TWI254149B - Photosensitive composition and color filter - Google Patents
Photosensitive composition and color filter Download PDFInfo
- Publication number
- TWI254149B TWI254149B TW093136235A TW93136235A TWI254149B TW I254149 B TWI254149 B TW I254149B TW 093136235 A TW093136235 A TW 093136235A TW 93136235 A TW93136235 A TW 93136235A TW I254149 B TWI254149 B TW I254149B
- Authority
- TW
- Taiwan
- Prior art keywords
- composition
- photosensitive
- group
- copolymer
- resin
- Prior art date
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- 239000011347 resin Substances 0.000 claims abstract description 97
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- 229920001225 polyester resin Polymers 0.000 description 1
- 239000004645 polyester resin Substances 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 239000009719 polyimide resin Substances 0.000 description 1
- 229920005862 polyol Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 229920005749 polyurethane resin Polymers 0.000 description 1
- 229920002689 polyvinyl acetate Polymers 0.000 description 1
- 239000011118 polyvinyl acetate Substances 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 239000001267 polyvinylpyrrolidone Substances 0.000 description 1
- 229920000036 polyvinylpyrrolidone Polymers 0.000 description 1
- 235000013855 polyvinylpyrrolidone Nutrition 0.000 description 1
- LYBIZMNPXTXVMV-UHFFFAOYSA-N propan-2-yl prop-2-enoate Chemical compound CC(C)OC(=O)C=C LYBIZMNPXTXVMV-UHFFFAOYSA-N 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 238000007348 radical reaction Methods 0.000 description 1
- 239000011541 reaction mixture Substances 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 239000004576 sand Substances 0.000 description 1
- DCKVNWZUADLDEH-UHFFFAOYSA-N sec-butyl acetate Chemical compound CCC(C)OC(C)=O DCKVNWZUADLDEH-UHFFFAOYSA-N 0.000 description 1
- UQDJGEHQDNVPGU-UHFFFAOYSA-N serine phosphoethanolamine Chemical compound [NH3+]CCOP([O-])(=O)OCC([NH3+])C([O-])=O UQDJGEHQDNVPGU-UHFFFAOYSA-N 0.000 description 1
- 229910000030 sodium bicarbonate Inorganic materials 0.000 description 1
- 235000017557 sodium bicarbonate Nutrition 0.000 description 1
- RYYKJJJTJZKILX-UHFFFAOYSA-M sodium octadecanoate Chemical compound [Na+].CCCCCCCCCCCCCCCCCC([O-])=O RYYKJJJTJZKILX-UHFFFAOYSA-M 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000008117 stearic acid Substances 0.000 description 1
- 210000002784 stomach Anatomy 0.000 description 1
- 150000003440 styrenes Chemical class 0.000 description 1
- BDHFUVZGWQCTTF-UHFFFAOYSA-M sulfonate Chemical compound [O-]S(=O)=O BDHFUVZGWQCTTF-UHFFFAOYSA-M 0.000 description 1
- 229920003002 synthetic resin Polymers 0.000 description 1
- 239000000057 synthetic resin Substances 0.000 description 1
- XONGDEOKKBSUIF-UHFFFAOYSA-N terephthalic acid;hydrobromide Chemical compound Br.OC(=O)C1=CC=C(C(O)=O)C=C1 XONGDEOKKBSUIF-UHFFFAOYSA-N 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- USFPINLPPFWTJW-UHFFFAOYSA-N tetraphenylphosphonium Chemical compound C1=CC=CC=C1[P+](C=1C=CC=CC=1)(C=1C=CC=CC=1)C1=CC=CC=C1 USFPINLPPFWTJW-UHFFFAOYSA-N 0.000 description 1
