30: cradle

140: Support 150: Reinforcement

160: Reinforcing column

The present invention relates to a nozzle for applying a photoresist in a process of applying a photoresist to a surface of a flat panel display during the manufacturing process of a flat panel display, and particularly relates to a nozzle for applying a photoresist to a flat panel display To a nozzle for applying a photoresist film to a surface thereof.

It is difficult for a semiconductor and / or LCD manufacturing process having a similar mechanism to be applied directly to a flat panel display manufacturing process because a flat panel display is so large as to have a size of 1,800 x 2,200 (mm). For example, it is very difficult to ensure on-plate uniformity, and equipment problems that require a large area simultaneously can not be solved easily.

The surface area of a flat panel display on which a photoresist is to be applied is very wide compared to wafers and / or LCD panels for semiconductor manufacturing, The thickness of the photoresist film is not so different. Specifically, the size of the wafer for semiconductor fabrication and / or the LCD panel is usually at the maximum of 300 mm, and only about 500 to 600 mm in the special case, so that the thickness of the photoresist film formed thereon is very small It can be said that they are similar to each other.

At this time, since the area of the flat panel display is very large, it is more difficult to secure the uniformity of the thickness of the photoresist film than the semiconductor and / or LCD panel.

In order to ensure uniform application of the photoresist film of such a flat panel display, it is necessary to first reduce the device parameters to a minimum. That is, the effect on the uniformity of coating of the photoresist film caused by the device problem should be minimized.

However, due to the large size of the flat panel display, the devices for performing the process on the flat panel display are therefore forced to grow accordingly. If the size of the device is large, the variable for it also becomes large. Therefore, the problem of reducing the device-related variable is not easy to solve.

An apparatus for applying a photoresist film on the surface of a flat panel display according to the prior art will be described with reference to the accompanying drawings.

1 is a perspective view schematically showing an apparatus for applying a photoresist film on the surface of a flat panel display according to the prior art.

Referring to FIG. 1, an apparatus 10 for applying a photoresist film on a surface of a flat panel display according to the related art includes a nozzle unit 20 for ejecting a photoresist, And support portions 40a and 40b which are in contact with the mount 30 and support the nozzle portion 20 and the mount 30.

Although the stand 30 and the supports 40a and 40b are shown as being separated from each other in the figure, this is simplified in order to facilitate understanding of the technical idea of the present invention. In practice, the two components are in physical contact.

The holder 30 is integrally formed with the nozzle unit 20 and directly receives a force necessary for moving, raising and lowering the nozzle unit 20 from the nozzle driving unit (not shown) or the supporting units 40a and 40b, (20).

The supporting portions 40a and 40b physically contact the holder 30 to bear the weight of the nozzle portion 20 and the holder 30 and to transmit the force for moving the nozzle portion 20 and the holder 30 Element.

The apparatus for applying the photoresist film to the surface of such a flat panel display according to the related art is vulnerable to the phenomenon that the nozzle portion 20 and / or the holder 30 are bent downward or bent at the center portion due to their weight.

When the central portion of the nozzle portion 20 and / or the holder 30 is knocked down or curved, it causes a failure in the process of applying the photoresist film to the surface of the flat panel display located beneath it. For example, the portion of the photoresist film that is applied to the surface of the flat panel display may bulge to the center by blowing down relatively more photoresist than the other portion by the downwardly bent portion. That is, the thickness of the photoresist film on the surface of the flat panel display may become uneven. In addition, the downwardly bent or curved nozzle portion 20 may cause scratches or the like on the surface of the photoresist film applied to the surface or the surface of the flat panel display, and conversely, the nozzle portion 20 may be damaged.

Therefore, a method of preventing the central portion of the nozzle unit 20 and / or the holder 30 from being stuck or bent is needed.

SUMMARY OF THE INVENTION It is an object of the present invention to provide an apparatus for coating a photoresist film on a surface of a flat panel display including a nozzle that can always maintain a horizontal state.

It is another object of the present invention to provide a nozzle for applying a photoresist film on a surface of a flat panel display which can always be kept horizontal.

The objects of the present invention are not limited to the above-mentioned objects, and other objects not mentioned can be clearly understood by those skilled in the art from the following description.

According to an aspect of the present invention, there is provided an apparatus for coating a photoresist film on a surface of a flat panel display, the apparatus comprising: a nozzle unit; a holder unit integrally formed on the nozzle unit; Reinforcing bars vertically connecting the cradle and the reinforcing bar, and supports supporting the weight of the nozzle, the cradle, the reinforcing bar, and the reinforcing columns.

The reinforcing bar may be directly connected to the support, not connected, or may be horizontal or arcuate.

