CH375450A - Verfahren zur Erzeugung eines hochdotierten p-Bereiches und des zugehörigen Kontaktes an einem Halbleiterkörper - Google Patents

Verfahren zur Erzeugung eines hochdotierten p-Bereiches und des zugehörigen Kontaktes an einem Halbleiterkörper

Info

Publication number
CH375450A
CH375450A CH7147959A CH7147959A CH375450A CH 375450 A CH375450 A CH 375450A CH 7147959 A CH7147959 A CH 7147959A CH 7147959 A CH7147959 A CH 7147959A CH 375450 A CH375450 A CH 375450A
Authority
CH
Switzerland
Prior art keywords
producing
region
semiconductor body
highly doped
associated contact
Prior art date
Application number
CH7147959A
Other languages
English (en)
Inventor
Hubert Dr Patalong
Adolf Dr Herlet
Original Assignee
Siemens Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Siemens Ag filed Critical Siemens Ag
Publication of CH375450A publication Critical patent/CH375450A/de

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22CALLOYS
    • C22C1/00Making non-ferrous alloys
    • C22C1/02Making non-ferrous alloys by melting
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B30PRESSES
    • B30BPRESSES IN GENERAL
    • B30B11/00Presses specially adapted for forming shaped articles from material in particulate or plastic state, e.g. briquetting presses, tabletting presses
    • B30B11/34Presses specially adapted for forming shaped articles from material in particulate or plastic state, e.g. briquetting presses, tabletting presses for coating articles, e.g. tablets
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22CALLOYS
    • C22C5/00Alloys based on noble metals
    • C22C5/02Alloys based on gold
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10PGENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P95/00Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00Metal working
    • Y10T29/49Method of mechanical manufacture
    • Y10T29/49002Electrical device making
    • Y10T29/49117Conductor or circuit manufacturing
    • Y10T29/49204Contact or terminal manufacturing
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00Metal working
    • Y10T29/49Method of mechanical manufacture
    • Y10T29/49002Electrical device making
    • Y10T29/49117Conductor or circuit manufacturing
    • Y10T29/49204Contact or terminal manufacturing
    • Y10T29/49208Contact or terminal manufacturing by assembling plural parts
    • Y10T29/4921Contact or terminal manufacturing by assembling plural parts with bonding
    • Y10T29/49211Contact or terminal manufacturing by assembling plural parts with bonding of fused material
    • Y10T29/49213Metal
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/12All metal or with adjacent metals
    • Y10T428/12493Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
    • Y10T428/12528Semiconductor component
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/12All metal or with adjacent metals
    • Y10T428/12493Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
    • Y10T428/12535Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.] with additional, spatially distinct nonmetal component
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/12All metal or with adjacent metals
    • Y10T428/12493Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
    • Y10T428/12674Ge- or Si-base component
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/12All metal or with adjacent metals
    • Y10T428/12493Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
    • Y10T428/12771Transition metal-base component
    • Y10T428/12861Group VIII or IB metal-base component
    • Y10T428/12889Au-base component

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Conductive Materials (AREA)
  • Die Bonding (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
  • Powder Metallurgy (AREA)
  • Silicon Compounds (AREA)
CH7147959A 1958-02-04 1959-04-02 Verfahren zur Erzeugung eines hochdotierten p-Bereiches und des zugehörigen Kontaktes an einem Halbleiterkörper CH375450A (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DES0056823 1958-02-04
DES57723A DE1089074B (de) 1958-02-04 1958-04-05 Verfahren zur Erzeugung eines hochdotierten p-Bereiches und des zugehoerigen Kontaktes einer Halbleiteranordnung mittels Einlegieren

Publications (1)

Publication Number Publication Date
CH375450A true CH375450A (de) 1964-02-29

Family

ID=25995480

Family Applications (2)

