CH680449A5 - - Google Patents
Download PDFInfo
- Publication number
- CH680449A5 CH680449A5 CH609/90A CH60990A CH680449A5 CH 680449 A5 CH680449 A5 CH 680449A5 CH 609/90 A CH609/90 A CH 609/90A CH 60990 A CH60990 A CH 60990A CH 680449 A5 CH680449 A5 CH 680449A5
- Authority
- CH
- Switzerland
- Prior art keywords
- nickel
- present
- composition
- saccharin
- composition according
- Prior art date
Links
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 66
- 229910052759 nickel Inorganic materials 0.000 claims description 33
- 239000000203 mixture Substances 0.000 claims description 26
- 238000006243 chemical reaction Methods 0.000 claims description 24
- 238000007747 plating Methods 0.000 claims description 21
- CVHZOJJKTDOEJC-UHFFFAOYSA-N saccharin Chemical compound C1=CC=C2C(=O)NS(=O)(=O)C2=C1 CVHZOJJKTDOEJC-UHFFFAOYSA-N 0.000 claims description 17
- 229940081974 saccharin Drugs 0.000 claims description 15
- 235000019204 saccharin Nutrition 0.000 claims description 15
- 239000000901 saccharin and its Na,K and Ca salt Substances 0.000 claims description 15
- 238000000576 coating method Methods 0.000 claims description 10
- 238000000034 method Methods 0.000 claims description 10
- 239000011248 coating agent Substances 0.000 claims description 8
- 239000008139 complexing agent Substances 0.000 claims description 7
- 239000000872 buffer Substances 0.000 claims description 6
- 239000003638 chemical reducing agent Substances 0.000 claims description 6
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 claims description 5
- -1 nitrate ions Chemical class 0.000 claims description 5
- 239000011593 sulfur Substances 0.000 claims description 5
- 229910052717 sulfur Inorganic materials 0.000 claims description 5
- VEQPNABPJHWNSG-UHFFFAOYSA-N Nickel(2+) Chemical compound [Ni+2] VEQPNABPJHWNSG-UHFFFAOYSA-N 0.000 claims description 4
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 claims description 4
- 239000011651 chromium Substances 0.000 claims description 4
- 229910001453 nickel ion Inorganic materials 0.000 claims description 4
- 239000011574 phosphorus Substances 0.000 claims description 4
- 229910052698 phosphorus Inorganic materials 0.000 claims description 4
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 3
- 229910002651 NO3 Inorganic materials 0.000 claims description 3
- 229910052804 chromium Inorganic materials 0.000 claims description 3
- 239000000758 substrate Substances 0.000 claims description 3
- JVTAAEKCZFNVCJ-UHFFFAOYSA-N lactic acid Chemical compound CC(O)C(O)=O JVTAAEKCZFNVCJ-UHFFFAOYSA-N 0.000 description 10
- 229910052751 metal Inorganic materials 0.000 description 7
- 239000002184 metal Substances 0.000 description 7
- 229910000831 Steel Inorganic materials 0.000 description 6
- 239000010959 steel Substances 0.000 description 6
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 5
- 239000004310 lactic acid Substances 0.000 description 5
- 235000014655 lactic acid Nutrition 0.000 description 5
- 238000007772 electroless plating Methods 0.000 description 4
- 239000003381 stabilizer Substances 0.000 description 4
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 3
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 3
- 150000001875 compounds Chemical group 0.000 description 3
- 229910021645 metal ion Inorganic materials 0.000 description 3
- 235000011007 phosphoric acid Nutrition 0.000 description 3
- 150000003839 salts Chemical class 0.000 description 3
- 239000011734 sodium Substances 0.000 description 3
- AEMRFAOFKBGASW-UHFFFAOYSA-N Glycolic acid Chemical compound OCC(O)=O AEMRFAOFKBGASW-UHFFFAOYSA-N 0.000 description 2
