CN100433252C - 对已进行曝光处理的衬底进行处理的设备及方法 - Google Patents
对已进行曝光处理的衬底进行处理的设备及方法 Download PDFInfo
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- CN100433252C CN100433252C CNB2006101281065A CN200610128106A CN100433252C CN 100433252 C CN100433252 C CN 100433252C CN B2006101281065 A CNB2006101281065 A CN B2006101281065A CN 200610128106 A CN200610128106 A CN 200610128106A CN 100433252 C CN100433252 C CN 100433252C
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- 239000000758 substrate Substances 0.000 title claims abstract description 599
- 238000012545 processing Methods 0.000 title claims abstract description 142
- 238000000034 method Methods 0.000 title claims abstract description 30
- 230000008569 process Effects 0.000 title abstract description 16
- 238000007654 immersion Methods 0.000 claims description 9
- 238000004140 cleaning Methods 0.000 abstract description 86
- 230000005540 biological transmission Effects 0.000 description 137
- 238000010438 heat treatment Methods 0.000 description 90
- 238000000576 coating method Methods 0.000 description 87
- 239000011248 coating agent Substances 0.000 description 86
- 238000011161 development Methods 0.000 description 67
- 239000007788 liquid Substances 0.000 description 37
- 230000007246 mechanism Effects 0.000 description 28
- 238000012546 transfer Methods 0.000 description 24
- 230000005577 local transmission Effects 0.000 description 19
- 239000012530 fluid Substances 0.000 description 18
- 102100030373 HSPB1-associated protein 1 Human genes 0.000 description 16
- 101000843045 Homo sapiens HSPB1-associated protein 1 Proteins 0.000 description 16
- 239000011261 inert gas Substances 0.000 description 16
- 230000003667 anti-reflective effect Effects 0.000 description 13
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 13
- 230000001012 protector Effects 0.000 description 12
- 238000001816 cooling Methods 0.000 description 11
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 description 10
- 101000582989 Homo sapiens Phospholipid phosphatase-related protein type 4 Proteins 0.000 description 9
- 102100030368 Phospholipid phosphatase-related protein type 4 Human genes 0.000 description 9
- 238000000137 annealing Methods 0.000 description 9
- 239000008367 deionised water Substances 0.000 description 9
- 101100206185 Arabidopsis thaliana TCP18 gene Proteins 0.000 description 8
- 101100206195 Arabidopsis thaliana TCP2 gene Proteins 0.000 description 8
- 101100004651 Schizosaccharomyces pombe (strain 972 / ATCC 24843) brc1 gene Proteins 0.000 description 8
- 229910021641 deionized water Inorganic materials 0.000 description 7
- 101100322810 Arabidopsis thaliana AHL1 gene Proteins 0.000 description 6
- 101100215719 Arabidopsis thaliana AHL3 gene Proteins 0.000 description 6
- 230000008520 organization Effects 0.000 description 6
- 229920002120 photoresistant polymer Polymers 0.000 description 6
- 238000005516 engineering process Methods 0.000 description 5
- 239000012298 atmosphere Substances 0.000 description 4
- 239000000498 cooling water Substances 0.000 description 4
- 238000007599 discharging Methods 0.000 description 4
- UQEAIHBTYFGYIE-UHFFFAOYSA-N hexamethyldisiloxane Chemical compound C[Si](C)(C)O[Si](C)(C)C UQEAIHBTYFGYIE-UHFFFAOYSA-N 0.000 description 4
- 230000002093 peripheral effect Effects 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 4
- 101100480814 Arabidopsis thaliana TCP12 gene Proteins 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 3
- 239000003570 air Substances 0.000 description 3
- 239000012080 ambient air Substances 0.000 description 3
- 230000008859 change Effects 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
- 238000001514 detection method Methods 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 230000003287 optical effect Effects 0.000 description 3
- 238000006552 photochemical reaction Methods 0.000 description 3
- 230000000630 rising effect Effects 0.000 description 3
- 238000004528 spin coating Methods 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 2
- 101000873785 Homo sapiens mRNA-decapping enzyme 1A Proteins 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 239000003377 acid catalyst Substances 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 229910052731 fluorine Inorganic materials 0.000 description 2
