CH416558A - Vorrichtung zum tiegelfreien Zonenschmelzen von Halbleitermaterial - Google Patents

Vorrichtung zum tiegelfreien Zonenschmelzen von Halbleitermaterial

Info

Publication number
CH416558A
CH416558A CH1350263A CH1350263A CH416558A CH 416558 A CH416558 A CH 416558A CH 1350263 A CH1350263 A CH 1350263A CH 1350263 A CH1350263 A CH 1350263A CH 416558 A CH416558 A CH 416558A
Authority
CH
Switzerland
Prior art keywords
crucible
semiconductor material
free zone
zone melting
melting
Prior art date
Application number
CH1350263A
Other languages
English (en)
Inventor
Wolfgang Dr Keller
Original Assignee
Siemens Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Siemens Ag filed Critical Siemens Ag
Publication of CH416558A publication Critical patent/CH416558A/de

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B13/00Single-crystal growth by zone-melting; Refining by zone-melting
    • C30B13/16Heating of the molten zone
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B13/00Single-crystal growth by zone-melting; Refining by zone-melting
    • C30B13/16Heating of the molten zone
    • C30B13/20Heating of the molten zone by induction, e.g. hot wire technique
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B13/00Single-crystal growth by zone-melting; Refining by zone-melting
    • C30B13/28Controlling or regulating
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05BELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B6/00Heating by electric, magnetic or electromagnetic fields
    • H05B6/02Induction heating
    • H05B6/22Furnaces without an endless core
    • H05B6/30Arrangements for remelting or zone melting
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S117/00Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
    • Y10S117/911Seed or rod holders
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T117/00Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
    • Y10T117/10Apparatus
    • Y10T117/1016Apparatus with means for treating single-crystal [e.g., heat treating]
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T117/00Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
    • Y10T117/10Apparatus
    • Y10T117/1024Apparatus for crystallization from liquid or supercritical state
    • Y10T117/1076Apparatus for crystallization from liquid or supercritical state having means for producing a moving solid-liquid-solid zone
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T117/00Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
    • Y10T117/10Apparatus
    • Y10T117/1024Apparatus for crystallization from liquid or supercritical state
    • Y10T117/1076Apparatus for crystallization from liquid or supercritical state having means for producing a moving solid-liquid-solid zone
    • Y10T117/1088Apparatus for crystallization from liquid or supercritical state having means for producing a moving solid-liquid-solid zone including heating or cooling details

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • General Induction Heating (AREA)
  • Silicon Compounds (AREA)
CH1350263A 1963-03-29 1963-11-04 Vorrichtung zum tiegelfreien Zonenschmelzen von Halbleitermaterial CH416558A (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DES84442A DE1208292B (de) 1963-03-29 1963-03-29 Vorrichtung zum tiegelfreien Zonenschmelzen von Halbleitermaterial
DES91638A DE1230763B (de) 1963-03-29 1964-06-20 Vorrichtung zum tiegelfreien Zonenschmelzen

Publications (1)

Publication Number Publication Date
CH416558A true CH416558A (de) 1966-07-15

Family

ID=25997180

Family Applications (1)

Application Number Title Priority Date Filing Date
CH1350263A CH416558A (de) 1963-03-29 1963-11-04 Vorrichtung zum tiegelfreien Zonenschmelzen von Halbleitermaterial

Country Status (6)

Country Link
US (1) US3271115A (de)
BE (2) BE645736A (de)
CH (1) CH416558A (de)
DE (2) DE1208292B (de)
FR (2) FR1431669A (de)
GB (2) GB986748A (de)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1275996B (de) * 1965-07-10 1968-08-29 Siemens Ag Vorrichtung zum tiegelfreien Zonenschmelzen
US3432753A (en) * 1966-09-30 1969-03-11 Gen Electric Method of analyzing materials to determine the impurity content thereof
DE1519908A1 (de) * 1966-12-30 1970-07-02 Siemens Ag Vorrichtung zum Herstellen eines kristallinen Stabes durch tiegelfreies Zonenschmelzen
DE1960088C3 (de) * 1969-11-29 1974-07-25 Siemens Ag, 1000 Berlin Und 8000 Muenchen Vorrichtung zum tiegelfreien Zonenschmelzen eines kristallinen Stabes
US4140570A (en) * 1973-11-19 1979-02-20 Texas Instruments Incorporated Method of growing single crystal silicon by the Czochralski method which eliminates the need for post growth annealing for resistivity stabilization
US3848107A (en) * 1973-12-26 1974-11-12 Park Ohio Industries Inc Inductor for heating elongated metal workpieces
DE2538854B2 (de) * 1975-09-01 1979-02-15 Wacker-Chemitronic Gesellschaft Fuer Elektronik-Grundstoffe Mbh, 8263 Burghausen Einwindige Induktionsheizspule zum tiegelfreien Zonenschmelzen
US4501943A (en) * 1983-09-19 1985-02-26 Gnb Batteries Inc. Apparatus and method for fusing battery terminals with improved induction heating power control
EP0292920B1 (de) * 1987-05-25 1992-07-29 Shin-Etsu Handotai Company Limited Vorrichtung für HF-Induktionsheizung
ATE185464T1 (de) * 1993-08-26 1999-10-15 Inductotherm Corp Induktionsschmelzofen mit magnetischer aufhängung

