CA959171A - Input transient protection for complementary insulated gate field effect transistor integrated circuit - Google Patents

Input transient protection for complementary insulated gate field effect transistor integrated circuit

Info

Publication number
CA959171A
CA959171A CA163,219A CA163219A CA959171A CA 959171 A CA959171 A CA 959171A CA 163219 A CA163219 A CA 163219A CA 959171 A CA959171 A CA 959171A
Authority
CA
Canada
Prior art keywords
integrated circuit
field effect
effect transistor
insulated gate
gate field
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
CA163,219A
Other languages
English (en)
Other versions
CA163219S (en
Inventor
Goetz W. Steudel
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
RCA Corp
Original Assignee
RCA Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by RCA Corp filed Critical RCA Corp
Application granted granted Critical
Publication of CA959171A publication Critical patent/CA959171A/en
Expired legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
    • H01L27/0203Particular design considerations for integrated circuits
    • H01L27/0248Particular design considerations for integrated circuits for electrical or thermal protection, e.g. electrostatic discharge [ESD] protection
    • H01L27/0251Particular design considerations for integrated circuits for electrical or thermal protection, e.g. electrostatic discharge [ESD] protection for MOS devices
    • H01L27/0255Particular design considerations for integrated circuits for electrical or thermal protection, e.g. electrostatic discharge [ESD] protection for MOS devices using diodes as protective elements
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
    • H01L27/04Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body
    • H01L27/08Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind
    • H01L27/085Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind including field-effect components only
    • H01L27/088Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind including field-effect components only the components being field-effect transistors with insulated gate
    • H01L27/092Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind including field-effect components only the components being field-effect transistors with insulated gate complementary MIS field-effect transistors
    • H01L27/0927Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind including field-effect components only the components being field-effect transistors with insulated gate complementary MIS field-effect transistors comprising a P-well only in the substrate

Landscapes

  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
  • Amplifiers (AREA)
CA163,219A 1972-03-27 1973-02-08 Input transient protection for complementary insulated gate field effect transistor integrated circuit Expired CA959171A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US23848672A 1972-03-27 1972-03-27

Publications (1)

Publication Number Publication Date
CA959171A true CA959171A (en) 1974-12-10

Family

ID=22898111

Family Applications (1)

Application Number Title Priority Date Filing Date
CA163,219A Expired CA959171A (en) 1972-03-27 1973-02-08 Input transient protection for complementary insulated gate field effect transistor integrated circuit

Country Status (9)

Country Link
US (1) US3712995A (xx)
JP (1) JPS5422277B2 (xx)
CA (1) CA959171A (xx)
DE (1) DE2313312A1 (xx)
FR (1) FR2177994B1 (xx)
GB (1) GB1359979A (xx)
IT (1) IT980654B (xx)
MY (1) MY7500146A (xx)
SE (1) SE383230B (xx)