According to another aspect of the present invention, there is provided a nozzle for applying a photoresist film on a surface of a flat panel display, comprising: a jetting unit for jetting a photoresist; a holder for integrally forming an upper part of the jetting unit; A reinforcing bar vertically disposed in parallel with the cradle, a reinforcing column vertically connecting the cradle and the reinforcing bar, and a support portion supporting the weight of the jetting portion, the cradle, the reinforcing bar, and the reinforcing columns.

The reinforcing bar may be directly connected to the support, not connected, or may be horizontal or arcuate.

The details of other embodiments are included in the detailed description and drawings.

BRIEF DESCRIPTION OF THE DRAWINGS The advantages and features of the present invention, and the manner of achieving them, will be apparent from and elucidated with reference to the embodiments described hereinafter in conjunction with the accompanying drawings. The present invention may, however, be embodied in many different forms and should not be construed as limited to the embodiments set forth herein. Rather, these embodiments are provided so that this disclosure will be thorough and complete, and will fully convey the scope of the invention to those skilled in the art. To fully disclose the scope of the invention to those skilled in the art, and the invention is only defined by the scope of the claims. Like reference numerals refer to like elements throughout the specification.

Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the accompanying drawings.

2 is a perspective view schematically showing an apparatus for applying a photoresist film on a surface of a flat panel display according to an embodiment of the present invention and a nozzle thereof.

Referring to FIG. 2, an apparatus 110 for coating a photoresist film on a surface of a flat panel display according to an exemplary embodiment of the present invention includes a nozzle unit 120, a nozzle unit 120, A reinforcing bar 150 positioned horizontally in parallel with the bar 130 on the upper portion of the barrel 130, a bar 130 and a bar 150 perpendicular to the barrel 120, 160b, 160c, and 160d and the weight of the nozzle portion 120, the holder 130, the reinforcing bar 150, and the reinforcing posts 160a, 160b, 160c, and 160d And support portions 140a and 140b.

The weight of the nozzle unit 120 and the holder 130 may be directly transmitted to the supports 140a and 140b but may be transferred to the reinforcing bar 150 via the reinforcing posts 160a, 160b, 160c, and 160d. . The reinforcing bar 150 is directly connected to the supporting portions 140a and 140b to transmit the weight of the nozzle unit 120 and the weight of the receiving unit 130 and their weight. It also conveys the weight of the reinforcing pillars 160a, 160b, 160c, 160d.

The apparatus for applying the photoresist film on the surface of the flat panel display according to the present embodiment can absorb the weight of the nozzle unit 120 and / or the holder 130 by the reinforcing bar 150, Or the center portion of the holder 130 is very effectively prevented from being knocked down or warped.

In other words, the nozzle 110 for applying the photoresist film to the surface of the flat panel display according to an embodiment of the present invention includes a spraying unit 120 for spraying the photoresist, A reinforcing bar 150 positioned horizontally in parallel with the barriers 130 on the upper portion of the barriers 130 and a vertical barriers 130 and a reinforcing bar 150 perpendicular to the barriers 130, 160b, 160c, and 160d that are connected to the reinforcing bars 160a, 160b, 160c, and 160d and the weight of the projecting portion 120, the holder 130, the reinforcing bar 150, And supports 140a and 140b.

3 is a perspective view schematically showing an apparatus for applying a photoresist film on a surface of a flat panel display according to another embodiment of the present invention and a nozzle thereof.

Referring to FIG. 3, the apparatus 210 for applying a photoresist film on the surface of a flat panel display according to another embodiment of the present invention is not directly connected to the supports 240a and 240b, And a reinforcing column 250 and reinforcing columns 260a, 260b, 260c, and 260d that evenly transfer the weight of the intermediate portion of the holder 230 to other portions.

In other words, the nozzle 210 for applying the photoresist film to the surface of the flat panel display according to another embodiment of the present invention is not directly connected to the supporting portions 240a and 240b, but the jetting portion 220 and the holder 230 And a reinforcing column 250 and reinforcing columns 260a, 260b, 260c, and 260d for uniformly transferring the weight of the intermediate portion of the frame 250 to other portions.

4 is a perspective view schematically showing an apparatus for applying a photoresist film on a surface of a flat panel display according to another embodiment of the present invention and a nozzle thereof.

Referring to FIG. 4, the apparatus 310 for applying a photoresist film on the surface of a flat panel display according to another embodiment of the present invention is not directly connected to the supports 340a and 340b, And an arcuate rib 350 for uniformly transferring the weight of the intermediate portion of the holder 330 to another portion and reinforcement columns 360a, 360b, 360c, and 360d of various lengths.

