CN100422192C - 制造嵌段巯基硅烷的方法 - Google Patents
制造嵌段巯基硅烷的方法 Download PDFInfo
- Publication number
- CN100422192C CN100422192C CNB200480012021XA CN200480012021A CN100422192C CN 100422192 C CN100422192 C CN 100422192C CN B200480012021X A CNB200480012021X A CN B200480012021XA CN 200480012021 A CN200480012021 A CN 200480012021A CN 100422192 C CN100422192 C CN 100422192C
- Authority
- CN
- China
- Prior art keywords
- thioacetic acid
- triethoxysilyl
- ester
- methyl
- silyl
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000000034 method Methods 0.000 title claims abstract description 49
- TXDNPSYEJHXKMK-UHFFFAOYSA-N sulfanylsilane Chemical class S[SiH3] TXDNPSYEJHXKMK-UHFFFAOYSA-N 0.000 title claims abstract description 37
- 238000004519 manufacturing process Methods 0.000 title abstract 2
- -1 methoxy, ethoxy Chemical group 0.000 claims abstract description 78
- 229910000057 polysulfane Inorganic materials 0.000 claims abstract description 51
- 229910052784 alkaline earth metal Inorganic materials 0.000 claims abstract description 22
- 150000001342 alkaline earth metals Chemical class 0.000 claims abstract description 22
- 150000003839 salts Chemical class 0.000 claims abstract description 17
- 229910052751 metal Inorganic materials 0.000 claims abstract description 16
- 239000002184 metal Substances 0.000 claims abstract description 16
- 125000004432 carbon atom Chemical group C* 0.000 claims abstract description 9
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 5
- 125000002947 alkylene group Chemical group 0.000 claims abstract description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Natural products CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 claims description 77
- KOUKXHPPRFNWPP-UHFFFAOYSA-N pyrazine-2,5-dicarboxylic acid;hydrate Chemical compound O.OC(=O)C1=CN=C(C(O)=O)C=N1 KOUKXHPPRFNWPP-UHFFFAOYSA-N 0.000 claims description 38
- 150000001875 compounds Chemical class 0.000 claims description 30
- 238000006243 chemical reaction Methods 0.000 claims description 29
- 229910052728 basic metal Inorganic materials 0.000 claims description 24
- 150000003818 basic metals Chemical class 0.000 claims description 24
- 239000007788 liquid Substances 0.000 claims description 14
- 229910052708 sodium Inorganic materials 0.000 claims description 13
- 239000011734 sodium Substances 0.000 claims description 13
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 claims description 12
- 239000002904 solvent Substances 0.000 claims description 10
- 125000005574 norbornylene group Chemical group 0.000 claims description 8
- 125000001181 organosilyl group Chemical group [SiH3]* 0.000 claims description 8
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 claims description 8
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 claims description 6
- 241001597008 Nomeidae Species 0.000 claims description 6
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 claims description 6
- CTSLXHKWHWQRSH-UHFFFAOYSA-N oxalyl chloride Chemical compound ClC(=O)C(Cl)=O CTSLXHKWHWQRSH-UHFFFAOYSA-N 0.000 claims description 6
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 claims description 5
- 239000000203 mixture Substances 0.000 claims description 5
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 claims description 4
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 claims description 4
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 claims description 4
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 claims description 4
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 claims description 4
- 229910052736 halogen Inorganic materials 0.000 claims description 4
- 150000002367 halogens Chemical group 0.000 claims description 4
