|
BE507657A
(forum.php)
*
|
1950-12-06 |
|
|
|
|
GB907718A
(en)
*
|
1957-11-01 |
1962-10-10 |
Lithoplate Inc |
Hydrophilic base plates for diazo presensitized lithographic printing plates
|
|
US2993788A
(en)
*
|
1958-06-17 |
1961-07-25 |
Gen Aniline & Film Corp |
Multicolor reproduction using light sensitive diazo oxides
|
|
US3130051A
(en)
*
|
1958-12-10 |
1964-04-21 |
Gen Aniline & Film Corp |
Process for producing negative working offset diazo printing plates
|
|
DE1095665B
(de)
*
|
1959-01-12 |
1960-12-22 |
Hans Hoerner |
Verfahren zur fotomechanischen Herstellung von Hochdruckformen aus mehreren Kunststoffschichten
|
|
US3095301A
(en)
*
|
1959-04-06 |
1963-06-25 |
Gen Aniline & Film Corp |
Electrophotographic element
|
|
US3173788A
(en)
*
|
1960-02-10 |
1965-03-16 |
Gen Aniline & Film Corp |
Developing positive working photolitho-graphic printing plates containing diazo oxides
|
|
US3164468A
(en)
*
|
1960-06-06 |
1965-01-05 |
Gen Aniline & Film Corp |
Photomechanical reversal process and foil and dyes for use therein
|
|
US3086861A
(en)
*
|
1960-07-01 |
1963-04-23 |
Gen Aniline & Film Corp |
Printing plates comprising ink receptive azo dye surfaces
|
|
US3149972A
(en)
*
|
1960-08-16 |
1964-09-22 |
Gen Aniline & Film Corp |
Diazo and resinous coupler printing plates for photomechanical reproduction
|
|
BE612386A
(forum.php)
*
|
1961-01-09 |
|
|
|
|
BE620660A
(forum.php)
*
|
1961-07-28 |
|
|
|
|
CA774047A
(en)
*
|
1963-12-09 |
1967-12-19 |
Shipley Company |
Light-sensitive material and process for the development thereof
|
|
US3486450A
(en)
*
|
1964-02-27 |
1969-12-30 |
Eastman Kodak Co |
Color proofing system
|
|
DE1472771A1
(de)
*
|
1965-07-30 |
1969-01-02 |
Adox Du Pont Fotowerke |
Verfahren zur Herstellung von masshaltigen photographischen Filmen
|
|
US3549373A
(en)
*
|
1966-03-19 |
1970-12-22 |
Ricoh Kk |
Negative-to-positive reversible copy sheet
|
|
US3474719A
(en)
*
|
1966-04-15 |
1969-10-28 |
Gaf Corp |
Offset printing plates
|
|
GB1188527A
(en)
*
|
1966-05-31 |
1970-04-15 |
Algraphy Ltd |
Development of Light-Sensitive Layers
|
|
NL136645C
(forum.php)
*
|
1966-12-12 |
|
|
|
|
US3637384A
(en)
*
|
1969-02-17 |
1972-01-25 |
Gaf Corp |
Positive-working diazo-oxide terpolymer photoresists
|
|
US3920455A
(en)
*
|
1971-05-28 |
1975-11-18 |
Polychrome Corp |
Light-sensitive compositions and materials with O-naphthoquinone diazide sulfonyl esters
|
|
JPS521663B2
(forum.php)
*
|
1973-02-10 |
1977-01-17 |
|
|
|
JPS5421089B2
(forum.php)
*
|
1973-05-29 |
1979-07-27 |
|
|
|
GB1482921A
(en)
*
|
1973-07-31 |
1977-08-17 |
Glaxo Lab Ltd |
Polymers
|
|
JPS56500646A
(forum.php)
*
|
1978-02-06 |
1981-05-14 |
|
|
|
CA1180931A
(en)
*
|
1980-09-15 |
1985-01-15 |
Robert W. Hallman |
Bilayer photosensitive imaging article including film-forming bimodal styrene-maleic anhydride copolymer in the image layer
|
|
WO1988002878A1
(en)
*
|
1986-10-20 |
1988-04-21 |
Macdermid, Incorporated |
Image reversal system and process
|
|
EP0280197A3
(en)
*
|
1987-02-23 |
1990-05-23 |