- 229920005992 thermoplastic resin Polymers 0.000 description 1
- LWRYDHOHXNQTSK-UHFFFAOYSA-N thiophene oxide Chemical compound O=S1C=CC=C1 LWRYDHOHXNQTSK-UHFFFAOYSA-N 0.000 description 1
- YRHRIQCWCFGUEQ-UHFFFAOYSA-N thioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC=CC=C3SC2=C1 YRHRIQCWCFGUEQ-UHFFFAOYSA-N 0.000 description 1
- 230000036962 time dependent Effects 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 229910000349 titanium oxysulfate Inorganic materials 0.000 description 1
- 229920006352 transparent thermoplastic Polymers 0.000 description 1
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 1
- 150000003648 triterpenes Chemical class 0.000 description 1
- HGBOYTHUEUWSSQ-UHFFFAOYSA-N valeric aldehyde Natural products CCCCC=O HGBOYTHUEUWSSQ-UHFFFAOYSA-N 0.000 description 1
- 229960000834 vinyl ether Drugs 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- NDKWCCLKSWNDBG-UHFFFAOYSA-N zinc;dioxido(dioxo)chromium Chemical compound [Zn+2].[O-][Cr]([O-])(=O)=O NDKWCCLKSWNDBG-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Chemical & Material Sciences (AREA)
- Nonlinear Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Optics & Photonics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Mathematical Physics (AREA)
- Materials For Photolithography (AREA)
- Optical Filters (AREA)
- Liquid Crystal (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2003395151A JP4351519B2 (ja) | 2003-11-26 | 2003-11-26 | 感光性組成物およびカラーフィルタ |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW200532252A TW200532252A (en) | 2005-10-01 |
| TWI254149B true TWI254149B (en) | 2006-05-01 |
Family
ID=34587594
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW093136235A TWI254149B (en) | 2003-11-26 | 2004-11-25 | Photosensitive composition and color filter |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US7220534B2 (https=) |
| JP (1) | JP4351519B2 (https=) |
| KR (1) | KR101110048B1 (https=) |
| CN (1) | CN100337160C (https=) |
| TW (1) | TWI254149B (https=) |
Families Citing this family (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4378163B2 (ja) * | 2003-12-16 | 2009-12-02 | 東洋インキ製造株式会社 | カラーフィルタ用青色着色組成物およびカラーフィルタ |
| KR101342521B1 (ko) * | 2005-07-26 | 2013-12-17 | 주식회사 동진쎄미켐 | 감광성 수지 조성물 |
| TWI394001B (zh) * | 2005-07-27 | 2013-04-21 | Jsr Corp | Side-chain unsaturated polymers, radiation-sensitive resin compositions, and spacers for liquid crystal display elements |
| JP4862998B2 (ja) * | 2005-07-27 | 2012-01-25 | Jsr株式会社 | 側鎖不飽和重合体、感放射線性樹脂組成物および液晶表示素子用スペーサー |
| TWI388581B (zh) * | 2005-08-25 | 2013-03-11 | Jsr Corp | Side-chain unsaturated polymers, radiation-sensitive resin compositions, and spacers for liquid crystal display elements |
| TWI364560B (en) * | 2006-01-13 | 2012-05-21 | Toyo Ink Mfg Co | Colored composition for color filters, color filter and liquid crystal display device |