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* Cited by examiner, † Cited by third party
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US3913125A (en) * 1973-06-11 1975-10-14 Gte Laboratories Inc Negative impedance converter
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US3955210A (en) * 1974-12-30 1976-05-04 International Business Machines Corporation Elimination of SCR structure
US4099074A (en) * 1975-03-06 1978-07-04 Sharp Kabushiki Kaisha Touch sensitive electronic switching circuitry for electronic wristwatches
US3967295A (en) * 1975-04-03 1976-06-29 Rca Corporation Input transient protection for integrated circuit element
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GB1559583A (en) * 1975-07-18 1980-01-23 Tokyo Shibaura Electric Co Complementary mosfet device and method of manufacturing the same
US4209713A (en) * 1975-07-18 1980-06-24 Tokyo Shibaura Electric Co., Ltd. Semiconductor integrated circuit device in which difficulties caused by parasitic transistors are eliminated
US4168442A (en) * 1975-07-18 1979-09-18 Tokyo Shibaura Electric Co., Ltd. CMOS FET device with abnormal current flow prevention
DE2539890B2 (de) * 1975-09-08 1978-06-01 Siemens Ag, 1000 Berlin Und 8000 Muenchen Schaltungsanordnung zum Schutz von Eingängen integrierter MOS-Schaltkreise
US4203126A (en) * 1975-11-13 1980-05-13 Siliconix, Inc. CMOS structure and method utilizing retarded electric field for minimum latch-up
JPS5286083A (en) * 1976-01-12 1977-07-16 Hitachi Ltd Production of complimentary isolation gate field effect transistor
JPS5299786A (en) * 1976-02-18 1977-08-22 Agency Of Ind Science & Technol Mos integrated circuit
US4037140A (en) * 1976-04-14 1977-07-19 Rca Corporation Protection circuit for insulated-gate field-effect transistors (IGFETS)
US4068278A (en) * 1976-05-27 1978-01-10 Williams Bruce T Overload protection circuit for amplifiers
US4066918A (en) * 1976-09-30 1978-01-03 Rca Corporation Protection circuitry for insulated-gate field-effect transistor (IGFET) circuits
US4240093A (en) * 1976-12-10 1980-12-16 Rca Corporation Integrated circuit device including both N-channel and P-channel insulated gate field effect transistors
CH621036B (fr) * 1977-02-28 Berney Sa Jean Claude Circuit integre pour piece d'horlogerie.
US4135955A (en) * 1977-09-21 1979-01-23 Harris Corporation Process for fabricating high voltage cmos with self-aligned guard rings utilizing selective diffusion and local oxidation
US4350906A (en) * 1978-06-23 1982-09-21 Rca Corporation Circuit with dual-purpose terminal
US4240042A (en) * 1979-04-05 1980-12-16 Rca Corporation Bandwidth limited large signal IC amplifier stage
JPS55136726A (en) * 1979-04-11 1980-10-24 Nec Corp High voltage mos inverter and its drive method
US4282556A (en) * 1979-05-21 1981-08-04 Rca Corporation Input protection device for insulated gate field effect transistor
US4296335A (en) * 1979-06-29 1981-10-20 General Electric Company High voltage standoff MOS driver circuitry
US4295176A (en) * 1979-09-04 1981-10-13 Bell Telephone Laboratories, Incorporated Semiconductor integrated circuit protection arrangement
US4342045A (en) * 1980-04-28 1982-07-27 Advanced Micro Devices, Inc. Input protection device for integrated circuits
JPS577966A (en) * 1980-06-19 1982-01-16 Oki Electric Ind Co Ltd Semiconductor integrated circuit device
IT1211141B (it) * 1981-12-04 1989-09-29 Ates Componenti Elettron Circuito limitatore-trasduttore disegnali in alternata codificati in forma binaria, come stadio d'ingresso di un circuito integrato a igfet.
JPS58119670A (ja) * 1982-01-11 1983-07-16 Nissan Motor Co Ltd 半導体装置
GB2128021A (en) * 1982-09-13 1984-04-18 Standard Microsyst Smc CMOS structure including deep region and process for fabrication
JPS60767A (ja) * 1983-06-17 1985-01-05 Hitachi Ltd 半導体装置
JPS6027145A (ja) * 1983-07-25 1985-02-12 Hitachi Ltd 半導体集積回路装置
US4605980A (en) * 1984-03-02 1986-08-12 Zilog, Inc. Integrated circuit high voltage protection
US4745450A (en) * 1984-03-02 1988-05-17 Zilog, Inc. Integrated circuit high voltage protection
JPS60254651A (ja) * 1984-05-30 1985-12-16 Mitsubishi Electric Corp Cmos回路の入力保護回路
US4626882A (en) * 1984-07-18 1986-12-02 International Business Machines Corporation Twin diode overvoltage protection structure
JPS6153761A (ja) * 1984-08-24 1986-03-17 Hitachi Ltd 半導体装置
US4739437A (en) * 1986-10-22 1988-04-19 Siemens-Pacesetter, Inc. Pacemaker output switch protection
JPS63305545A (ja) * 1987-06-05 1988-12-13 Hitachi Ltd 半導体集積回路装置
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US4890143A (en) * 1988-07-28 1989-12-26 General Electric Company Protective clamp for MOS gated devices
IT1227104B (it) * 1988-09-27 1991-03-15 Sgs Thomson Microelectronics Circuito integrato autoprotetto da inversioni di polarita' della batteria di alimentazione
US4922371A (en) * 1988-11-01 1990-05-01 Teledyne Semiconductor ESD protection circuit for MOS integrated circuits
US5032742A (en) * 1989-07-28 1991-07-16 Dallas Semiconductor Corporation ESD circuit for input which exceeds power supplies in normal operation
JP3124144B2 (ja) * 1993-01-27 2001-01-15 株式会社東芝 半導体装置
JPH0888323A (ja) * 1994-09-19 1996-04-02 Nippondenso Co Ltd 半導体集積回路装置
KR960015900A (ko) * 1994-10-06 1996-05-22 반도체 장치 및 그 제조방법
US5844370A (en) 1996-09-04 1998-12-01 Micron Technology, Inc. Matrix addressable display with electrostatic discharge protection
US6410964B1 (en) * 1998-03-31 2002-06-25 Nec Corporation Semiconductor device capable of preventing gate oxide film from damage by plasma process and method of manufacturing the same
US6184557B1 (en) * 1999-01-28 2001-02-06 National Semiconductor Corporation I/O circuit that utilizes a pair of well structures as resistors to delay an ESD event and as diodes for ESD protection
TW495952B (en) * 2001-07-09 2002-07-21 Taiwan Semiconductor Mfg Electrostatic discharge protection device
JP2008085188A (ja) * 2006-09-28 2008-04-10 Sanyo Electric Co Ltd 絶縁ゲート型半導体装置
JP5511124B2 (ja) * 2006-09-28 2014-06-04 セミコンダクター・コンポーネンツ・インダストリーズ・リミテッド・ライアビリティ・カンパニー 絶縁ゲート型半導体装置
JP5337470B2 (ja) * 2008-04-21 2013-11-06 セミコンダクター・コンポーネンツ・インダストリーズ・リミテッド・ライアビリティ・カンパニー 絶縁ゲート型半導体装置
US8482029B2 (en) * 2011-05-27 2013-07-09 Infineon Technologies Austria Ag Semiconductor device and integrated circuit including the semiconductor device
CN110828564B (zh) 2018-08-13 2022-04-08 香港科技大学 具有半导体性栅极的场效应晶体管
JP2021010286A (ja) * 2019-07-03 2021-01-28 ローム株式会社 駆動回路
JP7515857B2 (ja) 2020-05-26 2024-07-16 株式会社不二工機 排水ポンプ

Also Published As

Publication number Publication date
MY7500146A (en) 1975-12-31
DE2313312A1 (de) 1973-10-11
IT980654B (it) 1974-10-10
GB1359979A (en) 1974-07-17
FR2177994A1 (xx) 1973-11-09
US3712995A (en) 1973-01-23
FR2177994B1 (xx) 1977-09-02
JPS4916391A (xx) 1974-02-13
SE383230B (sv) 1976-03-01
JPS5422277B2 (xx) 1979-08-06

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