Oki Electric Industry Company, Limited |
Process for forming photoresist pattern
|
|
EP0410606B1
(en)
|
1989-07-12 |
1996-11-13 |
Fuji Photo Film Co., Ltd. |
Siloxane polymers and positive working light-sensitive compositions comprising the same
|
|
US5308744A
(en)
*
|
1993-03-05 |
1994-05-03 |
Morton International, Inc. |
Source of photochemically generated acids from diazonaphthoquinone sulfonates of nitrobenzyl derivatives
|
|
US5314782A
(en)
*
|
1993-03-05 |
1994-05-24 |
Morton International, Inc. |
Deep UV sensitive resistant to latent image decay comprising a diazonaphthoquinone sulfonate of a nitrobenzyl derivative
|
|
JPH0876380A
(ja)
|
1994-09-06 |
1996-03-22 |
Fuji Photo Film Co Ltd |
ポジ型印刷版組成物
|
|
WO1997039894A1
(en)
|
1996-04-23 |
1997-10-30 |
Horsell Graphic Industries Limited |
Heat-sensitive composition and method of making a lithographic printing form with it
|
|
JP3522923B2
(ja)
|
1995-10-23 |
2004-04-26 |
富士写真フイルム株式会社 |
ハロゲン化銀感光材料
|
|
TW502135B
(en)
*
|
1996-05-13 |
2002-09-11 |
Sumitomo Bakelite Co |
Positive type photosensitive resin composition and process for preparing polybenzoxazole resin film by using the same
|
|
US6117610A
(en)
*
|
1997-08-08 |
2000-09-12 |
Kodak Polychrome Graphics Llc |
Infrared-sensitive diazonaphthoquinone imaging composition and element containing non-basic IR absorbing material and methods of use
|
|
GB9622657D0
(en)
|
1996-10-31 |
1997-01-08 |
Horsell Graphic Ind Ltd |
Direct positive lithographic plate
|
|
EP0852341B1
(en)
|
1997-01-03 |
2001-08-29 |
Sumitomo Bakelite Company Limited |
Method for the pattern-processing of photosensitive resin composition
|
|
US6090532A
(en)
*
|
1997-03-21 |
2000-07-18 |
Kodak Polychrome Graphics Llc |
Positive-working infrared radiation sensitive composition and printing plate and imaging method
|
|
US6063544A
(en)
*
|
1997-03-21 |
2000-05-16 |
Kodak Polychrome Graphics Llc |
Positive-working printing plate and method of providing a positive image therefrom using laser imaging
|
|
JP2002510404A
(ja)
|
1997-07-05 |
2002-04-02 |
コダック・ポリクローム・グラフィックス・カンパニー・リミテッド |
パターン形成方法および放射線感受性材料
|
|
US6060217A
(en)
*
|
1997-09-02 |
2000-05-09 |
Kodak Polychrome Graphics Llc |
Thermal lithographic printing plates
|
|
US6045963A
(en)
*
|
1998-03-17 |
2000-04-04 |
Kodak Polychrome Graphics Llc |
Negative-working dry planographic printing plate
|
|
US6296982B1
(en)
|
1999-11-19 |
2001-10-02 |
Kodak Polychrome Graphics Llc |
Imaging articles
|
|
CN100347609C
(zh)
*
|
2000-10-31 |
2007-11-07 |
英特尔公司 |
正性光敏树脂组合物、制备正性光敏树脂组合物的方法及半导体设备
|
|
US7416822B2
(en)
*
|
2004-01-20 |
2008-08-26 |
Asahi Kasei Emd Corporation |
Resin and resin composition
|
|
JP5034269B2
(ja)
|
2005-03-31 |
2012-09-26 |
大日本印刷株式会社 |
パターン形成材料、及びポリイミド前駆体樹脂組成物
|
|
WO2008020573A1
(fr)
|
2006-08-15 |
2008-02-21 |
Asahi Kasei Emd Corporation |
Composition de résine photosensible positive
|
|
CN107850844B
(zh)
|
2016-03-31 |
2021-09-07 |
旭化成株式会社 |
感光性树脂组合物、固化浮雕图案的制造方法和半导体装置
|
|
CN112142613B
(zh)
*
|
2020-09-22 |
2021-06-25 |
江南大学 |
一种松香基小分子有机凝胶剂及其形成的环己烷凝胶
|