- YACCECLVHQLZQK-UHFFFAOYSA-N methoxyperoxyethane Chemical compound CCOOOC YACCECLVHQLZQK-UHFFFAOYSA-N 0.000 claims description 4
- 150000004702 methyl esters Chemical class 0.000 claims description 4
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 4
- 238000006884 silylation reaction Methods 0.000 claims description 4
- PZJJKWKADRNWSW-UHFFFAOYSA-N trimethoxysilicon Chemical group CO[Si](OC)OC PZJJKWKADRNWSW-UHFFFAOYSA-N 0.000 claims description 4
- YGYAWVDWMABLBF-UHFFFAOYSA-N Phosgene Chemical compound ClC(Cl)=O YGYAWVDWMABLBF-UHFFFAOYSA-N 0.000 claims description 3
- KEAYESYHFKHZAL-UHFFFAOYSA-N Sodium Chemical compound [Na] KEAYESYHFKHZAL-UHFFFAOYSA-N 0.000 claims description 3
- 125000003118 aryl group Chemical group 0.000 claims description 3
- HCUYBXPSSCRKRF-UHFFFAOYSA-N diphosgene Chemical compound ClC(=O)OC(Cl)(Cl)Cl HCUYBXPSSCRKRF-UHFFFAOYSA-N 0.000 claims description 3
- UCPYLLCMEDAXFR-UHFFFAOYSA-N triphosgene Chemical compound ClC(Cl)(Cl)OC(=O)OC(Cl)(Cl)Cl UCPYLLCMEDAXFR-UHFFFAOYSA-N 0.000 claims description 3
- MLQBTMWHIOYKKC-KTKRTIGZSA-N (z)-octadec-9-enoyl chloride Chemical compound CCCCCCCC\C=C/CCCCCCCC(Cl)=O MLQBTMWHIOYKKC-KTKRTIGZSA-N 0.000 claims description 2
- VMZCDNSFRSVYKQ-UHFFFAOYSA-N 2-phenylacetyl chloride Chemical compound ClC(=O)CC1=CC=CC=C1 VMZCDNSFRSVYKQ-UHFFFAOYSA-N 0.000 claims description 2
- DAUKMULBEHYFNY-UHFFFAOYSA-N CCCCC(CC)C(=O)C(CCCCCCCCCCC(=O)Cl)Cl Chemical compound CCCCC(CC)C(=O)C(CCCCCCCCCCC(=O)Cl)Cl DAUKMULBEHYFNY-UHFFFAOYSA-N 0.000 claims description 2
- RKEZYTBJAAZWFL-UHFFFAOYSA-N CCOOOC.C(C)(=S)O Chemical compound CCOOOC.C(C)(=S)O RKEZYTBJAAZWFL-UHFFFAOYSA-N 0.000 claims description 2
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 claims description 2
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 claims description 2
- WETWJCDKMRHUPV-UHFFFAOYSA-N acetyl chloride Chemical compound CC(Cl)=O WETWJCDKMRHUPV-UHFFFAOYSA-N 0.000 claims description 2
- 239000012346 acetyl chloride Substances 0.000 claims description 2
- 125000002877 alkyl aryl group Chemical group 0.000 claims description 2
- 125000003710 aryl alkyl group Chemical group 0.000 claims description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 2
- PASDCCFISLVPSO-UHFFFAOYSA-N benzoyl chloride Chemical compound ClC(=O)C1=CC=CC=C1 PASDCCFISLVPSO-UHFFFAOYSA-N 0.000 claims description 2
- DVECBJCOGJRVPX-UHFFFAOYSA-N butyryl chloride Chemical compound CCCC(Cl)=O DVECBJCOGJRVPX-UHFFFAOYSA-N 0.000 claims description 2
- 239000011575 calcium Substances 0.000 claims description 2
- 229910052791 calcium Inorganic materials 0.000 claims description 2
- 229910052799 carbon Inorganic materials 0.000 claims description 2
- 239000000460 chlorine Substances 0.000 claims description 2
- 229910052801 chlorine Inorganic materials 0.000 claims description 2
- 125000001309 chloro group Chemical group Cl* 0.000 claims description 2
- YWGHUJQYGPDNKT-UHFFFAOYSA-N hexanoyl chloride Chemical compound CCCCCC(Cl)=O YWGHUJQYGPDNKT-UHFFFAOYSA-N 0.000 claims description 2
- 229910052744 lithium Inorganic materials 0.000 claims description 2
- 229910000103 lithium hydride Inorganic materials 0.000 claims description 2
- 239000011777 magnesium Substances 0.000 claims description 2
- 229910052749 magnesium Inorganic materials 0.000 claims description 2
- 229910012375 magnesium hydride Inorganic materials 0.000 claims description 2
- XNJGLSDTGOHPBZ-UHFFFAOYSA-N o-(1-triethoxysilylbutan-2-yl) ethanethioate Chemical compound CCO[Si](OCC)(OCC)CC(CC)OC(C)=S XNJGLSDTGOHPBZ-UHFFFAOYSA-N 0.000 claims description 2
- WQZUKOYQSSSMBL-UHFFFAOYSA-N o-(10-triethoxysilyldecan-2-yl) ethanethioate Chemical compound CCO[Si](OCC)(OCC)CCCCCCCCC(C)OC(C)=S WQZUKOYQSSSMBL-UHFFFAOYSA-N 0.000 claims description 2
