CN100340698C - 溅射靶及光信息记录介质及其制造方法 - Google Patents

溅射靶及光信息记录介质及其制造方法 Download PDF

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Publication number
CN100340698C
CN100340698C CNB2004100962421A CN200410096242A CN100340698C CN 100340698 C CN100340698 C CN 100340698C CN B2004100962421 A CNB2004100962421 A CN B2004100962421A CN 200410096242 A CN200410096242 A CN 200410096242A CN 100340698 C CN100340698 C CN 100340698C
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China
Prior art keywords
sputtering target
recording medium
optical information
film
information recording
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Expired - Lifetime
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CNB2004100962421A
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English (en)
Chinese (zh)
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CN1621558A (zh
Inventor
高见英生
矢作政隆
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JX Nippon Mining and Metals Corp
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Nippon Mining and Metals Co Ltd
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  • Manufacturing Optical Record Carriers (AREA)
  • Compositions Of Oxide Ceramics (AREA)
  • Physical Vapour Deposition (AREA)
  • Optical Record Carriers And Manufacture Thereof (AREA)
CNB2004100962421A 2003-11-25 2004-11-25 溅射靶及光信息记录介质及其制造方法 Expired - Lifetime CN100340698C (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2003394028 2003-11-25
JP2003394028A JP4711244B2 (ja) 2003-11-25 2003-11-25 スパッタリングターゲット

Publications (2)

Publication Number Publication Date
CN1621558A CN1621558A (zh) 2005-06-01
CN100340698C true CN100340698C (zh) 2007-10-03

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CNB2004100962421A Expired - Lifetime CN100340698C (zh) 2003-11-25 2004-11-25 溅射靶及光信息记录介质及其制造方法

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Country Link
JP (1) JP4711244B2 (enrdf_load_stackoverflow)
CN (1) CN100340698C (enrdf_load_stackoverflow)
TW (1) TWI263686B (enrdf_load_stackoverflow)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1993847B1 (en) * 2006-03-10 2011-10-26 Ricoh Company, Ltd. Optical recording medium
JP4552950B2 (ja) * 2006-03-15 2010-09-29 住友金属鉱山株式会社 ターゲット用酸化物焼結体、その製造方法、それを用いた透明導電膜の製造方法、及び得られる透明導電膜
JP4788463B2 (ja) * 2006-04-25 2011-10-05 住友金属鉱山株式会社 酸化物焼結体、透明酸化物膜、ガスバリア性透明樹脂基板、ガスバリア性透明導電性樹脂基板およびフレキシブル表示素子
WO2007142330A1 (ja) 2006-06-08 2007-12-13 Asahi Glass Company, Limited 透明導電膜およびその製造方法、ならびにその製造に使用されるスパッタリングターゲット
JP5269501B2 (ja) * 2008-07-08 2013-08-21 出光興産株式会社 酸化物焼結体及びそれからなるスパッタリングターゲット
KR101671543B1 (ko) 2008-11-20 2016-11-01 이데미쓰 고산 가부시키가이샤 ＺｎＯ-ＳｎＯ₂-Ｉｎ₂Ｏ₃계 산화물 소결체 및 비정질 투명 도전막
JP5145513B2 (ja) 2008-12-12 2013-02-20 出光興産株式会社 複合酸化物焼結体及びそれからなるスパッタリングターゲット
US20120279856A1 (en) * 2009-10-15 2012-11-08 Medvedovski Eugene Tin Oxide Ceramic Sputtering Target and Method of Producing It
JP5389852B2 (ja) * 2011-04-07 2014-01-15 Ｊｘ日鉱日石金属株式会社 光情報記録媒体の保護膜
JP5476636B2 (ja) * 2011-05-23 2014-04-23 Ｊｘ日鉱日石金属株式会社 スパッタリングターゲットの製造方法及びスパッタリングターゲット
JP6212869B2 (ja) 2012-02-06 2017-10-18 三菱マテリアル株式会社 酸化物スパッタリングターゲット
TW201422835A (zh) * 2012-12-03 2014-06-16 Solar Applied Mat Tech Corp 濺鍍靶材及導電金屬氧化物薄膜
CN105074045B (zh) * 2013-04-08 2017-11-24 三菱综合材料株式会社 氧化物溅射靶、其制造方法及光记录介质用保护膜
WO2017094227A1 (ja) * 2015-12-01 2017-06-08 ソニー株式会社 光記録媒体

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5026672A (en) * 1990-06-25 1991-06-25 Tektronix, Inc. Method of fabricating a sintered body containing tin oxide
JP2000256059A (ja) * 1999-03-05 2000-09-19 Idemitsu Kosan Co Ltd 透明導電材料、透明導電ガラス及び透明導電フィルム
CN1287545A (zh) * 1998-08-31 2001-03-14 出光兴产株式会社 透明导电膜用靶、透明导电材料、透明导电玻璃及透明导电薄膜
WO2001029279A1 (en) * 1999-10-15 2001-04-26 Honeywell International Inc. Process for producing sputtering target materials
JP2003073819A (ja) * 2001-09-07 2003-03-12 Vacuum Metallurgical Co Ltd 錫−アンチモン酸化物焼結体ターゲット及びその製造方法

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5026672A (en) * 1990-06-25 1991-06-25 Tektronix, Inc. Method of fabricating a sintered body containing tin oxide
CN1287545A (zh) * 1998-08-31 2001-03-14 出光兴产株式会社 透明导电膜用靶、透明导电材料、透明导电玻璃及透明导电薄膜
JP2000256059A (ja) * 1999-03-05 2000-09-19 Idemitsu Kosan Co Ltd 透明導電材料、透明導電ガラス及び透明導電フィルム
WO2001029279A1 (en) * 1999-10-15 2001-04-26 Honeywell International Inc. Process for producing sputtering target materials
JP2003073819A (ja) * 2001-09-07 2003-03-12 Vacuum Metallurgical Co Ltd 錫−アンチモン酸化物焼結体ターゲット及びその製造方法

Also Published As

Publication number Publication date
TW200517509A (en) 2005-06-01
JP2005154820A (ja) 2005-06-16
JP4711244B2 (ja) 2011-06-29
TWI263686B (en) 2006-10-11
CN1621558A (zh) 2005-06-01

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