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Application filed by Kalle & Co AgfiledCriticalKalle & Co Ag
Publication of CH308915ApublicationCriticalpatent/CH308915A/de
G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
G03F7/004—Photosensitive materials
G03F7/022—Quinonediazides
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Physics & Mathematics
(AREA)
General Physics & Mathematics
(AREA)
Materials For Photolithography
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Photosensitive Polymer And Photoresist Processing
(AREA)
CH308915D1950-08-011951-07-31Lichtempfindliches Material zur photomechanischen Herstellung von druckfähigen Bildern, insbesondere von Druckformen.
CH308915A
(de)