Application Number Title Priority Date Filing Date
CH6876859A CH369519A (de) 1958-02-04 1959-01-27 Verfahren zur Herstellung eines hochdotierten p-Bereiches an einem Halbleiterkörper
CH7147959A CH375450A (de) 1958-02-04 1959-04-02 Verfahren zur Erzeugung eines hochdotierten p-Bereiches und des zugehörigen Kontaktes an einem Halbleiterkörper

Family Applications Before (1)

Application Number Title Priority Date Filing Date
CH6876859A CH369519A (de) 1958-02-04 1959-01-27 Verfahren zur Herstellung eines hochdotierten p-Bereiches an einem Halbleiterkörper

Country Status (6)

Country Link
US (1) US3009840A (de)
CH (2) CH369519A (de)
DE (2) DE1089074B (de)
FR (1) FR1228852A (de)
GB (2) GB905553A (de)
NL (2) NL235479A (de)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL113840C (de) * 1958-06-14
BE590762A (de) * 1959-05-12
US3068127A (en) * 1959-06-02 1962-12-11 Siemens Ag Method of producing a highly doped p-type zone and an appertaining contact on a semiconductor crystal
US3211595A (en) * 1959-11-02 1965-10-12 Hughes Aircraft Co P-type alloy bonding of semiconductors using a boron-gold alloy
DE1133834B (de) * 1960-09-21 1962-07-26 Siemens Ag Siliziumgleichrichter und Verfahren zu dessen Herstellung
NL270684A (de) * 1960-11-01
US3177054A (en) * 1960-12-14 1965-04-06 Nippon Electric Co Compound foil for connecting electrodes to semiconductor material
DE1240996B (de) * 1961-03-24 1967-05-24 Siemens Ag Verfahren zum Herstellen eines beiderseits hochdotierten pn-UEbergangs fuer Halbleiteranordnungen
NL274788A (de) * 1961-05-17
US3292130A (en) * 1961-07-28 1966-12-13 Texas Instruments Inc Resistor
US3155064A (en) * 1961-11-15 1964-11-03 Westinghouse Electric Corp Fusion mold fixture assembly
DE1246129B (de) * 1961-12-28 1967-08-03 Westinghouse Electric Corp Verfahren zum Herstellen eines Halbleiterbauelementes
NL300210A (de) * 1962-11-14
US3310443A (en) * 1963-09-06 1967-03-21 Theodore E Fessler Method of forming thin window drifted silicon charged particle detector
DE1278016B (de) * 1963-11-16 1968-09-19 Siemens Ag Halbleiterbauelement mit einem einkristallinen Halbleiterkoerper
DE1231824B (de) * 1964-07-04 1967-01-05 Danfoss As Kontaktanordnung fuer ein elektronisches Festkoerperschaltelement und Verfahren zu seiner Herstellung
US3382054A (en) * 1965-01-25 1968-05-07 Texas Instruments Inc Low melting point composite materials useful for brazing, soldering or the like
CH506188A (de) * 1970-09-02 1971-04-15 Ibm Feldeffekt-Transistor
JPS6481130A (en) * 1987-09-21 1989-03-27 Omron Tateisi Electronics Co Electrical contact
GB8818050D0 (en) * 1988-07-28 1988-09-01 Lilliwyte Sa Joining of ceramic components to metal components

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US1577995A (en) * 1925-10-28 1926-03-23 Wadsworth Watch Case Co White-gold alloy
US2510546A (en) * 1944-12-01 1950-06-06 Joseph B Brennan Manufacture of precision articles from powdered material
US2791524A (en) * 1953-04-03 1957-05-07 Gen Electric Fabrication method for p-n junctions
BE517459A (de) * 1952-02-07
NL98697C (de) * 1952-08-20
US2725288A (en) * 1952-08-26 1955-11-29 Harry W Dodds Process and apparatus for fabricating metallic articles
BE532794A (de) * 1953-10-26
AT187556B (de) * 1954-03-05 1956-11-10 Western Electric Co Verfahren zur Herstellung eines Halbleiters mit einer PN-Verbindung
BE548647A (de) * 1955-06-28
DE1012696B (de) * 1954-07-06 1957-07-25 Siemens Ag Halbleiteruebergang zwischen Zonen verschiedenen Leitungstypus und Verfahren zur Herstellung des UEberganges
BE544843A (de) * 1955-02-25
US2763822A (en) * 1955-05-10 1956-09-18 Westinghouse Electric Corp Silicon semiconductor devices
NL106749C (de) * 1956-02-08
NL215386A (de) * 1956-03-30

