CN100337160C - 感光性组合物以及滤色器 - Google Patents

感光性组合物以及滤色器 Download PDF

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Publication number
CN100337160C
CN100337160C CNB2004100471928A CN200410047192A CN100337160C CN 100337160 C CN100337160 C CN 100337160C CN B2004100471928 A CNB2004100471928 A CN B2004100471928A CN 200410047192 A CN200410047192 A CN 200410047192A CN 100337160 C CN100337160 C CN 100337160C
Authority
CN
China
Prior art keywords
polymerizable monomer
weight
parts
photosensitive
methyl
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
CNB2004100471928A
Other languages
English (en)
Chinese (zh)
Other versions
CN1629727A (zh
Inventor
池上布美子
清水美绘
糸井健
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toppan Inc
Artience Co Ltd
Original Assignee
Toppan Printing Co Ltd
Toyo Ink Mfg Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toppan Printing Co Ltd, Toyo Ink Mfg Co Ltd filed Critical Toppan Printing Co Ltd
Publication of CN1629727A publication Critical patent/CN1629727A/zh
Application granted granted Critical
Publication of CN100337160C publication Critical patent/CN100337160C/zh
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/20Filters
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007Filters, e.g. additive colour filters; Components for display devices
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1335Structural association of cells with optical devices, e.g. polarisers or reflectors
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/038Macromolecular compounds which are rendered insoluble or differentially wettable

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Nonlinear Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Optics & Photonics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Mathematical Physics (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
  • Liquid Crystal (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
CNB2004100471928A 2003-11-26 2004-11-26 感光性组合物以及滤色器 Expired - Lifetime CN100337160C (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP395151/2003 2003-11-26
JP2003395151A JP4351519B2 (ja) 2003-11-26 2003-11-26 感光性組成物およびカラーフィルタ

Publications (2)

Publication Number Publication Date
CN1629727A CN1629727A (zh) 2005-06-22
CN100337160C true CN100337160C (zh) 2007-09-12

Family

ID=34587594

Family Applications (1)

Application Number Title Priority Date Filing Date
CNB2004100471928A Expired - Lifetime CN100337160C (zh) 2003-11-26 2004-11-26 感光性组合物以及滤色器

Country Status (5)

Country Link
US (1) US7220534B2 (https=)
JP (1) JP4351519B2 (https=)
KR (1) KR101110048B1 (https=)
CN (1) CN100337160C (https=)
TW (1) TWI254149B (https=)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102466973A (zh) * 2010-11-08 2012-05-23 第一毛织株式会社 用于滤色片的光敏树脂组合物以及使用其的滤色片
CN105283806A (zh) * 2013-08-05 2016-01-27 富士胶片株式会社 着色感光性树脂组合物、硬化膜、彩色滤光片、彩色滤光片的制造方法、固体摄像元件及图像显示装置

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4378163B2 (ja) * 2003-12-16 2009-12-02 東洋インキ製造株式会社 カラーフィルタ用青色着色組成物およびカラーフィルタ
KR101342521B1 (ko) * 2005-07-26 2013-12-17 주식회사 동진쎄미켐 감광성 수지 조성물
TWI394001B (zh) * 2005-07-27 2013-04-21 Jsr Corp Side-chain unsaturated polymers, radiation-sensitive resin compositions, and spacers for liquid crystal display elements
JP4862998B2 (ja) * 2005-07-27 2012-01-25 Jsr株式会社 側鎖不飽和重合体、感放射線性樹脂組成物および液晶表示素子用スペーサー
TWI388581B (zh) * 2005-08-25 2013-03-11 Jsr Corp Side-chain unsaturated polymers, radiation-sensitive resin compositions, and spacers for liquid crystal display elements
TWI364560B (en) * 2006-01-13 2012-05-21 Toyo Ink Mfg Co Colored composition for color filters, color filter and liquid crystal display device
CN101067668B (zh) * 2006-05-02 2011-06-15 富士胶片株式会社 滤色器的制造方法、滤色器及显示装置
DE102006038714A1 (de) * 2006-08-18 2008-02-21 Evonik Röhm Gmbh Medienbeständige Lackharze
JP5344790B2 (ja) 2006-12-28 2013-11-20 富士フイルム株式会社 硬化性組成物、カラーフィルタ及びその製造方法
JP4826803B2 (ja) * 2007-03-20 2011-11-30 Jsr株式会社 感放射線性樹脂組成物および液晶表示素子用スペーサーとその製造法
CN101668714A (zh) * 2007-04-09 2010-03-10 Lg化学株式会社 多层光致变色板和由其制得的光致变色玻璃
TWI403838B (zh) * 2007-04-11 2013-08-01 Lg Chemical Ltd 包含由做為鹼溶性樹脂之大分子單體所製備之聚合物之光感樹脂組成物
JP5498724B2 (ja) * 2009-05-15 2014-05-21 凸版印刷株式会社 カラーフィルタ、及び液晶表示装置
KR101453771B1 (ko) * 2010-11-08 2014-10-23 제일모직 주식회사 컬러필터용 감광성 수지 조성물 및 이를 이용한 컬러필터
KR101690814B1 (ko) 2012-05-31 2017-01-10 주식회사 엘지화학 감광성 수지 조성물, 상기 감광성 수지 조성물로 제조된 감광재, 이를 포함하는 컬러필터 및 이를 포함하는 디스플레이 장치
JP6106638B2 (ja) * 2013-08-05 2017-04-05 富士フイルム株式会社 着色感光性樹脂組成物、硬化膜、カラーフィルタ、カラーフィルタの製造方法、固体撮像素子および画像表示装置
CN111694218B (zh) * 2014-05-21 2023-09-08 旭化成株式会社 感光性树脂组合物以及电路图案的形成方法

