TW200518849A - Coating method and coating apparatus - Google Patents
Coating method and coating apparatusInfo
- Publication number
- TW200518849A TW200518849A TW093127298A TW93127298A TW200518849A TW 200518849 A TW200518849 A TW 200518849A TW 093127298 A TW093127298 A TW 093127298A TW 93127298 A TW93127298 A TW 93127298A TW 200518849 A TW200518849 A TW 200518849A
- Authority
- TW
- Taiwan
- Prior art keywords
- coating
- nozzle
- resist
- pad
- going
- Prior art date
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D1/00—Processes for applying liquids or other fluent materials
- B05D1/40—Distributing applied liquids or other fluent materials by members moving relatively to surface
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05C5/00—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
- B05C5/02—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D1/00—Processes for applying liquids or other fluent materials
- B05D1/26—Processes for applying liquids or other fluent materials performed by applying the liquid or other fluent material from an outlet device in contact with, or almost in contact with, the surface
Landscapes
- Coating Apparatus (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
As stability always obtains a wet line good for a long-type coating nozzle, on a processed substrate, a film thickness is fixed and a coating film without coating unevenness is formed. The wet line ground processing part 125 supplying resist liquid or dilution resist liquid to the coating pad 162 constituted so that resist .liquid might ooze from the front from the resist liquid supply part in the utility unit 172. Pushing the coating pad 162 against the bottom half part of the nozzle part back 160 by predetermined pressure by pushing parts in the utility unit 172. The application pad 162 is made to move in the direction of nozzle longitudinal (the direction of Y) by the going-straight drive of the going-straight drive part 176 at linear from the end of the resist nozzle 120 to other ends, and a breath.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2003320845A JP4071183B2 (en) | 2003-09-12 | 2003-09-12 | Coating method and coating apparatus |
Publications (2)
Publication Number | Publication Date |
---|---|
TW200518849A true TW200518849A (en) | 2005-06-16 |
TWI299286B TWI299286B (en) | 2008-08-01 |
Family
ID=34452686
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW093127298A TWI299286B (en) | 2003-09-12 | 2004-09-09 | Coating method and coating apparatus |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP4071183B2 (en) |
KR (1) | KR101065876B1 (en) |
CN (1) | CN100542685C (en) |
TW (1) | TWI299286B (en) |
Families Citing this family (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4980644B2 (en) * | 2005-05-30 | 2012-07-18 | 東京エレクトロン株式会社 | Coating method and coating apparatus |
KR101097519B1 (en) | 2005-06-25 | 2011-12-22 | 엘지디스플레이 주식회사 | Coating apparatus and method of forming coating layer |
JP4799390B2 (en) * | 2006-12-15 | 2011-10-26 | 中外炉工業株式会社 | Application method |
KR100834145B1 (en) | 2006-12-27 | 2008-06-02 | 세메스 주식회사 | Apparatus for coating photoresist including a weight supporter |
JP5121778B2 (en) * | 2009-06-26 | 2013-01-16 | 東京エレクトロン株式会社 | Priming processing method and priming processing apparatus |
CN102221784B (en) * | 2010-04-19 | 2013-07-24 | 北京京东方光电科技有限公司 | Glue coating device and glue coating method |
JP5841449B2 (en) * | 2012-02-10 | 2016-01-13 | 東京エレクトロン株式会社 | Wiping pad, nozzle maintenance device using the pad, and coating treatment device |
JP6310179B2 (en) * | 2013-01-31 | 2018-04-11 | 積水化学工業株式会社 | Gel coating machine and lithium ion secondary battery manufacturing device |
CN103223396B (en) * | 2013-05-10 | 2016-02-03 | 深圳市华星光电技术有限公司 | A kind of contact immersion slot for light blockage coating equipment |
CN104338706B (en) * | 2013-08-02 | 2018-04-13 | 盛美半导体设备(上海)有限公司 | Cleaning device |
CN105728256A (en) * | 2016-04-29 | 2016-07-06 | 玖龙纸业(太仓)有限公司 | Production device and production method for coated duplex board with grey back |
CN105880104B (en) * | 2016-05-25 | 2020-03-31 | 成都国珈星际固态锂电科技有限公司 | Coating mechanism, slit coating device and film preparation method |
CN106125178A (en) * | 2016-08-19 | 2016-11-16 | 武汉华星光电技术有限公司 | Colored filter and the apparatus for coating of acquisition thereof and acquisition methods |
JP6794473B2 (en) | 2017-02-03 | 2020-12-02 | ビークルエナジージャパン株式会社 | Coating die, coating equipment, coating method and manufacturing method of secondary battery |
CN107282371A (en) * | 2017-08-17 | 2017-10-24 | 京东方科技集团股份有限公司 | A kind of coating head and its apparatus for coating |
CN213315692U (en) * | 2020-06-30 | 2021-06-01 | 东莞宇宙电路板设备有限公司 | Vertical spraying device and surface treatment equipment |
CN113262930A (en) * | 2021-04-07 | 2021-08-17 | 李来旺 | Steel pipe anticorrosion painting device |
CN115025935B (en) * | 2022-07-28 | 2023-02-28 | 深圳市三维机电设备有限公司 | Automatic heating, wiping, dispensing and curing all-in-one machine for liquid crystal workpieces |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3604987B2 (en) | 1994-04-21 | 2004-12-22 | 大日本スクリーン製造株式会社 | Coating device and coating method |
JPH10216598A (en) | 1997-02-04 | 1998-08-18 | Toray Ind Inc | Method and device for coating and method and device for manufacture of color filter |
US6275309B1 (en) * | 1998-09-16 | 2001-08-14 | Syscan, Inc. | Lightweight mobile scanners |
JP2002177848A (en) | 2000-12-15 | 2002-06-25 | Toray Ind Inc | Apparatus and method for cleaning coating die, and apparatus and method for manufacturing color filter using them |
-
2003
- 2003-09-12 JP JP2003320845A patent/JP4071183B2/en not_active Expired - Fee Related
-
2004
- 2004-09-09 TW TW093127298A patent/TWI299286B/en not_active IP Right Cessation
- 2004-09-10 CN CNB2004100784068A patent/CN100542685C/en not_active Expired - Fee Related
- 2004-09-10 KR KR1020040072641A patent/KR101065876B1/en not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
CN100542685C (en) | 2009-09-23 |
TWI299286B (en) | 2008-08-01 |
CN1593787A (en) | 2005-03-16 |
JP2005087777A (en) | 2005-04-07 |
KR20050027076A (en) | 2005-03-17 |
JP4071183B2 (en) | 2008-04-02 |
KR101065876B1 (en) | 2011-09-19 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
MM4A | Annulment or lapse of patent due to non-payment of fees |