| CN101067668B (zh) * | 2006-05-02 | 2011-06-15 | 富士胶片株式会社 | 滤色器的制造方法、滤色器及显示装置 |
| DE102006038714A1 (de) * | 2006-08-18 | 2008-02-21 | Evonik Röhm Gmbh | Medienbeständige Lackharze |
| JP5344790B2 (ja) | 2006-12-28 | 2013-11-20 | 富士フイルム株式会社 | 硬化性組成物、カラーフィルタ及びその製造方法 |
| JP4826803B2 (ja) * | 2007-03-20 | 2011-11-30 | Jsr株式会社 | 感放射線性樹脂組成物および液晶表示素子用スペーサーとその製造法 |
| CN101668714A (zh) * | 2007-04-09 | 2010-03-10 | Lg化学株式会社 | 多层光致变色板和由其制得的光致变色玻璃 |
| TWI403838B (zh) * | 2007-04-11 | 2013-08-01 | Lg Chemical Ltd | 包含由做為鹼溶性樹脂之大分子單體所製備之聚合物之光感樹脂組成物 |
| JP5498724B2 (ja) * | 2009-05-15 | 2014-05-21 | 凸版印刷株式会社 | カラーフィルタ、及び液晶表示装置 |
| KR101453771B1 (ko) * | 2010-11-08 | 2014-10-23 | 제일모직 주식회사 | 컬러필터용 감광성 수지 조성물 및 이를 이용한 컬러필터 |
| KR101443757B1 (ko) * | 2010-11-08 | 2014-09-25 | 제일모직 주식회사 | 컬러필터용 감광성 수지 조성물 및 이를 이용한 컬러필터 |
| KR101690814B1 (ko) | 2012-05-31 | 2017-01-10 | 주식회사 엘지화학 | 감광성 수지 조성물, 상기 감광성 수지 조성물로 제조된 감광재, 이를 포함하는 컬러필터 및 이를 포함하는 디스플레이 장치 |
| JP6106638B2 (ja) * | 2013-08-05 | 2017-04-05 | 富士フイルム株式会社 | 着色感光性樹脂組成物、硬化膜、カラーフィルタ、カラーフィルタの製造方法、固体撮像素子および画像表示装置 |
| JP6106639B2 (ja) * | 2013-08-05 | 2017-04-05 | 富士フイルム株式会社 | 着色感光性樹脂組成物、硬化膜、カラーフィルタ、カラーフィルタの製造方法、固体撮像素子および画像表示装置 |
| CN111694218B (zh) * | 2014-05-21 | 2023-09-08 | 旭化成株式会社 | 感光性树脂组合物以及电路图案的形成方法 |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5971048A (ja) * | 1982-10-18 | 1984-04-21 | Mitsubishi Chem Ind Ltd | 光重合系感光性組成物 |
| JPH0822030B2 (ja) | 1985-07-10 | 1996-03-04 | 旭精密株式会社 | テレビカメラ用レンズの自動絞り制御装置 |
| JP3218256B2 (ja) * | 1993-01-29 | 2001-10-15 | 東洋インキ製造株式会社 | アルカリ現像型感光性着色組成物 |
| JP3329877B2 (ja) * | 1993-03-02 | 2002-09-30 | 互応化学工業株式会社 | プリント回路基板製造用レジストインク組成物、それを用いたレジスト膜及びプリント回路基板 |
| JP3503460B2 (ja) * | 1997-02-26 | 2004-03-08 | 凸版印刷株式会社 | 感光性組成物、感光性着色組成物及びその感光性着色組成物を用いたカラーフィルタ |
| KR100334426B1 (ko) * | 1998-07-31 | 2002-05-03 | 기타지마 요시토시 | 감광성 수지 조성물 및 컬러 필터 |
| JP2000298339A (ja) | 1999-04-14 | 2000-10-24 | Dainippon Printing Co Ltd | 感光性樹脂組成物 |
| JP2002014468A (ja) | 2000-06-28 | 2002-01-18 | Mitsubishi Chemicals Corp | 光重合性組成物、光重合性着色組成物およびカラーフィルター |
| JP2002303975A (ja) | 2000-12-05 | 2002-10-18 | Nippon Shokubai Co Ltd | 感光性樹脂組成物およびその用途 |
-
2003
- 2003-11-26 JP JP2003395151A patent/JP4351519B2/ja not_active Expired - Fee Related
-
2004
- 2004-11-24 US US10/995,376 patent/US7220534B2/en not_active Expired - Fee Related
- 2004-11-25 TW TW093136235A patent/TWI254149B/zh not_active IP Right Cessation
- 2004-11-25 KR KR1020040097573A patent/KR101110048B1/ko not_active Expired - Lifetime
- 2004-11-26 CN CNB2004100471928A patent/CN100337160C/zh not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| US7220534B2 (en) | 2007-05-22 |
| CN100337160C (zh) | 2007-09-12 |
| TW200532252A (en) | 2005-10-01 |
| JP2005156930A (ja) | 2005-06-16 |
| KR101110048B1 (ko) | 2012-03-13 |
| US20050112501A1 (en) | 2005-05-26 |
| CN1629727A (zh) | 2005-06-22 |
| JP4351519B2 (ja) | 2009-10-28 |
| KR20050050600A (ko) | 2005-05-31 |
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| MK4A | Expiration of patent term of an invention patent |