CH626746A5 - - Google Patents
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- Publication number
- CH626746A5 CH626746A5 CH917678A CH917678A CH626746A5 CH 626746 A5 CH626746 A5 CH 626746A5 CH 917678 A CH917678 A CH 917678A CH 917678 A CH917678 A CH 917678A CH 626746 A5 CH626746 A5 CH 626746A5
- Authority
- CH
- Switzerland
- Prior art keywords
- substrate
- capillary
- film
- coated
- doping
- Prior art date
Links
- 239000000758 substrate Substances 0.000 claims description 62
- 238000000034 method Methods 0.000 claims description 29
- 238000000151 deposition Methods 0.000 claims description 24
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 20
- 229910002804 graphite Inorganic materials 0.000 claims description 19
- 239000010439 graphite Substances 0.000 claims description 19
- 229910052710 silicon Inorganic materials 0.000 claims description 16
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 15
- 229910021419 crystalline silicon Inorganic materials 0.000 claims description 15
- 239000010703 silicon Substances 0.000 claims description 15
- 230000008021 deposition Effects 0.000 claims description 14
- 239000000463 material Substances 0.000 claims description 12
- 239000000203 mixture Substances 0.000 claims description 12
- 239000002210 silicon-based material Substances 0.000 claims description 8
- 230000014759 maintenance of location Effects 0.000 claims description 6
- 230000008018 melting Effects 0.000 claims description 6
- 238000002844 melting Methods 0.000 claims description 6
- 238000010438 heat treatment Methods 0.000 claims description 5
- 239000013078 crystal Substances 0.000 claims description 3
- 239000010408 film Substances 0.000 description 18
- 239000010409 thin film Substances 0.000 description 7
- 238000006073 displacement reaction Methods 0.000 description 4
- 150000001875 compounds Chemical class 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 229910007991 Si-N Inorganic materials 0.000 description 2
- 229910006294 Si—N Inorganic materials 0.000 description 2
- 229910006367 Si—P Inorganic materials 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 238000010924 continuous production Methods 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 230000006698 induction Effects 0.000 description 1
- 239000012768 molten material Substances 0.000 description 1
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 229910052594 sapphire Inorganic materials 0.000 description 1
- 239000010980 sapphire Substances 0.000 description 1
- 229910052596 spinel Inorganic materials 0.000 description 1
- 239000011029 spinel Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 230000009897 systematic effect Effects 0.000 description 1
- 238000005019 vapor deposition process Methods 0.000 description 1
- 239000012808 vapor phase Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
- C30B15/007—Pulling on a substrate
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
- C30B15/06—Non-vertical pulling
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S117/00—Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
- Y10S117/914—Crystallization on a continuous moving substrate or cooling surface, e.g. wheel, cylinder, belt
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S438/00—Semiconductor device manufacturing: process
- Y10S438/914—Doping
- Y10S438/925—Fluid growth doping control, e.g. delta doping
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
- Ceramic Products (AREA)
- Photovoltaic Devices (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR7726402A FR2401696A1 (fr) | 1977-08-31 | 1977-08-31 | Methode de depot de silicium cristallin en films minces sur substrats graphites |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CH626746A5 true CH626746A5 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1981-11-30 |
Family
ID=9194902
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CH917678A CH626746A5 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1977-08-31 | 1978-08-31 |
Country Status (7)
Families Citing this family (26)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4525223A (en) * | 1978-09-19 | 1985-06-25 | Noboru Tsuya | Method of manufacturing a thin ribbon wafer of semiconductor material |
| DE2850790C2 (de) | 1978-11-23 | 1987-02-19 | Siemens AG, 1000 Berlin und 8000 München | Verfahren zum Herstellen von scheiben- oder bandförmigen Siliziumkristallen mit Kolumnarstruktur für Solarzellen |
| GB2059292A (en) * | 1979-09-28 | 1981-04-23 | Honeywell Inc | Growing silicon films on substrates |
| US4323419A (en) * | 1980-05-08 | 1982-04-06 | Atlantic Richfield Company | Method for ribbon solar cell fabrication |
| DE3019653A1 (de) * | 1980-05-22 | 1981-11-26 | SIEMENS AG AAAAA, 1000 Berlin und 8000 München | Verbesserung eines verfahres zur herstellung von platten-, band- oder folienfoermigen siliziumkristallkoerpern fuer solarzellen |
| DE3132776A1 (de) * | 1981-08-19 | 1983-03-03 | Heliotronic Gmbh | Verfahren zur herstellung grob- bis einkristalliner folien aus halbleitermaterial |
| FR2528454A1 (fr) * | 1982-06-11 | 1983-12-16 | Criceram | Creuset modifie pour la methode de cristallisation par goutte pendante |
| FR2529189B1 (fr) * | 1982-06-25 | 1985-08-09 | Comp Generale Electricite | Procede de fabrication d'une bande de silicium polycristallin pour photophiles |
| DE3231326A1 (de) * | 1982-08-23 | 1984-02-23 | Siemens AG, 1000 Berlin und 8000 München | Vorrichtung zum herstellen von grossflaechigen, bandfoermigen siliziumkoerpern fuer solarzellen |
