CH347712A - Photosensitive plate useful for making an offset printing plate - Google Patents

Photosensitive plate useful for making an offset printing plate

Info

Publication number
CH347712A
CH347712A CH347712DA CH347712A CH 347712 A CH347712 A CH 347712A CH 347712D A CH347712D A CH 347712DA CH 347712 A CH347712 A CH 347712A
Authority
CH
Switzerland
Prior art keywords
making
plate
offset printing
useful
photosensitive
Prior art date
Application number
Other languages
German (de)
Inventor
Ernest Jr Herrick Clifford
Forks Chenango
Thomas Jr Woitach Peter
City Johnson
John Trojnar Edward
Original Assignee
Gen Aniline & Film Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Gen Aniline & Film Corp filed Critical Gen Aniline & Film Corp
Publication of CH347712A publication Critical patent/CH347712A/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Printing Plates And Materials Therefor (AREA)
CH347712D 1954-08-20 1955-08-17 Photosensitive plate useful for making an offset printing plate CH347712A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US451271A US2772972A (en) 1954-08-20 1954-08-20 Positive diazotype printing plates

Publications (1)

Publication Number Publication Date
CH347712A true CH347712A (en) 1960-07-15

Family

ID=23791529

Family Applications (1)

Application Number Title Priority Date Filing Date
CH347712D CH347712A (en) 1954-08-20 1955-08-17 Photosensitive plate useful for making an offset printing plate

Country Status (7)

Country Link
US (1) US2772972A (en)
BE (1) BE540225A (en)
CH (1) CH347712A (en)
DE (1) DE1108079B (en)
FR (1) FR1134857A (en)
GB (1) GB784001A (en)
NL (2) NL199728A (en)