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2419116A (en) * 1944-04-20 1947-04-15 Westinghouse Electric Corp Apparatus for high-frequency induction heating of strips
US2708704A (en) * 1952-04-23 1955-05-17 Lindberg Eng Co Electric heating coil structure
DE1062847B (de) * 1955-08-04 1959-08-06 Friedrich Kocks Dr Ing Induktor zum Erhitzen der Kanten ebener Bleche oder Baender
US2935386A (en) * 1956-01-03 1960-05-03 Clevite Corp Method of producing small semiconductor silicon crystals
DE1045011B (de) * 1956-03-15 1958-11-27 Asea Ab Einphasiger Querfeldofen fuer die induktive Erwaermung von Werkstuecken
NL235481A (de) * 1958-02-19
US2990259A (en) * 1959-09-03 1961-06-27 Paul L Moody Syringe-type single-crystal furnace
US3101400A (en) * 1961-02-23 1963-08-20 Induction Heating Corp Hardening coil and method of heat treatment of toothed metal strips

Also Published As

Publication number Publication date
FR88198E (fr) 1966-12-23
GB1035090A (en) 1966-07-06
BE665626A (de) 1965-12-20
US3271115A (en) 1966-09-06
DE1230763B (de) 1966-12-22
DE1208292B (de) 1966-01-05
FR1431669A (fr) 1966-03-18
GB986748A (en) 1965-03-24
BE645736A (de) 1964-09-28

Similar Documents

Publication Publication Date Title
AT261675B (de) Verfahren zum epitaktischen Aufwachsen von Halbleitereinkristallen
CH506187A (de) Vorrichtung zum epitaktischen Abscheiden von Halbleitermaterial
AT249116B (de) Verfahren zum Ziehen von einkristallinem Halbleitermaterial
CH373903A (de) Verfahren zum tiegellosen Zonenziehen von Halbleitermaterial
CH365362A (de) Vorrichtung zum tiegelfreien Zonenziehen von stabförmigem Halbleitermaterial
CH380384A (de) Einrichtung zum tiegelfreien Zonenschmelzen von lotrecht stehenden Stäben aus Halbleitermaterial
CH416558A (de) Vorrichtung zum tiegelfreien Zonenschmelzen von Halbleitermaterial
AT244858B (de) Vorrichtung zum Verschweißen von Wandungen aus thermoplastischem Material
CH429012A (de) Vorrichtung zum Behandeln und Weiterbewegen von Fasermaterial
CH375527A (de) Vorrichtung zum tiegelfreien Zonenschmelzen
CH389249A (de) Verfahren zum tiegelfreien Zonenschmelzen von Halbleitermaterial
CH456798A (de) Vorrichtung zum elektrolytischen Abtragen von Material
DE1913881A1 (de) Vorrichtung zum tiegelfreien Zonenschmelzen
CH410613A (de) Vorrichtung zum Abschneiden von Blättern von bandförmigem Material
CH430656A (de) Verfahren zum tiegelfreien Zonenschmelzen von Halbleitermaterial, insbesondere von Silizium
CH407062A (de) Vorrichtung zum tiegelfreien Zonenschmelzen von Halbleitermaterial
CH420069A (de) Vorrichtung zum tiegelfreien Zonenschmelzen von Halbleitermaterial
CH435207A (de) Vorrichtung zum tiegelfreien Zonenschmelzen
CH464153A (de) Vorrichtung zum tiegelfreien Zonenschmelzen von Halbleitermaterial
CH540716A (de) Vorrichtung zum induktiven tiegellosen Zonenschmelzen von Stäben
CH407959A (de) Vorrichtung zum tiegelfreien Zonenschmelzen
CH388636A (de) Einrichtung zum tiegelfreien Zonenschmelzen von Halbleiterstäben
CH438229A (de) Vorrichtung zum tiegelfreien Zonenschmelzen
CH432475A (de) Vorrichtung zum tiegelfreien Zonenschmelzen
AT242042B (de) Vorrichtung zum Aufteilen und Zuführen von Formstücken