CN100364099C - 用于制造半导体器件的工艺和半导体器件 - Google Patents
用于制造半导体器件的工艺和半导体器件 Download PDFInfo
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- CN100364099C CN100364099C CNB2004100028376A CN200410002837A CN100364099C CN 100364099 C CN100364099 C CN 100364099C CN B2004100028376 A CNB2004100028376 A CN B2004100028376A CN 200410002837 A CN200410002837 A CN 200410002837A CN 100364099 C CN100364099 C CN 100364099C
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- 239000011347 resin Substances 0.000 claims description 8
- 229920005989 resin Polymers 0.000 claims description 8
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 claims description 6
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- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
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- 229910052732 germanium Inorganic materials 0.000 description 1
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- 239000011521 glass Substances 0.000 description 1
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- 238000004518 low pressure chemical vapour deposition Methods 0.000 description 1
- ORUIBWPALBXDOA-UHFFFAOYSA-L magnesium fluoride Chemical compound [F-].[F-].[Mg+2] ORUIBWPALBXDOA-UHFFFAOYSA-L 0.000 description 1
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- ZQPPMHVWECSIRJ-KTKRTIGZSA-N oleic acid group Chemical group C(CCCCCCC\C=C/CCCCCCCC)(=O)O ZQPPMHVWECSIRJ-KTKRTIGZSA-N 0.000 description 1
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- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 1
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Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/148—Charge coupled imagers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/48—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
- H01L33/52—Encapsulations
- H01L33/54—Encapsulations having a particular shape
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/14601—Structural or functional details thereof
- H01L27/14625—Optical elements or arrangements associated with the device
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0232—Optical elements or arrangements associated with the device
- H01L31/02327—Optical elements or arrangements associated with the device the optical elements being integrated or being directly associated to the device, e.g. back reflectors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/08—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors
- H01L31/10—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof in which radiation controls flow of current through the device, e.g. photoresistors characterised by potential barriers, e.g. phototransistors
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Electromagnetism (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Solid State Image Pick-Up Elements (AREA)
- Transforming Light Signals Into Electric Signals (AREA)
Abstract
Description
Claims (9)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2003009947A JP2004221487A (ja) | 2003-01-17 | 2003-01-17 | 半導体装置の製造方法及び半導体装置 |
JP9947/03 | 2003-01-17 | ||
JP9947/2003 | 2003-01-17 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1518118A CN1518118A (zh) | 2004-08-04 |
CN100364099C true CN100364099C (zh) | 2008-01-23 |
Family
ID=32709198
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CNB2004100028376A Expired - Lifetime CN100364099C (zh) | 2003-01-17 | 2004-01-17 | 用于制造半导体器件的工艺和半导体器件 |
Country Status (5)
Country | Link |
---|---|
US (1) | US7087945B2 (zh) |
JP (1) | JP2004221487A (zh) |
KR (1) | KR100603859B1 (zh) |
CN (1) | CN100364099C (zh) |
TW (1) | TWI235487B (zh) |
Families Citing this family (34)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6998656B2 (en) * | 2003-02-07 | 2006-02-14 | Hewlett-Packard Development Company, L.P. | Transparent double-injection field-effect transistor |
JP2005228997A (ja) * | 2004-02-13 | 2005-08-25 | Matsushita Electric Ind Co Ltd | 固体撮像装置およびその製造方法 |
JP4779320B2 (ja) * | 2004-08-10 | 2011-09-28 | ソニー株式会社 | 固体撮像装置およびその製造方法 |
KR100649019B1 (ko) * | 2004-08-11 | 2006-11-24 | 동부일렉트로닉스 주식회사 | 씨모스 이미지 센서 및 그의 제조 방법 |
KR100642764B1 (ko) * | 2004-09-08 | 2006-11-10 | 삼성전자주식회사 | 이미지 소자 및 그 제조 방법 |
JP2006156799A (ja) * | 2004-11-30 | 2006-06-15 | Fuji Photo Film Co Ltd | 固体撮像素子及びその製造方法 |
JP2006222270A (ja) * | 2005-02-10 | 2006-08-24 | Sony Corp | 固体撮像素子及び固体撮像素子の製造方法 |
US20060198008A1 (en) * | 2005-03-07 | 2006-09-07 | Micron Technology, Inc. | Formation of micro lens by using flowable oxide deposition |
US7791158B2 (en) * | 2005-04-13 | 2010-09-07 | Samsung Electronics Co., Ltd. | CMOS image sensor including an interlayer insulating layer and method of manufacturing the same |
WO2006115142A1 (ja) * | 2005-04-22 | 2006-11-02 | Matsushita Electric Industrial Co., Ltd. | 固体撮像素子およびその製造方法ならびに光導波路形成装置 |
