CN100482850C - 直列式有机电致发光制造装置 - Google Patents

直列式有机电致发光制造装置 Download PDF

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Publication number
CN100482850C
CN100482850C CNB2005100547673A CN200510054767A CN100482850C CN 100482850 C CN100482850 C CN 100482850C CN B2005100547673 A CNB2005100547673 A CN B2005100547673A CN 200510054767 A CN200510054767 A CN 200510054767A CN 100482850 C CN100482850 C CN 100482850C
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CN
China
Prior art keywords
substrate
bracing
strutting arrangement
film
chamber
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
CNB2005100547673A
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English (en)
Chinese (zh)
Other versions
CN1676659A (zh
Inventor
神川进
森崎裕彦
和田宏三
吉武隆
合田圣彦
平井悦郎
小林敏郎
加藤光雄
平野龙也
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Heavy Industries Ltd
Original Assignee
Mitsubishi Heavy Industries Ltd
Mitsubishi Hitachi Metals Machinery Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Heavy Industries Ltd, Mitsubishi Hitachi Metals Machinery Inc filed Critical Mitsubishi Heavy Industries Ltd
Publication of CN1676659A publication Critical patent/CN1676659A/zh
Application granted granted Critical
Publication of CN100482850C publication Critical patent/CN100482850C/zh
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10—Deposition of organic active material
    • H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
    • H10K71/164—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using vacuum deposition
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/12—Organic material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50—Substrate holders
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/10—Details of semiconductor or other solid state devices to be connected
    • H01L2924/11—Device type
    • H01L2924/12—Passive devices, e.g. 2 terminal devices
    • H01L2924/1204—Optical Diode
    • H01L2924/12044—OLED

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Electroluminescent Light Sources (AREA)
  • Physical Vapour Deposition (AREA)
CNB2005100547673A 2004-03-30 2005-03-11 直列式有机电致发光制造装置 Expired - Lifetime CN100482850C (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2004098403A JP2005285576A (ja) 2004-03-30 2004-03-30 インライン式有機エレクトロルミネセンス製造装置
JP2004098403 2004-03-30

Publications (2)

Publication Number Publication Date
CN1676659A CN1676659A (zh) 2005-10-05
CN100482850C true CN100482850C (zh) 2009-04-29

Family

ID=35049405

Family Applications (1)

Application Number Title Priority Date Filing Date
CNB2005100547673A Expired - Lifetime CN100482850C (zh) 2004-03-30 2005-03-11 直列式有机电致发光制造装置

Country Status (4)