- BQXZKHYBQNQQHL-UHFFFAOYSA-N o-(10-triethoxysilyldecyl) ethanethioate Chemical compound CCO[Si](OCC)(OCC)CCCCCCCCCCOC(C)=S BQXZKHYBQNQQHL-UHFFFAOYSA-N 0.000 claims description 2
- LNEPUQCXRWFYJZ-UHFFFAOYSA-N o-(2-methyl-4-triethoxysilylbutan-2-yl) ethanethioate Chemical compound CCO[Si](OCC)(OCC)CCC(C)(C)OC(C)=S LNEPUQCXRWFYJZ-UHFFFAOYSA-N 0.000 claims description 2
- VRLXDBAWJNGTSJ-UHFFFAOYSA-N o-(2-triethoxysilylethyl) ethanethioate Chemical compound CCO[Si](OCC)(OCC)CCOC(C)=S VRLXDBAWJNGTSJ-UHFFFAOYSA-N 0.000 claims description 2
- XESGARYTTVPVGI-UHFFFAOYSA-N o-(2-trimethoxysilylethyl) ethanethioate Chemical compound CO[Si](OC)(OC)CCOC(C)=S XESGARYTTVPVGI-UHFFFAOYSA-N 0.000 claims description 2
- VMARVBIRPYNUAP-UHFFFAOYSA-N o-(3-methyl-1-triethoxysilylbutan-2-yl) ethanethioate Chemical compound CCO[Si](OCC)(OCC)CC(OC(C)=S)C(C)C VMARVBIRPYNUAP-UHFFFAOYSA-N 0.000 claims description 2
- HTMRUFPADNOKKQ-UHFFFAOYSA-N o-(4-triethoxysilylbutan-2-yl) ethanethioate Chemical compound CCO[Si](OCC)(OCC)CCC(C)OC(C)=S HTMRUFPADNOKKQ-UHFFFAOYSA-N 0.000 claims description 2
- TVMXDCGIABBOFY-UHFFFAOYSA-N octane Chemical compound CCCCCCCC TVMXDCGIABBOFY-UHFFFAOYSA-N 0.000 claims description 2
- VFXVAXFIFHSGNR-UHFFFAOYSA-N octyl carbonochloridate Chemical compound CCCCCCCCOC(Cl)=O VFXVAXFIFHSGNR-UHFFFAOYSA-N 0.000 claims description 2
- 229910052760 oxygen Inorganic materials 0.000 claims description 2
- 239000001301 oxygen Substances 0.000 claims description 2
- XGISHOFUAFNYQF-UHFFFAOYSA-N pentanoyl chloride Chemical compound CCCCC(Cl)=O XGISHOFUAFNYQF-UHFFFAOYSA-N 0.000 claims description 2
- AHWALFGBDFAJAI-UHFFFAOYSA-N phenyl carbonochloridate Chemical compound ClC(=O)OC1=CC=CC=C1 AHWALFGBDFAJAI-UHFFFAOYSA-N 0.000 claims description 2
- 229910052700 potassium Inorganic materials 0.000 claims description 2
- 239000011591 potassium Substances 0.000 claims description 2
- NTTOTNSKUYCDAV-UHFFFAOYSA-N potassium hydride Chemical compound [KH] NTTOTNSKUYCDAV-UHFFFAOYSA-N 0.000 claims description 2
- 229910000105 potassium hydride Inorganic materials 0.000 claims description 2
- RZWZRACFZGVKFM-UHFFFAOYSA-N propanoyl chloride Chemical compound CCC(Cl)=O RZWZRACFZGVKFM-UHFFFAOYSA-N 0.000 claims description 2
- 239000012312 sodium hydride Substances 0.000 claims description 2
- 229910000104 sodium hydride Inorganic materials 0.000 claims description 2
- LXEJRKJRKIFVNY-UHFFFAOYSA-N terephthaloyl chloride Chemical compound ClC(=O)C1=CC=C(C(Cl)=O)C=C1 LXEJRKJRKIFVNY-UHFFFAOYSA-N 0.000 claims description 2
- 125000002769 thiazolinyl group Chemical group 0.000 claims description 2
- ZWZVWGITAAIFPS-UHFFFAOYSA-N thiophosgene Chemical compound ClC(Cl)=S ZWZVWGITAAIFPS-UHFFFAOYSA-N 0.000 claims description 2
- 125000003944 tolyl group Chemical group 0.000 claims 1
- 150000003961 organosilicon compounds Chemical class 0.000 abstract description 5
- 150000001266 acyl halides Chemical class 0.000 abstract description 3
- 229910052783 alkali metal Inorganic materials 0.000 abstract description 3
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 abstract description 2
- 150000001340 alkali metals Chemical class 0.000 abstract 2
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 abstract 1
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 abstract 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 16
- 239000000725 suspension Substances 0.000 description 12
- 239000000047 product Substances 0.000 description 11
- 229910001507 metal halide Inorganic materials 0.000 description 10
- MCEBKLYUUDGVMD-UHFFFAOYSA-N [SiH3]S(=O)=O Chemical compound [SiH3]S(=O)=O MCEBKLYUUDGVMD-UHFFFAOYSA-N 0.000 description 9
- 238000011084 recovery Methods 0.000 description 9
- 150000005309 metal halides Chemical class 0.000 description 8
- 150000003377 silicon compounds Chemical class 0.000 description 8
