CH534007A - Verfahren zum Herstellen eines rohrförmigen Körpers aus Halbleitermaterial - Google Patents
Verfahren zum Herstellen eines rohrförmigen Körpers aus HalbleitermaterialInfo
- Publication number
- CH534007A CH534007A CH1601269A CH1601269A CH534007A CH 534007 A CH534007 A CH 534007A CH 1601269 A CH1601269 A CH 1601269A CH 1601269 A CH1601269 A CH 1601269A CH 534007 A CH534007 A CH 534007A
- Authority
- CH
- Switzerland
- Prior art keywords
- producing
- semiconductor material
- tubular body
- tubular
- semiconductor
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/01—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes on temporary substrates, e.g. substrates subsequently removed by etching
Landscapes
- Chemical & Material Sciences (AREA)
- Metallurgy (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- General Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Silicon Compounds (AREA)
- Chemical Vapour Deposition (AREA)
- Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19681805970 DE1805970C (de) | 1968-10-30 | Vorrichtung zum Herstellen eines rohrförmigen Körpers aus Halbleitermaterial |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CH534007A true CH534007A (de) | 1973-02-28 |
Family
ID=5711898
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CH1601269A CH534007A (de) | 1968-10-30 | 1969-10-28 | Verfahren zum Herstellen eines rohrförmigen Körpers aus Halbleitermaterial |
Country Status (9)
| Country | Link |
|---|---|
| US (2) | US3892827A (de) |
| JP (1) | JPS4843798B1 (de) |
| AT (1) | AT308827B (de) |
| BE (1) | BE741010A (de) |
| CH (1) | CH534007A (de) |
| FR (1) | FR2021901A1 (de) |
| GB (1) | GB1263580A (de) |
| NL (1) | NL6915771A (de) |
| SE (1) | SE345553B (de) |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4276072A (en) * | 1977-06-07 | 1981-06-30 | International Telephone And Telegraph Corporation | Optical fiber fabrication |
| US4332751A (en) * | 1980-03-13 | 1982-06-01 | The United States Of America As Represented By The United States Department Of Energy | Method for fabricating thin films of pyrolytic carbon |
| US4488920A (en) * | 1982-05-18 | 1984-12-18 | Williams International Corporation | Process of making a ceramic heat exchanger element |
| US4732110A (en) * | 1983-04-29 | 1988-03-22 | Hughes Aircraft Company | Inverted positive vertical flow chemical vapor deposition reactor chamber |
| US4879074A (en) * | 1986-11-27 | 1989-11-07 | Ube Industries, Ltd. | Method for coating soot on a melt contact surface |
| CA2065724A1 (en) * | 1991-05-01 | 1992-11-02 | Thomas R. Anthony | Method of producing articles by chemical vapor deposition and the support mandrels used therein |
| US6464912B1 (en) * | 1999-01-06 | 2002-10-15 | Cvd, Incorporated | Method for producing near-net shape free standing articles by chemical vapor deposition |
| JP4918224B2 (ja) * | 2005-01-21 | 2012-04-18 | 昭和シェル石油株式会社 | 透明導電膜製膜装置及び多層透明導電膜連続製膜装置 |
| WO2006110481A2 (en) * | 2005-04-10 | 2006-10-19 | Rec Silicon Inc | Production of polycrystalline silicon |
| US9683286B2 (en) * | 2006-04-28 | 2017-06-20 | Gtat Corporation | Increased polysilicon deposition in a CVD reactor |
| US10893577B2 (en) * | 2016-09-19 | 2021-01-12 | Corning Incorporated | Millimeter wave heating of soot preform |
Family Cites Families (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR1141561A (fr) * | 1956-01-20 | 1957-09-04 | Cedel | Procédé et moyens pour la fabrication de matériaux semi-conducteurs |
| US2974388A (en) * | 1958-01-30 | 1961-03-14 | Norton Co | Process of making ceramic shells |
| US3014791A (en) * | 1958-10-01 | 1961-12-26 | Merck & Co Inc | Pyrolysis apparatus |
| NL249150A (de) * | 1959-03-25 | |||
| GB944009A (en) * | 1960-01-04 | 1963-12-11 | Texas Instruments Ltd | Improvements in or relating to the deposition of silicon on a tantalum article |
| US3178308A (en) * | 1960-09-07 | 1965-04-13 | Pfaudler Permutit Inc | Chemical vapor plating process |
| GB1097331A (en) * | 1961-05-26 | 1968-01-03 | Secr Defence | Improvements in or relating to the manufacture of ceramic articles |
| US3367826A (en) * | 1964-05-01 | 1968-02-06 | Atomic Energy Commission Usa | Boron carbide article and method of making |
| DE1230915B (de) * | 1965-03-26 | 1966-12-22 | Siemens Ag | Verfahren zum Herstellen von integrierten Halbleiterbauelementen |
| US3609829A (en) * | 1968-07-12 | 1971-10-05 | Texas Instruments Inc | Apparatus for the formation of silica articles |
| US3534131A (en) * | 1968-10-16 | 1970-10-13 | Us Navy | Method of utilizing a graphite parting layer to separate refractory articles during sintering |
-
1969
- 1969-10-17 NL NL6915771A patent/NL6915771A/xx not_active Application Discontinuation
- 1969-10-28 FR FR6936914A patent/FR2021901A1/fr not_active Withdrawn
- 1969-10-28 AT AT1014769A patent/AT308827B/de not_active IP Right Cessation
- 1969-10-28 SE SE14753/69A patent/SE345553B/xx unknown
- 1969-10-28 CH CH1601269A patent/CH534007A/de not_active IP Right Cessation
- 1969-10-29 GB GB52887/69A patent/GB1263580A/en not_active Expired
- 1969-10-29 US US872278A patent/US3892827A/en not_active Expired - Lifetime
- 1969-10-30 BE BE741010D patent/BE741010A/xx unknown
-
1972
- 1972-01-31 US US00222127A patent/US3781152A/en not_active Expired - Lifetime
- 1972-05-31 JP JP47054208A patent/JPS4843798B1/ja active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| DE1805970A1 (de) | 1970-09-17 |
| SE345553B (de) | 1972-05-29 |
| FR2021901A1 (de) | 1970-07-24 |
| DE1805970B2 (de) | 1971-09-23 |
| JPS4843798B1 (de) | 1973-12-20 |
| NL6915771A (de) | 1970-05-04 |
| AT308827B (de) | 1973-07-25 |
| US3892827A (en) | 1975-07-01 |
| GB1263580A (en) | 1972-02-09 |
| BE741010A (de) | 1970-04-30 |
| US3781152A (en) | 1973-12-25 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PL | Patent ceased |