In other words, the nozzle 310 for applying the photoresist film to the surface of the flat panel display according to another embodiment of the present invention is not directly connected to the supporting portions 340a and 340b, but the jetting portion 320 and the holder 360, 360c, 360d of various lengths, and arcuate barbs 350 that evenly transfer the weight of the intermediate portion of each of the barbs 330, 330 to other portions.

In embodiments of the present invention, the reinforcing bars and reinforcing posts are not to be construed as being limited to the shapes shown in the drawings. The description and the accompanying drawings described in the present specification are simplified or exaggerated drawings and embodiments in order to facilitate understanding of the technical idea of the present invention.

It will be apparent to those skilled in the art that various modifications and variations can be made in the present invention without departing from the spirit or essential characteristics thereof. It is to be understood that the invention may be embodied in other specific forms without departing from the spirit or scope of the invention. It is therefore to be understood that the above-described embodiments are illustrative in all aspects and not restrictive.

The device and the nozzle for applying the photoresist film to the surface of the flat panel display according to the embodiments of the present invention can always be kept horizontal so that the photoresist film applied to the surface of the flat panel display can be formed with a uniform thickness , No physical defect due to the nozzle occurs.

The effects of the present invention are not limited to the effects mentioned above, and other effects not mentioned can be clearly understood by those skilled in the art from the description of the claims.

Claims (8)

Nozzle portion, A holder that is integrally formed on the upper portion of the nozzle unit, A reinforcing bar positioned horizontally in parallel with the cradle at the top of the cradle, Reinforcing posts vertically connecting the cradle and the reinforcing bar, and And a support portion for supporting the weight of the nozzle portion, the holder, the reinforcing bar, and the reinforcing pillars. The method according to claim 1, Wherein the reinforcing bar is directly connected to the support. The method according to claim 1, Wherein the reinforcing bar is not directly connected to the support portion. The method according to claim 1, Wherein the reinforcing bars apply photoresist to the surface of a flat panel display having an arcuate shape. An ejector for ejecting the photoresist, A holder which is integrally formed on an upper portion of the spout, A reinforcing bar positioned horizontally in parallel with the cradle at the top of the cradle, Reinforcing posts vertically connecting the cradle and the reinforcing bar, and A nozzle for applying photoresist to a surface of a flat panel display, comprising a jetting portion, a holder, a reinforcing bar, and a support for supporting the weight of the reinforcing posts. 6. The method of claim 5, And wherein the ribs are directly connected to the support, wherein the photoresist is applied to the surface of the flat panel display. 6. The method of claim 5, Wherein the reinforcing bar applies photoresist to a surface of the flat panel display that is not directly connected to the support. 6. The method of claim 5, Wherein the reinforcing bar is coated with a photoresist on the surface of a flat panel display having an arcuate shape.
KR1020060135650A 2006-12-27 2006-12-27 Apparatus for coating photoresist including a weight supporter KR100834145B1 (en)

Priority Applications (1)

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KR1020060135650A KR100834145B1 (en) 2006-12-27 2006-12-27 Apparatus for coating photoresist including a weight supporter

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Application Number Priority Date Filing Date Title
KR1020060135650A KR100834145B1 (en) 2006-12-27 2006-12-27 Apparatus for coating photoresist including a weight supporter

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KR100834145B1 true KR100834145B1 (en) 2008-06-02

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Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR19980019188A (en) * 1996-08-30 1998-06-05 히가시 데쓰로 APPARATUS FOR FORMING COATING FILM FOR SEMICONDUCTOR PROCES SING
JP2004087798A (en) 2002-08-27 2004-03-18 Dainippon Screen Mfg Co Ltd Substrate treating device
JP2005087777A (en) 2003-09-12 2005-04-07 Tokyo Electron Ltd Coating liquid applying method and coating applicator
JP2006261394A (en) 2005-03-17 2006-09-28 Tokyo Electron Ltd Substrate processing apparatus, substrate processing method and substrate processing program

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR19980019188A (en) * 1996-08-30 1998-06-05 히가시 데쓰로 APPARATUS FOR FORMING COATING FILM FOR SEMICONDUCTOR PROCES SING
JP2004087798A (en) 2002-08-27 2004-03-18 Dainippon Screen Mfg Co Ltd Substrate treating device
JP2005087777A (en) 2003-09-12 2005-04-07 Tokyo Electron Ltd Coating liquid applying method and coating applicator
JP2006261394A (en) 2005-03-17 2006-09-28 Tokyo Electron Ltd Substrate processing apparatus, substrate processing method and substrate processing program

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