CN100361322C - 发光元件、其制造方法以及led灯 - Google Patents
发光元件、其制造方法以及led灯 Download PDFInfo
- Publication number
- CN100361322C CN100361322C CNB2003801090522A CN200380109052A CN100361322C CN 100361322 C CN100361322 C CN 100361322C CN B2003801090522 A CNB2003801090522 A CN B2003801090522A CN 200380109052 A CN200380109052 A CN 200380109052A CN 100361322 C CN100361322 C CN 100361322C
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- light
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- 238000004519 manufacturing process Methods 0.000 title claims description 21
- 239000000758 substrate Substances 0.000 claims abstract description 102
- 239000004065 semiconductor Substances 0.000 claims abstract description 64
- 230000012010 growth Effects 0.000 claims description 44
- 238000000034 method Methods 0.000 claims description 43
- 238000003475 lamination Methods 0.000 claims description 27
- 230000008569 process Effects 0.000 claims description 10
- 238000000227 grinding Methods 0.000 claims description 4
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 claims description 3
- 229910002601 GaN Inorganic materials 0.000 description 65
- 229910052594 sapphire Inorganic materials 0.000 description 41
- 239000010980 sapphire Substances 0.000 description 41
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 34
- JLTRXTDYQLMHGR-UHFFFAOYSA-N trimethylaluminium Chemical compound C[Al](C)C JLTRXTDYQLMHGR-UHFFFAOYSA-N 0.000 description 31
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 26
- XCZXGTMEAKBVPV-UHFFFAOYSA-N trimethylgallium Chemical compound C[Ga](C)C XCZXGTMEAKBVPV-UHFFFAOYSA-N 0.000 description 23
- 239000012159 carrier gas Substances 0.000 description 20
- 229910021529 ammonia Inorganic materials 0.000 description 17
- RGGPNXQUMRMPRA-UHFFFAOYSA-N triethylgallium Chemical compound CC[Ga](CC)CC RGGPNXQUMRMPRA-UHFFFAOYSA-N 0.000 description 17
- 229910017083 AlN Inorganic materials 0.000 description 14
- PIGFYZPCRLYGLF-UHFFFAOYSA-N Aluminum nitride Chemical compound [Al]#N PIGFYZPCRLYGLF-UHFFFAOYSA-N 0.000 description 14
- 239000011777 magnesium Substances 0.000 description 14
- 239000011347 resin Substances 0.000 description 14
- 229920005989 resin Polymers 0.000 description 14
- 230000004888 barrier function Effects 0.000 description 13
- 229910052757 nitrogen Inorganic materials 0.000 description 13
- 239000007789 gas Substances 0.000 description 11
- 239000002994 raw material Substances 0.000 description 10
- IBEFSUTVZWZJEL-UHFFFAOYSA-N trimethylindium Chemical compound C[In](C)C IBEFSUTVZWZJEL-UHFFFAOYSA-N 0.000 description 10
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 9
- 238000010438 heat treatment Methods 0.000 description 9
- 239000001257 hydrogen Substances 0.000 description 9
- 229910052739 hydrogen Inorganic materials 0.000 description 9
- 230000015572 biosynthetic process Effects 0.000 description 8
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- JMASRVWKEDWRBT-UHFFFAOYSA-N Gallium nitride Chemical compound [Ga]#N JMASRVWKEDWRBT-UHFFFAOYSA-N 0.000 description 4
- 239000013078 crystal Substances 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 238000004088 simulation Methods 0.000 description 4
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- 238000000137 annealing Methods 0.000 description 3
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- 239000010931 gold Substances 0.000 description 3
- 238000002488 metal-organic chemical vapour deposition Methods 0.000 description 3
- 238000000746 purification Methods 0.000 description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 238000002425 crystallisation Methods 0.000 description 2
