CH519249A - Verfahren zum Herstellen von diffundierten Halbleiterbauelementen unter Verwendung von festen Dotierstoffquellen - Google Patents
Verfahren zum Herstellen von diffundierten Halbleiterbauelementen unter Verwendung von festen DotierstoffquellenInfo
- Publication number
- CH519249A CH519249A CH158671A CH158671A CH519249A CH 519249 A CH519249 A CH 519249A CH 158671 A CH158671 A CH 158671A CH 158671 A CH158671 A CH 158671A CH 519249 A CH519249 A CH 519249A
- Authority
- CH
- Switzerland
- Prior art keywords
- manufacturing
- semiconductor components
- dopant sources
- solid dopant
- diffused semiconductor
- Prior art date
Links
- 239000002019 doping agent Substances 0.000 title 1
- 238000004519 manufacturing process Methods 0.000 title 1
- 238000000034 method Methods 0.000 title 1
- 239000004065 semiconductor Substances 0.000 title 1
- 239000007787 solid Substances 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/22—Diffusion of impurity materials, e.g. doping materials, electrode materials, into or out of a semiconductor body, or between semiconductor regions; Interactions between two or more impurities; Redistribution of impurities
- H01L21/225—Diffusion of impurity materials, e.g. doping materials, electrode materials, into or out of a semiconductor body, or between semiconductor regions; Interactions between two or more impurities; Redistribution of impurities using diffusion into or out of a solid from or into a solid phase, e.g. a doped oxide layer
- H01L21/2251—Diffusion into or out of group IV semiconductors
- H01L21/2254—Diffusion into or out of group IV semiconductors from or through or into an applied layer, e.g. photoresist, nitrides
- H01L21/2255—Diffusion into or out of group IV semiconductors from or through or into an applied layer, e.g. photoresist, nitrides the applied layer comprising oxides only, e.g. P2O5, PSG, H3BO3, doped oxides
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Physics & Mathematics (AREA)
- Power Engineering (AREA)
- Photovoltaic Devices (AREA)
- Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Formation Of Insulating Films (AREA)
- Silicon Compounds (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19702007752 DE2007752B2 (de) | 1970-02-19 | 1970-02-19 | Verfahren zum Herstellen von dotiertem Halbleitermaterial |
Publications (1)
Publication Number | Publication Date |
---|---|
CH519249A true CH519249A (de) | 1972-02-15 |
Family
ID=5762769
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CH158671A CH519249A (de) | 1970-02-19 | 1971-02-03 | Verfahren zum Herstellen von diffundierten Halbleiterbauelementen unter Verwendung von festen Dotierstoffquellen |
Country Status (8)
Country | Link |
---|---|
JP (1) | JPS5338597B1 (de) |
AT (1) | AT338335B (de) |
CH (1) | CH519249A (de) |
DE (1) | DE2007752B2 (de) |
FR (1) | FR2080610B1 (de) |
GB (1) | GB1289432A (de) |
NL (1) | NL7102176A (de) |
SE (1) | SE366227B (de) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE4013929A1 (de) * | 1989-05-02 | 1990-11-08 | Toshiba Kawasaki Kk | Verfahren zum herstellen eines halbleiterbauelements |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2262021C2 (de) * | 1972-12-19 | 1982-12-30 | Degussa Ag, 6000 Frankfurt | Verfahren zur Dotierung von Halbleitersilicium |
EP0104412B1 (de) * | 1982-09-23 | 1988-01-07 | Allied Corporation | Polymeres Bor und Stickstoff enthaltendes Dotiermaterial |
JPH01135017A (ja) * | 1987-11-20 | 1989-05-26 | Fujitsu Ltd | 半導体装置の製造方法 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3084079A (en) * | 1960-10-13 | 1963-04-02 | Pacific Semiconductors Inc | Manufacture of semiconductor devices |
US3355291A (en) * | 1963-10-08 | 1967-11-28 | Texas Instruments Inc | Application of glass to semiconductor devices |
US3514348A (en) * | 1967-05-10 | 1970-05-26 | Ncr Co | Method for making semiconductor devices |
JPS4822536B1 (de) * | 1969-03-20 | 1973-07-06 |
-
1970
- 1970-02-19 DE DE19702007752 patent/DE2007752B2/de active Granted
-
1971
- 1971-02-01 AT AT82571A patent/AT338335B/de not_active IP Right Cessation
- 1971-02-03 CH CH158671A patent/CH519249A/de not_active IP Right Cessation
- 1971-02-16 FR FR7105142A patent/FR2080610B1/fr not_active Expired
- 1971-02-18 NL NL7102176A patent/NL7102176A/xx unknown
- 1971-02-19 JP JP790471A patent/JPS5338597B1/ja active Pending
- 1971-02-19 SE SE216671A patent/SE366227B/xx unknown
- 1971-04-19 GB GB1289432D patent/GB1289432A/en not_active Expired
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE4013929A1 (de) * | 1989-05-02 | 1990-11-08 | Toshiba Kawasaki Kk | Verfahren zum herstellen eines halbleiterbauelements |
Also Published As
Publication number | Publication date |
---|---|
GB1289432A (de) | 1972-09-20 |
FR2080610B1 (de) | 1976-04-16 |
ATA82571A (de) | 1976-12-15 |
FR2080610A1 (de) | 1971-11-19 |
AT338335B (de) | 1977-08-25 |
DE2007752A1 (de) | 1971-08-26 |
JPS5338597B1 (de) | 1978-10-16 |
SE366227B (de) | 1974-04-22 |
DE2007752C3 (de) | 1979-04-05 |
NL7102176A (de) | 1971-08-23 |
DE2007752B2 (de) | 1978-07-27 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PL | Patent ceased |