CH616453A5 - - Google Patents
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- Publication number
- CH616453A5 CH616453A5 CH203975A CH203975A CH616453A5 CH 616453 A5 CH616453 A5 CH 616453A5 CH 203975 A CH203975 A CH 203975A CH 203975 A CH203975 A CH 203975A CH 616453 A5 CH616453 A5 CH 616453A5
- Authority
- CH
- Switzerland
- Prior art keywords
- copper
- solution
- compound
- reducing agent
- alkaline
- Prior art date
Links
- 238000000034 method Methods 0.000 claims description 18
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 17
- 239000003638 chemical reducing agent Substances 0.000 claims description 14
- 239000010949 copper Substances 0.000 claims description 13
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 11
- 229910052802 copper Inorganic materials 0.000 claims description 11
- -1 copper (I) ion compound Chemical class 0.000 claims description 11
- 206010070834 Sensitisation Diseases 0.000 claims description 10
- 230000008313 sensitization Effects 0.000 claims description 10
- 230000003197 catalytic effect Effects 0.000 claims description 9
- 230000001235 sensitizing effect Effects 0.000 claims description 9
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 claims description 6
- 238000000454 electroless metal deposition Methods 0.000 claims description 6
- 239000004215 Carbon black (E152) Substances 0.000 claims description 5
- 239000005749 Copper compound Substances 0.000 claims description 5
- VMQMZMRVKUZKQL-UHFFFAOYSA-N Cu+ Chemical compound [Cu+] VMQMZMRVKUZKQL-UHFFFAOYSA-N 0.000 claims description 5
- 150000001880 copper compounds Chemical class 0.000 claims description 5
- 229930195733 hydrocarbon Natural products 0.000 claims description 5
- 150000002430 hydrocarbons Chemical class 0.000 claims description 5
- 230000007062 hydrolysis Effects 0.000 claims description 5
- 238000006460 hydrolysis reaction Methods 0.000 claims description 5
- 239000004094 surface-active agent Substances 0.000 claims description 5
- 230000008929 regeneration Effects 0.000 claims description 4
- 238000011069 regeneration method Methods 0.000 claims description 4
- 239000002904 solvent Substances 0.000 claims description 4
- NWZSZGALRFJKBT-KNIFDHDWSA-N (2s)-2,6-diaminohexanoic acid;(2s)-2-hydroxybutanedioic acid Chemical compound OC(=O)[C@@H](O)CC(O)=O.NCCCC[C@H](N)C(O)=O NWZSZGALRFJKBT-KNIFDHDWSA-N 0.000 claims description 2
- KWSLGOVYXMQPPX-UHFFFAOYSA-N 5-[3-(trifluoromethyl)phenyl]-2h-tetrazole Chemical compound FC(F)(F)C1=CC=CC(C2=NNN=N2)=C1 KWSLGOVYXMQPPX-UHFFFAOYSA-N 0.000 claims description 2
- JPVYNHNXODAKFH-UHFFFAOYSA-N Cu2+ Chemical compound [Cu+2] JPVYNHNXODAKFH-UHFFFAOYSA-N 0.000 claims description 2
- 230000002378 acidificating effect Effects 0.000 claims description 2
- 244000052616 bacterial pathogen Species 0.000 claims description 2
- IKDUDTNKRLTJSI-UHFFFAOYSA-N hydrazine monohydrate Substances O.NN IKDUDTNKRLTJSI-UHFFFAOYSA-N 0.000 claims description 2
- 150000002500 ions Chemical class 0.000 claims description 2
- 229910001379 sodium hypophosphite Inorganic materials 0.000 claims description 2
- NVIFVTYDZMXWGX-UHFFFAOYSA-N sodium metaborate Chemical compound [Na+].[O-]B=O NVIFVTYDZMXWGX-UHFFFAOYSA-N 0.000 claims description 2
- 150000001875 compounds Chemical class 0.000 claims 3
- 239000003513 alkali Substances 0.000 claims 2
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 claims 1
- 229910021592 Copper(II) chloride Inorganic materials 0.000 claims 1
- 239000002253 acid Substances 0.000 claims 1
- 150000001450 anions Chemical class 0.000 claims 1
- ZADPBFCGQRWHPN-UHFFFAOYSA-N boronic acid Chemical compound OBO ZADPBFCGQRWHPN-UHFFFAOYSA-N 0.000 claims 1
- 229910052801 chlorine Inorganic materials 0.000 claims 1
- 239000000460 chlorine Substances 0.000 claims 1
- 150000001805 chlorine compounds Chemical class 0.000 claims 1
- ORTQZVOHEJQUHG-UHFFFAOYSA-L copper(II) chloride Chemical compound Cl[Cu]Cl ORTQZVOHEJQUHG-UHFFFAOYSA-L 0.000 claims 1
- 229910052736 halogen Inorganic materials 0.000 claims 1
- 238000010438 heat treatment Methods 0.000 claims 1
- ACVYVLVWPXVTIT-UHFFFAOYSA-M phosphinate Chemical compound [O-][PH2]=O ACVYVLVWPXVTIT-UHFFFAOYSA-M 0.000 claims 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 17
- 229910021591 Copper(I) chloride Inorganic materials 0.000 description 13