- 230000008025 crystallization Effects 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- QHGSGZLLHBKSAH-UHFFFAOYSA-N hydridosilicon Chemical compound [SiH] QHGSGZLLHBKSAH-UHFFFAOYSA-N 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 239000010453 quartz Substances 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 230000006641 stabilisation Effects 0.000 description 2
- 238000011105 stabilization Methods 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- 239000010936 titanium Substances 0.000 description 2
- 238000000927 vapour-phase epitaxy Methods 0.000 description 2
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- 244000137852 Petrea volubilis Species 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 239000004411 aluminium Substances 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 238000004364 calculation method Methods 0.000 description 1
- 239000003518 caustics Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
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- 239000011248 coating agent Substances 0.000 description 1
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- 238000000354 decomposition reaction Methods 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 238000004134 energy conservation Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000000407 epitaxy Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000012467 final product Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 230000008676 import Effects 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 239000003595 mist Substances 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 229910003465 moissanite Inorganic materials 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 238000005121 nitriding Methods 0.000 description 1
- 238000005457 optimization Methods 0.000 description 1
- 125000002524 organometallic group Chemical group 0.000 description 1
- 238000001259 photo etching Methods 0.000 description 1
- 238000002203 pretreatment Methods 0.000 description 1
- 238000010926 purge Methods 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- 229920002379 silicone rubber Polymers 0.000 description 1
- 238000010792 warming Methods 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/02—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
- H01L33/20—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a particular shape, e.g. curved or truncated substrate
- H01L33/22—Roughened surfaces, e.g. at the interface between epitaxial layers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02367—Substrates
- H01L21/0237—Materials
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02367—Substrates
- H01L21/0237—Materials
- H01L21/0242—Crystalline insulating materials
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02367—Substrates
- H01L21/02428—Structure
- H01L21/0243—Surface structure
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02518—Deposited layers
- H01L21/02521—Materials
- H01L21/02538—Group 13/15 materials
- H01L21/0254—Nitrides
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02612—Formation types
- H01L21/02617—Deposition types
- H01L21/0262—Reduction or decomposition of gaseous compounds, e.g. CVD
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02612—Formation types
- H01L21/02617—Deposition types
- H01L21/02636—Selective deposition, e.g. simultaneous growth of mono- and non-monocrystalline semiconductor materials
- H01L21/02639—Preparation of substrate for selective deposition
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Crystallography & Structural Chemistry (AREA)
- Led Devices (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP369092/2002 | 2002-12-20 | ||
JP2002369092A JP4201079B2 (ja) | 2002-12-20 | 2002-12-20 | 発光素子、その製造方法およびledランプ |
Publications (2)
Publication Number | Publication Date |
---|---|
CN1742381A CN1742381A (zh) | 2006-03-01 |
