FR2021901A1 - - Google Patents

Info

Publication number
FR2021901A1
FR2021901A1 FR6936914A FR6936914A FR2021901A1 FR 2021901 A1 FR2021901 A1 FR 2021901A1 FR 6936914 A FR6936914 A FR 6936914A FR 6936914 A FR6936914 A FR 6936914A FR 2021901 A1 FR2021901 A1 FR 2021901A1
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
FR6936914A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Siemens AG
Original Assignee
Siemens AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from DE19681805970 external-priority patent/DE1805970C/de
Application filed by Siemens AG filed Critical Siemens AG
Publication of FR2021901A1 publication Critical patent/FR2021901A1/fr
Withdrawn legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/01—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes on temporary substrates, e.g. substrates subsequently removed by etching

Landscapes

  • Chemical & Material Sciences (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Silicon Compounds (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
FR6936914A 1968-10-30 1969-10-28 Withdrawn FR2021901A1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19681805970 DE1805970C (de) 1968-10-30 Vorrichtung zum Herstellen eines rohrförmigen Körpers aus Halbleitermaterial

Publications (1)

Publication Number Publication Date
FR2021901A1 true FR2021901A1 (fr) 1970-07-24

Family

ID=5711898

Family Applications (1)

Application Number Title Priority Date Filing Date
FR6936914A Withdrawn FR2021901A1 (fr) 1968-10-30 1969-10-28

Country Status (9)

Country Link
US (2) US3892827A (fr)
JP (1) JPS4843798B1 (fr)
AT (1) AT308827B (fr)
BE (1) BE741010A (fr)
CH (1) CH534007A (fr)
FR (1) FR2021901A1 (fr)
GB (1) GB1263580A (fr)
NL (1) NL6915771A (fr)
SE (1) SE345553B (fr)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4276072A (en) * 1977-06-07 1981-06-30 International Telephone And Telegraph Corporation Optical fiber fabrication
US4332751A (en) * 1980-03-13 1982-06-01 The United States Of America As Represented By The United States Department Of Energy Method for fabricating thin films of pyrolytic carbon
US4488920A (en) * 1982-05-18 1984-12-18 Williams International Corporation Process of making a ceramic heat exchanger element
US4732110A (en) * 1983-04-29 1988-03-22 Hughes Aircraft Company Inverted positive vertical flow chemical vapor deposition reactor chamber
US4879074A (en) * 1986-11-27 1989-11-07 Ube Industries, Ltd. Method for coating soot on a melt contact surface
CA2065724A1 (fr) * 1991-05-01 1992-11-02 Thomas R. Anthony Methode de production d'articles par depot chimique en phase vapeur et mandrins de support connexes
US6464912B1 (en) * 1999-01-06 2002-10-15 Cvd, Incorporated Method for producing near-net shape free standing articles by chemical vapor deposition
JP4918224B2 (ja) * 2005-01-21 2012-04-18 昭和シェル石油株式会社 透明導電膜製膜装置及び多層透明導電膜連続製膜装置
WO2006110481A2 (fr) * 2005-04-10 2006-10-19 Rec Silicon Inc Production de silicium polycristallin
US9683286B2 (en) * 2006-04-28 2017-06-20 Gtat Corporation Increased polysilicon deposition in a CVD reactor
US10893577B2 (en) * 2016-09-19 2021-01-12 Corning Incorporated Millimeter wave heating of soot preform

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1141561A (fr) * 1956-01-20 1957-09-04 Cedel Procédé et moyens pour la fabrication de matériaux semi-conducteurs
US2974388A (en) * 1958-01-30 1961-03-14 Norton Co Process of making ceramic shells
US3014791A (en) * 1958-10-01 1961-12-26 Merck & Co Inc Pyrolysis apparatus
NL249150A (fr) * 1959-03-25
GB944009A (en) * 1960-01-04 1963-12-11 Texas Instruments Ltd Improvements in or relating to the deposition of silicon on a tantalum article
US3178308A (en) * 1960-09-07 1965-04-13 Pfaudler Permutit Inc Chemical vapor plating process
GB1097331A (en) * 1961-05-26 1968-01-03 Secr Defence Improvements in or relating to the manufacture of ceramic articles
US3367826A (en) * 1964-05-01 1968-02-06 Atomic Energy Commission Usa Boron carbide article and method of making
DE1230915B (de) * 1965-03-26 1966-12-22 Siemens Ag Verfahren zum Herstellen von integrierten Halbleiterbauelementen
US3609829A (en) * 1968-07-12 1971-10-05 Texas Instruments Inc Apparatus for the formation of silica articles
US3534131A (en) * 1968-10-16 1970-10-13 Us Navy Method of utilizing a graphite parting layer to separate refractory articles during sintering

Also Published As

Publication number Publication date
DE1805970A1 (de) 1970-09-17
SE345553B (fr) 1972-05-29
DE1805970B2 (de) 1971-09-23
JPS4843798B1 (fr) 1973-12-20
NL6915771A (fr) 1970-05-04
AT308827B (de) 1973-07-25
US3892827A (en) 1975-07-01
GB1263580A (en) 1972-02-09
CH534007A (de) 1973-02-28
BE741010A (fr) 1970-04-30
US3781152A (en) 1973-12-25

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Legal Events

Date Code Title Description
ST Notification of lapse