Country Link
JP (1) JP2005285576A (enExample)
KR (1) KR100692170B1 (enExample)
CN (1) CN100482850C (enExample)
TW (1) TW200539740A (enExample)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007149482A (ja) * 2005-11-28 2007-06-14 Konica Minolta Holdings Inc 有機ｅｌ素子の製造方法
KR101200593B1 (ko) * 2006-02-17 2012-11-12 황창훈 유기소자 양산용 증착용 기판 이송용 롤러장치
JP2007328999A (ja) * 2006-06-07 2007-12-20 Tokyo Electron Ltd 発光素子の製造装置および発光素子の製造方法
JP5051869B2 (ja) 2006-06-14 2012-10-17 東京エレクトロン株式会社 発光素子および発光素子の製造方法
JP5051870B2 (ja) * 2006-06-14 2012-10-17 東京エレクトロン株式会社 発光素子の製造装置および発光素子の製造方法
JP5280667B2 (ja) * 2007-11-08 2013-09-04 株式会社ジャパンディスプレイ 有機ｅｌ表示装置の製造方法及び蒸着マスクのクリーニング方法
JP5185678B2 (ja) * 2008-03-31 2013-04-17 芝浦メカトロニクス株式会社 スパッタリング装置及び方法
TWI582889B (zh) * 2009-11-19 2017-05-11 尼康股份有限公司 A substrate processing apparatus, a substrate cassette, a circuit manufacturing method, and a substrate processing method
JP2011127190A (ja) * 2009-12-18 2011-06-30 Showa Denko Kk インライン式成膜装置、磁気記録媒体の製造方法、及びゲートバルブ
TWI398533B (zh) * 2009-12-29 2013-06-11 Au Optronics Corp 蔭罩及其製作方法
JP5602483B2 (ja) * 2010-04-23 2014-10-08 パナソニック株式会社 発光モジュール及びそのモジュールを用いた照明器具
WO2013096951A1 (en) * 2011-12-23 2013-06-27 Solexel, Inc. High productivity spray processing for semiconductor metallization and interconnects
JP2013159841A (ja) * 2012-02-08 2013-08-19 Tokyo Electron Ltd 成膜装置
JP6196078B2 (ja) * 2012-10-18 2017-09-13 株式会社アルバック 成膜装置
KR101341850B1 (ko) * 2012-10-24 2013-12-16 주식회사 선익시스템 유기 증착 마스크의 플라즈마 건식세정을 위한 시스템
JP5968770B2 (ja) * 2012-11-30 2016-08-10 長州産業株式会社 真空成膜装置
JP6814998B1 (ja) * 2019-12-25 2021-01-20 株式会社プラズマイオンアシスト プラズマ処理装置
KR20210083082A (ko) * 2019-12-26 2021-07-06 캐논 톡키 가부시키가이샤 성막 시스템 및 성막 방법
US20240057462A1 (en) * 2020-12-25 2024-02-15 Semiconductor Energy Laboratory Co., Ltd. Manufacturing equipment of display device
CN114765103B (zh) * 2021-01-12 2025-07-25 等离子体成膜有限公司 等离子体处理装置

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06173002A (ja) * 1992-02-26 1994-06-21 Nkk Corp イオンプレ−ティング装置
JP2001007507A (ja) * 1999-06-25 2001-01-12 Fujitsu Ltd リフロー装置
JP3683788B2 (ja) * 1999-08-11 2005-08-17 東京エレクトロン株式会社 加熱処理装置の冷却方法及び加熱処理装置
JP4343480B2 (ja) * 2001-02-08 2009-10-14 株式会社半導体エネルギー研究所 成膜装置及び発光装置の作製方法
JP4704605B2 (ja) * 2001-05-23 2011-06-15 淳二 城戸 連続蒸着装置、蒸着装置及び蒸着方法
JP2003171763A (ja) * 2001-12-07 2003-06-20 Sony Corp インライン式真空成膜装置およびその冷却制御方法
JP2003309167A (ja) * 2002-04-16 2003-10-31 Canon Inc 基板保持装置
US20030221620A1 (en) * 2002-06-03 2003-12-04 Semiconductor Energy Laboratory Co., Ltd. Vapor deposition device
JP2005281784A (ja) * 2004-03-30 2005-10-13 Mitsubishi-Hitachi Metals Machinery Inc 基板の冷却構造

Also Published As

Publication number Publication date
CN1676659A (zh) 2005-10-05
KR100692170B1 (ko) 2007-03-12
KR20060043861A (ko) 2006-05-15
TW200539740A (en) 2005-12-01
JP2005285576A (ja) 2005-10-13
TWI311895B (enExample) 2009-07-01

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ASS Succession or assignment of patent right

Owner name: MITSUBISHI HEAVY INDUSTRY CORP.

Free format text: FORMER OWNER: MITSUBISHI HITACHI STEEL MACHINERY CO LTD

Effective date: 20090717

C41 Transfer of patent application or patent right or utility model
TR01 Transfer of patent right

Effective date of registration: 20090717

Address after: Tokyo, Japan

Patentee after: MITSUBISHI HEAVY INDUSTRIES, Ltd.

Address before: Tokyo, Japan

Co-patentee before: MITSUBISHI HEAVY INDUSTRIES, Ltd.

Patentee before: MITSUBISHI-HITACHI METALS MACHINERY, Inc.

CX01 Expiry of patent term
CX01 Expiry of patent term

Granted publication date: 20090429