CN100361322C true CN100361322C (zh) | 2008-01-09 |
Family
ID=32677134
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CNB2003801090522A Expired - Lifetime CN100361322C (zh) | 2002-12-20 | 2003-12-19 | 发光元件、其制造方法以及led灯 |
Country Status (7)
Country | Link |
---|---|
JP (1) | JP4201079B2 (de) |
KR (1) | KR100802452B1 (de) |
CN (1) | CN100361322C (de) |
AU (1) | AU2003292584A1 (de) |
DE (1) | DE10393949T5 (de) |
TW (1) | TWI241032B (de) |
WO (1) | WO2004057682A1 (de) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103545170A (zh) * | 2012-07-13 | 2014-01-29 | 华夏光股份有限公司 | 半导体装置及其制造方法 |
CN101661981B (zh) * | 2008-08-29 | 2014-10-22 | 广镓光电股份有限公司 | 用于制造发光元件的基板以及利用该基板制造的发光元件 |
Families Citing this family (40)
Publication number | Priority date | Publication date | Assignee | Title |
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KR100649494B1 (ko) | 2004-08-17 | 2006-11-24 | 삼성전기주식회사 | 레이저를 이용하여 발광 다이오드 기판을 표면 처리하는발광 다이오드 제조 방법 및 이 방법에 의해 제조된 발광다이오드 |
JP2006066442A (ja) * | 2004-08-24 | 2006-03-09 | Kyocera Corp | 半導体素子用単結晶サファイア基板とその製造方法及び半導体発光素子 |
CN100461471C (zh) * | 2004-11-11 | 2009-02-11 | 晶元光电股份有限公司 | 高亮度的发光元件及其制造方法 |
KR100624449B1 (ko) | 2004-12-08 | 2006-09-18 | 삼성전기주식회사 | 요철 구조를 포함하는 발광 소자 및 그 제조 방법 |
US20070145386A1 (en) | 2004-12-08 | 2007-06-28 | Samsung Electro-Mechanics Co., Ltd. | Semiconductor light emitting device and method of manufacturing the same |
JP5082278B2 (ja) | 2005-05-16 | 2012-11-28 | ソニー株式会社 | 発光ダイオードの製造方法、集積型発光ダイオードの製造方法および窒化物系iii−v族化合物半導体の成長方法 |
KR20070081184A (ko) | 2006-02-10 | 2007-08-16 | 삼성전기주식회사 | 질화물계 반도체 발광소자 및 그 제조방법 |
WO2007098215A2 (en) * | 2006-02-17 | 2007-08-30 | The Regents Of The University Of California | Method for growth of semipolar (al,in,ga,b)n optoelectronic devices |
TWI288491B (en) * | 2006-03-02 | 2007-10-11 | Nat Univ Chung Hsing | High extraction efficiency of solid-state light emitting device |
KR100786777B1 (ko) * | 2006-03-28 | 2007-12-18 | 전북대학교산학협력단 | 반도체 구조물의 제조 방법 |
DE102007004302A1 (de) * | 2006-09-29 | 2008-04-03 | Osram Opto Semiconductors Gmbh | Halbleiterchip und Verfahren zur Herstellung eines Halbleiterchips |
KR20090082923A (ko) * | 2006-11-15 | 2009-07-31 | 더 리전츠 오브 더 유니버시티 오브 캘리포니아 | 다중 추출기를 통하여 광을 고효율로 추출하는 발광 다이오드 |
JP5176334B2 (ja) * | 2007-02-01 | 2013-04-03 | 日亜化学工業株式会社 | 半導体発光素子 |
KR101364168B1 (ko) * | 2007-03-20 | 2014-02-18 | 서울바이오시스 주식회사 | 발광 소자용 기판 제조방법 |
JP4804444B2 (ja) * | 2007-10-31 | 2011-11-02 | 泰谷光電科技股▲ふん▼有限公司 | 発光ダイオードの構造及びその製造方法 |
CN101488545B (zh) * | 2008-01-18 | 2011-10-05 | 泰谷光电科技股份有限公司 | 发光二极管基板表面粗化的方法 |
CN101533881B (zh) * | 2008-03-11 | 2012-05-02 | 广镓光电股份有限公司 | 半导体发光组件 |
CN101621097B (zh) * | 2008-07-04 | 2011-12-28 | 泰谷光电科技股份有限公司 | 光电装置及其制造方法 |
CN102024885A (zh) * | 2009-09-10 | 2011-04-20 | 鸿富锦精密工业(深圳)有限公司 | 氮化物半导体发光元件 |
JP5603085B2 (ja) * | 2010-01-06 | 2014-10-08 | 株式会社ディスコ | 光デバイスウエーハの製造方法 |
JP2010135855A (ja) * | 2010-03-16 | 2010-06-17 | Showa Denko Kk | 発光素子の製造方法及び発光素子 |
JP2010147505A (ja) * | 2010-03-16 | 2010-07-01 | Showa Denko Kk | 発光素子の製造方法及び発光素子 |
US8217488B2 (en) * | 2010-07-19 | 2012-07-10 | Walsin Lihwa Corporation | GaN light emitting diode and method for increasing light extraction on GaN light emitting diode via sapphire shaping |
CN101937967B (zh) * | 2010-09-14 | 2012-07-04 | 映瑞光电科技(上海)有限公司 | 发光二极管、发光装置及制造方法 |
CN102130249B (zh) * | 2010-09-28 | 2013-05-01 | 映瑞光电科技(上海)有限公司 | 超亮度发光二极管及其制作方法 |
CN102130271A (zh) * | 2010-09-28 | 2011-07-20 | 映瑞光电科技(上海)有限公司 | Led芯片封装结构与白光led发光装置 |
JP5246235B2 (ja) * | 2010-09-30 | 2013-07-24 | 豊田合成株式会社 | Iii族窒化物半導体発光素子の製造方法 |
JP5246236B2 (ja) * | 2010-09-30 | 2013-07-24 | 豊田合成株式会社 | Iii族窒化物半導体発光素子の製造方法 |
KR20140068793A (ko) * | 2010-10-29 | 2014-06-09 | 더 리전츠 오브 더 유니버시티 오브 캘리포니아 | 서로 간에 예각, 직각 또는 둔각을 이루는 적어도 2개의 표면들을 가진 시드들 상에서의 ⅲ-족 질화물 결정들의 암모니아 열적 성장 |