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 2
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 2
- 229910001430 chromium ion Inorganic materials 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 229940046892 lead acetate Drugs 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- LGQLOGILCSXPEA-UHFFFAOYSA-L nickel sulfate Chemical compound [Ni+2].[O-]S([O-])(=O)=O LGQLOGILCSXPEA-UHFFFAOYSA-L 0.000 description 2
- 229910000363 nickel(II) sulfate Inorganic materials 0.000 description 2
- 229910017604 nitric acid Inorganic materials 0.000 description 2
- 150000007524 organic acids Chemical class 0.000 description 2
- 235000005985 organic acids Nutrition 0.000 description 2
- OFNHPGDEEMZPFG-UHFFFAOYSA-N phosphanylidynenickel Chemical compound [P].[Ni] OFNHPGDEEMZPFG-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 2
- ACVYVLVWPXVTIT-UHFFFAOYSA-M phosphinate Chemical compound [O-][PH2]=O ACVYVLVWPXVTIT-UHFFFAOYSA-M 0.000 description 2
- 239000002244 precipitate Substances 0.000 description 2
- 238000001556 precipitation Methods 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- BJEPYKJPYRNKOW-REOHCLBHSA-N (S)-malic acid Chemical compound OC(=O)[C@@H](O)CC(O)=O BJEPYKJPYRNKOW-REOHCLBHSA-N 0.000 description 1
- MQLJIOAPXLAGAP-UHFFFAOYSA-N 3-[amino(azaniumylidene)methyl]sulfanylpropane-1-sulfonate Chemical compound NC(=N)SCCCS(O)(=O)=O MQLJIOAPXLAGAP-UHFFFAOYSA-N 0.000 description 1
- KWSLGOVYXMQPPX-UHFFFAOYSA-N 5-[3-(trifluoromethyl)phenyl]-2h-tetrazole Chemical group FC(F)(F)C1=CC=CC(C2=NNN=N2)=C1 KWSLGOVYXMQPPX-UHFFFAOYSA-N 0.000 description 1
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 1
- JVTAAEKCZFNVCJ-UHFFFAOYSA-M Lactate Chemical compound CC(O)C([O-])=O JVTAAEKCZFNVCJ-UHFFFAOYSA-M 0.000 description 1
- 229910000990 Ni alloy Inorganic materials 0.000 description 1
- 229910001096 P alloy Inorganic materials 0.000 description 1
- VMHLLURERBWHNL-UHFFFAOYSA-M Sodium acetate Chemical compound [Na+].CC([O-])=O VMHLLURERBWHNL-UHFFFAOYSA-M 0.000 description 1
- KDYFGRWQOYBRFD-UHFFFAOYSA-N Succinic acid Natural products OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 1
- PHJJWPXKTFKKPD-UHFFFAOYSA-N [Ni+3].[O-]P([O-])[O-] Chemical compound [Ni+3].[O-]P([O-])[O-] PHJJWPXKTFKKPD-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- BJEPYKJPYRNKOW-UHFFFAOYSA-N alpha-hydroxysuccinic acid Natural products OC(=O)C(O)CC(O)=O BJEPYKJPYRNKOW-UHFFFAOYSA-N 0.000 description 1
- KDYFGRWQOYBRFD-NUQCWPJISA-N butanedioic acid Chemical compound O[14C](=O)CC[14C](O)=O KDYFGRWQOYBRFD-NUQCWPJISA-N 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- IKZBVTPSNGOVRJ-UHFFFAOYSA-K chromium(iii) phosphate Chemical class [Cr+3].[O-]P([O-])([O-])=O IKZBVTPSNGOVRJ-UHFFFAOYSA-K 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 238000009472 formulation Methods 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 239000001630 malic acid Substances 0.000 description 1
- 235000011090 malic acid Nutrition 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 150000002815 nickel Chemical class 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 230000002028 premature Effects 0.000 description 1
- KCXFHTAICRTXLI-UHFFFAOYSA-N propane-1-sulfonic acid Chemical compound CCCS(O)(=O)=O KCXFHTAICRTXLI-UHFFFAOYSA-N 0.000 description 1
- 239000001632 sodium acetate Substances 0.000 description 1
- 235000017281 sodium acetate Nutrition 0.000 description 1
- 229910001379 sodium hypophosphite Inorganic materials 0.000 description 1
- 239000011550 stock solution Substances 0.000 description 1
