TWI254149B - Photosensitive composition and color filter - Google Patents

Photosensitive composition and color filter Download PDF

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Publication number
TWI254149B
TWI254149B TW093136235A TW93136235A TWI254149B TW I254149 B TWI254149 B TW I254149B TW 093136235 A TW093136235 A TW 093136235A TW 93136235 A TW93136235 A TW 93136235A TW I254149 B TWI254149 B TW I254149B
Authority
TW
Taiwan
Prior art keywords
composition
photosensitive
group
copolymer
resin
Prior art date
Application number
TW093136235A
Other languages
English (en)
Chinese (zh)
Other versions
TW200532252A (en
Inventor
Fumiko Ikegami
Mie Shimizu
Takeshi Itoi
Original Assignee
Toyo Ink Mfg Co
Toppan Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toyo Ink Mfg Co, Toppan Printing Co Ltd filed Critical Toyo Ink Mfg Co
Publication of TW200532252A publication Critical patent/TW200532252A/zh
Application granted granted Critical
Publication of TWI254149B publication Critical patent/TWI254149B/zh

Links

Classifications

    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/20Filters
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007Filters, e.g. additive colour filters; Components for display devices
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1335Structural association of cells with optical devices, e.g. polarisers or reflectors
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/038Macromolecular compounds which are rendered insoluble or differentially wettable

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Nonlinear Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Optics & Photonics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Mathematical Physics (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
  • Liquid Crystal (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
TW093136235A 2003-11-26 2004-11-25 Photosensitive composition and color filter TWI254149B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2003395151A JP4351519B2 (ja) 2003-11-26 2003-11-26 感光性組成物およびカラーフィルタ

Publications (2)

Publication Number Publication Date
TW200532252A TW200532252A (en) 2005-10-01
TWI254149B true TWI254149B (en) 2006-05-01

Family

ID=34587594

Family Applications (1)

Application Number Title Priority Date Filing Date
TW093136235A TWI254149B (en) 2003-11-26 2004-11-25 Photosensitive composition and color filter

Country Status (5)

Country Link
US (1) US7220534B2 (https=)
JP (1) JP4351519B2 (https=)
KR (1) KR101110048B1 (https=)
CN (1) CN100337160C (https=)
TW (1) TWI254149B (https=)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4378163B2 (ja) * 2003-12-16 2009-12-02 東洋インキ製造株式会社 カラーフィルタ用青色着色組成物およびカラーフィルタ
KR101342521B1 (ko) * 2005-07-26 2013-12-17 주식회사 동진쎄미켐 감광성 수지 조성물
TWI394001B (zh) * 2005-07-27 2013-04-21 Jsr Corp Side-chain unsaturated polymers, radiation-sensitive resin compositions, and spacers for liquid crystal display elements
JP4862998B2 (ja) * 2005-07-27 2012-01-25 Jsr株式会社 側鎖不飽和重合体、感放射線性樹脂組成物および液晶表示素子用スペーサー
TWI388581B (zh) * 2005-08-25 2013-03-11 Jsr Corp Side-chain unsaturated polymers, radiation-sensitive resin compositions, and spacers for liquid crystal display elements
TWI364560B (en) * 2006-01-13 2012-05-21 Toyo Ink Mfg Co Colored composition for color filters, color filter and liquid crystal display device
CN101067668B (zh) * 2006-05-02 2011-06-15 富士胶片株式会社 滤色器的制造方法、滤色器及显示装置
DE102006038714A1 (de) * 2006-08-18 2008-02-21 Evonik Röhm Gmbh Medienbeständige Lackharze
JP5344790B2 (ja) 2006-12-28 2013-11-20 富士フイルム株式会社 硬化性組成物、カラーフィルタ及びその製造方法
JP4826803B2 (ja) * 2007-03-20 2011-11-30 Jsr株式会社 感放射線性樹脂組成物および液晶表示素子用スペーサーとその製造法
CN101668714A (zh) * 2007-04-09 2010-03-10 Lg化学株式会社 多层光致变色板和由其制得的光致变色玻璃
TWI403838B (zh) * 2007-04-11 2013-08-01 Lg Chemical Ltd 包含由做為鹼溶性樹脂之大分子單體所製備之聚合物之光感樹脂組成物
JP5498724B2 (ja) * 2009-05-15 2014-05-21 凸版印刷株式会社 カラーフィルタ、及び液晶表示装置
KR101453771B1 (ko) * 2010-11-08 2014-10-23 제일모직 주식회사 컬러필터용 감광성 수지 조성물 및 이를 이용한 컬러필터
KR101443757B1 (ko) * 2010-11-08 2014-09-25 제일모직 주식회사 컬러필터용 감광성 수지 조성물 및 이를 이용한 컬러필터
KR101690814B1 (ko) 2012-05-31 2017-01-10 주식회사 엘지화학 감광성 수지 조성물, 상기 감광성 수지 조성물로 제조된 감광재, 이를 포함하는 컬러필터 및 이를 포함하는 디스플레이 장치
JP6106638B2 (ja) * 2013-08-05 2017-04-05 富士フイルム株式会社 着色感光性樹脂組成物、硬化膜、カラーフィルタ、カラーフィルタの製造方法、固体撮像素子および画像表示装置
JP6106639B2 (ja) * 2013-08-05 2017-04-05 富士フイルム株式会社 着色感光性樹脂組成物、硬化膜、カラーフィルタ、カラーフィルタの製造方法、固体撮像素子および画像表示装置
CN111694218B (zh) * 2014-05-21 2023-09-08 旭化成株式会社 感光性树脂组合物以及电路图案的形成方法

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5971048A (ja) * 1982-10-18 1984-04-21 Mitsubishi Chem Ind Ltd 光重合系感光性組成物
JPH0822030B2 (ja) 1985-07-10 1996-03-04 旭精密株式会社 テレビカメラ用レンズの自動絞り制御装置
JP3218256B2 (ja) * 1993-01-29 2001-10-15 東洋インキ製造株式会社 アルカリ現像型感光性着色組成物
JP3329877B2 (ja) * 1993-03-02 2002-09-30 互応化学工業株式会社 プリント回路基板製造用レジストインク組成物、それを用いたレジスト膜及びプリント回路基板
JP3503460B2 (ja) * 1997-02-26 2004-03-08 凸版印刷株式会社 感光性組成物、感光性着色組成物及びその感光性着色組成物を用いたカラーフィルタ
KR100334426B1 (ko) * 1998-07-31 2002-05-03 기타지마 요시토시 감광성 수지 조성물 및 컬러 필터
JP2000298339A (ja) 1999-04-14 2000-10-24 Dainippon Printing Co Ltd 感光性樹脂組成物
JP2002014468A (ja) 2000-06-28 2002-01-18 Mitsubishi Chemicals Corp 光重合性組成物、光重合性着色組成物およびカラーフィルター
JP2002303975A (ja) 2000-12-05 2002-10-18 Nippon Shokubai Co Ltd 感光性樹脂組成物およびその用途

Also Published As

Publication number Publication date
US7220534B2 (en) 2007-05-22
CN100337160C (zh) 2007-09-12
TW200532252A (en) 2005-10-01
JP2005156930A (ja) 2005-06-16
KR101110048B1 (ko) 2012-03-13
US20050112501A1 (en) 2005-05-26
CN1629727A (zh) 2005-06-22
JP4351519B2 (ja) 2009-10-28
KR20050050600A (ko) 2005-05-31

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