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06230212A (ja) * 1993-01-29 1994-08-19 Toyo Ink Mfg Co Ltd アルカリ現像型感光性着色組成物
US5539064A (en) * 1993-03-02 1996-07-23 Goo Chemical Industries Co., Ltd. Resist ink composition, printed circuit board produced by using the composition and process for producing the printed circuit board
JPH10301267A (ja) * 1997-02-26 1998-11-13 Toppan Printing Co Ltd 感光性組成物、感光性着色組成物及びその感光性着色組成物を用いたカラーフィルタ
US6558858B2 (en) * 1998-07-31 2003-05-06 Dai Nippon Printing Co., Ltd. Photosensitive resin composition and color filter

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5971048A (ja) * 1982-10-18 1984-04-21 Mitsubishi Chem Ind Ltd 光重合系感光性組成物
JPH0822030B2 (ja) 1985-07-10 1996-03-04 旭精密株式会社 テレビカメラ用レンズの自動絞り制御装置
JP2000298339A (ja) 1999-04-14 2000-10-24 Dainippon Printing Co Ltd 感光性樹脂組成物
JP2002014468A (ja) 2000-06-28 2002-01-18 Mitsubishi Chemicals Corp 光重合性組成物、光重合性着色組成物およびカラーフィルター
JP2002303975A (ja) 2000-12-05 2002-10-18 Nippon Shokubai Co Ltd 感光性樹脂組成物およびその用途

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06230212A (ja) * 1993-01-29 1994-08-19 Toyo Ink Mfg Co Ltd アルカリ現像型感光性着色組成物
US5539064A (en) * 1993-03-02 1996-07-23 Goo Chemical Industries Co., Ltd. Resist ink composition, printed circuit board produced by using the composition and process for producing the printed circuit board
JPH10301267A (ja) * 1997-02-26 1998-11-13 Toppan Printing Co Ltd 感光性組成物、感光性着色組成物及びその感光性着色組成物を用いたカラーフィルタ
US6558858B2 (en) * 1998-07-31 2003-05-06 Dai Nippon Printing Co., Ltd. Photosensitive resin composition and color filter

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102466973A (zh) * 2010-11-08 2012-05-23 第一毛织株式会社 用于滤色片的光敏树脂组合物以及使用其的滤色片
CN105283806A (zh) * 2013-08-05 2016-01-27 富士胶片株式会社 着色感光性树脂组合物、硬化膜、彩色滤光片、彩色滤光片的制造方法、固体摄像元件及图像显示装置
CN105283806B (zh) * 2013-08-05 2019-11-12 富士胶片株式会社 着色感光性树脂组合物、硬化膜、彩色滤光片及其制造方法、固体摄像元件及图像显示装置

Also Published As

Publication number Publication date
US7220534B2 (en) 2007-05-22
TW200532252A (en) 2005-10-01
JP2005156930A (ja) 2005-06-16
KR101110048B1 (ko) 2012-03-13
US20050112501A1 (en) 2005-05-26
CN1629727A (zh) 2005-06-22
TWI254149B (en) 2006-05-01
JP4351519B2 (ja) 2009-10-28
KR20050050600A (ko) 2005-05-31

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Granted publication date: 20070912