- 239000006227 byproduct Substances 0.000 description 7
- 150000001805 chlorine compounds Chemical class 0.000 description 7
- 239000002585 base Substances 0.000 description 6
- 239000000243 solution Substances 0.000 description 6
- 239000002699 waste material Substances 0.000 description 6
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 5
- QAZGSZIABORBEG-UHFFFAOYSA-N octanoic acid;toluene Chemical compound CC1=CC=CC=C1.CCCCCCCC(O)=O QAZGSZIABORBEG-UHFFFAOYSA-N 0.000 description 5
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 4
- XYFCBTPGUUZFHI-UHFFFAOYSA-N Phosphine Chemical compound P XYFCBTPGUUZFHI-UHFFFAOYSA-N 0.000 description 4
- IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 description 4
- 229910000041 hydrogen chloride Inorganic materials 0.000 description 4
- 239000003643 water by type Substances 0.000 description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- 239000002253 acid Substances 0.000 description 3
- 229910002114 biscuit porcelain Inorganic materials 0.000 description 3
- 239000011541 reaction mixture Substances 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- SIXNTGDWLSRMIC-UHFFFAOYSA-N sodium;toluene Chemical compound [Na].CC1=CC=CC=C1 SIXNTGDWLSRMIC-UHFFFAOYSA-N 0.000 description 3
- 238000011282 treatment Methods 0.000 description 3
- NESLVXDUKMNMOG-UHFFFAOYSA-N triethoxy-(propyltetrasulfanyl)silane Chemical compound CCCSSSS[Si](OCC)(OCC)OCC NESLVXDUKMNMOG-UHFFFAOYSA-N 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 239000005046 Chlorosilane Substances 0.000 description 2
- BWGNESOTFCXPMA-UHFFFAOYSA-N Dihydrogen disulfide Chemical class SS BWGNESOTFCXPMA-UHFFFAOYSA-N 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 2
- WQDUMFSSJAZKTM-UHFFFAOYSA-N Sodium methoxide Chemical compound [Na+].[O-]C WQDUMFSSJAZKTM-UHFFFAOYSA-N 0.000 description 2
- 239000003513 alkali Substances 0.000 description 2
- 150000001412 amines Chemical class 0.000 description 2
- KOPOQZFJUQMUML-UHFFFAOYSA-N chlorosilane Chemical compound Cl[SiH3] KOPOQZFJUQMUML-UHFFFAOYSA-N 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 239000007822 coupling agent Substances 0.000 description 2
- 230000007613 environmental effect Effects 0.000 description 2
- YYZUSRORWSJGET-UHFFFAOYSA-N ethyl octanoate Chemical compound CCCCCCCC(=O)OCC YYZUSRORWSJGET-UHFFFAOYSA-N 0.000 description 2
- 238000004817 gas chromatography Methods 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 238000006460 hydrolysis reaction Methods 0.000 description 2
- 229910052987 metal hydride Inorganic materials 0.000 description 2
- 150000004681 metal hydrides Chemical class 0.000 description 2
- 238000006386 neutralization reaction Methods 0.000 description 2
- 150000002825 nitriles Chemical class 0.000 description 2
- 229910000073 phosphorus hydride Inorganic materials 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 150000003512 tertiary amines Chemical class 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- KSCAZPYHLGGNPZ-UHFFFAOYSA-N 3-chloropropyl(triethoxy)silane Chemical compound CCO[Si](OCC)(OCC)CCCCl KSCAZPYHLGGNPZ-UHFFFAOYSA-N 0.000 description 1
- 239000004215 Carbon black (E152) Substances 0.000 description 1
- GOOHAUXETOMSMM-UHFFFAOYSA-N Propylene oxide Chemical compound CC1CO1 GOOHAUXETOMSMM-UHFFFAOYSA-N 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- GHVZOJONCUEWAV-UHFFFAOYSA-N [K].CCO Chemical compound [K].CCO GHVZOJONCUEWAV-UHFFFAOYSA-N 0.000 description 1
- GWZOLWLJEJRQMZ-UHFFFAOYSA-N [S].S Chemical class [S].S GWZOLWLJEJRQMZ-UHFFFAOYSA-N 0.000 description 1
- 125000002252 acyl group Chemical group 0.000 description 1