JP2006332347A (ja) * | 2005-05-26 | 2006-12-07 | Sharp Corp | 層内レンズ、固体撮像素子、電子情報装置、層内レンズの形成方法および固体撮像素子の製造方法 |
US7259102B2 (en) * | 2005-09-30 | 2007-08-21 | Molecular Imprints, Inc. | Etching technique to planarize a multi-layer structure |
JP2007165403A (ja) * | 2005-12-09 | 2007-06-28 | Fujifilm Corp | 固体撮像素子及びその製造方法 |
JP4705499B2 (ja) * | 2006-03-27 | 2011-06-22 | パナソニック株式会社 | オンチップレンズの形成方法および固体撮像装置の製造方法 |
JP2007287987A (ja) * | 2006-04-18 | 2007-11-01 | Fujifilm Corp | 固体撮像装置の製造方法及び固体撮像装置 |
KR101176545B1 (ko) * | 2006-07-26 | 2012-08-28 | 삼성전자주식회사 | 마이크로 렌즈의 형성방법과 마이크로 렌즈를 포함한이미지 센서 및 그의 제조방법 |
KR20080015643A (ko) * | 2006-08-16 | 2008-02-20 | 삼성전자주식회사 | 내부 렌즈들을 구비하는 이미지 센서 및 그 제조방법 |
JP2008058794A (ja) * | 2006-09-01 | 2008-03-13 | Fujifilm Corp | カラーフィルタ用材料、カラーフィルタ、その製造方法、これを用いた固体撮像素子およびその製造方法 |
US7879631B2 (en) * | 2006-10-24 | 2011-02-01 | Hong Jim T | Systems and methods for on-die light sensing with low leakage |
US20080237764A1 (en) * | 2007-03-30 | 2008-10-02 | Fujifilm Corporation | Semiconductor element and method for manufacturing the same |
US20090216944A1 (en) * | 2008-02-22 | 2009-08-27 | International Business Machines Corporation | Efficient validation of writes for protection against dropped writes |
JP2009260089A (ja) * | 2008-04-17 | 2009-11-05 | Sharp Corp | 固体撮像装置の製造方法および電子情報機器 |
US7943989B2 (en) * | 2008-12-31 | 2011-05-17 | Alpha And Omega Semiconductor Incorporated | Nano-tube MOSFET technology and devices |
US10121857B2 (en) * | 2008-12-31 | 2018-11-06 | Alpha And Omega Semiconductor Incorporated | Nano-tube MOSFET technology and devices |
US9508805B2 (en) * | 2008-12-31 | 2016-11-29 | Alpha And Omega Semiconductor Incorporated | Termination design for nanotube MOSFET |
US7910486B2 (en) * | 2009-06-12 | 2011-03-22 | Alpha & Omega Semiconductor, Inc. | Method for forming nanotube semiconductor devices |
US8299494B2 (en) | 2009-06-12 | 2012-10-30 | Alpha & Omega Semiconductor, Inc. | Nanotube semiconductor devices |
US8314469B2 (en) | 2009-09-04 | 2012-11-20 | United Microelectronics Corp. | Image sensor structure with different pitches or shapes of microlenses |
CN102024829B (zh) * | 2009-09-17 | 2014-03-26 | 联华电子股份有限公司 | 影像传感器结构及其制法 |
JP5274678B2 (ja) * | 2011-02-09 | 2013-08-28 | キヤノン株式会社 | 光電変換素子、およびこれを用いた光電変換装置、撮像システム |
JP2013004685A (ja) * | 2011-06-15 | 2013-01-07 | Canon Inc | 固体撮像装置の製造方法 |
US9523803B2 (en) * | 2012-10-17 | 2016-12-20 | Sony Corporation | Image capturing element and image capturing apparatus for removing infrared components from light |
JP6075458B2 (ja) * | 2013-09-18 | 2017-02-08 | 富士電機株式会社 | 半導体装置およびその製造方法 |
CN110168739B (zh) * | 2016-12-01 | 2022-08-30 | 赫普塔冈微光有限公司 | 光电子模块和光电子模制工具以及其制造方法 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5796154A (en) * | 1995-05-22 | 1998-08-18 | Matsushita Electronics Corporation | Solid-state imaging device with dual lens structure |
US5877040A (en) * | 1995-08-10 | 1999-03-02 | Lg Semicon Co., Ltd. | Method of making charge-coupled device with microlens |
US6255640B1 (en) * | 1998-03-27 | 2001-07-03 | Sony Corporation | Solid-state image sensing device and method for manufacturing solid-state image sensing device |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2945440B2 (ja) | 1990-05-02 | 1999-09-06 | シャープ株式会社 | 固体撮像装置の製造方法 |
JP2833941B2 (ja) * | 1992-10-09 | 1998-12-09 | 三菱電機株式会社 | 固体撮像装置とその製造方法 |
JPH1187672A (ja) | 1997-09-11 | 1999-03-30 | Sony Corp | 固体撮像素子の層内集光レンズの形成方法 |
JP4482982B2 (ja) * | 1999-11-08 | 2010-06-16 | ソニー株式会社 | 固体撮像素子及びその製造方法 |
JP2003229553A (ja) * | 2002-02-05 | 2003-08-15 | Sharp Corp | 半導体装置及びその製造方法 |
-
2003
- 2003-01-17 JP JP2003009947A patent/JP2004221487A/ja active Pending
-
2004
- 2004-01-08 US US10/755,019 patent/US7087945B2/en not_active Expired - Lifetime
- 2004-01-13 TW TW093100796A patent/TWI235487B/zh not_active IP Right Cessation
- 2004-01-16 KR KR1020040003227A patent/KR100603859B1/ko active IP Right Grant
- 2004-01-17 CN CNB2004100028376A patent/CN100364099C/zh not_active Expired - Lifetime
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5796154A (en) * | 1995-05-22 | 1998-08-18 | Matsushita Electronics Corporation | Solid-state imaging device with dual lens structure |
US5877040A (en) * | 1995-08-10 | 1999-03-02 | Lg Semicon Co., Ltd. | Method of making charge-coupled device with microlens |
US6255640B1 (en) * | 1998-03-27 | 2001-07-03 | Sony Corporation | Solid-state image sensing device and method for manufacturing solid-state image sensing device |
Also Published As
Publication number | Publication date |
---|---|
KR20040067930A (ko) | 2004-07-30 |
TWI235487B (en) | 2005-07-01 |
US20040142501A1 (en) | 2004-07-22 |
JP2004221487A (ja) | 2004-08-05 |
KR100603859B1 (ko) | 2006-07-24 |
TW200427074A (en) | 2004-12-01 |
CN1518118A (zh) | 2004-08-04 |
US7087945B2 (en) | 2006-08-08 |
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