CN102324460A (zh) * | 2011-10-24 | 2012-01-18 | 佛山市国星光电股份有限公司 | 基于图形化封装基板的led封装装置 |
JP5811009B2 (ja) | 2012-03-30 | 2015-11-11 | 豊田合成株式会社 | Iii族窒化物半導体の製造方法及びiii族窒化物半導体 |
JP2014034481A (ja) * | 2012-08-07 | 2014-02-24 | Hitachi Metals Ltd | 窒化ガリウム結晶成長用サファイア基板、窒化ガリウム結晶の製造方法、及び窒化ガリウム結晶 |
EP3043392A1 (de) * | 2012-10-12 | 2016-07-13 | Asahi Kasei E-materials Corporation | Optisches substrat, lichtemittierendes halbleiterbauelement und herstellungsverfahren dafür |
KR20140085918A (ko) * | 2012-12-28 | 2014-07-08 | 서울바이오시스 주식회사 | 발광 소자 및 그것을 제조하는 방법 |
JP6020357B2 (ja) | 2013-05-31 | 2016-11-02 | 豊田合成株式会社 | Iii族窒化物半導体の製造方法及びiii族窒化物半導体 |
WO2015012403A1 (ja) * | 2013-07-26 | 2015-01-29 | 株式会社トクヤマ | ベース基板の前処理方法、および該前処理を行ったベース基板を用いた積層体の製造方法 |
TWI640104B (zh) * | 2014-05-30 | 2018-11-01 | 日商日亞化學工業股份有限公司 | 氮化物半導體元件及其製造方法 |
JP6227134B2 (ja) * | 2014-06-03 | 2017-11-08 | シャープ株式会社 | 窒化物半導体発光素子 |
CN104752586A (zh) * | 2015-03-27 | 2015-07-01 | 华南理工大学 | 一种led图形优化封装基板、led封装体及其制备方法 |
TWI778010B (zh) * | 2017-01-26 | 2022-09-21 | 晶元光電股份有限公司 | 發光元件 |
Citations (6)
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---|---|---|---|---|
JPH10270754A (ja) * | 1997-03-24 | 1998-10-09 | Sanyo Electric Co Ltd | 半導体発光素子および発光ランプ |
JP2000164929A (ja) * | 1998-11-26 | 2000-06-16 | Sony Corp | 半導体薄膜と半導体素子と半導体装置とこれらの製造方法 |
JP2001168387A (ja) * | 1999-09-29 | 2001-06-22 | Toyoda Gosei Co Ltd | Iii族窒化物系化合物半導体素子 |
JP2002280611A (ja) * | 2001-03-21 | 2002-09-27 | Mitsubishi Cable Ind Ltd | 半導体発光素子 |
JP2002280609A (ja) * | 2001-03-21 | 2002-09-27 | Mitsubishi Cable Ind Ltd | 紫外線発光素子 |
CN1529915A (zh) * | 2001-07-24 | 2004-09-15 | 日亚化学工业株式会社 | 具有形成凹凸的基板的半导体发光元件 |
Family Cites Families (1)
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JP3556916B2 (ja) | 2000-09-18 | 2004-08-25 | 三菱電線工業株式会社 | 半導体基材の製造方法 |
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2002
- 2002-12-20 JP JP2002369092A patent/JP4201079B2/ja not_active Expired - Lifetime
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2003
- 2003-12-19 DE DE10393949T patent/DE10393949T5/de not_active Withdrawn
- 2003-12-19 CN CNB2003801090522A patent/CN100361322C/zh not_active Expired - Lifetime
- 2003-12-19 WO PCT/JP2003/016330 patent/WO2004057682A1/ja active Application Filing
- 2003-12-19 AU AU2003292584A patent/AU2003292584A1/en not_active Abandoned
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- 2003-12-19 KR KR1020057011483A patent/KR100802452B1/ko active IP Right Grant
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JPH10270754A (ja) * | 1997-03-24 | 1998-10-09 | Sanyo Electric Co Ltd | 半導体発光素子および発光ランプ |
JP2000164929A (ja) * | 1998-11-26 | 2000-06-16 | Sony Corp | 半導体薄膜と半導体素子と半導体装置とこれらの製造方法 |
JP2001168387A (ja) * | 1999-09-29 | 2001-06-22 | Toyoda Gosei Co Ltd | Iii族窒化物系化合物半導体素子 |
JP2002280611A (ja) * | 2001-03-21 | 2002-09-27 | Mitsubishi Cable Ind Ltd | 半導体発光素子 |
JP2002280609A (ja) * | 2001-03-21 | 2002-09-27 | Mitsubishi Cable Ind Ltd | 紫外線発光素子 |
CN1529915A (zh) * | 2001-07-24 | 2004-09-15 | 日亚化学工业株式会社 | 具有形成凹凸的基板的半导体发光元件 |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
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CN101661981B (zh) * | 2008-08-29 | 2014-10-22 | 广镓光电股份有限公司 | 用于制造发光元件的基板以及利用该基板制造的发光元件 |
CN103545170A (zh) * | 2012-07-13 | 2014-01-29 | 华夏光股份有限公司 | 半导体装置及其制造方法 |
Also Published As
Publication number | Publication date |
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KR100802452B1 (ko) | 2008-02-13 |
TWI241032B (en) | 2005-10-01 |
JP2004200523A (ja) | 2004-07-15 |
JP4201079B2 (ja) | 2008-12-24 |
DE10393949T5 (de) | 2011-12-01 |
TW200418207A (en) | 2004-09-16 |
WO2004057682A1 (ja) | 2004-07-08 |
AU2003292584A1 (en) | 2004-07-14 |
KR20050091736A (ko) | 2005-09-15 |
CN1742381A (zh) | 2006-03-01 |
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