- PWAXUOGZOSVGBO-UHFFFAOYSA-N adipoyl chloride Chemical compound ClC(=O)CCCCC(Cl)=O PWAXUOGZOSVGBO-UHFFFAOYSA-N 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- 230000002051 biphasic effect Effects 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 238000005119 centrifugation Methods 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 230000006837 decompression Effects 0.000 description 1
- 239000008367 deionised water Substances 0.000 description 1
- 229910021641 deionized water Inorganic materials 0.000 description 1
- 125000003963 dichloro group Chemical group Cl* 0.000 description 1
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical compound [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 description 1
- MAHNFPMIPQKPPI-UHFFFAOYSA-N disulfur Chemical compound S=S MAHNFPMIPQKPPI-UHFFFAOYSA-N 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 239000012065 filter cake Substances 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 239000012467 final product Substances 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 229920000620 organic polymer Polymers 0.000 description 1
- BDAWXSQJJCIFIK-UHFFFAOYSA-N potassium methoxide Chemical compound [K+].[O-]C BDAWXSQJJCIFIK-UHFFFAOYSA-N 0.000 description 1
- 230000002028 premature Effects 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- QDRKDTQENPPHOJ-UHFFFAOYSA-N sodium ethoxide Chemical compound [Na+].CC[O-] QDRKDTQENPPHOJ-UHFFFAOYSA-N 0.000 description 1
- LSNNMFCWUKXFEE-UHFFFAOYSA-L sulfite Chemical class [O-]S([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-L 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 150000003866 tertiary ammonium salts Chemical class 0.000 description 1
- 238000010792 warming Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/18—Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
- C07F7/1804—Compounds having Si-O-C linkages
- C07F7/1872—Preparation; Treatments not provided for in C07F7/20
- C07F7/1892—Preparation; Treatments not provided for in C07F7/20 by reactions not provided for in C07F7/1876 - C07F7/1888
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/18—Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Silicon Polymers (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Abstract
制造嵌段巯基硅烷的方法,包括:(a)将至少一种通式为(R3 1SiG)2Sn的含聚硫烷的有机硅化合物和至少一种碱金属、碱土金属或者碱金属或者碱土金属的碱性衍生物反应,来提供含聚硫烷的有机硅化合物的相应金属盐,上式中,每个R1独立地是甲氧基、乙氧基或者具有1到约6个碳原子的烷基,条件是至少一个R1基团是甲氧基或者乙氧基,G是具有1到约12个碳原子的亚烃基基团,n是2到约8,以及;(b)含聚硫烷的有机硅化合物的金属盐和酰卤或者碳酰二卤反应,得到嵌段巯基硅烷。
Description
发明背景
发明领域
本发明涉及通过含聚硫烷的有机硅化合物的金属盐(metal salt of apolysulfane-containing organosilicon compound)和酰卤(acyl halide)或者碳酰二卤(carbonyl dihalide),制造嵌段巯基硅烷(blocked mercaptosilane)的方法,其中含聚硫烷的有机硅化合物的金属盐是通过含聚硫烷的有机硅(polysulfane-containing organosilicon)和碱金属、碱土金属或者碱金属或者碱土金属衍生的强碱反应得到的。本发明还涉及所述嵌段巯基硅烷作为偶合剂(coupling agent)在橡胶混合物中的用途。
现有技术描述
含硫有机硅化合物在制造硅填充的轮胎中用作基本成分。填充硅的轮胎增强了在汽车应用方面的性能,特别是改进了耐摩擦性、转动阻力和湿滑性能。在硅填充的轮胎中大量的含硫化合物可用作偶合剂。含有巯基的有机硅化合物在降低负荷方面提供了突出的偶合作用,但是,它们和有机聚合物的化学反应性导致在加工或早期固化过程中具有不能容忍的高粘度。结果显示嵌段的巯基硅烷保持了含巯基的有机硅化合物的优点,不存在前述问题。嵌段的含巯基的有机硅化合物,特别是含有硫代羧基的硅化合物,能够通过含巯基硅化合物和酰基卤反应制备。该反应的副产物---氯化氢会和有机硅化合物反应,使所需的产品降解,产生氯代硅烷。与氯化氢进行的这些反应非常块,不能用传统的机械的方式阻止,也就是说不能通过温度或者压力阻止,这是因为氯化氢在产物中的溶解度高。能够通过使用碱如醇钠或环氧丙烷中和上述过程中注意到的氯硅烷,但是由于产物分解和/或得到不希望的混合物,所以并不希望采取这种方式。
以前使用的另一种方法是使用酸接受剂即叔胺去就地中和氯化氢,见美国临时专利申请号60/423577,2002年11月4日申请;但是这需要化学计量量的胺,减少了每次的收率并且给出了大量的不希望的盐,随后它还不得不被除去,参见美国专利6229036。如众所周知的,叔胺盐由于其溶解度问题,难于被除去,传统的过滤方法是强性机械操作,常常导致低收率。进而,滤饼的再处理也增加了更多的成本,如需要处置叔胺和其内盐酸盐,由此带来了严重的环境问题。
如已经显示的,含巯基的有机硅化合物的金属盐和酰卤反应产生盼望的嵌段巯基硅烷和金属卤化物盐,参照美国专利6414061,它的内容被合并在这里作为参考文献;但是除了以前说到的困难,含巯基的有机硅化合物价格昂贵,限制了它们的广泛应用。所以,感兴趣的是需要开发嵌段巯基硅烷,该嵌段巯基硅烷通过使用价格不贵、没有上述的化学和环境问题的方法得到。已知有大量的方法能够断裂硫-硫键,即使用碱如胺、膦、金属氰化物、金属氢化物和碱金属,但是,膦和金属氢化物成本高,金属氰化物存在大量的安全问题。
发明概述
含聚硫烷的硅化合物(polysulfane-containing silicon compounds)成本不高、来源广,而且它们的可供应性也好,金属卤化物副产物不和产物嵌段巯基硅烷反应,而且含聚硫烷的硅化合物也没有叔胺卤化物的环境问题。碱金属是安全的并且廉价。碱金属和含聚硫烷的硅化合物反应给出了含聚硫烷的硅化合物的金属盐,提供了所需的酸受体,能够就地用于制备所需的嵌段巯基硅烷化合物和金属卤化物。