- OXBLHERUFWYNTN-UHFFFAOYSA-M copper(I) chloride Chemical group [Cu]Cl OXBLHERUFWYNTN-UHFFFAOYSA-M 0.000 description 13
- 229910052751 metal Inorganic materials 0.000 description 7
- 239000002184 metal Substances 0.000 description 7
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 6
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 6
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 6
- 239000004033 plastic Substances 0.000 description 6
- 229920003023 plastic Polymers 0.000 description 6
- 229910000510 noble metal Inorganic materials 0.000 description 5
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 4
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 4
- 239000008367 deionised water Substances 0.000 description 4
- 229910021641 deionized water Inorganic materials 0.000 description 4
- 238000001465 metallisation Methods 0.000 description 4
- 239000000080 wetting agent Substances 0.000 description 4
- 230000035784 germination Effects 0.000 description 3
- 239000010970 precious metal Substances 0.000 description 3
- 238000005086 pumping Methods 0.000 description 3
- 150000003839 salts Chemical class 0.000 description 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000007772 electroless plating Methods 0.000 description 2
- 238000007747 plating Methods 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 239000011780 sodium chloride Substances 0.000 description 2
- 239000008399 tap water Substances 0.000 description 2
- 235000020679 tap water Nutrition 0.000 description 2
- 229910021529 ammonia Inorganic materials 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 150000001768 cations Chemical class 0.000 description 1
- 238000004182 chemical digestion Methods 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- WCTXJBYIXVVFCF-UHFFFAOYSA-M chlorotin Chemical compound [Sn]Cl WCTXJBYIXVVFCF-UHFFFAOYSA-M 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 150000004696 coordination complex Chemical class 0.000 description 1
- LTYZGLKKXZXSEC-UHFFFAOYSA-N copper dihydride Chemical compound [CuH2] LTYZGLKKXZXSEC-UHFFFAOYSA-N 0.000 description 1
- 229910000050 copper hydride Inorganic materials 0.000 description 1
- 238000005238 degreasing Methods 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 150000002366 halogen compounds Chemical class 0.000 description 1
- GPRLSGONYQIRFK-UHFFFAOYSA-N hydron Chemical compound [H+] GPRLSGONYQIRFK-UHFFFAOYSA-N 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 159000000014 iron salts Chemical class 0.000 description 1
- 229910001510 metal chloride Inorganic materials 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 238000002203 pretreatment Methods 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- 239000012279 sodium borohydride Substances 0.000 description 1
- 229910000033 sodium borohydride Inorganic materials 0.000 description 1
- 239000011877 solvent mixture Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/18—Pretreatment of the material to be coated
- C23C18/20—Pretreatment of the material to be coated of organic surfaces, e.g. resins
- C23C18/28—Sensitising or activating
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemically Coating (AREA)
- Catalysts (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE2409251A DE2409251C3 (de) | 1974-02-22 | 1974-02-22 | Verfahren zum katalytischen Bekeimen nichtmetallischer Oberflächen für eine nachfolgende, stromlose Metallisierung und Badlösungen zur Durchführung des Verfahrens |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CH616453A5 true CH616453A5 (xx) | 1980-03-31 |
Family
ID=5908533
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CH203975A CH616453A5 (xx) | 1974-02-22 | 1975-02-19 |
Country Status (15)
| Country | Link |
|---|---|
| US (1) | US4020197A (xx) |
| JP (2) | JPS5642668B2 (xx) |
| AT (1) | AT332189B (xx) |
| CA (1) | CA1037655A (xx) |
| CH (1) | CH616453A5 (xx) |
| DE (1) | DE2409251C3 (xx) |
| DK (1) | DK148777C (xx) |
| ES (1) | ES434868A1 (xx) |
| FR (1) | FR2262124B1 (xx) |
| GB (1) | GB1461036A (xx) |
| IL (1) | IL46596A (xx) |
| IT (1) | IT1035102B (xx) |
| NL (1) | NL7502144A (xx) |
| SE (1) | SE7501792L (xx) |
| ZA (1) | ZA75545B (xx) |
Families Citing this family (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4748056A (en) * | 1972-07-11 | 1988-05-31 | Kollmorgen Corporation | Process and composition for sensitizing articles for metallization |