- 239000011737 fluorine Substances 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 102100035856 mRNA-decapping enzyme 1A Human genes 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 238000006116 polymerization reaction Methods 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 230000002000 scavenging effect Effects 0.000 description 2
- 239000007921 spray Substances 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 1
- 239000006117 anti-reflective coating Substances 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 238000007630 basic procedure Methods 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 230000018044 dehydration Effects 0.000 description 1
- 238000006297 dehydration reaction Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000005868 electrolysis reaction Methods 0.000 description 1
- 230000003628 erosive effect Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000005755 formation reaction Methods 0.000 description 1
- 230000006870 function Effects 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- 239000010985 leather Substances 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 238000010422 painting Methods 0.000 description 1
- 238000001259 photo etching Methods 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 238000005057 refrigeration Methods 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 230000001360 synchronised effect Effects 0.000 description 1
- 239000003643 water by type Substances 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/38—Treatment before imagewise removal, e.g. prebaking
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70991—Connection with other apparatus, e.g. multiple exposure stations, particular arrangement of exposure apparatus and pre-exposure and/or post-exposure apparatus; Shared apparatus, e.g. having shared radiation source, shared mask or workpiece stage, shared base-plate; Utilities, e.g. cable, pipe or wireless arrangements for data, power, fluids or vacuum
Abstract
Description
Claims (10)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005-266888 | 2005-09-14 | ||
JP2005266888A JP4937559B2 (ja) | 2005-09-14 | 2005-09-14 | 基板処理装置および基板処理方法 |
JP2005266888 | 2005-09-14 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1933100A CN1933100A (zh) | 2007-03-21 |
CN100433252C true CN100433252C (zh) | 2008-11-12 |
Family
ID=37854709
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CNB2006101281065A Active CN100433252C (zh) | 2005-09-14 | 2006-09-04 | 对已进行曝光处理的衬底进行处理的设备及方法 |
Country Status (4)
Country | Link |
---|---|
US (2) | US20070058147A1 (zh) |
JP (1) | JP4937559B2 (zh) |
CN (1) | CN100433252C (zh) |
TW (1) | TWI366077B (zh) |
Families Citing this family (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4937559B2 (ja) * | 2005-09-14 | 2012-05-23 | 株式会社Sokudo | 基板処理装置および基板処理方法 |
JP4781834B2 (ja) * | 2006-02-07 | 2011-09-28 | 大日本スクリーン製造株式会社 | 現像装置および現像方法 |
US8636458B2 (en) | 2007-06-06 | 2014-01-28 | Asml Netherlands B.V. | Integrated post-exposure bake track |
KR100904392B1 (ko) | 2007-06-18 | 2009-06-26 | 세메스 주식회사 | 기판 처리 장치 |
JP5006122B2 (ja) | 2007-06-29 | 2012-08-22 | 株式会社Sokudo | 基板処理装置 |
JP5128918B2 (ja) * | 2007-11-30 | 2013-01-23 | 株式会社Sokudo | 基板処理装置 |
JP5160204B2 (ja) * | 2007-11-30 | 2013-03-13 | 株式会社Sokudo | 基板処理装置 |
JP5179170B2 (ja) | 2007-12-28 | 2013-04-10 | 株式会社Sokudo | 基板処理装置 |
JP5001828B2 (ja) | 2007-12-28 | 2012-08-15 | 株式会社Sokudo | 基板処理装置 |
JP2010177673A (ja) * | 2009-01-30 | 2010-08-12 | Semes Co Ltd | 基板処理設備及び基板処理方法 |
CN101794710B (zh) | 2009-01-30 | 2012-10-03 | 细美事有限公司 | 用于处理基板的系统及方法 |
CN102103333B (zh) * | 2009-12-17 | 2013-08-14 | 上海微电子装备有限公司 | 一种烘烤光刻胶的方法及使用该方法的装置 |
US11520226B2 (en) | 2017-05-12 | 2022-12-06 | Canon Kabushiki Kaisha | Imprint method, imprint apparatus, imprint system, and method of manufacturing article |
JP7112220B2 (ja) * | 2017-05-12 | 2022-08-03 | キヤノン株式会社 | 方法、装置、システム、および物品の製造方法 |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0474180A2 (en) * | 1990-09-03 | 1992-03-11 | Dainippon Screen Mfg. Co., Ltd. | Method of and device for transporting semiconductor substrate in semiconductor processing system |
US6790681B2 (en) * | 2001-06-20 | 2004-09-14 | Tokyo Elecetron Limited | Substrate processing apparatus and substrate processing method |
US20040209201A1 (en) * | 2000-08-15 | 2004-10-21 | Tokyo Electron Limited | Substrate processing method and substrate processing apparatus |
US20040229441A1 (en) * | 2003-05-13 | 2004-11-18 | Dainippon Screen Mfg. Co., Ltd | Substrate processing apparatus |