另外,使用水洗产物使前述的成本和去除金属盐的困难最小化。用过滤或者用离心分离去除金属卤化物盐要求强的机械单元操作和投资,但是由此不再需要进行水洗,而是成为两相系统,其中一相含有嵌段巯基硅烷,另一相含有金属卤化物的水溶液。该方法的主要危险是嵌段巯基硅烷的水解趋势和(得到)有机官能硅烷的趋势。但是,通过金属卤化物的存在,水相的离子特征被提高,由此最小化了任何可能存在的水解反应,见美国专利6294683。
本发明的目的是提供制备用作偶联剂的嵌段巯基硅烷的方法,该方法最小化了和嵌段巯基硅烷反应的副产物的生成,不需要中和或者过滤,是工业上可以供应的。
为了达到本发明的这个和其他目的,提供了制造嵌段巯基硅烷的方法,包括:
(a)将至少一种下述通式的含聚硫烷的有机硅化合物
(R1 3SiG)2Sn
式中,每个R1独立地是甲氧基、乙氧基或者具有1到约6个碳原子的烷基,条件是至少一个R1基团是甲氧基或者乙氧基,G是具有1到约12个碳原子的亚烃基基团,n是2到约8,
和至少一种碱金属、碱土金属或者碱金属或者碱土金属的碱性衍生物反应,来提供含聚硫烷的有机硅化合物的相应金属盐,以及;
(b)含聚硫烷的有机硅化合物的金属盐和酰卤或者碳酰二卤反应,提供嵌段巯基硅烷。
对照在前述美国专利6414061中描述的方法,本发明的方法让从非常容易获得的含聚硫烷的有机硅化合物制备嵌段巯基硅烷成为可能。得到了高纯度的嵌段巯基硅烷,并不需要中和或者过滤来去除副产物金属卤化物,副产物是含聚硫烷的有机硅化合物的金属盐和酰卤或者碳酰二卤反应得到的。
本发明其它目的是提供涉及使用最终产物溶液的水洗的使用的方法,它并不像以前美国专利6414061中所需的蒸馏步骤,是从金属卤化物副产物中分离嵌段巯基硅烷的更方便和有效的方法。
优选实施方案的说明
在本发明的方法中,具有通式(R1 3SiG)2Sn的含聚硫烷的有机硅化合物,式中,R1、G、n与前述定义相同,碱金属、碱土金属或者碱金属或者碱土金属的强碱性的衍生物被认为根据下述反应(以碱金属的钠盐为例)进行反应来形成含聚硫烷的有机硅化合物的金属盐:
Metal+(R1 3SiG)2Sn→(R1 3SiG)2S-Metal
含聚硫烷的有机硅化合物的金属盐和反应性卤化物(例如具有通式R2C(O)X的酰卤或者碳酰二卤,这里R2和X具有前述的意义),被认为依据下述反应进行反应生成嵌段巯基硅烷产物和金属卤化物副产物:
(R1 3SiG)2S-Metal+R2C(O)X→R2C(O)SGSiR1 3+Metal-X
有用的含聚硫烷的有机硅化合物包括,例如双[(三乙氧基甲硅烷基)丙基]聚硫烷,双[(甲基二乙氧基甲硅烷基)丙基]聚硫烷,双[(三乙氧基甲硅烷基)异丁基]聚硫烷,双[(甲基二乙氧基甲硅烷基)异丁基]聚硫烷,双[(三甲氧基甲硅烷基)丙基]聚硫烷,双[(甲基二甲氧基甲硅烷基)丙基]聚硫烷,双[(三甲氧基甲硅烷基)异丁基]聚硫烷和双[(甲基二甲氧基甲硅烷基)异丁基]聚硫烷。
含聚硫烷的有机硅化合物与碱金属、碱土金属或者碱金属或者碱土金属衍生的强碱反应。有用的碱金属、碱土金属和碱性的金属衍生物包括,例如锂、钠、钾、镁、钙、氢化锂、氢化钠、氢化钾、氢化镁、氢化钙、甲醇钠、乙醇钠、甲醇钾、乙醇钾和上述的混合物。
得到的含聚硫烷的有机硅化合物金属盐就地与酰卤或者碳酰二卤化物组合,如具有R2C(O)X通式的酰卤或酰二卤,式中,R2是卤素或者高达(upto)约18个碳原子的烷基、烯基、芳基、烷芳基或者芳烷基且X是卤素,以制备嵌段巯基硅烷。有用的酰卤包括乙酰氯,丙酰氯,丁酰氯,戊酰氯,己酰氯,庚酰氯、辛酰氯、2-乙基己酰氯、月桂酰氯,油酰氯,氯甲酸辛酯,己二酰氯(adipoyl chloride),苯基乙酰氯,苯甲酰氯,对苯二甲酰氯以及氯甲酸苯酯。有用的碳酰二卤包括碳酰二氯(光气,phosgene),双光气(diphosgene),三光气(triphosgene),硫代光气(thiophosgene)和草酰氯(oxalylchloride)。
通过前述方法得到的嵌段巯基硅烷产物满足通式R2C(O)SGSiR1 3,其中R1、R2和G具有前述的意义。具体的嵌段巯基硅烷包括,例如硫代乙酸2-三乙氧基甲硅烷基-1-乙基酯;硫代乙酸2-三甲氧基甲硅烷基-1-乙基酯;硫代乙酸2-(甲基二甲氧基甲硅烷基)-1-乙基酯;硫代乙酸3-三甲氧基甲硅烷基-1-丙基酯;硫代乙酸三乙氧基甲硅烷基甲基酯;硫代乙酸三甲氧基甲硅烷基甲基酯;硫代乙酸三异丙氧基甲硅烷基甲基酯;硫代乙酸甲基二乙氧基甲硅烷基甲基酯;硫代乙酸甲基二甲氧基甲硅烷基甲基酯;硫代乙酸甲基二异丙氧基甲硅烷基甲基酯;硫代乙酸二甲基乙氧基甲硅烷基甲基酯;硫代乙酸二甲基甲氧基甲硅烷基甲基酯;硫代乙酸二甲基异丙氧基甲硅烷基甲基酯;硫代乙酸2-三异丙氧基甲硅烷基-1-乙基酯;硫代乙酸2-(甲基二乙氧基甲硅烷基)-1-乙基酯;硫代乙酸2-(甲基二异丙氧基甲硅烷基)-1-乙基酯;硫代乙酸2-(二甲基乙氧基甲硅烷基)-1-乙基酯;硫代乙酸2-(二甲基甲氧基甲硅烷基)-1-乙基酯;硫代乙酸2-(二甲基异丙氧基甲硅烷基)-1-乙基酯;硫代乙酸3-三乙氧基甲硅烷基-1-丙基酯;硫代乙酸3-三异丙氧基甲硅烷基-1-丙基酯;硫代乙酸3-甲基二乙氧基甲硅烷基-1-丙基酯;硫代乙酸3-甲基二甲氧基甲硅烷基-1-丙基酯;硫代乙酸3-甲基二异丙氧基甲硅烷基-1-丙基酯;1-(2-三乙氧基甲硅烷基-1-乙基)-4-硫代乙酰环己烷;1-(2-三乙氧基甲硅烷基-1-乙基)-3-硫代乙酰环己烷;2-三乙氧基甲硅烷基-5-硫代乙酰降冰片烯;2-三乙氧基甲硅烷基-4-硫代乙酰降冰片烯;2-(2-三乙氧基甲硅烷基-1-乙基)-5-硫代乙酰降冰片烯;2-(2-三乙氧基甲硅烷基-1-乙基)-4-硫代乙酰降冰片烯;硫代乙酸6-三乙氧基甲硅烷基-1-己基酯;硫代乙酸1-三乙氧基甲硅烷基-5-己基酯;硫代乙酸8-三乙氧基甲硅烷基-1-辛基酯;硫代乙酸1-三乙氧基甲硅烷基-7辛基酯;硫代乙酸6-三乙氧基甲硅烷基-1-己基酯;硫代乙酸1-三乙氧基甲硅烷基-5-辛基酯;硫代乙酸8-三甲氧基甲硅烷基-1-辛基酯;硫代乙酸1-三甲氧基甲硅烷基-7-辛基酯;硫代乙酸10-三乙氧基甲硅烷基-1-癸基酯;硫代乙酸1-三乙氧基甲硅烷基-9-癸基酯;硫代乙酸1-三乙氧基甲硅烷基-2-丁基酯;硫代乙酸1-三乙氧基甲硅烷基-3-丁基酯;硫代乙酸1-三乙氧基甲硅烷基-3-甲基-2-丁基酯;硫代乙酸1-三乙氧基甲硅烷基-3-甲基-3-丁基酯;硫代辛酸3-三甲氧基甲硅烷基-1-丙基酯;硫代棕榈酸3-三乙氧基甲硅烷基-1-丙基酯;硫代辛酸3-三乙氧基甲硅烷基-1-丙基酯;硫代苯甲酸3-三乙氧基甲硅烷基-1-丙基酯;硫代-2-乙基己酸3-三乙氧基甲硅烷基-1-丙基酯;硫代乙酸3-甲基二乙酰氧基甲硅烷基-1-丙基酯;硫代乙酸3-三乙酰氧基甲硅烷基-1-丙基酯和硫代乙酸2-甲基二乙酰氧基甲硅烷基-1-乙基酯。
含聚硫烷的有机硅化合物和碱金属、碱土金属或者碱金属或者碱土金属的碱性衍生物以约1∶1到约1∶10的摩尔当量,优选约1∶2.0到约1∶2.5的摩尔当量进行反应。含聚硫烷的有机硅化合物金属盐和酰卤在约1.25∶1到约1∶1的摩尔当量的范围,或者和碳酰二卤在约2.25∶1到约2∶1的摩尔当量的范围内进行反应。
含聚硫烷的有机硅化合物和碱金属、碱土金属或者碱性金属衍生物的反应在环境温度到约使用的金属或者金属衍生物的融化温度的范围内进行。优选是在使用的金属处于液态以提高它的表面积的温度下进行反应,如约25℃到约150℃,优选约80℃到约120℃的范围。随后含聚硫烷的有机硅化合物金属盐和酰卤或者和碳酰二卤的反应可以在约环境温度到约使用的溶剂的沸点的范围下进行;优选温度是在约10℃到约50℃的范围。嵌段巯基硅烷产物和金属卤化物的水洗在约40℃到约100℃的范围,优选约10℃到约50℃的范围内进行。另外,整个过程或者其中任何步骤可以在环境、加压或者减压的条件下进行。
本发明的整个方法或者其中任何步骤可以在溶剂中进行。有用的溶剂可以是,例如任意的芳族化合物如甲苯、苯、二甲苯,以及任意烃溶剂如己烷、庚烷、异辛烷和辛烷。
下述的实施例是本发明方法的举例说明。
所有的操作都在氮气中进行。SilquestA-1589(双(三乙氧基甲硅烷基丙基)二硫烷),SilquestA-15304“更提纯的二亚硫酸酯,相比于SilquestA-1589”(双(三乙氧基甲硅烷基丙基)二硫烷),SilquestA-1289(双(三乙氧基甲硅烷基丙基)四硫硫烷)、甲苯和钠被直接使用没有进行进一步提纯。去离子水被直接使用。全部的气相色谱数据被表达成重量百分率(重量/重量),由惠普5890系列II气相色谱仪在气相色谱实验室收集得到。下列的略语和商品名(含有它们的说明)出现在实施例中:
省略语 说明
CPTES 氯丙基三乙氧基硅烷