| US4632857A (en) * | 1974-05-24 | 1986-12-30 | Richardson Chemical Company | Electrolessly plated product having a polymetallic catalytic film underlayer |
| US4232060A (en) * | 1979-01-22 | 1980-11-04 | Richardson Chemical Company | Method of preparing substrate surface for electroless plating and products produced thereby |
| US4259113A (en) * | 1976-05-26 | 1981-03-31 | Kollmorgen Technologies Corporation | Composition for sensitizing articles for metallization |
| US4167596A (en) * | 1977-08-01 | 1979-09-11 | Nathan Feldstein | Method of preparation and use of electroless plating catalysts |
| US4322451A (en) * | 1978-05-01 | 1982-03-30 | Western Electric Co., Inc. | Method of forming a colloidal wetting sensitizer |
| US4233344A (en) * | 1978-07-20 | 1980-11-11 | Learonal, Inc. | Method of improving the adhesion of electroless metal deposits employing colloidal copper activator |
| US4222778A (en) * | 1979-03-30 | 1980-09-16 | Kollmorgen Technologies Corporation | Liquid seeders for electroless metal deposition |
| US4384893A (en) * | 1979-09-14 | 1983-05-24 | Western Electric Co., Inc. | Method of forming a tin-cuprous colloidal wetting sensitizer |
| DE3068305D1 (en) * | 1980-07-28 | 1984-07-26 | Lea Ronal Inc | A stable aqueous colloid for the activation of non-conductive substrates and the method of activating |
| DE3121015C2 (de) * | 1981-05-27 | 1986-12-04 | Friedr. Blasberg GmbH und Co KG, 5650 Solingen | Verfahren zur Aktivierung von gebeizten Oberflächen und Lösung zur Durchführung desselben |
| CH656401A5 (de) * | 1983-07-21 | 1986-06-30 | Suisse Horlogerie Rech Lab | Verfahren zur stromlosen abscheidung von metallen. |
| JP3689096B2 (ja) * | 2002-10-02 | 2005-08-31 | 学校法人神奈川大学 | 薄膜の形成方法 |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3520723A (en) * | 1968-01-25 | 1970-07-14 | Eastman Kodak Co | Process for forming a metallic layer on a substrate |
| US3772056A (en) * | 1971-07-29 | 1973-11-13 | Kollmorgen Photocircuits | Sensitized substrates for chemical metallization |
| US3873358A (en) * | 1971-11-26 | 1975-03-25 | Western Electric Co | Method of depositing a metal on a surface of a substrate |
| CA1058457A (en) * | 1973-10-18 | 1979-07-17 | Francis J. Nuzzi | Process for sensitizing surface of nonmetallic article for electroless deposition |
| JPS5621066B2 (xx) * | 1973-12-04 | 1981-05-16 |
-
1974
- 1974-02-22 DE DE2409251A patent/DE2409251C3/de not_active Expired
-
1975
- 1975-01-27 ZA ZA00750545A patent/ZA75545B/xx unknown
- 1975-02-05 US US05/547,360 patent/US4020197A/en not_active Expired - Lifetime
- 1975-02-06 AT AT91975*#A patent/AT332189B/de not_active IP Right Cessation
- 1975-02-07 IL IL46596A patent/IL46596A/en unknown
- 1975-02-11 GB GB571475A patent/GB1461036A/en not_active Expired
- 1975-02-18 SE SE7501792A patent/SE7501792L/ unknown
- 1975-02-19 CH CH203975A patent/CH616453A5/de not_active IP Right Cessation
- 1975-02-19 ES ES434868A patent/ES434868A1/es not_active Expired
- 1975-02-20 CA CA220,503A patent/CA1037655A/en not_active Expired
- 1975-02-21 NL NL7502144A patent/NL7502144A/xx active Search and Examination
- 1975-02-21 JP JP2235575A patent/JPS5642668B2/ja not_active Expired
- 1975-02-21 DK DK66375A patent/DK148777C/da active
- 1975-02-21 FR FR7505456A patent/FR2262124B1/fr not_active Expired
- 1975-02-21 IT IT48285/75A patent/IT1035102B/it active
-
1978
- 1978-02-24 JP JP53021428A patent/JPS5815499B2/ja not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| NL7502144A (nl) | 1975-08-26 |
| US4020197A (en) | 1977-04-26 |
| JPS50129432A (xx) | 1975-10-13 |
| AU7849075A (en) | 1976-08-26 |
| DK148777B (da) | 1985-09-23 |
| IL46596A (en) | 1977-01-31 |
| JPS5642668B2 (xx) | 1981-10-06 |
| DK66375A (xx) | 1975-10-20 |
| SE7501792L (xx) | 1975-08-25 |
| FR2262124B1 (xx) | 1978-02-24 |
| ZA75545B (en) | 1976-01-28 |
| CA1037655A (en) | 1978-09-05 |
| ES434868A1 (es) | 1976-12-16 |
| JPS53111372A (en) | 1978-09-28 |
| DE2409251C3 (de) | 1979-03-15 |
| JPS5815499B2 (ja) | 1983-03-25 |
| IT1035102B (it) | 1979-10-20 |
| GB1461036A (en) | 1977-01-13 |
| DK148777C (da) | 1986-04-28 |
| IL46596A0 (en) | 1975-04-25 |
| DE2409251A1 (de) | 1975-08-28 |
| FR2262124A1 (xx) | 1975-09-19 |
| AT332189B (de) | 1976-09-10 |
| DE2409251B2 (de) | 1977-10-06 |
| ATA91975A (de) | 1975-12-15 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PL | Patent ceased |