- 125000000446 sulfanediyl group Chemical group *S* 0.000 description 1
- 229910021653 sulphate ion Inorganic materials 0.000 description 1
- 235000011149 sulphuric acid Nutrition 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/31—Coating with metals
- C23C18/32—Coating with nickel, cobalt or mixtures thereof with phosphorus or boron
- C23C18/34—Coating with nickel, cobalt or mixtures thereof with phosphorus or boron using reducing agents
- C23C18/36—Coating with nickel, cobalt or mixtures thereof with phosphorus or boron using reducing agents using hypophosphites
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemically Coating (AREA)
- Electroplating And Plating Baths Therefor (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GB8904435A GB2231063A (en) | 1989-02-27 | 1989-02-27 | Electroless plating composition containing saccharin |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CH680449A5 true CH680449A5 (ja) | 1992-08-31 |
Family
ID=10652386
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CH609/90A CH680449A5 (ja) | 1989-02-27 | 1990-02-27 |
Country Status (8)
| Country | Link |
|---|---|
| JP (1) | JPH0317277A (ja) |
| BE (1) | BE1003583A5 (ja) |
| CH (1) | CH680449A5 (ja) |
| DE (1) | DE4005088A1 (ja) |
| ES (1) | ES2021949A6 (ja) |
| GB (1) | GB2231063A (ja) |
| IT (1) | IT1240776B (ja) |
| NL (1) | NL9000308A (ja) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE10246453A1 (de) * | 2002-10-04 | 2004-04-15 | Enthone Inc., West Haven | Verfahren zur stromlosen Abscheidung von Nickel |
| JP4705776B2 (ja) * | 2004-12-17 | 2011-06-22 | 日本カニゼン株式会社 | リン酸塩被膜を有する無電解ニッケルめっき膜の形成方法およびその形成膜 |
| EP2449148B1 (en) | 2009-07-03 | 2019-01-02 | MacDermid Enthone Inc. | Beta-amino acid comprising electrolyte and method for the deposition of a metal layer |
| CN111850534B (zh) * | 2020-06-16 | 2022-03-01 | 中国石油天然气集团有限公司 | 一种马氏体不锈钢油管低应力预钝化膜及其制备方法 |
Family Cites Families (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3088846A (en) * | 1962-01-24 | 1963-05-07 | Gen Am Transport | Processes of treating nickel-phosphorus alloy coatings and the resulting modified coatings |
| US3215700A (en) * | 1964-02-03 | 1965-11-02 | Harshaw Chem Corp | Certain 2-(hydroxyalkynyl)-substituted saccharins |
| US3586524A (en) * | 1969-07-10 | 1971-06-22 | Shell Oil Co | Consolidation of formations by electroless metal plating process |
| DE2111136A1 (de) * | 1971-03-09 | 1972-09-28 | Kalle Ag | Verfahren zur Herstellung von metallisierten Formkoerpern aus makromolekularem Material |
| JPS5437088B2 (ja) * | 1972-02-18 | 1979-11-13 | ||
| CA1016488A (en) * | 1974-04-01 | 1977-08-30 | Oxy Metal Industries Corporation | Electrodeposition of bright nickel-iron deposits |
| GB1553503A (en) * | 1976-05-14 | 1979-09-26 | Oxy Metal Industries Corp | Electrodeposition of bright nickel-iron deposits |
| US4179343A (en) * | 1979-02-12 | 1979-12-18 | Oxy Metal Industries Corporation | Electroplating bath and process for producing bright, high-leveling nickel iron electrodeposits |
| NL8201849A (nl) * | 1982-05-06 | 1983-12-01 | Philips Nv | Voorwerp met een laag van een nikkel-fosfor-legering en met een conversielaag bedekt. |
| JPS6075583A (ja) * | 1983-09-29 | 1985-04-27 | Komatsu Ltd | 超砥粒の無電解めつき法 |
| JPS60248882A (ja) * | 1984-05-24 | 1985-12-09 | Aisin Seiki Co Ltd | 高リン含有ニツケル合金の無電解めつき浴 |
| CA1274754A (en) * | 1985-09-06 | 1990-10-02 | Gary A. Reghi | Passivation process and composition for zinc-aluminum alloys |
-
1989
- 1989-02-27 GB GB8904435A patent/GB2231063A/en not_active Withdrawn
-
1990
