DE69226511D1 - Verfahren und Vorrichtung zur Belichtung von Substraten - Google Patents

Verfahren und Vorrichtung zur Belichtung von Substraten

Info

Publication number
DE69226511D1
DE69226511D1 DE69226511T DE69226511T DE69226511D1 DE 69226511 D1 DE69226511 D1 DE 69226511D1 DE 69226511 T DE69226511 T DE 69226511T DE 69226511 T DE69226511 T DE 69226511T DE 69226511 D1 DE69226511 D1 DE 69226511D1
Authority
DE
Germany
Prior art keywords
exposing substrates
exposing
substrates
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69226511T
Other languages
English (en)
Other versions
DE69226511T2 (de
Inventor
Torbjoern Erland Sandstroem
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Micronic Laser Systems AB
Original Assignee
Micronic Laser Systems AB
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Micronic Laser Systems AB filed Critical Micronic Laser Systems AB
Application granted granted Critical
Publication of DE69226511D1 publication Critical patent/DE69226511D1/de
Publication of DE69226511T2 publication Critical patent/DE69226511T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • H—ELECTRICITY
    • H04—ELECTRIC COMMUNICATION TECHNIQUE
    • H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
    • H04N1/00—Scanning, transmission or reproduction of documents or the like, e.g. facsimile transmission; Details thereof
    • H04N1/04—Scanning arrangements, i.e. arrangements for the displacement of active reading or reproducing elements relative to the original or reproducing medium, or vice versa
    • H04N1/10—Scanning arrangements, i.e. arrangements for the displacement of active reading or reproducing elements relative to the original or reproducing medium, or vice versa using flat picture-bearing surfaces
    • H04N1/1008—Scanning arrangements, i.e. arrangements for the displacement of active reading or reproducing elements relative to the original or reproducing medium, or vice versa using flat picture-bearing surfaces with sub-scanning by translatory movement of the picture-bearing surface
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
    • G03F7/2053—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a laser
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/0073—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces
    • H05K3/0082—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces characterised by the exposure method of radiation-sensitive masks
DE69226511T 1992-03-05 1992-03-05 Verfahren und Vorrichtung zur Belichtung von Substraten Expired - Lifetime DE69226511T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP92103778A EP0558781B1 (de) 1992-03-05 1992-03-05 Verfahren und Vorrichtung zur Belichtung von Substraten

Publications (2)

Publication Number Publication Date
DE69226511D1 true DE69226511D1 (de) 1998-09-10
DE69226511T2 DE69226511T2 (de) 1999-01-28

Family

ID=8209400

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69226511T Expired - Lifetime DE69226511T2 (de) 1992-03-05 1992-03-05 Verfahren und Vorrichtung zur Belichtung von Substraten

Country Status (5)

Country Link
US (1) US5495279A (de)
EP (1) EP0558781B1 (de)
JP (1) JP3574156B2 (de)
KR (1) KR100293479B1 (de)
DE (1) DE69226511T2 (de)

