CH653708A5 - Process and device for applying strongly adhesive layers to large-area substrates by means of ionised gases and/or vapours - Google Patents

Process and device for applying strongly adhesive layers to large-area substrates by means of ionised gases and/or vapours Download PDF

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Publication number
CH653708A5
CH653708A5 CH737480A CH737480A CH653708A5 CH 653708 A5 CH653708 A5 CH 653708A5 CH 737480 A CH737480 A CH 737480A CH 737480 A CH737480 A CH 737480A CH 653708 A5 CH653708 A5 CH 653708A5
Authority
CH
Switzerland
Prior art keywords
hot cathode
anode
reflector electrodes
substrates
substrate
Prior art date
Application number
CH737480A
Other languages
German (de)
English (en)
Inventor
Helmut Bollinger
Bernd Buecken
Ruediger Wilberg
Original Assignee
Hochvakuum Dresden Veb
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hochvakuum Dresden Veb filed Critical Hochvakuum Dresden Veb
Publication of CH653708A5 publication Critical patent/CH653708A5/de

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/26—Deposition of carbon only
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/503—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using dc or ac discharges

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Inorganic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Physical Vapour Deposition (AREA)
CH737480A 1979-10-02 1980-10-02 Process and device for applying strongly adhesive layers to large-area substrates by means of ionised gases and/or vapours CH653708A5 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DD21595179A DD146307A1 (de) 1979-10-02 1979-10-02 Einrichtung zur grossflaechigen haftfesten abscheidung,insbesondere von kohlenstoffschichten

Publications (1)

Publication Number Publication Date
CH653708A5 true CH653708A5 (en) 1986-01-15

Family

ID=5520396

Family Applications (1)

Application Number Title Priority Date Filing Date
CH737480A CH653708A5 (en) 1979-10-02 1980-10-02 Process and device for applying strongly adhesive layers to large-area substrates by means of ionised gases and/or vapours

Country Status (4)

Country Link
JP (1) JPS5941509B2 (pt)
CH (1) CH653708A5 (pt)
DD (1) DD146307A1 (pt)
DE (1) DE3030454C2 (pt)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4504519A (en) * 1981-10-21 1985-03-12 Rca Corporation Diamond-like film and process for producing same
DE3246361A1 (de) * 1982-02-27 1983-09-08 Philips Patentverwaltung Gmbh, 2000 Hamburg Kohlenstoff enthaltende gleitschicht
US6795929B2 (en) 1990-03-23 2004-09-21 Matsushita Electric Industrial Co., Ltd. Data processing apparatus
JPH0560537U (ja) * 1992-01-22 1993-08-10 弘 小川 厨房用塵芥処理装置
JP4080503B2 (ja) 2005-10-03 2008-04-23 中部日本マルコ株式会社 非接触コネクタ

Also Published As

Publication number Publication date
DD146307A1 (de) 1981-02-04
DE3030454A1 (de) 1981-04-16
JPS5941509B2 (ja) 1984-10-08
JPS56102576A (en) 1981-08-17
DE3030454C2 (de) 1987-04-02

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