DE69227313T2 - Verfahren und vorrichtung zur behandlung von bauteilen in einem gasentladungsplasma - Google Patents

Verfahren und vorrichtung zur behandlung von bauteilen in einem gasentladungsplasma

Info

Publication number
DE69227313T2
DE69227313T2 DE69227313T DE69227313T DE69227313T2 DE 69227313 T2 DE69227313 T2 DE 69227313T2 DE 69227313 T DE69227313 T DE 69227313T DE 69227313 T DE69227313 T DE 69227313T DE 69227313 T2 DE69227313 T2 DE 69227313T2
Authority
DE
Germany
Prior art keywords
gas discharge
discharge plasma
treating components
treating
components
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69227313T
Other languages
English (en)
Other versions
DE69227313D1 (de
Inventor
Leonid Pavlovich Sablev
Anatoly Afanasievich Andreev
Sergei Nikolaevich Grigoriev
Alexandr Sergeevich Metel
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Novatech-Instrument ltd Moskau/moscow Ru
Original Assignee
SCIENTIFIC-INDUSTRIAL ENTERPRISE NOVATECH MOSCOW RU
SCIENT IND ENTERPRISE NOVATECH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from SU4938768 external-priority patent/RU2010031C1/ru
Priority claimed from SU915002528A external-priority patent/RU1834911C/ru
Priority claimed from SU5002413 external-priority patent/RU2022056C1/ru
Priority claimed from SU5008181 external-priority patent/RU2003196C1/ru
Priority claimed from SU5008180 external-priority patent/RU2002333C1/ru
Priority claimed from SU5018360 external-priority patent/RU2071992C1/ru
Priority claimed from SU925024441A external-priority patent/RU1834912C/ru
Priority claimed from SU5024440 external-priority patent/RU2061092C1/ru
Priority claimed from SU5027759 external-priority patent/RU2037561C1/ru
Application filed by SCIENTIFIC-INDUSTRIAL ENTERPRISE NOVATECH MOSCOW RU, SCIENT IND ENTERPRISE NOVATECH filed Critical SCIENTIFIC-INDUSTRIAL ENTERPRISE NOVATECH MOSCOW RU
Priority claimed from PCT/RU1992/000088 external-priority patent/WO1992019785A1/ru
Publication of DE69227313D1 publication Critical patent/DE69227313D1/de
Publication of DE69227313T2 publication Critical patent/DE69227313T2/de
Application granted granted Critical
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32055—Arc discharge
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/02—Pretreatment of the material to be coated
    • C23C14/021—Cleaning or etching treatments
    • C23C14/022—Cleaning or etching treatments by means of bombardment with energetic particles or radiation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • C23C14/325—Electric arc evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C8/00—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
    • C23C8/06—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases
    • C23C8/36—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases using ionised gases, e.g. ionitriding
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H01J27/08—Ion sources; Ion guns using arc discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32623—Mechanical discharge control means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/06—Sources
    • H01J2237/08—Ion sources
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/32—Processing objects by plasma generation
    • H01J2237/33—Processing objects by plasma generation characterised by the type of processing
    • H01J2237/338—Changing chemical properties of treated surfaces
    • H01J2237/3387—Nitriding

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Combustion & Propulsion (AREA)
  • Physical Vapour Deposition (AREA)
  • Junction Field-Effect Transistors (AREA)
  • Solid-Phase Diffusion Into Metallic Material Surfaces (AREA)
DE69227313T 1991-04-29 1992-04-23 Verfahren und vorrichtung zur behandlung von bauteilen in einem gasentladungsplasma Expired - Fee Related DE69227313T2 (de)

Applications Claiming Priority (10)