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US5764365A (en) * 1993-11-09 1998-06-09 Nova Measuring Instruments, Ltd. Two-dimensional beam deflector
IL107549A (en) * 1993-11-09 1996-01-31 Nova Measuring Instr Ltd Device for measuring the thickness of thin films
USRE38153E1 (en) * 1993-11-09 2003-06-24 Nova Measuring Instruments, Ltd. Two-dimensional beam deflector
JPH09106941A (ja) * 1995-10-11 1997-04-22 Nikon Corp 走査型露光装置及び露光方法
AU1975197A (en) * 1996-02-28 1997-10-01 Kenneth C. Johnson Microlens scanner for microlithography and wide-field confocal microscopy
US6031597A (en) * 1996-10-15 2000-02-29 Knirck; Jeffrey G. Method and apparatus for transfer of a reticle pattern onto a substrate by scanning
US6045431A (en) * 1997-12-23 2000-04-04 Speedfam Corporation Manufacture of thin-film magnetic heads
WO1999039999A1 (fr) * 1998-02-09 1999-08-12 Nikon Corporation Appareil de support d'une plaque de base, appareil et procede de transport de cette plaque, appareil de remplacement de cette plaque et appareil d'exposition et procede de fabrication dudit appareil
SE9800665D0 (sv) 1998-03-02 1998-03-02 Micronic Laser Systems Ab Improved method for projection printing using a micromirror SLM
IL123575A (en) * 1998-03-05 2001-08-26 Nova Measuring Instr Ltd Method and apparatus for alignment of a wafer
DE19829986C1 (de) 1998-07-04 2000-03-30 Lis Laser Imaging Systems Gmbh Verfahren zur Direktbelichtung von Leiterplattensubstraten
EP0973069A3 (de) 1998-07-14 2006-10-04 Nova Measuring Instruments Limited Kontrollgerät und photolithographisches Verfahren zur Behandlung von Substraten
US6212961B1 (en) 1999-02-11 2001-04-10 Nova Measuring Instruments Ltd. Buffer system for a wafer handling system
SE514835C2 (sv) * 1999-01-21 2001-04-30 Micronic Laser Systems Ab System och metod för mikrolitografiskt skrivande
ATE414933T1 (de) 1999-02-17 2008-12-15 Kodak Graphic Comm Gmbh Flachbettdruckplattenherstellungssystem
US6341029B1 (en) * 1999-04-27 2002-01-22 Gsi Lumonics, Inc. Method and apparatus for shaping a laser-beam intensity profile by dithering
SE522531C2 (sv) * 1999-11-24 2004-02-17 Micronic Laser Systems Ab Metod och anordning för märkning av halvledare
SE518170C2 (sv) * 2000-06-27 2002-09-03 Micronic Laser Systems Ab Flerstrålemönstergenerator och metod för skannande
US6593066B2 (en) * 2001-02-28 2003-07-15 Creo Il. Ltd. Method and apparatus for printing patterns on substrates
DE10297208T5 (de) * 2001-09-12 2005-01-05 Micronic Laser Systems Ab Verbessertes Verfahren und verbesserte Vorrichtung unter Verwendung eines SLM
US6897941B2 (en) 2001-11-07 2005-05-24 Applied Materials, Inc. Optical spot grid array printer
US6841787B2 (en) 2001-11-07 2005-01-11 Applied Materials, Inc. Maskless photon-electron spot-grid array printer
US6618185B2 (en) * 2001-11-28 2003-09-09 Micronic Laser Systems Ab Defective pixel compensation method
DE10160917A1 (de) * 2001-12-07 2003-06-26 Kleo Halbleitertechnik Gmbh Lithografiebelichtungseinrichtung
US7106490B2 (en) * 2001-12-14 2006-09-12 Micronic Laser Systems Ab Methods and systems for improved boundary contrast
SE0300453D0 (sv) * 2003-02-20 2003-02-20 Micronic Laser Systems Ab Pattern generation method
US7371287B2 (en) * 2003-05-29 2008-05-13 Perkinelmer, Inc. Substrate handling system
JP2008511144A (ja) * 2004-08-23 2008-04-10 マイクロニック レーザー システムズ アクチボラゲット 強化されたｃｄ線形性のための非コヒーレント結像システムのひとみ改善
KR101326133B1 (ko) * 2005-03-10 2013-11-06 삼성디스플레이 주식회사 평판 표시 장치 제조 시스템
DE102006008075A1 (de) * 2005-04-19 2006-10-26 Kleo Halbleitertechnik Gmbh & Co Kg Belichtungsanlage
US7436423B2 (en) 2005-05-23 2008-10-14 Matsushita Electric Industrial Co., Ltd. Apparatus and method of making a grayscale photo mask and an optical grayscale element
US7197828B2 (en) * 2005-05-31 2007-04-03 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method utilizing FPD chuck Z position measurement
JP2007025085A (ja) * 2005-07-14 2007-02-01 Nikon Corp 露光装置、光学素子アレー及びマルチスポットビームジェネレータ、並びにデバイス製造方法
US8122846B2 (en) 2005-10-26 2012-02-28 Micronic Mydata AB Platforms, apparatuses, systems and methods for processing and analyzing substrates
US20070182808A1 (en) * 2005-10-26 2007-08-09 Lars Stiblert Writing apparatuses and methods
DE102006008080A1 (de) 2006-02-22 2007-08-30 Kleo Maschinenbau Ag Belichtungsanlage
DE102007055530A1 (de) 2007-11-21 2009-05-28 Carl Zeiss Ag Laserstrahlbearbeitung
JP2010060990A (ja) * 2008-09-05 2010-03-18 Hitachi High-Technologies Corp 露光装置、露光方法、及び表示用パネル基板の製造方法
US20100078857A1 (en) * 2008-09-29 2010-04-01 Coherent, Inc. Diode-laser marker with one-axis scanning mirror mounted on a translatable carriage
US7952603B2 (en) * 2008-09-29 2011-05-31 Coherent, Inc. Diode-laser marker with one-axis scanning mirror mounted on a translatable carriage
JP2010197750A (ja) * 2009-02-25 2010-09-09 Hitachi High-Technologies Corp 露光装置、露光方法、及び表示用パネル基板の製造方法
JP5598936B2 (ja) * 2009-09-01 2014-10-01 マイクロニック アーベー パターン生成システム
US8539395B2 (en) 2010-03-05 2013-09-17 Micronic Laser Systems Ab Method and apparatus for merging multiple geometrical pixel images and generating a single modulator pixel image
WO2012076629A2 (en) * 2010-12-07 2012-06-14 Micronic Mydata AB Criss-cross writing strategy
JP5752970B2 (ja) * 2011-03-30 2015-07-22 株式会社Ｓｃｒｅｅｎホールディングス パターン描画装置、パターン描画方法
US8558859B2 (en) 2011-04-20 2013-10-15 Coherent, Inc. Laser printer with multiple laser-beam sources
DE102011081247A1 (de) * 2011-08-19 2013-02-21 Carl Zeiss Smt Gmbh Belichtungsanlage und Verfahren zur strukturierten Belichtung einer lichtempfindlichen Schicht
CN105143987B (zh) 2013-03-12 2017-10-20 麦克罗尼克迈达塔有限责任公司 机械制造的对准基准方法和对准系统
WO2014140047A2 (en) 2013-03-12 2014-09-18 Micronic Mydata AB Method and device for writing photomasks with reduced mura errors
FR3006068B1 (fr) * 2013-05-24 2015-04-24 Saint Gobain Procede d'obtention d'un substrat
CN104459858B (zh) * 2014-12-30 2017-02-22 中国科学院长春光学精密机械与物理研究所 一种双气浮导轨式光栅刻划刀架驱动装置
US9718291B2 (en) * 2015-10-16 2017-08-01 Oce-Technologies B.V. Printer carriage support structure
KR102495302B1 (ko) * 2022-10-21 2023-02-06 정성용 노광기용 렌즈 위치 조정 시스템