- 1990-02-09 NL NL9000308A patent/NL9000308A/nl not_active Application Discontinuation
- 1990-02-17 DE DE4005088A patent/DE4005088A1/de active Granted
- 1990-02-21 ES ES9000522A patent/ES2021949A6/es not_active Expired - Lifetime
- 1990-02-23 BE BE9000202A patent/BE1003583A5/fr not_active IP Right Cessation
- 1990-02-23 IT IT47670A patent/IT1240776B/it active IP Right Grant
- 1990-02-27 CH CH609/90A patent/CH680449A5/de not_active IP Right Cessation
- 1990-02-27 JP JP2047102A patent/JPH0317277A/ja active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| IT9047670A1 (it) | 1990-08-28 |
| DE4005088A1 (de) | 1990-08-30 |
| GB8904435D0 (en) | 1989-04-12 |
| NL9000308A (nl) | 1990-09-17 |
| ES2021949A6 (es) | 1991-11-16 |
| GB2231063A (en) | 1990-11-07 |
| IT1240776B (it) | 1993-12-17 |
| BE1003583A5 (fr) | 1992-04-28 |
| IT9047670A0 (it) | 1990-02-23 |
| JPH0317277A (ja) | 1991-01-25 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| EP1413646B2 (de) | Verfahren zur stromlosen Abscheidung von Metallen | |
| DE2845439C2 (de) | Bad zur galvanischen Abscheidung von Überzügen aus Zinn oder Zinnlegierungen | |
| DE2921900A1 (de) | Galvanisierbad und verfahren zur galvanischen beschichtung mit schwarzem chrom | |
| DE2522939A1 (de) | Nickel enthaltende polymetallische nickellegierungen und hierfuer geeignete plattierungsbaeder | |
| EP0037535B1 (de) | Galvanisches Bad zur Abscheidung von Gold- und Goldlegierungsüberzügen | |
| DE1017000B (de) | Bad und Verfahren fuer die elektrolytische Abscheidung von Kupferueberzuegen | |
| DE959242C (de) | Bad zur galvanischen Abscheidung von Antimon oder Antimonlegierungen | |
| DE2114119A1 (de) | Verfahren zur elektrolytischen Abscheidung von Ruthenium und Elektrolysebad zur Durchfuehrung dieses Verfahrens | |
| DE3400670A1 (de) | Waessriges goldsulfit enthaltendes galvanisches bad und verfahren zur galvanischen abscheidung von gold unter verwendung dieses bades | |
| AT510422B1 (de) | Verfahren zur abscheidung von hartchrom aus cr(vi)- freien elektrolyten | |
| CH680449A5 (ja) | ||
| DE3122390A1 (de) | "waessriges galvanisches bad und verfahren zur abscheidung einer eine chromauflage vortaeuschenden kobalt-zink-legierung" | |
| DE1621060B2 (de) | Waessriges bad zur galvanischen abscheidung von schwarzchromueberzuegen | |
| DE2249037A1 (de) | Verfahren zum plattieren von kupfer auf aluminium | |
| DE2829979C2 (de) | Wässriges Bad zur galvanischen Abscheidung von Gold-Kupfer-Cadmium-Legierungen | |
| DE1521080A1 (de) | Verfahren zur Aufbringung von metallischen Oberflaechenschichten auf Werkstuecke aus Titan | |
| DE2948999C2 (de) | Wässriges, saures Bad zur galvanischen Abscheidung von Gold und Verfahren zur galvanischen Abscheidung von Hartgold unter seiner Verwendung | |
| DE2131815A1 (de) | Elektrolytische Vergoldungsloesungen und Verfahren zu ihrer Verwendung | |
| DE2236493C3 (de) | Verfahren zum galvanischen Abscheiden glänzender Goldüberzüge mit hohem Goldgehalt | |
| DE2635560A1 (de) | Alkalische baeder zur elektrolytischen abscheidung von metallen und verfahren zu ihrer verwendung | |
| CH680003A5 (ja) | ||
| DE3705949A1 (de) | Waessriges saures bad und verfahren zur galvanischen abscheidung von zinklegierungen | |
| DE1796217C2 (de) | Zyanidfreies, Natriumzinkat enthaltendes Glanzzinkbad | |
| DE2122455C3 (de) | Wäßrige Lösung für die stromlose Ablagerung einer Nickel-Kupfer-Phosphor-Legierung mit höchstens 25 Gew.% Kupfer | |
| AT238529B (de) | Wässerige, nickelbeschleunigte Phosphatüberzugslösung |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PL | Patent ceased |