Application Number Priority Date Filing Date Title
SU4938768 RU2010031C1 (ru) 1991-04-29 1991-04-29 Вакуумная печь
SU5002413 RU2022056C1 (ru) 1991-09-11 1991-09-11 Установка для нанесения покрытий
SU915002528A RU1834911C (ru) 1991-09-11 1991-09-11 Способ обработки изделий в установках вакуумно-плазменного нанесени покрытий
SU5008180 RU2002333C1 (ru) 1991-11-11 1991-11-11 Ионный источник
SU5008181 RU2003196C1 (ru) 1991-11-11 1991-11-11 Установка дл генерировани ионного пучка большого сечени
SU5018360 RU2071992C1 (ru) 1991-12-24 1991-12-24 Способ обработки изделий источником ионов
SU925024441A RU1834912C (ru) 1992-01-28 1992-01-28 Установка дл нанесени покрытий
SU5024440 RU2061092C1 (ru) 1992-01-28 1992-01-28 Установка для нанесения покрытий
SU5027759 RU2037561C1 (ru) 1992-02-18 1992-02-18 Устройство для упрочняющей поверхностной обработки
PCT/RU1992/000088 WO1992019785A1 (en) 1991-04-29 1992-04-23 Method and device for treatment of articles in gas-discharge plasma

Publications (2)

Publication Number Publication Date
DE69227313D1 DE69227313D1 (de) 1998-11-19
DE69227313T2 true DE69227313T2 (de) 1999-04-08

Family

ID=27577858

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69227313T Expired - Fee Related DE69227313T2 (de) 1991-04-29 1992-04-23 Verfahren und vorrichtung zur behandlung von bauteilen in einem gasentladungsplasma

Country Status (3)

Country Link
US (1) US5503725A (de)
EP (1) EP0583473B1 (de)
DE (1) DE69227313T2 (de)

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US5868878A (en) * 1993-08-27 1999-02-09 Hughes Electronics Corporation Heat treatment by plasma electron heating and solid/gas jet cooling
US5738768A (en) * 1995-10-31 1998-04-14 Caterpillar Inc. Process for reducing particle defects in arc vapor deposition coatings
FR2741361B3 (fr) * 1995-11-22 1998-04-17 Balzers Hochvakuum Procede pour traitement thermochimique de surface par immersion dans un plasma, installation pour ce procede, utilisations et pieces obtenues
RU2094896C1 (ru) 1996-03-25 1997-10-27 Научно-производственное предприятие "Новатех" Источник быстрых нейтральных молекул
US7014738B2 (en) 1997-10-24 2006-03-21 Filplas Vacuum Technology Pte Ltd. Enhanced macroparticle filter and cathode arc source
GB9722645D0 (en) * 1997-10-24 1997-12-24 Univ Nanyang Enhanced macroparticle filter and cathode arc source
WO1999029923A1 (en) * 1997-12-05 1999-06-17 Tegal Corporation Plasma reactor with a deposition shield
US7300559B2 (en) * 2000-04-10 2007-11-27 G & H Technologies Llc Filtered cathodic arc deposition method and apparatus
CA2305938C (en) * 2000-04-10 2007-07-03 Vladimir I. Gorokhovsky Filtered cathodic arc deposition method and apparatus
US6440219B1 (en) * 2000-06-07 2002-08-27 Simplus Systems Corporation Replaceable shielding apparatus
US6391164B1 (en) * 2000-06-23 2002-05-21 Isak I. Beilis Deposition of coatings and thin films using a vacuum arc with a non-consumable hot anode
US8241468B2 (en) 2004-12-13 2012-08-14 United Technologies Corporation Method and apparatus for cathodic arc deposition of materials on a substrate
IL170401A (en) * 2005-08-21 2012-03-29 Dialit Ltd Plasma emitter and method utilizing the same
EP1775353B1 (de) * 2005-09-15 2008-10-08 Applied Materials GmbH & Co. KG Beschichtungsanlage und Verfahren zum Betrieb einer Beschichtungsanlage
BRPI0622083A2 (pt) * 2006-10-27 2014-06-10 Oerlikon Trading Ag Método e aparelho destinados à fabricação de substratos purificados ou substratos puros que são adicionalmente processados.
KR101923221B1 (ko) 2007-12-07 2018-11-28 에바텍 아크티엔게젤샤프트 Ｈｉｐｉｍｓ를 이용한 반응성 스퍼터링
GB0816240D0 (en) * 2008-09-05 2008-10-15 Nordiko Technical Services Ltd Apparatus
PL2236641T3 (pl) 2009-03-30 2012-05-31 Oerlikon Trading Ag Sposób wstępnej obróbki podłoży w procesie PVD
CN102031493B (zh) * 2009-09-30 2013-08-21 鸿富锦精密工业（深圳）有限公司 镀膜装置
TW201134972A (en) * 2010-04-14 2011-10-16 Hon Hai Prec Ind Co Ltd Coating device
US10304665B2 (en) 2011-09-07 2019-05-28 Nano-Product Engineering, LLC Reactors for plasma-assisted processes and associated methods
US9761424B1 (en) 2011-09-07 2017-09-12 Nano-Product Engineering, LLC Filtered cathodic arc method, apparatus and applications thereof
US9793098B2 (en) 2012-09-14 2017-10-17 Vapor Technologies, Inc. Low pressure arc plasma immersion coating vapor deposition and ion treatment
US10056237B2 (en) 2012-09-14 2018-08-21 Vapor Technologies, Inc. Low pressure arc plasma immersion coating vapor deposition and ion treatment
US9412569B2 (en) 2012-09-14 2016-08-09 Vapor Technologies, Inc. Remote arc discharge plasma assisted processes
EP2829635B1 (de) 2013-07-23 2017-12-27 Semih Oncel Verfahren zur kontrollierten Herstellung von diffusionsbasierten Beschichtungen durch kathodische Vakuum-Lichtbogensysteme
US11834204B1 (en) 2018-04-05 2023-12-05 Nano-Product Engineering, LLC Sources for plasma assisted electric propulsion
CN111270209B (zh) * 2018-12-05 2023-12-12 东君新能源有限公司 一种蒸汽溅射装置及控制系统、控制方法
RU2716133C1 (ru) * 2018-12-24 2020-03-06 Федеральное государственное бюджетное образовательное учреждение высшего образования "Московский государственный технологический университет "СТАНКИН" (ФГБОУ ВО "МГТУ "СТАНКИН") Источник быстрых нейтральных молекул
DE102019122972A1 (de) * 2019-08-27 2021-03-04 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Vorrichtung und Verfahren zum Beschichten oder Modifizieren der Oberfläche eines Substrates innerhalb einer Vakuumkammer