| US4781565A (en) * | 1982-12-27 | 1988-11-01 | Sri International | Apparatus for obtaining silicon from fluosilicic acid |
| US4584181A (en) * | 1982-12-27 | 1986-04-22 | Sri International | Process and apparatus for obtaining silicon from fluosilicic acid |
| US4748014A (en) * | 1982-12-27 | 1988-05-31 | Sri International | Process and apparatus for obtaining silicon from fluosilicic acid |
| DE3306135A1 (de) * | 1983-02-22 | 1984-08-23 | Siemens AG, 1000 Berlin und 8000 München | Verfahren und vorrichtung zum herstellen von polykirstallinen, grossflaechigen siliziumkristallkoerpern fuer solarzellen |
| DE3404818A1 (de) * | 1984-02-10 | 1985-08-14 | Siemens AG, 1000 Berlin und 8000 München | Vorrichtung zum erzeugen eines pn- ueberganges in einem nach dem durchlaufverfahren hergestellten siliziumband |
| DE3419137A1 (de) * | 1984-05-23 | 1985-11-28 | Bayer Ag, 5090 Leverkusen | Verfahren und vorrichtung zur herstellung von halbleiterfolien |
| EP0278131B1 (en) * | 1987-02-06 | 1991-07-17 | The BOC Group plc | A method for the preparation of a thin semiconductor film |
| WO1988005835A1 (en) * | 1987-02-06 | 1988-08-11 | The Boc Group Plc | A method for the preparation of a thin semiconductor film |
| US5075257A (en) * | 1990-11-09 | 1991-12-24 | The Board Of Trustees Of The University Of Arkansas | Aerosol deposition and film formation of silicon |
| US5688324A (en) * | 1994-07-15 | 1997-11-18 | Dainippon Screen Mfg. Co., Ltd. | Apparatus for coating substrate |
| JP3875314B2 (ja) | 1996-07-29 | 2007-01-31 | 日本碍子株式会社 | シリコン結晶プレートの育成方法、シリコン結晶プレートの育成装置、シリコン結晶プレートおよび太陽電池素子の製造方法 |
| US7691199B2 (en) * | 2004-06-18 | 2010-04-06 | Memc Electronic Materials, Inc. | Melter assembly and method for charging a crystal forming apparatus with molten source material |
| US7344594B2 (en) * | 2004-06-18 | 2008-03-18 | Memc Electronic Materials, Inc. | Melter assembly and method for charging a crystal forming apparatus with molten source material |
| US7465351B2 (en) * | 2004-06-18 | 2008-12-16 | Memc Electronic Materials, Inc. | Melter assembly and method for charging a crystal forming apparatus with molten source material |
| RU2365684C1 (ru) * | 2008-03-26 | 2009-08-27 | Учреждение Российской академии наук Институт физики твердого тела РАН | Устройство для выращивания слоев кремния на углеродной подложке |
| US20110303290A1 (en) * | 2010-06-14 | 2011-12-15 | Korea Institute Of Energy Research | Method and apparatus for manufacturing silicon substrate with excellent surface quality using inert gas blowing |
| WO2014117840A1 (en) * | 2013-01-31 | 2014-08-07 | European Space Agency | Method of and system for producing an elongated alloy component having controlled longitudinal composition variation; corresponding elongated alloy component |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL270516A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * | 1960-11-30 | |||
| NL7004876A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * | 1970-04-04 | 1971-10-06 | ||
| IT1055104B (it) * | 1975-02-07 | 1981-12-21 | Philips Nv | Metodo di fabbricazione di dispositivi semiconduttori comportante la formazione di uno strato di materiale semiconduuttore su di un substrato apparato per l'attuazione di tale metodo e dispositivo semiconduttore fabbricato con l'ausilio di detto metodo |
| US4119744A (en) * | 1975-02-07 | 1978-10-10 | U.S. Philips Corporation | Method of manufacturing semiconductor devices in which a layer of semiconductor material is provided on a substrate |
| US3961997A (en) * | 1975-05-12 | 1976-06-08 | The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration | Fabrication of polycrystalline solar cells on low-cost substrates |
| FR2321326A1 (fr) | 1975-08-08 | 1977-03-18 | Ugine Kuhlmann | Procede de fabrication en continu de monocristaux preformes |
| US4124411A (en) * | 1976-09-02 | 1978-11-07 | U.S. Philips Corporation | Method of providing a layer of solid material on a substrate in which liquid from which the solid material can be formed, is spread over the substrate surface |
| US4090851A (en) * | 1976-10-15 | 1978-05-23 | Rca Corporation | Si3 N4 Coated crucible and die means for growing single crystalline silicon sheets |
| US4099924A (en) * | 1977-03-16 | 1978-07-11 | Rca Corporation | Apparatus improvements for growing single crystalline silicon sheets |
-
1977
- 1977-08-31 FR FR7726402A patent/FR2401696A1/fr active Granted
-
1978
- 1978-07-24 US US05/926,879 patent/US4233338A/en not_active Expired - Lifetime
- 1978-08-07 IT IT68866/78A patent/IT1160579B/it active
- 1978-08-30 DE DE2837775A patent/DE2837775C2/de not_active Expired
- 1978-08-31 JP JP10568278A patent/JPS5460291A/ja active Pending
- 1978-08-31 CH CH917678A patent/CH626746A5/fr not_active IP Right Cessation
- 1978-08-31 GB GB7835225A patent/GB2003400B/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| GB2003400A (en) | 1979-03-14 |
| JPS5460291A (en) | 1979-05-15 |
| DE2837775A1 (de) | 1979-03-08 |
| DE2837775C2 (de) | 1984-03-15 |
| GB2003400B (en) | 1982-03-03 |
| US4233338A (en) | 1980-11-11 |
| FR2401696A1 (fr) | 1979-03-30 |
| IT1160579B (it) | 1987-03-11 |
| IT7868866A0 (it) | 1978-08-07 |
| FR2401696B1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1980-02-01 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PL | Patent ceased | ||
| PL | Patent ceased |