Families Citing this family (50)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE540601A (en) * 1950-12-06
GB907718A (en) * 1957-11-01 1962-10-10 Lithoplate Inc Hydrophilic base plates for diazo presensitized lithographic printing plates
US2993788A (en) * 1958-06-17 1961-07-25 Gen Aniline & Film Corp Multicolor reproduction using light sensitive diazo oxides
US3130051A (en) * 1958-12-10 1964-04-21 Gen Aniline & Film Corp Process for producing negative working offset diazo printing plates
DE1095665B (en) * 1959-01-12 1960-12-22 Hans Hoerner Process for the photomechanical production of letterpress forms from several plastic layers
US3095301A (en) * 1959-04-06 1963-06-25 Gen Aniline & Film Corp Electrophotographic element
US3173788A (en) * 1960-02-10 1965-03-16 Gen Aniline & Film Corp Developing positive working photolitho-graphic printing plates containing diazo oxides
US3164468A (en) * 1960-06-06 1965-01-05 Gen Aniline & Film Corp Photomechanical reversal process and foil and dyes for use therein
US3086861A (en) * 1960-07-01 1963-04-23 Gen Aniline & Film Corp Printing plates comprising ink receptive azo dye surfaces
US3149972A (en) * 1960-08-16 1964-09-22 Gen Aniline & Film Corp Diazo and resinous coupler printing plates for photomechanical reproduction
BE612386A (en) * 1961-01-09
BE620660A (en) * 1961-07-28
CA774047A (en) * 1963-12-09 1967-12-19 Shipley Company Light-sensitive material and process for the development thereof
US3486450A (en) * 1964-02-27 1969-12-30 Eastman Kodak Co Color proofing system
DE1472771A1 (en) * 1965-07-30 1969-01-02 Adox Du Pont Fotowerke Process for the production of dimensionally stable photographic films
US3549373A (en) * 1966-03-19 1970-12-22 Ricoh Kk Negative-to-positive reversible copy sheet
US3474719A (en) * 1966-04-15 1969-10-28 Gaf Corp Offset printing plates
GB1188527A (en) * 1966-05-31 1970-04-15 Algraphy Ltd Development of Light-Sensitive Layers
NL136645C (en) * 1966-12-12
US3637384A (en) * 1969-02-17 1972-01-25 Gaf Corp Positive-working diazo-oxide terpolymer photoresists
US3920455A (en) * 1971-05-28 1975-11-18 Polychrome Corp Light-sensitive compositions and materials with O-naphthoquinone diazide sulfonyl esters
JPS521663B2 (en) * 1973-02-10 1977-01-17
JPS5421089B2 (en) * 1973-05-29 1979-07-27
GB1482921A (en) * 1973-07-31 1977-08-17 Glaxo Lab Ltd Polymers
JPS56500646A (en) * 1978-02-06 1981-05-14
CA1180931A (en) * 1980-09-15 1985-01-15 Robert W. Hallman Bilayer photosensitive imaging article including film-forming bimodal styrene-maleic anhydride copolymer in the image layer
JPH01501176A (en) * 1986-10-20 1989-04-20 マクダーミッド，インコーポレーテッド Image reversible systems and processes
EP0280197A3 (en) * 1987-02-23 1990-05-23 Oki Electric Industry Company, Limited Process for forming photoresist pattern
EP0410606B1 (en) 1989-07-12 1996-11-13 Fuji Photo Film Co., Ltd. Siloxane polymers and positive working light-sensitive compositions comprising the same
US5308744A (en) * 1993-03-05 1994-05-03 Morton International, Inc. Source of photochemically generated acids from diazonaphthoquinone sulfonates of nitrobenzyl derivatives
US5314782A (en) * 1993-03-05 1994-05-24 Morton International, Inc. Deep UV sensitive resistant to latent image decay comprising a diazonaphthoquinone sulfonate of a nitrobenzyl derivative
JPH0876380A (en) 1994-09-06 1996-03-22 Fuji Photo Film Co Ltd Positive printing plate composition
JP3522923B2 (en) 1995-10-23 2004-04-26 富士写真フイルム株式会社 Silver halide photosensitive material
DE29724584U1 (en) 1996-04-23 2002-04-18 Kodak Polychrome Graphics Co Heat-sensitive composition and precursor of a lithographic printing plate produced therewith
TW502135B (en) * 1996-05-13 2002-09-11 Sumitomo Bakelite Co Positive type photosensitive resin composition and process for preparing polybenzoxazole resin film by using the same
US6117610A (en) * 1997-08-08 2000-09-12 Kodak Polychrome Graphics Llc Infrared-sensitive diazonaphthoquinone imaging composition and element containing non-basic IR absorbing material and methods of use
GB9622657D0 (en) 1996-10-31 1997-01-08 Horsell Graphic Ind Ltd Direct positive lithographic plate
EP0852341B1 (en) 1997-01-03 2001-08-29 Sumitomo Bakelite Company Limited Method for the pattern-processing of photosensitive resin composition
US6090532A (en) * 1997-03-21 2000-07-18 Kodak Polychrome Graphics Llc Positive-working infrared radiation sensitive composition and printing plate and imaging method
US6063544A (en) * 1997-03-21 2000-05-16 Kodak Polychrome Graphics Llc Positive-working printing plate and method of providing a positive image therefrom using laser imaging
WO1999001796A2 (en) 1997-07-05 1999-01-14 Kodak Polychrome Graphics Llc Pattern-forming methods
US6060217A (en) * 1997-09-02 2000-05-09 Kodak Polychrome Graphics Llc Thermal lithographic printing plates
US6045963A (en) * 1998-03-17 2000-04-04 Kodak Polychrome Graphics Llc Negative-working dry planographic printing plate
US6296982B1 (en) 1999-11-19 2001-10-02 Kodak Polychrome Graphics Llc Imaging articles
US6908717B2 (en) * 2000-10-31 2005-06-21 Sumitomo Bakelite Company Limited Positive photosensitive resin composition, process for its preparation, and semiconductor devices
CN1910221B (en) * 2004-01-20 2010-12-08 旭化成电子材料株式会社 Resin and resin composition
JP5034269B2 (en) 2005-03-31 2012-09-26 大日本印刷株式会社 Pattern forming material and polyimide precursor resin composition
EP2056163A4 (en) 2006-08-15 2009-11-11 Asahi Kasei Emd Corp Positive photosensitive resin composition
KR102090449B1 (en) 2016-03-31 2020-03-18 아사히 가세이 가부시키가이샤 Photosensitive resin composition, method for manufacturing cured relief pattern, and semiconductor apparatus
CN112142613B (en) * 2020-09-22 2021-06-25 江南大学 Rosin-based small-molecule organic gel and cyclohexane gel formed by same

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE525534C (en) * 1930-07-09 1931-05-26 Klimsch & Co Process for developing chromate shellac copies
BE416158A (en) * 1935-01-12
DE699462C (en) * 1936-02-15 1940-11-29 Kodak Akt Ges Photographic film with a subbing layer for the photosensitive emulsion
DE754015C (en) * 1940-02-24 1953-05-11 Johannes Dr Albrecht Photosensitive layer for the production of printing forms
DE862956C (en) * 1941-10-30 1953-01-15 Basf Ag Process for the production of copolymers
BE476486A (en) * 1947-05-09
NL70798C (en) * 1948-10-15
NL76414C (en) * 1949-07-23
DE960335C (en) * 1951-06-07 1957-03-21 Kalle & Co Ag Photosensitive material
DE904733C (en) * 1951-09-29 1954-02-22 Johannes Herzog & Co Photochem Photosensitive material for the production of source reliefs for printing purposes and methods of printing with the reliefs
BE523231A (en) * 1953-05-22

Also Published As

Publication number Publication date
NL199728A (en)
US2772972A (en) 1956-12-04
BE540225A (en)
NL95407C (en)
GB784001A (en) 1957-10-02
FR1134857A (en) 1957-04-18
DE1108079B (en) 1961-05-31

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