MPTES 巯基丙基三乙氧基硅烷
嵌段巯基硅烷 3-(辛酰基硫代)-1-丙基三乙氧基硅烷
S1-BTESPS 双(三乙氧基甲硅烷基)丙基硫烷
S2-BTESPS 双(三乙氧基甲硅烷基)丙基二硫烷
S3-BTESPS 双(三乙氧基甲硅烷基)丙基三硫烷
2Si S-硫代羧酸酯巯基硅烷的二硅氧烷
(disiloxane of S-thiocarboxylate mercaptosilane)
芳香烃的混合物
对比例1
在环境温度下,515.20克甲苯被用25.00克的金属钠(1.076摩尔)处理并温热到~105℃。在30分钟的过程中,将熔融的钠-甲苯悬浊液用265.21克MPTES(1.079摩尔)处理,导致氢气的放出。完成MPTES的添加之后,将得到的透明、无色溶液冷却到~45℃并用164.75克辛酰氯(0.982摩尔)处理。辛酰氯的添加是放热反应,生成盐。在1小时的过程中,添加辛酰氯,同时反应温度被慢慢地提高到62℃。一旦反应温度冷却到了50℃,则加入215.0克去离子水,结果是盐溶解并分成两层。除去水层,真空回收甲苯,得到504.72克甲苯(98%回收率)。嵌段巯基硅烷回收得到387.59克,为透明、无色液体,具有下述GC组成(98%效率)。
嵌段
洗脱的
甲苯 辛酸乙酯 CPTES MPTES 巯基硅烷 S 1 -BTESPS 2Si 重量
0.45 0.74 0.01 4.67 89.74 0.85 1.71 3.49
对比例2
在环境温度下,将45磅甲苯(20.4千克)加入到50升反应器中,随后添加2.4磅钠(1015克,43.7摩尔)。将该悬液加热到~105℃,在一小时又22分钟内,将得到的熔融钠用24.3磅MPTES(11.0千克,44.8摩尔)处理,生成氢气。完成MPTES的添加之后,将澄清溶液冷却到环境温度,然后在95分钟的过程中,用15.5磅辛酰氯(7.0千克,42.8摩尔)处理,同时反应温度也上升到58℃。得到的混合物被冷却到32℃,然后加入19.0磅去离子水(8.6千克),结果是盐溶解给出两层。水层被除去,回收得到25.4磅的含水废料(11.5千克),真空回收甲苯,得到46.1磅甲苯(20.9千克,102%回收率)。产物通过Kuno漏斗,使用5微米的滤垫过滤,回收得到31.0磅的嵌段巯基硅烷(14.0千克),是透明、黄色液体,并具有下述的GC分析结果:
嵌段 洗脱的
甲苯 辛酸乙酯 CPTES MPTES 巯基硅烷 S 1 -BTESPS 2Si 重量
0.69 3.80 0.01 6.40 82.04 0.71 2.28 2.97
实施例1
在环境温度下,将526.82克甲苯用29.28克钠(1.261摩尔)处理,加热到~110℃。用299.15克SilquestA-1589(0.590摩尔)处理熔融的钠-甲苯悬液,持续大致45分钟。SilquestA-1589的添加是放热反应,形成暗红紫色、不透明的溶液。完成SilquestA-1589的添加之后,将反应混合物冷却到~45℃,在一小时的过程中添加189.26克辛酰氯(1.152摩尔),得到粘性盐悬液,此时反应温度到达60℃。在~45℃,将反应用278.42克水处理,结果盐溶解形成透明的、黄-桔黄色的甲苯层和暗的不透明的水层,水层被除去。回收382.62克含水废料。真空回收甲苯,得到576.93克甲苯(106%回收率,含有水)。373.53克嵌段巯基硅烷被回收得到,为透明、暗桔黄液体,具有下述的GC分析结果(87%效率):
乙基 嵌段 洗脱
甲苯 辛酸酯 CPTES MPTES 巯基硅烷 S 1 -BTESPS S 2 -BTESPS S 3 -BTESPS 2Si 重量
1.41 0.76 0.01 0.43 80.36 6.80 4.97 0.01 2.90 4.06
实施例2
在环境温度下,将46.0磅甲苯(20.9千克)加入50升反应器中,随后添加2.3磅钠(164克,45.8摩尔)并加热到~110℃。在大致69分钟的过程中,将熔融的钠用22.7磅SilquestA-1589(10.3千克)处理,是放热反应。SilquestA-1589的添加被完成之后,得到的暗的悬浊液被冷却到~38℃,然后在2小时过程中,用13.8磅辛酰氯(6.3千克,38.1摩尔)处理,反应温度也升到48℃。得到的悬浊液被冷却到环境温度,然后被22.0磅去离子水(10.0千克)处理。观察到5℃的放热,盐溶解导致出现两层。暗的、不透明的水层被除去,回收了31.4磅的含水废物(14.2千克)。回收甲苯,得到43.9磅甲苯(19.9千克,95%回收率)。产物通过Kuno漏斗用5微米的滤垫过滤,回收31.0磅的嵌段巯基硅烷(14.1千克),是透明、黄色液体,并具有下述的GC分析结果(92%效率):
乙基 嵌段 洗脱
甲苯 辛酸酯 CPTES MPTES 巯基硅烷 S 1 -BTESPS S 2 -BTESPS S 3 -BTESPS 2Si 重量
0.80 0.99 0.01 1.00 79.01 7.08 5.72 0.16 2.36 4.02
实施例3
在环境温度,将509.88克甲苯用30.04克钠(1.299摩尔)处理并加热到~110℃。将熔融的钠-甲苯悬液用300.97克SilquestY-15304(0.590摩尔)处理45分钟的过程。SilquestY-15304的添加是放热反应,形成暗红紫色、不透明的溶液。SilquestY-15304的添加完成之后,将反应混合物冷却到~45℃,在1小时的过程中加入196.01克辛酰氯(1.169摩尔),得到粘性盐悬液,同时反应温度到达60℃。在~45℃,反应用270.72克水处理,导致盐溶解给出透明的、黄-桔黄色的甲苯层和暗的不透明的要除去的水层。回收330.89克含水废物。真空回收甲苯,得到382.98克甲苯(75%回收率)。得到433.06克嵌段巯基硅烷,是透明、暗黄液体,具有下述的GC分析结果(95%效率):
乙基 嵌段 洗脱
甲苯 辛酸酯 CPTES MPTES 巯基硅烷 S 1 -BTESPS S 2 -BTESPS S 3 -BTESPS 2Si 重量
0.04 0.46 0.01 0.15 84.47 2.15 5.41 1.52 3.02 4.91
实施例4
在环境温度,将45.0磅甲苯(20.4千克)加入50升反应器中,随后添加2.34磅钠(1061克,45.7摩尔),加热到110℃。将熔融的钠在69分钟的过程中用22.8磅SilquestY-15304(10.3千克)处理,结果是放热反应。SilquestY-15304的添加完成之后,得到的暗的不透明的悬浊液被冷却到35℃,然后用13.6磅辛酰氯(6.2千克,37.6摩尔)处理109分钟的过程,得到的是放热反应,反应温度也升到~50℃。完成辛酰氯的添加之后,得到的悬浊液用22.2磅去离子水(10.1千克)处理,结果盐溶解给出了两层。得到的暗的水层被除去,回收30.3磅含水废料(13.7千克)。真空回收甲苯,得到45.7磅甲苯(20.7千克,102%回收率)。产物通过Kuno漏斗用5微米的滤垫过滤,回收得到30.6磅嵌段巯基硅烷(13.9千克),是透明、暗黄色液体,并具有下述的GC分析结果(92%效率):
乙基 嵌段 洗脱
甲苯 辛酸酯 CPTES MPTES 巯基硅烷 S 1 -BTESPS S 2 -BTESPS S 3 -BTESPS 2Si 重量
0.61 0.82 0.01 2.72 82.04 2.57 6.57 0.14 2.38 3.37
实施例5
在环境温度,将160克溶剂140用11克钠(0.478摩尔)处理,并加热到~110℃。将熔融的钠-溶剂140悬液用63克SilquestA-1289(0.117摩尔)处理45分钟的过程。SilquestA-1289的添加是放热反应,形成暗红紫色、不透明的溶液。完成SilquestA-1289的添加之后,将反应混合物冷却到45℃并用76克辛酰氯(0.468摩尔)处理1小时的过程,得到粘性盐悬液,此时反应温度到达104℃。在~45℃,将反应用175克水处理,结果盐溶解给出透明的、黄-桔黄色的溶140层和暗的不透明的水层,水层被除去。回收得到236克含水废料。真空回收甲苯,得到155克溶剂140(97%回收率)。回收得到110克嵌段巯基硅烷,是透明、黄色液体,具有下述的GC分析结果(89%效率):
乙基 嵌段 洗脱
甲苯 辛酸酯 CPTES MPTES 巯基硅烷 S 1 -BTESPS S 2 -BTESPS S 3 -BTESPS 2Si 重量
0.70 2.20 0.01 2.66 64.75 0.90 23.31 2.18 --- ---
Claims (15)
1. 制造嵌段巯基硅烷的方法,包括:将至少一种具有下述通式的含聚硫烷的有机硅化合物
(R1 3SiG)2Sn(a)
(a)式中,每个R1独立地是甲氧基、乙氧基或者具有1到约6个碳原子的烷基,条件是至少一个R1基团是甲氧基或者乙氧基,G是具有1到约12个碳原子的亚烃基基团,n是2到约8,