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CH671407A5 (de) * 1986-06-13 1989-08-31 Balzers Hochvakuum
CH671238A5 (de) * 1986-11-06 1989-08-15 Vni Instrument Inst
DE58909180D1 (de) * 1988-03-23 1995-05-24 Balzers Hochvakuum Verfahren und Anlage zur Beschichtung von Werkstücken.
DE3829260A1 (de) * 1988-08-29 1990-03-01 Multi Arc Gmbh Plasmabeschichtungskammer mit entfernbarem schutzschirm
US4992153A (en) * 1989-04-26 1991-02-12 Balzers Aktiengesellschaft Sputter-CVD process for at least partially coating a workpiece
CH680369A5 (de) * 1989-11-22 1992-08-14 Balzers Hochvakuum
US5250779A (en) * 1990-11-05 1993-10-05 Balzers Aktiengesellschaft Method and apparatus for heating-up a substrate by means of a low voltage arc discharge and variable magnetic field
WO1992016959A1 (en) * 1991-03-25 1992-10-01 Commonwealth Scientific And Industrial Research Organisation Arc source macroparticle filter
WO1992021787A1 (en) * 1991-05-31 1992-12-10 Kharkovsky Fiziko-Tekhnichesky Institut Method and device for thermochemical treatment of articles
DE4125365C1 (de) * 1991-07-31 1992-05-21 Multi-Arc Oberflaechentechnik Gmbh, 5060 Bergisch Gladbach, De

Also Published As

Publication number Publication date
US5503725A (en) 1996-04-02
EP0583473A4 (en) 1995-11-29
DE69227313D1 (de) 1998-11-19
EP0583473B1 (de) 1998-10-14
EP0583473A1 (de) 1994-02-23

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: NOVATECH-INSTRUMENT,LTD., MOSKAU/MOSCOW, RU

8339 Ceased/non-payment of the annual fee