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US3861804A (en) * 1971-04-01 1975-01-21 Xerox Corp Inferometry readout of phase information
US3938191A (en) * 1974-08-21 1976-02-10 The Singer Company Rotary data base with air bearing
JPS5793907U (de) * 1980-11-26 1982-06-09
US4464030A (en) * 1982-03-26 1984-08-07 Rca Corporation Dynamic accuracy X-Y positioning table for use in a high precision light-spot writing system
DE3427611A1 (de) * 1984-07-26 1988-06-09 Bille Josef Laserstrahl-lithograph
US4764815A (en) * 1985-06-24 1988-08-16 Powers Chemco Array scanning system with movable platen
US5027132A (en) * 1988-03-25 1991-06-25 Texas Instruments Incorporated Position compensation of laser scan for stage movement
DE4031418A1 (de) * 1989-10-04 1991-04-18 Mitsubishi Paper Mills Ltd Abtastaufnahmevorrichtung und plattenherstellungsverfahren

Also Published As

Publication number Publication date
US5495279A (en) 1996-02-27
JPH06283398A (ja) 1994-10-07
EP0558781B1 (de) 1998-08-05
KR100293479B1 (ko) 2001-09-17
KR930021039A (ko) 1993-10-20
DE69226511T2 (de) 1999-01-28
JP3574156B2 (ja) 2004-10-06
EP0558781A1 (de) 1993-09-08

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Legal Events

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8328 Change in the person/name/address of the agent

Free format text: NOETH UND KOLLEGEN, 80336 MUENCHEN

8364 No opposition during term of opposition