和至少一种碱金属、碱土金属或者碱金属或者碱土金属的碱性衍生物反应,以提供含聚硫烷的有机硅化合物的相应金属盐,以及
(b)将含聚硫烷的有机硅化合物的金属盐和酰卤或者碳酰二卤反应以提供嵌段巯基硅烷。
2. 权利要求1的方法,其中含聚硫烷的有机硅化合物选自:双[(三乙氧基甲硅烷基)丙基]聚硫烷,双[(甲基二乙氧基甲硅烷基)丙基]聚硫烷,双[(三乙氧基甲硅烷基)异丁基]聚硫烷,双[(甲基二乙氧基甲硅烷基)异丁基]聚硫烷,双[(三甲氧基甲硅烷基)丙基]聚硫烷,双[(甲基二甲氧基甲硅烷基)丙基]聚硫烷,双[(三甲氧基甲硅烷基)异丁基]聚硫烷和双[(甲基二甲氧基甲硅烷基)异丁基]聚硫烷。
3. 权利要求1的方法,其中碱金属、碱土金属和碱金属或者碱土金属的碱性衍生物选自:锂、钠、钾、镁、钙、氢化锂、氢化钠、氢化钾、氢化镁、氢化钙和上述的混合物。
4. 权利要求1的方法,其中酰卤或者碳酰二卤具有通式:
R2C(O)X
其中R2是卤素或者高达约18个碳原子的烷基、烯基、芳基、烷芳基或者芳烷基,X是卤素。
5. 权利要求4的方法,其中酰卤选自乙酰氯,丙酰氯,丁酰氯,戊酰氯,己酰氯,庚酰氯、辛酰氯、2-乙基己酰氯、月桂酰氯,油酰氯,氯甲酸辛酯,己二酰氯,苯基乙酰氯,苯甲酰氯,对苯二甲酰氯和氯甲酸苯酯。
6. 权利要求4的方法,其中碳酰二卤选自光气,双光气,三光气,硫代光气和草酰氯。
7. 权利要求4的方法,其中嵌段巯基硅烷产物具有通式:
R2C(O)SGSiR1 3
其中R1、R2和G具有前述的定义。
8. 权利要求7的方法,其中嵌段巯基硅烷产物选自:硫代乙酸2-三乙氧基甲硅烷基-1-乙基酯;硫代乙酸2-三甲氧基甲硅烷基-1-乙基酯;硫代乙酸2-(甲基二甲氧基甲硅烷基)-1-乙基酯;硫代乙酸3-三甲氧基甲硅烷基-1-丙基酯;硫代乙酸三乙氧基甲硅烷基甲基酯;硫代乙酸三甲氧基甲硅烷基甲基酯;硫代乙酸三异丙氧基甲硅烷基甲基酯;硫代乙酸甲基二乙氧基甲硅烷基甲基酯;硫代乙酸甲基二甲氧基甲硅烷基甲基酯;硫代乙酸甲基二异丙氧基甲硅烷基甲基酯;硫代乙酸二甲基乙氧基甲硅烷基甲基酯;硫代乙酸二甲基甲氧基甲硅烷基甲基酯;硫代乙酸二甲基异丙氧基甲硅烷基甲基酯;硫代乙酸2-三异丙氧基甲硅烷基-1-乙基酯;硫代乙酸2-(甲基二乙氧基甲硅烷基)-1-乙基酯;硫代乙酸2-(甲基二异丙氧基甲硅烷基)-1-乙基酯;硫代乙酸2-(二甲基乙氧基甲硅烷基)-1-乙基酯;硫代乙酸2-(二甲基甲氧基甲硅烷基)-1-乙基酯;硫代乙酸2-(二甲基异丙氧基甲硅烷基)-1-乙基酯;硫代乙酸3-三乙氧基甲硅烷基-1-丙基酯;硫代乙酸3-三异丙氧基甲硅烷基-1-丙基酯;硫代乙酸3-甲基二乙氧基甲硅烷基-1-丙基酯;硫代乙酸3-甲基二甲氧基甲硅烷基-1-丙基酯;硫代乙酸3-甲基二异丙氧基甲硅烷基-1-丙基酯;1-(2-三乙氧基甲硅烷基-1-乙基)-4-硫代乙酰环己烷;1-(2-三乙氧基甲硅烷基-1-乙基)-3-硫代乙酰环己烷;2-三乙氧基甲硅烷基-5-硫代乙酰降冰片烯;2-三乙氧基甲硅烷基-4-硫代乙酰降冰片烯;2-(2-三乙氧基甲硅烷基-1-乙基)-5-硫代乙酰降冰片烯;2-(2-三乙氧基甲硅烷基-1-乙基)-4-硫代乙酰降冰片烯;硫代乙酸6-三乙氧基甲硅烷基-1-己基酯;硫代乙酸1-三乙氧基甲硅烷基-5-己基酯;硫代乙酸8-三乙氧基甲硅烷基-1-辛基酯;硫代乙酸1-三乙氧基甲硅烷基-7辛基酯;硫代乙酸6-三乙氧基甲硅烷基-1-己基酯;硫代乙酸1-三乙氧基甲硅烷基-5-辛基酯;硫代乙酸8-三甲氧基甲硅烷基-1-辛基酯;硫代乙酸1-三甲氧基甲硅烷基-7-辛基酯;硫代乙酸10-三乙氧基甲硅烷基-1-癸基酯;硫代乙酸1-三乙氧基甲硅烷基-9-癸基酯;硫代乙酸1-三乙氧基甲硅烷基-2-丁基酯;硫代乙酸1-三乙氧基甲硅烷基-3-丁基酯;硫代乙酸1-三乙氧基甲硅烷基-3-甲基-2-丁基酯;硫代乙酸1-三乙氧基甲硅烷基-3-甲基-3-丁基酯;硫代辛酸3-三甲氧基甲硅烷基-1-丙基酯;硫代棕榈酸3-三乙氧基甲硅烷基-1-丙基酯;硫代辛酸3-三乙氧基甲硅烷基-1-丙基酯;硫代苯甲酸3-三乙氧基甲硅烷基-1-丙基酯;硫代-2-乙基己酸3-三乙氧基甲硅烷基-1-丙基酯;硫代乙酸3-甲基二乙酰氧基甲硅烷基-1-丙基酯;硫代乙酸3-三乙酰氧基甲硅烷基-1-丙基酯和硫代乙酸2-甲基二乙酰氧基甲硅烷基-1-乙基酯。
9. 权利要求1的方法,其中碱金属、碱土金属或者碱金属或者碱土金属的碱性衍生物对含聚硫烷的有机硅化合物的摩尔当量的范围是从约1∶1到约10∶1。
10. 权利要求1的方法,其中含聚硫烷的有机硅化合物金属盐对酰卤的范围是从约1.25∶1到约1∶1摩尔当量,或者对碳酰二卤的范围是从约2.25∶1到约2∶1摩尔当量。
11. 权利要求1的方法,其中含聚硫烷的有机硅化合物和碱金属、碱土金属或者碱金属、碱土金属的碱性衍生物之间的反应在金属或者金属衍生物处于液态的温度条件下进行。
12. 权利要求1的方法,其中含聚硫烷的有机硅化合物金属盐和酰卤或者和碳酰二卤的反应在约10℃到约50℃的温度范围内进行。
13. 权利要求1的方法,在溶剂中进行。
14. 权利要求13的方法,其中溶剂选自甲苯、苯、二甲苯、己烷、庚烷、异辛烷和辛烷。
15. 权利要求9的方法,其中所述摩尔当量的范围为从约2∶1到约2.5∶1。
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US7510670B2 (en) * | 2006-02-21 | 2009-03-31 | Momentive Performance Materials Inc. | Free flowing filler composition based on organofunctional silane |
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- 2004-03-03 KR KR1020057016270A patent/KR101052958B1/ko active IP Right Grant
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- 2004-03-03 EP EP04716878A patent/EP1603925A2/en not_active Withdrawn
- 2004-03-03 RU RU2005130488/04A patent/RU2005130488A/ru not_active Application Discontinuation
- 2004-03-03 CN CNB200480012021XA patent/CN100422192C/zh not_active Expired - Lifetime
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AU2004217886A1 (en) | 2004-09-16 |
JP4571125B2 (ja) | 2010-10-27 |
JP2006519864A (ja) | 2006-08-31 |
NO20054516L (no) | 2005-09-29 |
RS20050678A (en) | 2007-08-03 |
BRPI0408662A (pt) | 2006-03-28 |
CA2517875A1 (en) | 2004-09-16 |
KR20050107596A (ko) | 2005-11-14 |
CN1784412A (zh) | 2006-06-07 |
BRPI0408662B1 (pt) | 2015-09-15 |
ZA200507438B (en) | 2006-09-27 |
WO2004078813A3 (en) | 2004-10-21 |
KR101052958B1 (ko) | 2011-07-29 |
TW200500371A (en) | 2005-01-01 |
EP1603925A2 (en) | 2005-12-14 |
US6777569B1 (en) | 2004-08-17 |
AR043461A1 (es) | 2005-07-27 |
MXPA05009376A (es) | 2005-12-05 |
WO2004078813A2 (en) | 2004-09-16 |
RU2005130488A (ru) | 2006-03-10 |
CL2004000421A1 (es) | 2005-01-28 |
TWI364425B (en) | 2012-05-21 |
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