US6893171B2 (en) * | 2002-05-01 | 2005-05-17 | Dainippon Screen Mfg. Co., Ltd. | Substrate treating apparatus |
Family Cites Families (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH05268138A (ja) * | 1992-03-19 | 1993-10-15 | Nec Corp | 携帯電話機 |
US5997653A (en) * | 1996-10-07 | 1999-12-07 | Tokyo Electron Limited | Method for washing and drying substrates |
US6168672B1 (en) * | 1998-03-06 | 2001-01-02 | Applied Materials Inc. | Method and apparatus for automatically performing cleaning processes in a semiconductor wafer processing system |
JP2000150815A (ja) * | 1998-09-04 | 2000-05-30 | Kokusai Electric Co Ltd | 半導体装置の製造方法及び半導体製造装置 |
JP2001005189A (ja) * | 1999-06-23 | 2001-01-12 | Nec Corp | 現像方法、及び、現像装置 |
JP2001176833A (ja) * | 1999-12-14 | 2001-06-29 | Tokyo Electron Ltd | 基板処理装置 |
JP3593496B2 (ja) | 2000-07-24 | 2004-11-24 | 東京エレクトロン株式会社 | 塗布現像処理装置 |
KR20050004156A (ko) | 2002-05-17 | 2005-01-12 | 가부시키가이샤 에바라 세이사꾸쇼 | 기판처리장치 및 기판처리방법 |
JP4087328B2 (ja) * | 2002-11-28 | 2008-05-21 | 東京エレクトロン株式会社 | 塗布、現像装置及び塗布、現像装置の運転方法 |
US7379785B2 (en) * | 2002-11-28 | 2008-05-27 | Tokyo Electron Limited | Substrate processing system, coating/developing apparatus, and substrate processing apparatus |
AU2003289199A1 (en) * | 2002-12-10 | 2004-06-30 | Nikon Corporation | Exposure apparatus and method for manufacturing device |
JP4525062B2 (ja) * | 2002-12-10 | 2010-08-18 | 株式会社ニコン | 露光装置及びデバイス製造方法、露光システム |
US20050077182A1 (en) * | 2003-10-10 | 2005-04-14 | Applied Materials, Inc. | Volume measurement apparatus and method |
JP4106017B2 (ja) * | 2003-12-19 | 2008-06-25 | 東京エレクトロン株式会社 | 現像装置及び現像方法 |
JP4194495B2 (ja) | 2004-01-07 | 2008-12-10 | 東京エレクトロン株式会社 | 塗布・現像装置 |
JP4535489B2 (ja) | 2004-03-31 | 2010-09-01 | 東京エレクトロン株式会社 | 塗布・現像装置 |
JP4937559B2 (ja) * | 2005-09-14 | 2012-05-23 | 株式会社Sokudo | 基板処理装置および基板処理方法 |
-
2005
- 2005-09-14 JP JP2005266888A patent/JP4937559B2/ja active Active
-
2006
- 2006-08-10 TW TW095129430A patent/TWI366077B/zh active
- 2006-08-15 US US11/464,636 patent/US20070058147A1/en not_active Abandoned
- 2006-09-04 CN CNB2006101281065A patent/CN100433252C/zh active Active
-
2010
- 2010-02-02 US US12/698,888 patent/US8460476B2/en active Active
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0474180A2 (en) * | 1990-09-03 | 1992-03-11 | Dainippon Screen Mfg. Co., Ltd. | Method of and device for transporting semiconductor substrate in semiconductor processing system |
US20040209201A1 (en) * | 2000-08-15 | 2004-10-21 | Tokyo Electron Limited | Substrate processing method and substrate processing apparatus |
US6790681B2 (en) * | 2001-06-20 | 2004-09-14 | Tokyo Elecetron Limited | Substrate processing apparatus and substrate processing method |
US6893171B2 (en) * | 2002-05-01 | 2005-05-17 | Dainippon Screen Mfg. Co., Ltd. | Substrate treating apparatus |
US20040229441A1 (en) * | 2003-05-13 | 2004-11-18 | Dainippon Screen Mfg. Co., Ltd | Substrate processing apparatus |
Also Published As
Publication number | Publication date |
---|---|
US8460476B2 (en) | 2013-06-11 |
CN1933100A (zh) | 2007-03-21 |
US20070058147A1 (en) | 2007-03-15 |
TWI366077B (en) | 2012-06-11 |
US20100126527A1 (en) | 2010-05-27 |
JP2007081117A (ja) | 2007-03-29 |
JP4937559B2 (ja) | 2012-05-23 |
TW200719090A (en) | 2007-05-16 |
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C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
ASS | Succession or assignment of patent right |
Owner name: SOKUDO CO., LTD. Free format text: FORMER OWNER: DAINIPPON SCREEN MFG Effective date: 20070427 |
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C41 | Transfer of patent application or patent right or utility model | ||
TA01 | Transfer of patent application right |
Effective date of registration: 20070427 Address after: Kyoto Japan Applicant after: Sokudo Co., Ltd. Address before: Kyoto City, Kyoto, Japan Applicant before: Dainippon Screen Manufacturing Co., Ltd. |
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C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
C56 | Change in the name or address of the patentee |
Owner name: SCREEN SEMICONDUCTOR SOLUTIONS CO., LTD. Free format text: FORMER NAME: SOKUDO CO., LTD. |
|
CP03 | Change of name, title or address |
Address after: Kyoto Japan Patentee after: Skrine Semiconductor Technology Co. Ltd. Address before: Kyoto Japan Patentee before: Sokudo Co., Ltd. |