Also Published As

Publication number Publication date
DE1089074B (de) 1960-09-15
FR1228852A (fr) 1960-09-02
NL237782A (de) 1900-01-01
DE1067936B (de) 1959-10-29
GB907303A (en) 1962-10-03
CH369519A (de) 1963-05-31
US3009840A (en) 1961-11-21
GB905553A (en) 1962-09-12
NL235479A (de) 1900-01-01

Similar Documents

Publication Publication Date Title
CH375450A (de) Verfahren zur Erzeugung eines hochdotierten p-Bereiches und des zugehörigen Kontaktes an einem Halbleiterkörper
CH422161A (de) Verfahren zur Herstellung eines elektrischen Kontaktes an einem Halbleiterelement
CH447610A (de) Verfahren zur Herstellung eines Copolymerisates
AT244577B (de) Verfahren und Vorrichtung zur kontinuierlichen Herstellung eines Schichtkörpers
AT264590B (de) Verfahren zum Herstellen eines Kontaktes an einem Halbleiterkörper
CH457627A (de) Halbleiterbauelement mit einem Metallkontakt und Verfahren zur Herstellung eines Halbleiterbauelementes
AT259226B (de) Verfahren zur Herstellung eines Copolymerisates
CH371187A (de) Verfahren zur Herstellung einer dotierten Zone in einem Halbleiterkörper
CH372116A (de) Einrichtung zur Erzeugung und Formung eines Ladungsträgerstrahles
CH379656A (de) Vorrichtung an einem Elektronenmikroskop
AT249249B (de) Vorrichtung zur kontinuierlichen Herstellung eines Stauchkräuselgarnes
CH381771A (de) Halbleiterbauelement mit einer gasdichten Kammer sowie Verfahren zur Herstellung eines solchen Halbleiterelementes und Vorrichtung zur Durchführung des Verfahrens
CH375799A (de) Verfahren zur Herstellung eines Halbleiterkörpers
CH354858A (de) Verfahren zur Herstellung eines elektrischen Halbleitergerätes mit einkristallinem Halbleiterkörper
CH398805A (de) Verfahren zur Oberflächenbehandlung eines Halbleiter-Bauelementes
CH373108A (de) Gehäuse mit einem Halbleiterelement und Verfahren zur Herstellung eines solchen
AT248100B (de) Vorrichtung zur Herstellung eines Ringkörpers
AT213727B (de) Verfahren und Vorrichtung zur Herstellung eines Flaschenverschlusses
CH372758A (de) Verfahren und Vorrichtung zur Herstellung einer Halbleitervorrichtung
CH380244A (de) Verfahren zur Herstellung eines hochdotierten Bereiches in Halbleiterkörpern
DD42684A5 (de) Verfahren und Vorrichtung zur Herstellung von elektrischen Kleinteilen
CH374428A (de) Verfahren zur Herstellung einer Halbleitervorrichtung mit wenigstens einer aluminiumhaltigen Elektrode
AT212881B (de) Verfahren zur Einführung einer die Leitfähigkeitstype bestimmenden Verunreinigung in einen Siliziumkörper
CH389100A (de) Verfahren zum Kontaktieren eines Halbleiterkörpers und danach hergestellte Halbleiteranordnung
AT275136B (de) Verfahren und Vorrichtung zur Herstellung eines Schlauches